Design of a diffractive optical element for pattern formation in a bilingual virtual keyboard

Pattern formation is one of the many applications of diffractive optical elements (DOEs) for display. Since DOEs have lightweight and slim nature compared to other optical devices, using them as image projection device in virtual keyboards is suggested. In this paper, we present an approach to designing elements that produce distinct intensity patterns, in the far field, for two wavelengths. These two patterns are images of bilingual virtual keyboard. To achieve this with DOEs is not simple, as they are inherently wavelength specific. Our technique is based on phase periodic characteristic of wavefront using iterative algorithm to design the phase profiles.     

Diffractive optical element used in an external feedback configuration to tune the wavelength of uncoated Fabry-Pérot diode lasers

Abstract

A diffractive optical element (DOE) has been designed, fabricated and used in an external feedback configuration to set the wavelength of operation of uncoated Fabry-Pérot diode lasers. The DOE was designed to replace the conventional elements of an external feedback system, which are a collimating lens and grating in the Littrow configuration. The goal was to simplify use of the external cavity laser by replacing the lens and grating with a single optical element while maintaining the performance that is achieved with a grating and lens. Four DOEs were fabricated with two different focal lengths and two different reflectivities. DOE external cavity lasers were tested for maximum tunable range and stability of the wavelength of operation and compared with an external cavity laser based on a lens and grating in the Littrow configuration. A 40 nm tuning range was achieved with the DOE external cavity laser and this is comparable with the tuning range of the external cavity lasers based on a grating and collimating lens in the Littrow configuration.     

Parametric dependencies of high-diffraction-order achromatized aplanatic configurations that employ circular or crossed-linear diffractive optical elements

The parametric relationships of achromatized transmissive and reflective diffractive optical elements (DOEs) are explored for a number of configuration classes as a function of diffraction order, focal ratio, wavelength, and field angle. The necessity for blazing high-diffraction-order DOEs is elucidated. The ray image sizes are presented in dimensionless imaging space and thus are applicable to any size of optical system. Several aplanatic configurations are evaluated.     

Surface-enhanced Raman scattering of crystal violets from periodic array of gold nanocylinders

The periodic arrays of gold nanocylinder with 121?nm in diameter, 6.3?nm in gap, and 34?nm in thickness are fabricated on glass by electron-beam lithography and lift-off techniques. Some crystal violet molecules are coated on the array by using the dipping and drawing method. In addition, the surface-enhanced Raman scattering (SERS) spectra of these samples with and without gold nanocylinder arrays are characterized specifically. The largest enhancement factor is obtained when the excitation wavelength corresponds to the peak wavelength of localized surface plasmon resonance (LSPR). The density functional theory and the finite-difference time-domain method are used for the calculations of the extinction spectrum of the arrays and Raman spectra of the crystal violet, respectively. These results unambiguously demonstrate that the periodic arrays of gold nanocylinder have good and effective surface-enhanced properties for Raman scattering of crystal violets, and they also show that the excitation wavelength corresponding to the peak one of the LSPR is one of the major reasons causing SERS.     

Diffractive optical elements for simultaneous operation in reflection and transmission

It is advantageous for some diffractive optical element (DOE) applications to produce different output patterns in different circumstances. There has been considerable work on the design of wavelength multiplexing DOEs and in devices where the polarization of the incident light determines the output. One parameter that has not, to our knowledge, been exploited for pattern formation DOEs is the mode of operation, i.e., whether the element works in reflection or transmission. We present an approach for designing such devices and design an element with modeled efficiency, mean square error (MSE), and cross-talk of 65.9, 2.52, and 4.2% in transmission and 66.6, 2.50, and 3.5% in reflection. The element has been successfully fabricated and has measured efficiencies of 58.3% +/- 2 in reflection and 68.8% +/- 5 in transmission are reported.     

