钨离子掺杂对钛片表面TiO2薄膜光催化活性的影响

采用溶胶-凝胶法制备了负载在钛片上掺杂W⁶⁺的TiO₂薄膜光催化剂。研究结果表明,焙烧温度为520 ℃,TiO₂薄膜光催化剂活性最好;W⁶⁺的掺杂提高了TiO₂薄膜的光催化活性。当W⁶⁺掺杂浓度为6.04×10¹⁶个·cm^-3时,W⁶⁺-TiO₂薄膜光催化剂光催化活性最高,XRD结果表明,掺杂W⁶⁺前后TiO₂均为锐钛矿相,并未检测出任何钨的氧化物。     

不同载体表面负载TiO2薄膜的离子掺杂研究

TiO₂薄膜是解决TiO₂回收的有效方法，缺点是TiO₂活性低，寻找合适的载体以及提高TiO₂薄膜的光催化活性,是TiO₂负载薄膜技术需要解决的核心问题。研究了13种离子对负载在釉面瓷砖、玻璃、陶瓷、钛片、铝片和不锈钢片6种载体上TiO₂薄膜的掺杂，并从界面材料结构、双电层结构等方面讨论了离子掺杂与载体对TiO₂薄膜光催化活性的影响。结果表明，TiO₂薄膜的离子掺杂效果不仅和离子掺杂浓度、种类有关，而且还与载体类型有关。TiO₂薄膜和非金属载体主要形成复合半导体结构，改善掺杂离子对载流子的捕获能力。金属载体与TiO₂薄膜之间主要形成肖特基势垒，有利于电子与空穴的分离。载体与TiO₂薄膜之间形成的界面双电层结构能改变离子捕获中心与TiO₂半导体费米能级间的相对位置，从而提高或降低离子对载流子的捕获能力。     

Mn2+-SiO2-TiO2纳米薄膜光催化性能的研究

在溶胶-凝胶法制备Mn²⁺掺杂TiO₂催化剂的基础上，掺入SiO₂纳米粉体，制备了一种新的Mn²⁺SiO₂TiO₂纳米薄膜。以甲醛为降解对象，探讨该种新薄膜的光催化性能，并与单纯TiO₂薄膜、Mn²⁺-TiO₂薄膜和SiO₂-TiO₂薄膜进行比较。结果表明，500 ℃焙烧，掺杂m(Mn²⁺)∶m(SiO₂)∶m(TiO₂)＝1.0∶12∶100 时，Mn²⁺-SiO₂-TiO₂纳米薄膜的光催化活性最高，150 min后甲醛降解率达88%，是单纯 TiO₂薄膜的1.8倍。该薄膜稳定性较好，经重复7次使用,最大降解率只下降7%，表明其稳定性较好。     

Gd3+掺杂TiO2纳米粉体的晶粒尺寸、表面特性和光催化活性

利用酸催化的溶胶-凝胶法制备了纯的和不同Gd³⁺掺杂量的TiO₂纳米粉体，并用XRD、BET、XPS、SPS等技术对样品进行了表征.研究了Gd³⁺掺杂量和焙烧温度对样品光催化降解亚甲基蓝的活性、相结构、晶粒尺寸和表面织构特性的影响，并结合表面光电特性和表面组成等探讨了Gd³⁺掺杂对纳米TiO₂的光催化活性的影响机制.结果表明：与纯TiO₂相比，适量掺杂Gd³⁺可以显著提高其光催化活性.当Gd³⁺掺杂量为0.5%（质量），焙烧温度为500 ℃时，TiO₂复合纳米粉体的光催化活性最佳，其锐钛矿含量为100%，平均晶粒粒径为15.55 nm，比表面积为12.81 m²·g^-1.Gd³⁺掺杂强烈地抑制TiO₂由锐钛矿相向金红石相的转变，减小晶粒尺寸，提高光响应阈值，这三方面均有利于提高光催化活性.XPS分析表明，Gd³⁺掺杂导致TiO₂纳米粉体的表面羟基含量降低.     

掺杂铁纳米TiO2的制备及其光催化性能研究

分别采用水热法和溶胶-凝胶法制备了纳米级TiO₂和不同掺铁量的TiO₂纳米粒子。通过纯TiO₂和掺铁TiO₂分别作光催化剂时甲基橙溶液在紫外光下的光催化降解试验发现，溶胶-凝胶法掺杂铁离子可以有效地提高TiO₂光催化活性，而水热法掺杂铁使TiO₂的光催化活性明显降低。Fe/TiO₂摩尔比为0.01％～0.1％，随掺杂量的增大,TiO₂光催化活性逐渐降低。     

