基片负偏压对PEMSIP法铁基体TiN涂层相组成的影响

利用等离子体增强磁控溅射离子镀（ＰＥＭＳＩＰ）技术在铁基体上沉积ＴｉＮ涂层之前，先镀一层很薄的钛中间层，继之再沉积ＴｉＮ。研究了基片负偏压对涂层相组成的影响。结果表明，随着基片负偏压增加，膜层的相分朝着富氮相及其含量增加的方向发展，变化趋势为（ａ－Ｔｉ＋Ｔｉ２Ｎ＋ＴｉＮ）→（Ｔｉ２Ｎ＋ＴｉＮ）→ＴｉＮ。在基体中间层界面处有ＦｅＴｉ相；在中间层与后继膜的交接处，发现ａ＝１与Ｔｉ２Ｎ有取向关系。     

基片负偏压对PEMSIP法铁基体TiN涂层相组成的影响

利用等离子体增强磁控溅射离子镀（ＰＥＭＳＩＰ）技术在铁基体上沉积ＴｉＮ涂层之前，先镀一层很薄的钛中间层，继之再沉积ＴｉＮ。研究了基片负偏压对涂层相组成的影响。结果表明，随着基片负偏压增加，膜层的相分朝着富氮相及其含量增加的方向发展，变化趋势为（α－Ｔｉ＋Ｔｉ_２Ｎ＋ＴｉＮ）→（Ｔｉ_２Ｎ＋ＴｉＮ）→ＴｉＮ。在基体与中间层界面处有ＦｅＴｉ相；在中间层与后继膜的交接处，发现α＝１与Ｔｉ_２Ｎ有取向关系。     

C2H2／N2流量比对沉积Ti（C,N）薄膜影响的研究

以Ｃ２Ｈ２和Ｎ２为反应气体，Ａｒ作载气，用多弧离子法在高速钢基片上沉积Ｔｉ（Ｃ，Ｎ）薄膜。所制轩的薄膜分别用ＳＥＭ，ＸＲＤ，ＸＰＳ等技术进行分析与测试。结果表明，薄膜结构比较致密，膜厚在１．５－２．０μｍ。     

利用O^18示踪和核反应分析研究不锈钢的着色机制

利用Ｏ＾１８示踪技术和Ｏ＾１８（Ｐ，ａ）Ｎ＾１５核反应分析研究了不锈钢在Ｈ２ＳＯ４－ＣｒＯ３溶液中形成氧化膜机制，用ＥＳＣＡ分析了不锈钢表面氧化物的价态。     

高取向锐钛矿TiO2薄膜的MOCVD法制备与表征

采用热壁低压ＭＯＣＶＤ方法，以Ｔｉ（ＯＣ４Ｈ９）４为源在ＳｉＯ２／Ｓｉ衬底上制备出高取向锐钛矿ＴｉＯ２薄膜。用Ｘ射线衍射技术研究了沉积温度和衬底对薄膜的结构和相组成的影响规律，采用ＸＰＳ和ＳＥＭ分别研究了薄膜的组成和形貌，结果表明，当沉积温度为５００＾０Ｃ和６００＾０Ｃ时，薄膜为锐钛矿结构，３００＾０Ｃ和４００＾０Ｃ地，薄膜以无定形结构为主，薄膜的组成为ＴｉＯ２，衬底影响薄膜的相组成，不同沉积温度     

在DC—PCVD阴阳极上沉积氮化硅薄膜

置于直流等离子体化学气相沉积（ＤＣ－ＰＣＶＤ）装置的阴极或阳极的２０、２０Ｃｒ、ＧＣｒ１５及２Ｃｒ１３钢，以及单晶硅材料的试样均可沉积获得以Ｓｉ２Ｎ４成为主要成分的非晶态的绝缘薄膜。这种膜有一定制作条件，讨论了阴阳极上试样都能获得这种膜的原因。     

液膜分离富集和测定锤液中的微量铅

用二环己基－１８－王冠－６（ＤＣ－１８－Ｃ－６）、表面活性剂ＳＰＡＮ８０、中性油ＳＩＯＯＮ－１和溶剂三氯甲烷乳状液膜体系，研究了Ｐｂ＾２＋的迁移行为。在适宜条件下，８ｍｉｎ内Ｐｂ＾２＋的迁移率达９９．４％以上，相同条件下，许多金属离子（如Ｎｉ＾２＋、Ｌｉ＾＋、Ｋ＾＋、Ｎａ＾＋、Ｃａ＾２＋、Ｍｇ＾２＋、Ｓｒ＾２＋、Ｂａ＾２＋、Ｆｅ＾３＋、ＡＬ＾３＋、Ｃｕ＾２＋、Ｚｎ＾２＋和Ｃｏ＾２＋等）均不被迁移，     