Fan-out diffractive optical elements designed for increased fabrication tolerances to linear relief depth errors

The intensity uniformity of the spots generated by fan-out diffractive optical elements (DOEs) (or kinoforms) is often highly sensitive to any fabrication error that leads to a deviation of the surface-relief depth of the DOE from its design value. Many of the fabrication errors, such as those that are due to insufficient control of development or etch rates, increase almost linearly with the desired relief depth in every position of the DOE. We present an algorithm for designing fan-out DOEs with a significantly reduced sensitivity of the intensity uniformity to such errors. The reduced sensitivity can be obtained without reducing the efficiency of the DOE. Experimental results for fabricated DOEs show that reduced sensitivity is also obtained in practice.     

Transfer of micro-optical structures into GaAs by use of inductively coupled plasma dry etching

The transfer of continuous-relief micro-optical structures from resist into GaAs by the use of direct-write electron-beam (e-beam) lithography followed by dry etching in an inductively coupled plasma is demonstrated. BCl3-Ar chemistry was found to give satisfactory results; N2 and Cl2 were added to change the selectivity between GaAs and e-beam resist. The transfer process generates smooth etched structures. Distortion of the diffractive structures in the transfer process was examined. Blazed gratings with a period of 10 microns were optically evaluated with a 940-nm VCSEL. This grating was a five-step approximation of a blazed profile. The diffraction efficiency was 67% in the first order, with a theoretical value of 87%. Also, simulations of the optical performance of the transferred diffractive elements were made by use of a Fourier transform of the grating profile. Our goal is to integrate micro-optical structures with VCSELs.     

Optimization of diffraction grating profiles in fabrication by electron-beam lithography

We propose a new design method for periodic diffraction gratings to be fabricated with direct-writing electron-beam lithography. When the grating has a small period, the proximity effect of electron scattering restricts the grating profile after developing. Our design method optimizes the electron-dose profile and grating profile simultaneously to obtain the desired diffraction efficiency under the restriction of the proximity effect. The optimization is made with rigorous electromagnetic grating analysis and the resist development simulator. When we designed the diffraction grating with a period of 1.0 microm to obtain the highest efficiency of the first-order diffracted light of a 633-nm wavelength, the calculated grating profile was really different from the profile optimized only with rigorous electromagnetic grating analysis. Moreover, the diffraction grating of the electron-beam resist was fabricated according to the simulation result. The estimated diffraction efficiency was 82%, and the measured efficiency was 70%.     

Diffraction gratings of photosensitive ZrO2 gel films fabricated with the two-ultraviolet-beam interference method

Photosensitive ZrO(2) gel films were patterned with a two-beam interference method by use of a 325-nm-wavelength He-Cd laser for the first time to our knowledge. The ZrO(2) gel films were prepared from Zr(O-n-C(4)H(9))(4) chemically modified with benzoylacetone. We fabricated uniform gratings with a 0.5-mum period on Si or SiO(2) substrates by etching the gel films in ethyl alcohol after UV irradiation. A maximum diffraction efficiency of 28% was attained with the grating fabricated on Si substrate under a Littrow mounting condition by use of a 633-nm-wavelength He-Ne laser. Blazed gratings could also be fabricated.     

Computer-generated stratified diffractive optical elements

We present what is to our knowledge a new type of diffractive optical element (DOE), the computer-generated stratified diffractive optical element (SDOE), a hybridization of thin computer-generated DOEs and volume holograms. A model and several algorithms for calculating computer-generated SDOEs are given. Simulations and experimental results are presented that exhibit the properties of computer-generated SDOEs: the strong angular and wavelength selectivity of SDOEs makes it possible to store multiple pages in a computer-generated SDOE, which can be read out separately (multiplexing). The reconstruction of an optimized SDOE has a higher quality than the reconstruction of optimized one-layer DOEs. SDOEs can be calculated to have only one diffraction order.     

Optimal quantization method for uneven-phase diffractive optical elements by use of a modified iterative Fourier-transform algorithm

A method based on an iterative Fourier-transform algorithm (IFTA) with phase optimization for phase-only multilevel diffractive optical elements (DOEs) is presented. Phase optimization by minimizing the mean-squared error composed of an amplitude-weighted probability-density function is performed in the IFTA iterations to ensure that the wavefront difference is minimized and thus to improve the DOEs' performance. Using the proposed method, we obtained a small standard deviation of diffraction efficiency of 20 uneven-phase DOEs, showing that DOEs with high diffraction efficiency did not vary significantly with the initial conditions. The simulation results of even- and uneven-phase four-level DOEs designed by use of direct and stepwise quantization IFTA methods are compared.     