Ho-Si-TiO2复合光催化剂的性能研究

用溶胶-凝胶法制备了Ho/Si/TiO₂复合光催化剂,采用X射线衍射对样品进行分析表征,并以甲基橙为模拟污染物,考察其光催化活性。结果表明,Ho和Si共掺杂抑制了晶粒的长大,Ho掺杂引起晶格畸变和膨胀,促进TiO₂的晶型转变;Ho/Si/TiO₂复合光催化剂与TiO₂相比,光催化活性明显提高,当焙烧温度为900 ℃,添加Ho的物质的量为0.05％时,光催化活性最佳。     

不同金属离子掺杂TiO2薄膜的制备及光催化活性的研究

以溶胶-凝胶法制备了分别用Ag^+、Cu²⁺、Fe³⁺、La³⁺、Ce³⁺和Eu³⁺等离子掺杂的纳米TiO₂薄膜，经XRD和UV-Vis对薄膜样品进行表征并研究了其光催化活性。XRD结果证明，掺镧TiO₂薄膜与未掺杂薄膜的X射线衍射图基本一致，实验条件下主要为锐钛矿型，且掺入La^3+离子使得TiO₂薄膜的晶粒变小。UV-Vis吸收光谱说明当λ＞380 nm时，其吸光度低于0.15。薄膜光催化降解亚甲基蓝的实验表明,La³⁺或Fe^3+掺杂薄膜的光催化降解率远高于未掺杂TiO₂薄膜，而Ce^3+或Cu^2+离子掺杂薄膜与未掺杂薄膜的光催化活性相似，掺Ag⁺或Eu³⁺离子则降低了活性。当最佳掺杂量La³⁺为0.6%或Fe³⁺为1.5%时，光催化降解率分别高达92%和82%。     

Zn2+离子掺杂对负载TiO2薄膜光催化活性的影响

以钛酸丁酯和ZnSO₄·7H₂O为原料，采用溶胶-凝胶法在钛片、玻璃、釉面瓷砖、陶瓷、不锈钢和铝片六种载体上制备了Zn²⁺掺杂TiO₂薄膜，讨论了不同Zn²⁺掺杂浓度下不同载体表面上制备的TiO₂薄膜对甲基橙脱色率的影响。结果表明，Zn²⁺对TiO₂薄膜的掺杂效果与载体的类型密切相关，并且不同载体其Zn²⁺掺杂的最佳浓度也不同。Zn²⁺掺杂后，TiO₂薄膜光催化活性提高最大的是釉面瓷砖，其次是钛片、玻璃、陶瓷。不锈钢和铝片上TiO₂薄膜的光催化活性不但没有升高，反而降低了。     

低含量Ni掺杂TiO2光催化剂及其在水溶液体系中的重复使用性能

利用溶胶-凝胶法制备了低含量Ni掺杂的TiO₂光催化剂粉体,考察了催化剂在甲基橙水溶液中的重复使用性能,并用XRD、XPS和N₂吸附-脱附等手段对催化剂进行了表征分析。结果表明,当掺杂Ni物质的量分数为0.3%和焙烧温度400 ℃时,制备的Ni/TiO₂的光催化降解甲基橙水溶液的活性高于纯TiO₂的光催化降解活性。Ni/TiO₂光催化剂在水溶液体系重复使用过程中,催化活性急剧下降,重复使用性能较差。Ni掺杂使TiO₂上产生具有较低结合能的低价钛离子如Ti^3＋,使表面缺陷（或氧空位）增加。比表面积和氧空位增加可能是Ni掺杂提高TiO₂光催化活性的主要原因。Ni流失可能是Ni/TiO₂在水溶液体系中重复使用性能较差的原因。     

溶胶-凝胶法制备二氧化钛薄膜的研究进展

光催化净化空气是一项造福人类的绿色环保技术。TiO₂薄膜化是光催化技术实用化的关键。介绍了近几年来溶胶-凝胶法制备TiO₂薄膜光催化净化空气的研究进展,对溶胶-凝胶法制备TiO₂薄膜的各种影响因素进行了分析,并探讨了提高TiO₂薄膜光催化能力的途径及其相关的光催化反应系统。     

Photo-induced Superhydrophilicity on TiO2 Thin Films Prepared by an Ionized Cluster Beam Deposition Method

The photocatalytic reactivity and the surface wettability of highly transparent TiO₂ thin films prepared by an ionized cluster beam deposition method were investigated, focusing on their surface morphologies, surface areas, and crystal phases. The As-prepared TiO₂ thin films showed higher photocatalytic reactivity, greater roughness in surface morphology and a larger surface area than the films calcined at temperatures higher than 823 K. Furthermore, the As-prepared film exhibited efficient photoluminescence (PL) spectra at 77 K, showing prolonged lifetimes for the photo-formed electron–hole pairs. Detailed discussions on the interaction between the PL intensity and photocatalytic reactivity as well as the surface wettability have been carried out from the viewpoint of the physicochemical properties of the TiO₂ thin films.     

