Study of manganese oxide thin films grown by pulsed laser deposition

In this paper, we report on the growth of manganese oxides thin films by Pulsed Laser Deposition using an MnO target at various oxygen pressures and substrate temperatures ranging from 550 to 800 °C. Grazing Incidence X-Ray Diffraction measurements on the grown films revealed that, at low deposition temperature, the dominant phase is Mn₂O₃, but as the deposition temperature was raised above 700 °C, a phase transformation occurred leading to the formation of Mn₃O₄. In a qualitative comparison, in the temperature range of 500-850 °C, and at a pressure below 13 Pa, the phase diagram of bulk manganese oxides and our grown films show a fair correlation. The films grown near the transition temperature (T = 700 °C) were found to be very thin compared to those grown at lower or higher temperatures, but the surface roughness was found to increase with temperature, as determined by Atomic Force Microscopy.     

Amorphous carbon nitrogenated films prepared by plasma immersion ion implantation and deposition

In this work, an investigation was conducted on amorphous hydrogenated-nitrogenated carbon films prepared by plasma immersion ion implantation and deposition. Glow discharge was excited by radiofrequency power (13.56 MHz, 40 W) whereas the substrate-holder was biased with 25 kV negative pulses. The films were deposited from benzene, nitrogen and argon mixtures. The proportion of nitrogen in the chamber feed (R_N) was varied against that of argon, while keeping the total pressure constant (1.3 Pa). From infrared reflectance-absorbance spectroscopy it was observed that the molecular structure of the benzene is not preserved in the film. Nitrogen was incorporated from the plasma while oxygen arose as a contaminant. X-ray photoelectron spectroscopy revealed that N/C and O/C atomic ratios change slightly with R_N. Water wettability decreased as the proportion of N in the gas phase increased while surface roughness underwent just small changes. Nanoindentation measurements showed that film deposition by means of ion bombardment was beneficial to the mechanical properties of the film-substrate interface. The intensity of the modifications correlates well with the degree of ion bombardment.     

Optical properties of amorphous carbon thin films prepared by plasma deposition in a graphite hollow cathode

Carbon films have been produced using a graphite hollow cathode and an r.f. plasma of hydrogen or hydrogen and argon. No hydrocarbon gas was used. The films were subjected to heat treatments up to 700 °C in air. The optical properties of the films were studied using Fourier transform IR, UV-visible, Raman, ellipsometry and photoluminescence techniques before and after the annealing. Films prepared without argon have a narrower band gap and a different photoluminescence response from films prepared with argon. The index of refraction was seen to have values between 1.7 and 2.2 depending on the preparation conditions. The optical band gap of the films was generally greater than 2 eV and the annealing process both increased the gap and reduced the density of states responsible for the large photoluminescence signal.     

活化和MnO2沉积提高碳纳米管超级电容器的性能

为了提高碳纳米管( carbon nanotubes,CNTs)超级电容器的性能,分别对 CNTs进行活化处理增大其比表面积和在CNTs表面沉积MnO2 引进赝电容,并利用TEM、BET、循环伏安和恒流充放电测试对实验样品进行了分析和表征。结果表明活化和MnO2 沉积有效地提高了 CNTs 超级电容器的性能。在充放电电流密度为 5mA/cm2 时,在 CNTs 的比容为46F/g的情况下,活化 CNTs和 CNTs/MnO2 复合物的比容分别达到87和150F/g,而且基于活化CNTs和CNTs/MnO2 复合物的超级电容器具有良好的功率特性。     

Hybrid manganese oxide films for supercapacitor application prepared by sol-gel technique

Hybrid films were prepared by adding various concentrations of meso-carbon microbeads (MCMB) during sol-gel processing of manganese oxide films. The heat-treated films were characterized by scanning electron microscopy (SEM) and X-ray diffraction (XRD). In addition, electrochemical performance of the MCMB-added Mn-oxide hybrid coatings was evaluated by cyclic voltammetry (CV) and compared with its unadded counterpart. Experimental results showed that Mn-oxide films exhibited a mixture of Mn₂O₃ and Mn₃O₄ phases. The higher the heat-treatment temperature, the more Mn₂O₃ can be observed. The specific capacitance of the unadded Mn-oxide electrodes is 209 F/g. Because the MCMB particles provide more interfacial surface area for electrochemical reactions, a significant improvement can be noticed by adding MCMB in Mn-oxide coatings. The 300 °C heat-treated hybrid Mn-oxide coating with a Mn/MCMB ratio of 10/1 exhibits the highest value of 350 F/g, showing a ~ 170% increase in specific capacitance.     