DMF中电沉积制备Yb-Co合金膜

研究了于室温下含有少量水的ＹｂＣｌ３－ＣｏＣｌ２－ＤＭＦ溶液中电沉积制备Ｙｂ－Ｃｏ合金膜。ＥＤＡＸ和ＸＲＤ分析表面：在０．１０ｍｏｌ／Ｌ ＹｂＣｌ３－０．１０ｍｏｌ／Ｌ ＣｏＣｌ２的ＤＭＦ电镀液中,以控制电位为－２．７５Ｖ（ＳＣＥ）进行恒电位电解,以控制电流密度为１００Ａ／ｍ＾２进行恒电流电解或以控制脉冲电流密度为１５０Ａ／ｍ＾２进行脉冲电解,可以得到不同形态和Ｙｂ含量的共沉积合金膜,且膜层光滑、     

试样参数对划痕试验临界载荷的影响

本文有摩擦力监测的划痕法研究了试样参数（基体硬度、膜厚、基体表面粗糙度等）对硬质摩膜（或软膜）的临界载荷Ｌｃ的影响．样品基材是Ｗ６Ｍｏ５Ｃｒ４Ｖ２、５ＣｒＭｎＭｏ、４５钢、Ａ３钢和不锈钢．膜层为磁控溅射离子镀ＴｉＮ膜和Ｔｉ膜、化学镀ＮｉＰＣＵ膜，以及在Ｓｉ３Ｎ４上溅射镀Ａｌ膜．结果发现离子度ＴｉＮ膜和Ｔｉ膜与ＮｉＰＣｕ膜规律不同，ＴｉＮ膜和Ｔｉ膜的临界载荷Ｌｃ随基体硬度的提高而提高，但当基体硬度接近和超过膜层硬度时，Ｌｃ变化不大；基体粗糙度增加时Ｌｃ下降；随膜厚的增加Ｌｃ提高．而化学镀ＮｉＰＣｕ膜的临界载荷Ｌｃ随基体硬度的提高而下降，随基体表面粗糙度的提高而增加．以Ｗ６Ｍｏ５Ｃｒ４Ｖ２为基体的ＮｉＰＣｕ膜，随膜厚的增加Ｌｃ变化不大．本文对上述规律的实质进行了初步探讨，并对目前生产中正在推广的工具钢磁控溅射离子镀ＴｉＮ膜的划痕法标准提出建议．     

电致发光材料MGa2S4：Ce的合成及其发光特性

用固相反应法制备ＣａＳ，ＳｒＳ，ｇＡ２ＳＥ及Ｃｅ２Ｓ３，进而合成了ＭＧａ２Ｓ４：Ｃｅ（Ｍ＝Ｃａ，Ｓｒ）电致发光材料，ＣａＧａ２Ｓ４和ＳｒＧａ２Ｓ４同属Ｄ＾２４２ｈ空间群中斜方晶系结构。     

Thermal plasmas in material processing

Thermal plasmas are partially ionized gases at atmospheric pressures, characterized by temperatures in the range of 2000–20,000 K and charged particle number densities in the range of 10¹⁹–10²¹ per m³. Thermal plasmas are produced by plasma torches as a highly constricted jet. The high temperatures, enthalpies and heat fluxes in the plasma jet make it amenable to many chemical and metallurgical processes of industrial importance. The processing environment can be inert as in the case of argon or nitrogen plasmas or can be made reactive by introducing suitable gases. Reactive thermal plasma processing is a novel technique, wherein the plasma enters the reaction scheme, with ions and excited species opening up new channels. This technique is versatile in producing a wide variety of materials like oxides, carbides, borides, aluminides and coatings of diamond, superconductors and bioceramics. In this paper, the basic design of the plasma devices and some of the significant materials-related activities carried out recently at BARC are reported.     

Time evolution of electronegativity in a pulsed inductively coupled oxygen plasma

The electronegativity in a continuous wave (CW) and pulsed mode plasmas was calculated using the measured results of both the single Langmuir probe and the retarding field analyzer. For the pulsed mode measurement, both of the measurements were performed in a time-resolved method using a boxcar sampling technique. For the conversion of the retarding field analyzer measurement results into absolute positive ion densities, argon plasma was used as a reference. The pulsed oxygen plasma was generated using the inductively coupled antenna and modulated at a repetition rate of 5 kHz and the duty ratio of 50%. The gas pressure was changed from 5 to 30 mTorr. The time evolution of the electronegativity shows that there is a pressure regime where the electron attachment reaction during the RF on-time is very active, indicating that the negative ion density reaches its maximum value during the RF on-time. Compared to the CW oxygen plasma, the electronegativity of the pulsed oxygen plasma varies within a wider range of values.     

Study on formation process of surface plasma

A suitable equation group used to describe the establishment process and characteristics of induced dielectric barrier discharge (IDBD) plasma have been determined. Some experiments have been done which are used to examine whether the equation group is right or not. The examination results show that the equation groups are correct and can be used to design an IDBD device.     

