共查询到19条相似文献，搜索用时 46 毫秒
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ITO/PTCDA/p-Si薄膜器件的表面和界面特性研究 总被引：2，自引：2，他引：0
界面态对于薄膜器件的性能具有非常重要的影响。有米用真空蒸发和溅射沉积的方法制备了ITO／PTCDA／p—Si薄膜器件,并采用X射线光电子能谱（xPs）和Ar^＋溅射技术对其表面和界面电子态进行了研究。结果表明,在ITO／PTCDA／pSi薄膜器件的界面,不仅ITO与PTCDA薄膜之间存在扩散,PTCDA与Si衬底材料之间也存在扩散现象。此外,每种原子的XPS谱表现出一定的化学位移,并以Cls和Ols谱的化学位移最为显著。 相似文献
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氧化铟锡(ITO)同时结合了可见光范围内高透过率和高电导率等特性,被广泛应用于Si基薄膜太阳电池中。本文侧重研究了采用反应热蒸发(RTE)技术低温(约160℃)生长ITO透明导电薄膜过程中不同Sn掺杂含量对薄膜微观结构以及光电性能的影响。实验结果表明,随着Sn掺杂含量的增加,ITO薄膜微观结构稍有变化,薄膜的电子迁移率呈现先增大后减小的趋势,薄膜的光学带隙一定程度上呈现展宽趋势;对于较高的Sn掺杂含量,在低温条件下电离杂质散射和中性杂质散射成为影响电子迁移率降低的重要因素。经过薄膜生长优化,较佳的Sn掺杂含量为6.0wt.%,ITO薄膜电阻率为3.74×10-4Ω·cm,电子迁移率为47cm2/Vs,载流子浓度为3.71×1020cm-3,且在380~900nm波长范围内的平均透过率约87%。将其应用于结构为SS/Ag/ZnO/nip aSiGe:H/nipa-Si:H/ITO/Al的n-i-p型a-Si:H/a-SiGe:H叠层太阳电池,取得的光电转化效率达10.51%(开路电压Voc=1.66V,短路电流密度Jsc=9.31mA/cm2,填充因子FF=0.68)。 相似文献
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针对a-Si:H(n)/c-Si(p)双面异质结太阳电池结构,数值研究了不同p型单晶硅衬底厚度、氧缺陷密度、电阻率以及异质结界面缺陷态密度与电池转化效率之间的关系.结果表明:异质结界面缺陷态密度是影响电池性能的最主要因素,衬底前表面界面缺陷密度增大,主要降低开路电压和填充因子,衬底背表面界面缺陷态密度主要影响短路电流和填充因子.其次,p型硅衬底厚度减小和氧缺陷密度的增大,均导致短路电流密度下降,电池转化效率降低,特别是在界面缺陷态密度较低时,氧缺陷密度对电池性能影响较大;最后,在衬底前表面界面缺陷态密度为5×1010 cm-2,后表面界面缺陷态密度为5×1010 cm-2以及氧缺陷密度为109 cm-2时,衬底电阻率存在最优值1 Ω·cm. 相似文献
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低温高速率沉积非晶硅薄膜及太阳电池 总被引：1，自引：0，他引：1
采用射频等离子体增强化学气相沉积(RF-PECVD)技术,保持沉积温度在125℃制备非晶硅薄膜材料及太阳电池。在85 Pa的低压下以及400～667 Pa的高压下,改变Si H4浓度和辉光功率等沉积参数,对本征a-Si材料的性能进行优化。结果表明,在高压下,合适的Si H4浓度和压力功率比可以使a-Si材料的光电特性得到优化,并且薄膜的沉积速率得到一定程度的提高。采用低压低速和高压高速的沉积条件,在125℃的低温条件下制备出效率为6.7%的单结a-Si电池,高压下本征层a-Si材料的沉积速率由0.06～0.08 nm/s提高到0.17～0.19 nm/s。 相似文献
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利用直流磁控溅射系统在p型SiCGe和载玻片衬底上沉积ITO薄膜,并研究其ITO与p型SiCGe的接触特性与p型SiCGe制备条件、退火温度、退火时间的关系.结果表明:p型SiCGe制备条件的不同影响着退火使ITO/p型SiCGe的接触由线性变为非线性或者由非线性变为线性;随着退火温度的增加,接触电阻先减小后增加,这是由于退火过程中,接触界面层发生了反应以及接触势垒高度与宽度发生了变化造成的.当退火温度为500℃时,其接触电阻达到最小值,此时ITO薄膜的最高透过率高达90%,方块电阻为20.6Ω/□. 相似文献
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利用直流磁控溅射系统在p型SiCGe和载玻片衬底上沉积ITO薄膜,并研究其ITO与p型SiCGe的接触特性与p型SiCGe制备条件、退火温度、退火时间的关系.结果表明:p型SiCGe制备条件的不同影响着退火使ITO/p型SiCGe的接触由线性变为非线性或者由非线性变为线性;随着退火温度的增加,接触电阻先减小后增加,这是由于退火过程中,接触界面层发生了反应以及接触势垒高度与宽度发生了变化造成的.当退火温度为500℃时,其接触电阻达到最小值,此时ITO薄膜的最高透过率高达90%,方块电阻为20.6Ω/□. 相似文献
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Hydrogenated microcrystalline silicon (μc-Si:H) intrinsic films and solar cells with n-i-p configuration were prepared by plasma enhanced chemical vapor deposition (PECVD). The influence of n/i and i/p buffer layerson the μc-Si:H cell performance was studied in detail. The experimental results demonstrated that the efficiency is much improved when there is a higher crystallinity at n/i interface and an optimized a-Si:H buffer layer at i/p interface. By combining the above methods, the performance ofμc-Si:H single-junction and a-Si:H/μc-Si:H tandemsolar ceils has been significantly improved. 相似文献
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Hydrogenated microcrystalline silicon （μc-Si：H） intrinsic films and solar cells with n-i-p configuration were prepared by plasma enhanced chemical vapor deposition （PECVD）. The influence of n/i and i/p buffer layers on the μc-Si：H cell performance was studied in detail. The experimental results demonstrated that the efficiency is much improved when there is a higher crystallinity at n/i interface and an optimized a-Si：H buffer layer at i/p interface. By combining the above methods, the performance of μc-Si：H single-junction and a-Si：H/μc-Si：H tandem solar cells has been significantly improved. 相似文献