Structure of multiwalled carbon nanotubes grown by chemical vapor deposition

Carbon nanotubes have been grown by chemical vapor deposition at 650°C in an argon atmosphere using a butane-propane mixture and a nickel catalyst and have been characterized by scanning and transmission electron microscopy and Raman spectroscopy. The results indicate that the multiwalled nanotubes have an imperfect graphite-like structure with a conical supramolecular configuration. A phenomenological technique is proposed for statistical analysis of the state of carbon nanotubes in measurements of the intensity of the defect zone D in their Raman spectra.     

Hydrothermal synthesis of manganese oxide encapsulated multiporous carbon nanofibers for supercapacitors

Hydrothermal carbonization (HTC) of biomass to produce one-dimensional carbon materials with hierarchical pores is of significant importance. Here, we fabricate composites of MnOx-encapsulated multiporous carbon nanofibers (M-MCNFs) from naturally available carbohydrates through a dopamine-assisted HTC/ templating process. The introduction of dopamine aids in the formation of the morphology of carbon nanofibers (CNFs) by enhancing the interactions between the hard-templates and carbohydrates. The chosen cryptomelane hard-templates, which are superior to traditional hard-templates, are converted into Mn₃O₄ nanoparticles embedded in multiporous CNFs (MCNFs), eliminating the need for tedious post deposition procedures to introduce redox active sites. Hence, the obtained hybrids with large surface areas, hierarchical pores, and unique structures show great potential in supercapacitors. This economic and sustainable strategy paves a new way for synthesizing MCNFs and metal oxide-encapsulated MCNFs composites from biomass.

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Monocrystalline zinc oxide films grown by atomic layer deposition

In the present work we report on the monocrystalline growth of (00.1) ZnO films on GaN template by the Atomic Layer Deposition technique. The ZnO films were obtained at temperature of 300 °C using dietylzinc (DEZn) as a zinc precursor and deionized water as an oxygen precursor. High resolution X-ray diffraction analysis proves that ZnO layers are monocrystalline with rocking curve FWHM of the 00.2 peak equals to 0.07°. Low temperature photoluminescence shows a sharp and bright excitonic line with FWHM of 13 meV.     

Binder-free manganese oxide/carbon nanomaterials thin film electrode for supercapacitors

A ternary thin film electrode was created by coating manganese oxide onto a network composed of single-walled carbon nanotubes and single-walled carbon nanohorns. The electrode exhibited a porous structure, which is a promising architecture for supercapacitors applications. The maximum specific capacitances of 357 F/g for total electrode at 1 A/g were achieved in 0.1 M Na(2)SO(4) aqueous solution.     

Supercritical carbon dioxide-assisted deposition of tin oxide on carbon nanotubes

This work demonstrates a versatile and effective method for uniform deposition of SnO₂ on the surfaces of CNTs. The obtained SnO₂–CNT nanohybrids were morphologically and structurally characterized by different techniques. Detailed transmission electron microscopy (TEM) observation revealed that SnO₂ nanoparticles may cover the tube surfaces or be encapsulated into the tube channels by manipulating experimental conditions. The loading density of SnO₂ on CNTs is tunable by varying the initial weight ratio of the precursor to CNTs. This simple and clean method offers a flexible avenue for further exploring the properties and applications of the as-synthesized CNT composites.     

Properties of indium tin oxide films prepared by ion-assisted deposition

Conducting transparent films of indium tin oxide were deposited by 100 eV oxygen-ion-assisted deposition. A refractive index of 2.13 at 550 nm was obtained for films deposited onto ambient temperature substrates. The refractive index decreased with increasing substrate temperature to a value of 2.0 at 400°C. The sheet resistance of films 135 nm thick decreased from 800 Ω/□ for layers deposited onto room temperature substrates to around 25 Ω/□ at 400°C. Structural studies revealed that ion-assisted deposition onto ambient temperature substrates produced amorphous films, and that at temperatures above 100°C the films exhibit In₂O₃ crystallinity. In addition, it was found that the number of voids in the ion-bombarded films was reduced relative to that in films produced by conventional reactive evaporation.     