Diffractive optics applied to free-space optical interconnects

The optimum design of free-space optical interconnection systems utilizing diffractive optics is determined from a practical engineering standpoint for systems ranging from space invariant to fully space variant. System volume is calculated in terms of parameters such as the f-number of the diffractive lens, the wavelength of light, and also the total number, size, and separation of the optical sources and detectors. Performance issues such as interconnection complexity, diffraction efficiency, and signal-tonoise ratio are discussed. Diffractive optics fabricated by electron-beam direct-write techniques are used to provide experimental results for both shuffle-exchange and twin-butterfly free-space optical interconnects.     

Diffractive light attenuators with variable transmission

Abstract

A new application of diffractive optical elements (DOEs) for continuous or multistage adjustment of optical radiation intensity is described. The diffractive attenuators are linear or circular gratings (amplitude or phase) with constant period and diffraction efficiency that varies across the grating. The zero order of diffraction is used as the output and transmitted through the grating without angular deviation. The diffractive attenuators, in distinction to conventional analogues, allow one to change the intensity of the light beam according to predetermined function and have no limitations for power of the regulated light beam. These elements can be used in optical systems as a beam splitter with adjusted splitting coefficient. The experimental results on a circular diffractive attenuator fabricated by direct laser writing on a chromium film are presented. The range of transmission variation was 20 times within a 340° angle of attenuator turn. The possibility to use a phase diffractive attenuator as a light radiation modulator for a powerful technological laser is discussed.     

Chalcogenide coatings of Ge15Sb20S65 and Te20As30Se50

Chalcogenide coatings are investigated to obtain either optical components for spectral applications or optochemical sensors in the mid-infrared. The deposition of Ge(15)Sb(20)S(65) and Te(20)As(30)Se(50) chalcogenide glasses is performed by two physical techniques: electron-beam and pulsed-laser deposition. The quality of the film is analyzed by scanning electron microscopy, atomic force microscopy, and energy dispersive spectroscopy to characterize the morphology, topography, and chemical composition. The optical properties and optical constants are also determined. A CF(4) dry etching is performed on these films to obtain a channeled optical waveguide. For a passband filter made by electron-beam deposition, cryolite as a low-refractive-index material and chalcogenide glasses as high-refractive-index materials are used to favor a large refractive-index contrast. A shift of a centered wavelength of a photosensitive passband filter is controlled by illumination time.     

Completely passive method of speckle reduction utilizing static multimode optical fibre and two-dimensional diffractive optical element

ABSTRACT

In this paper, we present experimental results on speckle noise suppression using a completely passive method. The passivity of the method is achieved owing to the absence of any mechanical, electronic, or other dynamic influences on the optical scheme elements. In the experiment, a multimode semiconductor 520?±?5-nm laser with a spectral bandwidth of 2?nm, static two-dimensional (2D) and 2?×?1D diffractive optical elements (DOEs), as well as multimode single-core optical fibre and multimode optical fibre bundle were used. The dependence of the speckle reduction efficiency as a function of the optical fibre type and optical fibre length was measured for different DOEs. A speckle contrast of 0.148 and speckle reduction coefficient of 2.38 were obtained for a 2.5-m-long multimode optical fibre bundle. The experimental results confirmed that it is possible to construct completely passive optical circuits with reduced speckle noises using static multimode optical fibres and diffraction optical elements.     