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High performance, hysteresis-free, low temperature n-i-p perovskite solar cells are successfully fabricated by solution processing using fullerene electron transport layer (ETL). PC71BM fullerene, with broader absorption spectrum and lower HOMO level, when incorporated in the perovskite solar cell yielded average power conversion efficiency (PCE) of 13.9%. This is the highest reported PCE in n-i-p perovskite solar cells with PC71BM ETL. The devices exhibited negligible hysteresis and high open-circuit voltage (Voc). On the contrary, devices with PC61BM, a common fullerene ETL in perovskite solar cell, exhibited large hysteresis and lower Voc. The underlying mechanisms of superior performance of devices with PC71BM ETL were found to be correlated with fullerene surface wettability and perovskite grain size. The influence of fullerene ETL on the perovskite grain growth and subsequent photovoltaic performance was investigated by contact angle measurement, morphological characterization of the surface topography and electrochemical impedance analysis. 相似文献
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Dong Kyu Lee Kyoung Soon Choi Jaeyeong Lee Youngho Kim Sein Oh Hojun Shin Cheolho Jeon Hak Ki Yu 《Advanced Electronic Materials》2019,5(7)
The electronic properties of indium tin oxide (ITO) nanobranches fabricated by electron beam evaporation are controlled using the following two methods: i) The growth direction of the rods and branches is controlled by an epitaxial relationship with a yttria‐stabilized zirconia substrate. The aligned growth of ITO nanobranches causes low sheet resistance because of the high density and good connectivity of the branches. ii) Heterojunction metal‐oxide nanoparticles are coated on the surface of the nanobranches to form a depletion region in the near surface for band bending. The morphology of the metal oxide also affects the electronic properties of the nanobranches. The sheet resistance of Fe2O3‐coated nanobranches (Fe2O3: film shape) increases linearly with the number of coatings. In the case of Mn2O3 (Mn2O3: nanoparticle shape), the sheet resistance is dramatically increased and saturated with the increase in the number of coatings. 相似文献
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Xiaoyu Zhang Qingsen Zeng Yuan Xiong Tianjiao Ji Chen Wang Xinyu Shen Min Lu Haoran Wang Shanpeng Wen Yu Zhang Xuyong Yang Xin Ge Wei Zhang Aleksandr P. Litvin Alexander V. Baranov Dong Yao Hao Zhang Bai Yang Andrey L. Rogach Weitao Zheng 《Advanced functional materials》2020,30(11)
Controlling the transport and minimizing charge carrier trapping at interfaces is crucial for the performance of various optoelectronic devices. Here, how electronic properties of stable, abundant, and easy‐to‐synthesized carbon dots (CDs) are controlled via the surface chemistry through a chosen ratio of their precursors citric acid and ethylenediamine are demonstrated. This allows to adjust the work function of indium tin oxide (ITO) films over the broad range of 1.57 eV, through deposition of thin CD layers. CD modifiers with abundant amine groups reduce the ITO work function from 4.64 to 3.42 eV, while those with abundant carboxyl groups increase it to 4.99 eV. Using CDs to modify interfaces between metal oxide (SnO2 and ZnO) films and active layers of solar cells and light‐emitting diodes (LEDs) allows to significantly improve their performance. Power conversion efficiency of CH3NH3PbI3 perovskite solar cells increases from 17.3% to 19.5%; the external quantum efficiency of CsPbI3 perovskite quantum dot LEDs increases from 4.8% to 10.3%; and that of CdSe/ZnS quantum dot LEDs increases from 8.1% to 21.9%. As CD films are easily fabricated in air by solution processing, the approach paves the way to a simplified manufacturing of large‐area and low‐cost optoelectronic devices. 相似文献
