低阈值电流密度INGaAs/GaAs/AlGaAs应变量子阱激光器

利用分子束外延技术，生长了极低阈值电流密度、低内损耗、高量子效率的InGaAs／GaAs／AlGaAs应变量子阱激光器．在腔长900μm时，80μm宽接触激光器阈值电流密度是125A／cm2，在腔长为2000μm时是113A／cm2，这样低的阈值电流密度是目前国内报道的最低值．激光器的内损耗和内量子效率分别是2cm－1和84％．     

大功率低阈值半导体激光器研究

针对大光腔结构往往导致阈值电流密度增大的矛盾,设计了一种具有较高势垒高度的三量子阱有源区。采用非对称宽波导结构的半导体激光器,该激光器在实现大光腔结构的同时保持阈值电流密度不增加。通过金属有机物化学气相沉积(MOCVD)生长InGaAs/AlGaAs三量子阱有源区以及3.6μm超大光腔半导体激光器的外延结构。结合后期工艺,制备了980nm脊形边发射半导体激光器。在未镀膜情况下,4mm腔长半导体激光器阈值电流为1105.5mA,垂直发散角为15.6°,注入电流为25A时的最大输出功率可达到15.9 W。测试结果表明:所设计的半导体激光器在有效地拓展光场,实现大光腔结构的同时,保证了激光器具有较低的阈值电流。     

2.0μm中红外量子阱激光器研制及其性能测试与分析

利用固态源分子束外延技术在GaSb衬底上生长In GaAsSb/AlGaAsSb量子阱激光器结构,研制了激 射波长为2.0μm波段的GaSb基量子阱激光器。测量了激光器的阈值 电流密度随激光器腔长的变化规律, 得出无限腔长时器件的阈值电流密度为135A/cm²,在室温连续波 工作模式下,测得激光器的内量子效率 为61.1%,内部损耗为8.3cm－1,激光 输出功率斜效率为112mW/A,最高输出功率达到72mW,器件性 能优异。另外,还研究了改变激光器的腔长和改变注入电流的条件下器件激射波长的调谐特 性。器件激射 波长随注入电流的红移速度为0.475nm/mA。对于不同腔长的器件, 腔长越长,器件工作波长越长,工作波 长和腔长之间呈单调关系。上述波长变化规律是GaSb量子阱激光器的典型特征。     

GaAs/AlGaAs环形激光器的量子阱结构优化

为了研究量子阱结构对半导体环形激光器阈值电流的影响,从F-P腔激光器的振荡条件出发,分析了半导体环形激光器的阈值电流密度与量子阱结构参量的函数关系,并推导出最佳量子阱数的表达式。利用器件仿真软件ATLAS建立环形激光器的等效模型,仿真、分析了不同工作温度下,量子阱数、阱厚及势垒厚度对阈值电流的影响。结果表明,阈值电流随量子阱数和阱厚的增加先减小后增大,存在一组最佳值;在确定合适的量子阱数和阱厚后,相对较窄的势垒厚度有助于进一步降低阈值电流;采用GaAs/AlGaAs材料体系和器件结构,其最佳量子阱结构参量为M=3,dw=20nm及db=10nm。     

低阈值高效率InAlGaAs量子阱808 nm激光器

以Al0.3Ga0.7As/InAlGaAs/Al0.3Ga0.7As压应变量子阱代替传统的无应变量子阱作为有源区,实现降低808 nm半导体激光器的阈值电流,并提高器件的效率。首先优化设计了器件结构,并利用金属有机物化学气相淀积(MOCVD)进行了器件的外延生长。通过优化外延生长条件,保证了5.08 cm片内的量子阱(QW)光致发光(PL)光谱峰值波长均匀性达0.1%。对于条宽为50μm,腔长为750μm的器件,经镀膜后的阈值电流为81mA,斜率效率为1.22 W/A,功率转换效率达53.7%。变腔长实验得到器件的腔损耗仅为2 cm-1,内量子效率达90%。结果表明,压应变量子阱半导体激光器具有更优异的特性。     