Diffractive optical elements for beam shaping of monochromatic spatially incoherent light

Fresnel-type diffractive optical elements (DOEs) for general beam shaping of monochromatic, spatially incoherent light are demonstrated. Direct and indirect methods, i.e., adding a lens' phase to the designed Fraunhofer-type DOEs, are used for the design. The indirect method can reduce the calculation time by approximately half without loss of design accuracy. Two different design examples are shown. For one design the direct method gives a maximum sidelobe intensity of 5.0% of the maximum intensity in the signal window. For the second design the indirect method gives 23.0% of this value. The generated patterns can maintain their basic shapes over a long distance. The elements have been fabricated by directly using gray-scale commercial slides as masks. Experimental results are in close agreement with numerical predictions.     

Analysis of the influence of the passive facet of blazed transmission gratings in the intermediate diffraction regime

Blazed diffraction gratings are of enormous practical importance for imaging and analyzing hybrid optical systems. The intermediate diffraction regime is characterized by the transition from the scalar to the rigorous electromagnetic theory. An effect known as shadowing occurs and reduces the diffraction efficiency. Based on rigorous calculations for optimized sawtooth-shaped and binary-multilevel blaze profiles, we deduce a semianalytical model describing the shadowing phenomenon for the general case of oblique incidence. We discuss illumination both from air and from the substrate. Though a multilevel blaze possesses a discrete substructure, our shadowing model remains valid, if substructural effects are neglected. We find that electromagnetic effects due to the passive blaze facet lead to the efficiency reduction, and the blazing efficiency shows a linear dependence on the ratio of blaze wavelength to grating period. Our shadowing model is applied to predict the performance of a Littrow-like blazing condition in transmission geometry as, e.g., for a diffractive solid immersion lens.     

Diffractive optical elements for the formation of "light bottle" intensity distributions

Application of the two-photon polymerization (2PP) technique for the fabrication of binary radial diffractive optical elements (DOEs) to form a bottle-like intensity distribution, or "light bottle," is studied. Computer modeling and fabrication of a binary DOE for the formation of the desired light distributions are realized. The results of scanning electron microscopy analysis of the diffractive relief produced by the 2PP technique and an investigation of the optical properties of the fabricated elements are presented.     

Efficient beam shaping of linear, high-power diode lasers by use of micro-optics

We have designed, fabricated, and characterized a micro-optical beam-shaping device that is intended to optimize the coupling of an incoherent, linearly extended high-power diode laser into a multimode fiber. The device uses two aligned diffractive optical elements (DOEs) in combination with conventional optics. With a first prototype, we achieved an overall efficiency of 28%. Straightforward improvements, such as antireflective coatings and the use of gray-tone elements, are expected to lead to an efficiency of approximately 50%. The device is compact, and its fabrication is suited for mass production at low cost. This micro-optical device, used in a range-finder measurement system, will extend the measurement range. In addition to the direct laser writing technique, which was used for fabrication of the DOEs of the prototype, we applied two other technologies for the fabrication of the micro-optical elements and compared their performance. The technologies were multiple-projection photolithography in combination with reactive-ion etching in fused silica and high-energy beam-sensitive glass gray-tone lithography in photoresist. We found that refractive-type elements (gray tone) yield better efficiency for large deflection angles, whereas diffractive elements (multilevel or laser written) give intrinsically accurate deflection angles.     

Development of a two-dimensional phase-grating mask for fabrication of an analog-resist profile

Fabrication of a thick analog profile with photoresist is a difficult task in photolithography. We demonstrate that a binary phase-grating photomask with an appropriate period and duty cycles is capable of manipulating the exposure illumination in an analog fashion and can be used for fabrication of the desired analog micro-optics profiles on the surface of a thick photoresist. By choosing the proper period and variation of duty cycle of the phase-grating mask, one can create the desired analog intensity of exposure illumination for an optical stepper. This allows the formation of a wide range of analog micro-optics profiles with an SPR 220-7 photoresist. The numerical convolution of the diffraction efficiency curve and resist exposure characteristics is used to predict the final resist profile and also to design the appropriate duty-cycle distribution for the binary phase grating. As a demonstration of this technology, we fabricated a variety of micro-optical elements, such as a positive lens, ring lens, prism, and vortex of approximately 100-200 microm diameter, by using a phase-grating mask fabricated in a poly(methyl methacrylate) electron-beam resist.