底喷式等离子体发生器的输出特性研究

等离子体点火是发射药燃烧的一种新型点火方式,等离子体发生器性能会影响等离子体的输出效果。为了实现发射药高效的等离子体点火作用而研究等离子体发生器的输出性能。通过调整底喷式等离子体发生器内部关键参量,分析了发生器输出特性影响规律,优化了等离子体发生器内部结构参数,并在30 mm火炮中进行了试验。结果表明:等离子体发生器效率和输出电压及等离子体射流压强随毛细管孔径增加而下降,但随放电通道长度增加而增加;增加脉冲功率源的充电电压能够提高等离子体射流动能和压强峰值;聚乙烯(PE)和聚四氟乙烯(PTFE)两种材质对等离子体发生器输出特性影响不显著;经优选后的底喷式等离子体发生器能够在火炮装置中有效地点燃发射药。     

直流非转移弧等离子喷枪中电弧的工作特性研究

利用计算机数值模拟技术，采用有限容积方法，针对自制的低能耗、高效率内送粉等离子喷涂设备，对喷枪内部电弧长度及其对流体特性的影响进行了分析研究。结果表明，通过增加进气流量和减少电流的大小，均使得等离子电弧长度增加，阳极弧根位置逐渐向下游移动，但是产生这两种现象的机理以及对气流温度和速度的影响是不同的。     

电池隔膜表面空心阴极等离子体接枝聚合研究

应用自制的空心阴极等离子体装置,引发丙烯酸在丙纶表面的接枝聚合,研究了等离子体接枝聚合作用机理,分析了等离子体接枝聚合各参数(放电功率、气体流量、丙烯酸蒸气流量、样品位置等)对聚合速率的影响。通过红外光谱、扫描电镜等对丙纶接枝聚合膜表面的化学组成和形态结构等进行了表征分析,证明了亲水基团的引入,改善了丙纶隔膜的亲水性能。     

Cold atmospheric plasma: Sources, processes, and applications

Atmospheric pressure gas discharge plasmas, especially those operated at energy non-equilibrium and low gas temperatures, have recently become a subject of great interest for a wide variety of technologies including surface treatment and thin-film deposition. A driving force for these developments is the avoidance of expensive equipment required for competing vacuum-based plasma technologies. Although there are many applications where non-equilibrium (cold) plasma at atmospheric and higher pressures represents a substantial advantage, there are also a number of applications where low-pressure plasmas simply cannot be replaced due to specific properties and limitations of the atmospheric plasma and related equipment. In this critical review, the primary principles and characteristics of the cold atmospheric plasma and differences from vacuum-based plasma processes are described and discussed to provide a better understanding of the capabilities and limits of emerging atmospheric plasma technologies.     

潘宁气体真空等离子体天线的基本特性研究

根据潘宁气体放电的物理特性,定性分析了等离子体天线中氦氩潘宁气体放电的特性,实验测量了充满氦氩潘宁气体的等离子体天线与充满纯氦或纯氩等离子体天线的等离子体长度、等离子体密度,得出等离子体天线中充入氦氩潘宁气体时,在同等条件下能使等离子体天线的有效长度更长,等离子体密度更高。等离子体密度对天线的辐射效率和隐身性能影响很大,因此研究氦氩潘宁效应存在时表面波等离子体柱的等离子体长度与所加射频功率的关系和等离子体密度沿天线的分布对于提高天线的辐射效率和隐身性能至关重要。     

Change of the argon-based atmospheric pressure large area plasma characteristics by the helium and oxygen gas mixing

Oxygen and helium gases, often used in many plasma processes, were added to argon-based glow plasmas, produced at the atmospheric pressure, in order to study the controllability of the plasma characteristics by the supply gas mixing. Based on the electrical and optical diagnostics, the plasma parameters, such as the breakdown voltage, the rotational temperature, and the plasma uniformity, and their changes due to the gas mixing were investigated. The experimental results showed that the helium gas addition reduced the breakdown voltage (from 430 V to 300 V), the rotational temperature (from 465 K to 360 K), and the plasma uniformity. On the other hand, a small amount of oxygen gas increased the breakdown voltage (from 435 V to 463 V) and the rotational temperature (from 520 K to 600 K) due to various energy loss channels of the oxygen gas. The experimental results showed that it was possible to control the plasma characteristics by the gas mixing.     

反应等离子喷涂TiN/Ti3O复相陶瓷涂层

采用等离子反应合成技术,制备出了TiN/Ti3O复相陶瓷涂层,并分析了复相涂层的组织及其性能.研究结果表明:复相涂层主要由TiN相组成,并含有少量的钛的氧化物;复相涂层具有典型的层状组织结构,且层与层之间结合较好;制备的复相涂层的韧性得到明显提高,其韧性优于等离子喷涂Al2O3陶瓷涂层;特别是复相涂层具有优于M2钢的耐磨性.