Localized deposition of GaAs/GaInP heterostructures using LP-MOVPE

GaInP layers were grown selectively by low pressure MOVPE in patterned SiO₂ masks on GaAs (100) substrates. The variation of the composition and spontaneous ordering phenomena were analysed by Raman spectroscopy and photoluminescence. In contrast to GaInAs, the composition of GalnP shows only a very weak dependence on the size of the structures. On the other hand, there is a shift of the bandgap energy up to 40 meV with decreasing size of the stripes caused by ordering of the Ga and In atoms. Based on these findings lattice matched GaAs/GalnP multilayers were grown to delineate the growth history of the structures. It was demonstrated that the growth habit of deposition in narrow slits (>1μm) can be used to produce mesa-like stripes with dimensions below 100 nm on top of the mesa. Results of GaAs/GaInP quantum wells selectively grown on top of a mesa are presented.     

Two‐terminal metal‐inter‐connected multijunction III–V solar cells

A novel bonding approach with an interface consisting of a metal and dielectric is developed, and a “pillar‐array” metal topology is proposed for minimal optical and electrical loss at the interface. This enables a fully lattice‐matched two‐terminal, four‐junction device that consists of an inverted top two‐junction (2J) cell with 1.85 eV GaInP/1.42 eV GaAs, and an upright lower 2J cell with ~1 eV GaInAsP/0.74 eV GaInAs aimed for concentrator applications. The fabrication process and simulation of the metal topology are discussed along with the results of GaAs/GaInAs 2J and (GaInP + GaAs)/GaInAs three‐junction bonded cells. Bonding‐related issues are also addressed along with optical coupling across the bonding interface. Copyright © 2014 John Wiley & Sons, Ltd.     

Design and optimization of a monolithic GaInP/GaInAs tandem solar cell

We have theoretically calculated the photovoltaic conversion efficiency of a monolithic dual-junction GaInP/GaInAs device,which can be experimentally fabricated on a binary GaAs substrate.By optimizing the bandgap combination of the considered structure,an improvement of conversion efficiency has been observed in comparison to the conventional GaInP_2/GaAs system.For the suggested bandgap combination 1.83 eV/1.335 eV,our calculation indicates that the attainable efficiency can be enhanced up to 40.45%(30...     

GaInP/GaInAs 叠层太阳电池的结构设计及优化

我们计算了单级联GaInP/GaInAs叠层太阳能电池理论转换效率,在实验上它通常生长在GaAs衬底上。相比于传统的GaInP2/GaAs叠层电池,通过对禁带宽度组合的优化,我们得到了更高转换效率的体系结构。这里,对于所考虑禁带组合1.83eV/1.335eV,计算结果表明,当对其结构进行优化后（即顶电池GaInP厚度为1550nm,底电池GaInAs厚度为5500nm),其理论转换效率可以达到40.45% (300suns,AM1.5d),另外鉴于它相对于GaAs衬底较低的晶格失配（0.43%),在未来它将更具有应用前途。     

Self-organized GaAs patterns on misoriented GaAs (1 1 1)B substrates using dilute nitrides by molecular beam epitaxy

Recently, the growth of patterned surfaces is being used to demonstrate the site control of the three-dimensional nanostructures, and in particular quantum dots. Nevertheless the pre-patterning techniques show some disadvantages. In this work, we report a novel in situ hole-patterning technique which consists of growing by molecular beam epitaxy a dilute nitride GaAsN layer on 1° and 2° towards [2¯ 1 1] misoriented GaAs(1 1 1)B substrates. Later, we carry out a regrowth of GaAs layers on this patterned surfaces in order to improve the surface quality and the homogeneity of the characteristics of holes (size, depth, etc.). Consecutively, we use these patterned surfaces to grow InAs quantum dots, whose growth on these misorientations results in a greater difficulty. A structural characterization of the resulting samples, both hole-patterns and quantum dots, has been performed. Besides, we have realized studies of the dependence of the surface morphology on some important parameters (including substrate misorientation, thicknesses of the GaAsN and GaAs layers grown and growth conditions).     