Studies of diamond-like carbon films prepared by ion beam-assisted deposition

Ion beam-assisted deposition offers a novel and unique process to prepare diamond-like carbon (DLC) films at room temperature, with particularly good interface adhesion. This advantage was explored in this study to deposit highly wear-resistant coating on bearing 52100 steel. Both dual ion beam sputtering and ion beam deposition were employed. Various bombarding species and energy were investigated to optimize the process. Raman, X-ray photoelectron and Auger electron spectroscopy were used to characterize the bonding structure of DLC. Extensive experiments were carried out to examine the tribological behaviour of the DLC/52100 system. A metal intermediate layer can help tremendously in wear resistance. The results are optimistic and may lead to useful applications.     

Tungsten-doped tin oxide thin films prepared by pulsed plasma deposition

Transparent conductive oxide tungsten-doped tin oxide thin films were deposited on glass substrates from ceramic targets by the pulsed plasma deposition method. The structural, electrical and optical properties have been investigated as functions of tungsten doping content and oxygen partial pressure. The lowest resistivity of 2.1 × 10^? 3 Ω?cm was reproducibly obtained, with carrier mobility of 30 cm²V^? 1s^? 1 and carrier concentration of 9.6 × 10¹⁹ cm^? 3 at the oxygen partial pressure of 1.8 Pa. The average optical transmission was in excess of 80% in the visible region from 400 to 700 nm, with the optical band gap ranging from 3.91 to 4.02 eV.     

Nano-polycrystalline vanadium oxide thin films prepared by pulsed laser deposition

Nano-polycrystalline vanadium oxide thin films have been successfully produced by pulsed laser deposition on Si(100) substrates using a pure vanadium target in an oxygen atmosphere. The vanadium oxide thin film is amorphous when deposited at relatively low substrate temperature (500 degrees C) and enhancing substrate temperature (600-800 degrees C) appears to be efficient in crystallizing VOx thin films. Nano-polycrystalline V3O7 thin film has been achieved when deposited at oxygen pressure of 8 Pa and substrate temperature of 600 degrees C. Nano-polycrystalline VO2 thin films with a preferred (011) orientation have been obtained when deposited at oxygen pressure of 0.8 Pa and substrate temperatures of 600-800 degrees C. The vanadium oxide thin films deposited at high oxygen pressure (8 Pa) reveal a mix-valence of V5+ and V4+, while the VOx thin films deposited at low oxygen pressure (0.8 Pa) display a valence of V4+. The nano-polycrystalline vanadium oxide thin films prepared by pulsed laser deposition have smooth surface with high qualities of mean crystallite size ranging from 30 to 230 nm and Ra ranging from 1.5 to 22.2 nm. Relative low substrate temperature and oxygen pressure are benifit to aquire nano-polycrystalline VOx thin films with small grain size and low surface roughness.     

Properties of tantalum oxide thin films grown by atomic layer deposition

Thin tantalum oxide films were deposited using atomic layer deposition from TaCl₅ and H₂O at temperatures in the range 80–500 °C. The films deposited at temperatures below 300 °C were predominantly amorphous, whereas those grown at higher temperatures were polycrystalline containing the phases TaO₂ and Ta₂O₅. The oxygen to tantalum mass concentration ratio corresponded to that of TaO₂ at all growth temperatures. The optical band gap was close to 4.2 eV for amorphous films and ranged from 3.9 to 4.5 eV for polycrystalline films. The refractive index measured at λ = 550 nm increased from 1.97 to 2.20 with an increase in growth temperature from 80 to 300 °C. The films deposited at 80 °C showed low absorption with absorption coefficients of less than 100 cm⁻¹ in the visible region.     

Structure determinations of double-wall carbon nanotubes grown by catalytic chemical vapor deposition

We report an application of nanoarea electron diffraction for structure determination of double-wall carbon nanotubes (DWNT) grown by catalytic chemical vapor deposition. The structures of 30 tubes were determined from experimental diffraction patterns. Among these tubes, the inner and outer wall structure of 18 tubes was precisely determined by comparison with kinematic electron diffraction simulations. For the structure of the DWNTs, our experiment revealed a mixture of semiconducting-metallic (S-M), S-S and M-M tubes. The spacing between the two walls ranges from 0.335 nm to 0.384 nm. Most DWNTs are incommensurate and chiral.