低阈值电流、高量子效率脊形波导激光器

研制了低阈值电流、高量子效率670nm压缩应变单量子阱GaInP/AIGalnP脊形波导激光器。测量解理成的激光器条,腔长为300μm时,阈值电流为12．8mA,双面外部量子效率之和达到94．6％。     

2μm InGaAsSb/AlGaAsSb应变补偿量子阱结构的数值研究

为了降低2μm半导体激光器的阈值电流并提高器件的输出功率,设计了InGaAsSb/AlGaAsSb应变补偿量子阱结构,并利用SimLastip软件对器件进行了数值模拟.研究表明,在势垒中适当引入张应变可以改善量子阱的能带结构,提高对载流子的限制能力.当条宽为120 μm、腔长为1 000 μm时,采用应变补偿量子阱结构的激光器的阈值电流为91 mA,斜率效率为0.48 W/A.与压应变量子阱激光器相比,器件性能得到明显的改善.     

MBE生长高质量GaAs／AlGaAs量子阱激光器

我们利用分子束外延方法研制了ＧａＡｓ／ＡｌＧａＡｓ缓交折射率分别限制（ＧＲＩＮ－ＳＣＨ）单量子阱和双量子阱激光器．对腔长为６００μｍ的端面不镀膜的宽接触条型Ｆ－Ｐ腔激光器，阈值电流密度（平均值）分别为２９０Ａ／ｃｍ２和２４０Ａ／ｃｍ２．腔长在１２００μｍ的双量子阱激光器的阈电流密度低达１９０Ａ／ｃｍ２．对出光面和背面分别镀以增透膜和高反膜的宽接触条型（８０μｍ）．激光器，线性输出功率高达１．８２Ｗ；出光面的斜率效率达到１．０４Ｗ／Ａ；利用湿法化学腐蚀所制备的脊形波导结构单量子阱激光器阈值电流最低可达８ｍＡ     

低阈值量子结构激光器的优化结构设计

针对低阈值半导体量子结构激光器（简称量子结构激光器）,包括量子阱、量子线和量子点结构,给出了一个完整简便的方法用以优化设计最低阈值条件所需要的有源区结构。以对数形式给出了量子结构激光器材料增益和注入载流子浓度的关系,并且以ＩｎＧａＡｓ（Ｐ）／ＩｎＰ量子阱激光器和ＩｎＡｓ／ＧａＡｓ自组装量子点结构激光器为例,分别计算了为得到最低阈值电流所需要的量子阱阱数和自组装量子点的面密度以及激光器的腔长。     

低阈值高效率InAIGaAs量子阱808nm激光器

以Al0.3Ga0.7 As／InAlGaAs／Al0.3Ga0.7As压应变量子阱代替传统的无应变量子阱作为有源区，实现降低808nm半导体激光器的阈值电流，并提高器件的效率。首先优化设计了器件结构，并利用金属有机物化学气相淀积（MOCVD）进行了器件的外延生长。通过优化外延生长条件，保证了5．08cm片内的量子阱（OW）光致发光（PL）光谱峰值波长均匀性达0．1％。对于条宽为50／zm，腔长为750／zm的器件，经镀膜后的阈值电流为81mA，斜率效率为1．22W／A，功率转换效率达53．7％。变腔长实验得到器件的腔损耗仅为2cm^-1，内量子效率达90％。结果表明，压应变量子阱半导体激光器具有更优异的特性。     

Very low threshold GRIN-SCH GaAs/GaAlAs laser structure grown by OM-VPE

In a recent publication we gave preliminary results on the lasing characteristics of a GRIN-SCH GaAs/GaAlAs laser grown by OM-VPE. The parameters of this single quantum well laser have now been further optimised, and for a quantum well thickness of 60 ?, with outer confinement layers composed of Ga0.4Al0.6As, significantly lower threshold current densities have been achieved. For a broad-area laser of cavity length 413 ?m (width 140 ?m) the average threshold current density is 232 A cm?2, and this decreases to 121 A cm?2 for a chip length of 1788 ?m. We believe that these are the lowest lasing threshold current densities that have yet been reported.     