Designing of 1 eV GaNAs/GaInAs superlattice subcell in current-matched four-junction solar cell

A reasonably-thick GaNAs/GaInAs superlattice could be an option as a roughly 1 eV subcell to achieve high-efficiency multi-junction solar cells on a lattice-matched Ge substrate. A detailed consideration of a high-efficiency design for a GaInP/GaAs/1 eV/Ge device is presented. Calculations have been done for this structure to obtain the confined energies of the electrons and holes by utilizing the Kronig-Penney model, as well as the absorption coefficient and thereby the external quantum efficiency. The effect of well layers, GaNAs or GaInAs, on the absorption and photocurrent density under the AM 1.5 condition is discussed in order to realize a requirement of current matching in the four-junction solar cells. The management of these considerations implies the feasibility of the GaNAs/GaInAs superlattice subcell design to improve the overall conversion efficiency of lattice matched GaInP/GaAs/1 eV/Ge cells.     

Morphological evolution and lateral ordering of uniform SiGe/Si(0 0 1) islands

By investigating the morphological evolution during epitaxial growth of Ge on Si(0 0 1) substrates, we find that highly uniform distributions of islands can be obtained. The islands are no longer domes but they consist of barns, which are bounded by steeper facets. A detailed morphological analysis indicates the presence of facets at their base, which are not stable for Ge but for Si. Finally, we show that long-range ordering of highly uniform SiGe barns can be obtained when the growth is performed on patterned Si(0 0 1) substrates.     

The control of size and areal density of InAs self-assembled quantum dots in selective area molecular beam epitaxy on GaAs (0 0 1) surface

The growth of InAs quantum dots (QDs) on GaAs (0 0 1) substrates by selective area molecular beam epitaxy (SA-MBE) with dielectric mask is investigated. The GaAs polycrystals on the mask, which is formed during growth due to low GaAs selectivity between dielectric mask and epitaxial region in MBE, strongly affect the distribution of InAs QDs on the neighbouring epitaxial regions. It is found that the GaAs polycrystalline regions strongly absorb indium during QD growth, confirmed by microscopic and optical studies. GaAs polycrystalline deposit can be reduced under low growth rate and high-temperature growth conditions. Almost no reduction in QD areal density is observed when there is minimal polycrystalline coverage of the mask.     

On the Combined Application of Raman Spectroscopy and Photoluminescence Spectroscopy for the Diagnostics of Multilayer Heterostructures

Semiconductors - The results of studying GaInAs/GaInP/GaAs photodiode structures grown by metal–organic vapor-phase epitaxy are reported. A procedure for the diagnostics of such multilayer...     

Temperature-controlled self-organized InP nanostructures grown on GaAs(1 0 0) substrate by MOCVD

The self-organized InP nanostructures grown on GaAs(0 0 1) substrates by metalorganic vapor deposition were examined in detail using atomic force microscopy. By properly selecting growth temperature, three kinds of nanostructure, islands, pits and ripples were formed. For growth temperature of 400–450 °C, the surface morphologies were governed by islands; but, for the growth temperature of 500 °C, the formation of surface ripples instead of islands was presumably due to the combination effect of temperature-controlled surface kinetics and strain effect. On the other hand, the observation of enhanced growth of pits upon a high-temperature annealing (at 685 °C for 90 s) indicated that the strained InP epitaxial film would be morphologically stabilized by taking the form of pits formation.     

Effect on Ordering of the Growth of GaInP Layers on (111)-GaAs Faces

GaInP, an essential material for multijunction structures of III–V compounds for solar cells, can achieve better photovoltaic responses when grown on (111)GaAs faces, due to the large internal electric fields generated by the off-diagonal strain. In this work, we explored metalorganic chemical vapor deposition growth of GaInP layers on (001)-, (111)Ga-, and (111)As-GaAs substrates, using different phosphine flow rates. The structural and optical properties of the layers have been studied by micro-Raman spectroscopy, microphotoluminescence, and cathodoluminescence. Problems such as composition control, growth rate, and the presence of ordered phases are addressed.     

Study of minority carrier diffusion lengths in photoactive layers of multijunction solar cells

A technique for determining a minority carrier’s diffusion length in photoactive III–V layers of solar cells by approximating their spectral characteristics is presented. Single-junction GaAs, Ge and multi-junction GaAs/Ge, GaInP/GaAs, and GaInP/GaInAs/Ge solar cells fabricated by hydride metal-organic vapor-phase epitaxy (H-MOVPE) have been studied. The dependences of the minority carrier diffusion length on the doping level of p-Ge and n-GaAs are determined. It is shown that the parameters of solid-state diffusion of phosphorus atoms to the p-Ge substrate from the n-GaInP nucleation layer are independent of the thickness of the latter within 35–300 nm. It is found that the diffusion length of subcells of multijunction structures in Ga(In)As layers is smaller in comparison with that of single-junction structures.     

