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 共查询到20条相似文献,搜索用时 15 毫秒
1.
Dewan  Basudha  Chaudhary  Shalini  Yadav  Menka 《SILICON》2022,14(7):3259-3268
Silicon - To overcome the random dopant fluctuations (RDFs) and high thermal budget problems faced by normally doped Tunnel Field Effect Transistor (TFET) devices, charge plasma SiGe-heterojunction...  相似文献   

2.
Yadav  Menka 《SILICON》2022,14(13):7769-7779
Silicon - A detailed Sentaurus TCAD simulation based study for Silicon Double Gate Tunnel Field Effect Transistor (Si-DG TFET) based Ring Oscillator (RO) is presented in this work. Two different...  相似文献   

3.
4.
Bharadwaj  Himanshu  Kumar  Naveen  Amin  S. Intekhab  Anand  Sunny 《SILICON》2022,14(13):7677-7684
Silicon - The device Dopingless Vertical Nanowire Tunnel Field Effect Transistor is simulated as a biosensor in this paper. The technique used is Charge Plasma for general doping in this device....  相似文献   

5.
Kumar  Prateek  Gupta  Maneesha  Singh  Kunwar 《SILICON》2020,12(12):2809-2817
Silicon - In this paper, five layered Black Phosphorus (BP) – Silicon (Si) based Tunnel Field Effect Transistor (TFET) is used to overcome the thermionic limits faced by Metal Oxide...  相似文献   

6.
Cecil  Kanchan  Singh  Jawar  Samajdar  Dip Prakash 《SILICON》2022,14(7):3665-3672
Silicon - In this paper, we propose a novel n-type raised source/drain dopingless tunnel field-effect transistor along with stacked source configuration. Using calibrated TCAD 2-D device...  相似文献   

7.
Khan  Anam  Loan  Sajad A. 《SILICON》2021,13(5):1421-1431
Silicon - In this paper, we propose and simulate a novel double gate tunnel field effect transistor (DG-TFET) employing a metallic drain and a gate-drain underlap. The use of a metallic drain and...  相似文献   

8.
Paul  Omdarshan  Rajan  Chithraja  Samajdar  Dip Prakash  Hidouri  Tarek  Nasr  Samia 《SILICON》2022,14(16):10475-10483
Silicon - A highly sensitive, accurate, fast and power efficient biosensor is the need of the hour. Undoubtedly, dielectrically modulated (DM) tunnel FET (TFET) assures better sensitivity as...  相似文献   

9.
Paul  Robi 《SILICON》2023,15(5):2147-2162
Silicon - Conventional biosensor designs are often vulnerable to issues like random dopant fluctuations (RDFs) and high thermal budgets due to their design and the device they are based on. The...  相似文献   

10.
Gupta  Ashok Kumar  Raman  Ashish 《SILICON》2022,14(3):1147-1158
Silicon - This paper demonstrates the effect of ferroelectric gate oxide on the electrostatic doped nanotube tunnel field-effect transistor (FE-ED-NTTFET). The proposed device is a dopingless...  相似文献   

11.
Gupta  Ashok Kumar  Raman  Ashish  Kumar  Naveen 《SILICON》2022,14(16):10357-10373
Silicon - This paper proposed the electrostatically doped Ferroelectric Nanotube Tunnel FET (FE-NT-TFET). The proposed device is electrostatically doped, so the applied source voltage is...  相似文献   

12.
Vanlalawmpuia  K.  Bhowmick  Brinda 《SILICON》2021,13(1):155-166
Silicon - A new hetero-structure vertical tunnel field effect transistor is proposed and investigated using Sentaurus Technology Computer-aided Design simulation. Since the direction of the gate...  相似文献   

13.
Das  Debika  Chakraborty  Ujjal 《SILICON》2021,13(3):787-798
Silicon - This communication presents the performance analysis and impact of low frequency flicker noise on a dual dielectric pocket heterojunction silicon on insulator (SOI) tunnel FET (TFET). The...  相似文献   

14.
Gupta  Ashok Kumar  Raman  Ashish  Kumar  Naveen 《SILICON》2021,13(12):4553-4564
Silicon - This paper examines, an electrostatically configured Nano-Tube Tunnel Field-Effect Transistor (ED-NTTFET). During the fabrication process, different charges such as fixed charge, oxide...  相似文献   

15.
Kale  S. 《SILICON》2020,12(3):479-485

This work reports a platinum silicide (PtSi) Schottky Barrier (SB) p-MOSFET (SB p-MOSFET) using charge plasma concept for low power applications. Here, we use two different materials to form source of the device. The source consists of two parts as primary source and extension. To consist source, PtSi and for extension, platinum metal is used. The proposed device is named as charge plasma (CP) SB p-MOSFET (CP SB p-MOSFET). The use of platinum extension induces the hole plasma near the source end. As a result, increased band bending reduces the SB width. This enhances the DC performance of the device. In addition, we have compared the DC and analog/RF performance of both the proposed device and the conventional SB p-MOSFET. It is observed that the proposed device exhibits improvement in on-state current (Ion), on- to off current ratio (ION/IOFF), transconductance (gm), cut-off frequency (ft), product of gain and bandwidth (fa) and transconductance generation factor (gm/Ids). We also optimized the performance of the device by modulating the work function and length of metal employed for extension. Moreover, the proposed device eliminated the doping, lowers the thermal budget requirement and unaffected from fluctuations due to randomly distributed dopant.

  相似文献   

16.
Panda  Shwetapadma  Dash  Sidhartha 《SILICON》2022,14(15):9305-9317
Silicon - In this paper, a simulated Si0.6Ge0.4/Si hetero-structure double gate tunneling FET with drain dielectric pocket (DDP-SiGe-TFET) is reported for the first time. The high-k (HfO2)...  相似文献   

17.
Sharma  Swati  Goel  Anubha  Rewari  Sonam  Nath  Vandana  Gupta  R. S. 《SILICON》2022,14(15):9733-9749
Silicon - In this paper, Gallium Nitride (GaN) based Dielectric Engineered High-K GaN Schottky Nanowire Field Effect Transistor (DE-HK-GaN-SNWFET) is examined for enhancing analog performance for...  相似文献   

18.
Singh  Shailendra  Chauhan  Amit Kumar Singh  Joshi  Gaurish  Singh  Jeetendra 《SILICON》2022,14(11):6193-6204
Silicon - This paper explores the Vertical tunnel FET with the introduced layer of SiGe within the channel/source junction using TCAD. As Tunnel FETs smothered the 60 mV/decade confinement...  相似文献   

19.
Priya  G. Lakshmi  Venkatesh  M.  Balamurugan  N. B.  Samuel  T. S. Arun 《SILICON》2021,13(5):1691-1702
Silicon - The promising capability of Triple Material Surrounding Gate Junctionless Tunnel FET (TMSG – JL – TFET) based 6 T SRAM structure is demonstrated by employing...  相似文献   

20.
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