Analysis and application of theoretical gain curves to the design of multi-quantum-well lasers

Gain/current curves for a single quantum well are calculated. The optimum well number, cavity length, threshold current, and current density of multi-quantum-well (MQW) lasers are derived in terms of this gain curve. The limiting performance of MQW lasers is found to be better than that of graded refractive index (GRIN) lasers, assuming comparable efficiencies and spontaneous emission linewidths. The optimum threshold current for an MQW laser with a 7 μm cavity and 90 percent facet reflectivity issim50 muA/μm.     

外腔反馈半导体激光器的损耗和阈值特性研究

通过对半导体激光器(LD)的损耗和阈值电流特性的分析，引入等效反射系数的概念，根据多光束干涉的原理，导出了在外腔反馈作用下LD的阈值电流公式。从等效反射系数的推导可以看出，外腔的反馈相当于增大了LD一个端面的反射率，减小了损耗，从而使LD激光振荡的阈值降低。该公式在外腔长度和激光波长可以比拟的情况下能够准确地分析反馈注入对阈值电流的影响，但是在外腔长度远大于激光波长情况下不再适用。针对实验中外腔长度较大的情况，使用光功率的分析简化了理论模型，得出了与实验结果相吻合的结论，即外腔反馈注入使LD出光阈值电流明显降低。     

俄歇复合对应变量子阱激光器阈值电流的影响

通过考虑不同因素对压应变和张应变量子阱激光器阈值电流和特征温度的影响,得到了俄歇复合和非俄歇复合对阈值电流起主要作用的转变温度Tc,小于Tc时,主要是非俄歇复合;大于Tc时,主要是俄歇复合,而且张应变量子阱激光器转变温度要比压应变量子阱激光器的转变温度要高;张应变量子阱激光器与压应变量子阱激光器相比,阈值电流更低,特征温度更高。     

Low-threshold 833-nm GaAsP-AlGaAs tensile-strained quantum-well laser diodes

We report the demonstration of TM polarized laser emission at 833 nm from GaAsP-AlGaAs quantum well laser structures grown on GaAs substrates by low-pressure organometallic vapor phase epitaxy for the first time. This is the longest wavelength near infrared TM polarized laser ever reported. Broad area laser diodes containing single GaAs/sub 0.95/P/sub 0.05/ quantum well lased at a low threshold current density of 280 A/cm/sup 2/ for a cavity length of 1 mm and with a high differential quantum efficiency of 32%/facet for cavity length less than 500 /spl mu/m.     

Analysis of threshold current density and optical gain in InGaAsP quantum well lasers

Single-mode and multimode quantum well (QW) laser diodes with emission wavelengths λ=1.0 and 1.58 μm, based on MOCVD-grown separate-confinement heterostructures, have been studied. An analysis of the threshold current density and optical gain is made on the basis of experimental dependences of the threshold current and differential quantum efficiency on the cavity length. The threshold current is decomposed into principal components in terms of model approximations taking into account the Auger recombination, ejection of electrons from QWs into waveguide layers, and lateral current spreading to passive regions of a mesa-stripe laser. __________ Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 36, No. 3, 2002, pp. 364–374. Original Russian Text Copyright ? 2002 by Pikhtin, Sliptchenko, Sokolova, Tarasov.     

Low threshold current density 1.3 μm metamorphic InGaAs/GaAs quantum well laser diodes

Very low threshold current density InGaAs/GaAs quantum well laser diodes grown by molecular beam epitaxy on InGaAs metamorphic buffers are reported. The lasing wavelength of the ridge waveguide laser diode with cavity length of 1200 mum is centered at 1337.2 nm; the threshold current density is 205 A/cm² at room temperature under continuous-wave operation.     

1.06 μm high-power InGaAs/GaAsP quantum well lasers

The high power and low internal loss 1.06 μm InGaAs/GaAsP quantum well lasers with asymmetric waveguide structure were designed and fabricated. For a 4000 μm cavity length and 100 μm stripe width device, the maximum output power and conversion efficiency of the device are 7.13 W and 56.4%, respectively. The cavity length dependence of the threshold current density and conversion efficiency have been investigated theoretically and experimentally; the laser diode with 4000 μm cavity length shows better characteristics than that with 3000 and 4500 μm cavity length:the threshold current density is 132.5 A/cm², the slope efficiency of 1.00 W/A and the junction temperature of 15.62 K were achieved.