Self-organization of nanostructures on planar and patterned high-index semiconductor surfaces

In order to directly control the size and in particular the position of nanostructures naturally formed on high-index semiconductor surfaces during molecular beam epitaxy (MBE) and metalorganic vapor phase epitaxy (MOVPE), the growth on patterned high-index GaAs substrates is investigated. During MBE of (AlGa)As on patterned GaAs (311)A substrates, a new phenomenon in the selectivity of growth has been found to form a fast growing sidewall on one side of mesa stripes oriented along the [01-1] direction. Preferential migration of Ga adatoms from the mesa top as well as the mesa bottom toward the sidewall develops a smooth convex curved surface profile without facets. This unique growth mode that does not occur for the perpendicular stripe orientation nor on other patterned GaAs (n11)A and B substrates is stable for step heights down to the quantum size regime to produce lateral quantum wires on patterned GaAs (311)A substrates. Quantum confinement of excitons in the wires has been demonstrated by the transition from two-dimensional to magnetic confinement with increasing magnetic field. For device applications it is important that the wires can be stacked in the growth direction without any increase in interface roughness or wire size fluctuations, indicating a self-limiting lateral growth mechanism. Finally, in strained layer epitaxy, (InGa)As islands can be selectively placed on the mesa top and bottom leaving entirely free the curved part along the fast growing side-wall.     

GaInAsP过渡层在808 nm GaAsP/(Al)GaInP半导体激光器中降电压的应用

利用金属有机化学气相沉积的方法在GaAs衬底上生长了GaInAsP外延层及GaAsP/(Al)GaInP激光器外延层。生长的GaInAsP外延层与GaAs晶格匹配,并且带隙处于Ga_0.5In_0.5P与GaAs中间。在GaInP/GaAs异质结界面插入此结构的GaInAsP过渡层,可以有效的降低异质结的带阶,尤其是价带带阶。相比于突变GaInP/GaAs异质结的808 nm GaAsP/(Al)GaInP半导体激光器,含有GaInAsP过渡层的半导体激光器具有更低的工作电压。因此,在350 mW输出功率下,半导体激光器的功率转换效率由52%提高至60%。并且在大电流注入下,含有GaInAsP过渡层的半导体激光器由于产生的焦耳热减少,具有更高的输出功率。     

InAs量子点尺寸和间距对GaInP/GaAs/GaInAs/Ge多结叠层电池的影响

A metamorphic GaInP/GaAs/GaInAs/Ge multi-junction solar cell with InAs quantum dots is investigated, and the analytical expression of the energy conversion efficiency on the multi-junction tandem solar cell is derived using the detailed balance principle and the Kronig-Penney model.The influences of interdot distance, quantum-dot size and the intermediate band location on the energy conversion efficiency are studied.This shows that the maximum efficiency,as a function of quantum-dot size and distance,is about 60.15%under the maximum concentration for only one InAs/GaAs subcell,and is even up to 39.69%for the overall cell.In addition,other efficiency factors such as current mismatch,the formation of a quasicontinuum conduction band and concentrated light are examined.     

Highly strained InGaP/InGaAs p-HEMT using reduced area growth

Highly strained InGaP/In_0.33Ga_0.67As pseudomorphic high electron mobility transistor (p-HEMT) structures were grown on patterned GaAs substrates. Performance of the highly strained p-HEMTs grown on patterned substrates was compared with that of highly strained p-HEMTs and conventional InGaP/In_0.22Ga_0.78 As p-HEMTs grown on nonpatterned substrates. The highly strained p-HEMTs grown on patterned substrates showed substantial improvements in dc (transconductance and drain saturation current) and rf (cutoff frequency: f_T and maximum oscillation frequency: f_max ) performances as compared with those of the p-HEMTs grown on nonpatterned substrates. The results indicate the potential of highly strained p-HEMTs using reduced area growth for high-speed device applications     

Nano-patterning and growth of self-assembled quantum dots

Different techniques for the preparation of patterned GaAs substrates for subsequent overgrowth are presented, including focused ion beam direct writing and laser holography followed by wet chemical or dry etching. GaAs-based buffer layers were grown on the patterns and consequently covered with self-assembled quantum dots (QDs). The effect of a strained InGaAs layer grown directly on the patterned substrates and its influence on QD formation and ordering is shown. The dot density, lateral distribution and size distribution of the dots are measured using atomic force microscopy. A comparison of the growth of QDs on patterned and unpatterned substrates indicates that on patterned substrates a higher QD density at the same InAs deposition can be achieved.     