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We fabricated solution-processed flexible inverted organic solar cell (IOSC) modules (10 cm × 10 cm) on roll-to-roll (RTR) sputtered ITO/Ag/ITO multilayer cathodes. By using a pilot-scale RTR sputtering system equipped with mid-range frequency power for dual ITO targets and direct current power for the Ag target, we were able to continuously deposit a high-quality ITO/Ag/ITO multilayer on PET substrate with a width of 700 mm and length of 20,000 mm as a function of Ag thickness. At the Ag thickness of 12 nm, the ITO/Ag/ITO multilayer had a very low sheet resistance of 3.03 Ohm/square and high transmittance of 88.17%, which are better values than those of amorphous ITO film. A strip-type ITO/Ag/ITO cathode was successfully patterned using a RTR wet etching process. Successful operation of flexible IOSC modules on RTR sputtered ITO/Ag/ITO cathodes indicate that the RTR sputtering technique is a promising coating process for fabrication of high-quality transparent and flexible cathodes and can advance the commercialization of cost-efficient flexible IOSCs. 相似文献
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Nilushi Wijeyasinghe Flurin Eisner Leonidas Tsetseris Yen‐Hung Lin Akmaral Seitkhan Jinhua Li Feng Yan Olga Solomeshch Nir Tessler Panos Patsalas Thomas D. Anthopoulos 《Advanced functional materials》2018,28(31)
The ability to tune the electronic properties of soluble wide bandgap semiconductors is crucial for their successful implementation as carrier‐selective interlayers in large area opto/electronics. Herein the simple, economical, and effective p‐doping of one of the most promising transparent semiconductors, copper(I) thiocyanate (CuSCN), using C60F48 is reported. Theoretical calculations combined with experimental measurements are used to elucidate the electronic band structure and density of states of the constituent materials and their blends. Obtained results reveal that although the bandgap (3.85 eV) and valence band maximum (?5.4 eV) of CuSCN remain unaffected, its Fermi energy shifts toward the valence band edge upon C60F48 addition—an observation consistent with p‐type doping. Transistor measurements confirm the p‐doping effect while revealing a tenfold increase in the channel's hole mobility (up to 0.18 cm2 V?1 s?1), accompanied by a dramatic improvement in the transistor's bias‐stress stability. Application of CuSCN:C60F48 as the hole‐transport layer (HTL) in organic photovoltaics yields devices with higher power conversion efficiency, improved fill factor, higher shunt resistance, and lower series resistance and dark current, as compared to control devices based on pristine CuSCN or commercially available HTLs. 相似文献
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NIP型非晶硅薄膜太阳能电池的研究 总被引：3，自引：3，他引：0
采用射频等离子体增强化学气相沉积(RF-PECVD)技术制备非晶硅(a-Si)NIP太阳能电池,其中电池的窗口层采用P型晶化硅薄膜,电池结构为Al/glass/SnO2/N(a-Si:H)/I(a-Si:H)/P(cryst-Si:H)/ITO/Al.为了使P型晶化硅薄膜能够在a-Si表面成功生长,电池制备过程中采用了H等离子体处理a-Si表面的方法.通过调节电池P层和N层厚度和H等离子体处理a-Si表面的时间,优化了太阳能电池的制备工艺.结果表明,使用H等离子体处理a-Si表面5 min,可以在a-Si表面获得高电导率的P型晶化硅薄膜,并且这种结构可以应用到电池上;当P型晶化硅层沉积时间12.5 min,N层沉积12 min,此种结构电池特性最好,效率达6.40%.通过调整P型晶化硅薄膜的结构特征,将能进一步改善电池的性能. 相似文献