Atomic force microscopy studies of CdTe films grown by epitaxial lateral overgrowth

Epitaxial lateral overgrowth (ELO) of CdTe was carried out on GaAs using silicon nitride as the mask material. Windows were delineated on silicon, nitride mask deposited on GaAs substrates and CdTe was grown using metalorganic vapor phase epitaxy. The films were characterized by atomic force microscopy (AFM). It has been shown that highly selective growth of CdTe can be achieved at temperatures higher than 500 C and pressures lower than 25 torr using silicon nitride as the mask layer. Optimizing the growth conditions as well as the stripe directions on the substrates enables the growth of ELO-CdTe with a flattop surface and vertical sidewalls. AFM studies show that ELO-grown CdTe contains large grains with reduced defect densities, but there seems to be no difference on the films grown on the window region or on the masked region. The results suggest that the growth mechanism for CdTe growth on GaAs is different from that of ELO-grown GaN. A possible growth model for the patterned CdTe growth is also proposed.     

Influence of temperature on luminescent coupling and material quality evaluation in inverted lattice‐matched and metamorphic multi‐junction solar cells

Inverted metamorphic multi‐junction solar cells have reached efficiencies close to 46%. These solar cells contain very high‐quality materials that exhibit strong luminescent coupling between the junctions. The presence of luminescent coupling has a significant impact on the behavior of multi‐junction solar cells affecting the optimal design of these devices. Because of the importance of studying devices under real operating conditions, the temperature dependence of the luminescent coupling is analyzed over a range of 25–120°C. Luminescent coupling analysis results show a reduction of the luminescent coupling current as a function of temperature in two tandem components of an inverted metamorphic triple junction solar cell such as GaInP/GaAs and GaAs/GaInAs solar cells. This reduction is quantified and examined by means of luminescent coupling analysis and modeling, electroluminescence measurements and optical modeling at the device and subcell level. The results of the models are verified and discussed. Copyright © 2015 John Wiley & Sons, Ltd.     

MBE growth and device applications of lattice-matched and strained heterostructures on (n11)-oriented and patterned substrates

The epitaxy of lattice-matched and strained semi-conducting films on patterned and misoriented substrates has led to new growth phenomena, material properties and device applications. Our work on InP- and GaAs-based heterostructures on (111)- and (311)-oriented substrates and strained heterostructures on planar and patterned (small area) substrates is described in this paper. The possibility of reliable and reproducible p-type doping of (311)A GaAs by Si during molecular-beam epitaxial growth and the application of such doping in the realization of high-performance electronic devices have been investigated. It is seen that p-type doping up to a free hole concentration of 4 × 10¹⁹ cm⁻³ is obtained at low ( 500°C) growth temperature and high As₄ flux. The incorporation of Si atoms into electrically active As sites is at least 95%. n-p-n heterojunction bipolar transistors grown by all-Si doping exhibit excellent current voltage characteristics and a common emitter current gain β = 240. Doped channel p-type heterojunction field-effect transistors have transconductance g_m = 25 mS/mm. We have experimentally and theoretically studied piezo-electric field effects in InP-based In_xGa_{1 − x}As/In_0.52Al_0.48As pseudomorphic quantum wells grown by molecular-beam epitaxy on (111)B InP substrates. The electro-optic coefficients of this material were measured and found to be much larger than that of GaAs. We have also investigated the consequences of altered growth modes on the epitaxy of highly strained InGaAs on patterned small area (001) GaAs substrates. Al_0.15Ga_0.85As/In_0.25Ga_0.75As pseudomorphic modulation-doped field-effect transistors and strained In_xGa_{1 − x}As/GaAs p-i-n photodiodes have been fabricated on patterned (100)-GaAs substrates and characterized. Compared with devices made on planar substrates, small area growth improves the dc transconductance by 40% and current gain cutoff frequency by 50% in the transistors. Photodiodes grown in small recesses (30 μm) exhibit 2–4 times higher quantum efficiency than those on planar substrates.