Antibacterial Activity of Photocatalytic Titanium Dioxide Thin Films with Photodeposited Silver on the Surface of Sanitary Ware

The antibacterial activity of photocatalytic titanium dioxide (TiO₂) thin films with photodeposited silver on the surface of sanitary ware was studied. Samples were prepared by coating a TiO₂ sol that was calcined at 880°–980°C and photodeposited with silver ions onto the glazed layer of the sanitary ware. The relationships between the antibacterial activity and the fabrication conditions were investigated by X-ray diffractometry, scanning electron microscopy, and colorimetry. The phase of TiO₂ identified in the thin films was a mixture of anatase and rutile. The amount of rutile phase increased as the calcination temperature increased, and grain growth of the TiO₂ particles was observed. The activity was dependent on the TiO₂ thickness, the calcination temperature, and the amount of silver. These results suggest that the antibacterial activity was strongly affected by the amount of anatase in the thin films.     

CuO/ZnO叠层复合薄膜的制备及其光催化活性

分别通过光还原和电还原在以氧化铟锡玻璃为基体的ZnO上沉积Cu和Cu2O,后经400℃空气中热处理,制备了两种CuO/ZnO叠层复合薄膜。用X射线衍射、扫描电子显微镜和X射线能量散射谱分别对复合薄膜的晶相、形貌和化学组成进行表征。以橙黄II在模拟自然光照射下的光催化降解作为探针反应评价其光催化活性。结果表明：由Cu/ZnO经400℃下焙烧1h转化的CuO/ZnO叠层复合薄膜具有更高的光催化活性,反应1h后,橙黄II的降解率比由Cu2O/ZnO经400℃下焙烧1h转化的CuO/ZnO提高了14%。对CuO/ZnO叠层复合薄膜光催化活性提高的原因也进行了讨论。     

Enhanced photocatalytic activity of Au-buffered TiO2 thin films prepared by radio frequency magnetron sputtering

Au-buffered TiO₂ thin films have been prepared by radio frequency magnetron sputtering method. The structural and morphological properties of the thin films were characterized by X-ray diffraction, scanning electron microscopy, and atomic force microscopy. The photocatalytic activity of the samples was evaluated by the photodecomposition of methylene blue. The Au-buffer thin layer placed between the TiO₂ thin films significantly enhanced photocatalytic activity by 50%. Annealing the Au-buffered TiO₂ thin film at 600 °C decreased the film roughness, but it increased the surface area and anatase crystalline size, enhancing the photocatalytic activity.     

Effects of atomic layer deposition conditions on the formation of thin ZnO films and their photocatalytic characteristics

The use of photocatalysts in water treatment systems is regarded as an advanced technology. To ensure efficiency and stability, the optimization of photocatalyst immobilization is essential for application in water treatment processes. In this study, we investigated the effect of atomic layer deposition (ALD) conditions on the development of highly photocatalytically active thin ZnO films. Three different temperatures and three ALD cycles were employed to evaluate the photocatalytic activity of thin ZnO films (represented by the production rate of reactive oxygen species and the degradation rate of methylene blue). We found that the surface properties of the thin ZnO films, such as grain size and homogeneity, exerted a dominant influence on the photocatalytic activity. At a low temperature (50 °C), nanograins were not formed properly, while various nanograin shapes were obtained at a high temperature (250 °C). The optimized grain had a grain size of 20 nm and a (002)/(101) crystalline orientation ratio of 2.2. The UV light absorption increased in proportion to the film thickness, and a minimum film thickness (50 nm) was necessary to ensure high photocatalytic activity at the film surface. In addition, the increase in the photocatalytic activity was not significant as the thickness increased beyond the optimum thickness. These results will provide useful guidelines for the fabrication of thin ZnO films with excellent photocatalytic activity for water treatment.     

Effects of annealing temperature on the photocatalytic activity of N-doped TiO2 thin films

The effects of annealing temperature on the photocatalytic activity of nitrogen-doped (N-doped) titanium oxide (TiO₂) thin films deposited on soda-lime-silica slide glass by radio frequency (RF) magnetron sputtering have been studied. Glancing incident X-ray diffraction (GIAXRD), Raman spectrum, scanning electron microscopy (SEM), atomic force microscopy (AFM) and UV-vis spectra were utilized to characterize the N-doped TiO₂ thin films with and without annealing treatment. GIAXRD and Raman results show as-deposited N-doped TiO₂ thin films to be nearly amorphous and that the rutile and anatase phases coexisted when the N-doped TiO₂ thin films were annealed at 623 and 823 K for 1 h, respectively. SEM microstructure shows uniformly close packed and nearly round particles with a size of about 10 nm which are on the slide glass surface for TiO₂ thin films annealed at 623 K for 1 h. AFM image shows the lowest surface roughness for the N-doped TiO₂ thin films annealed at 623 K for 1 h. The N-doped TiO₂ thin films annealed at 623 K for 1 h exhibit the best photocatalytic activity, with a rate constant (k_a) of about 0.0034 h⁻¹.     

纳米WO_3/玻璃薄膜光催化性能研究

以溶胶-凝胶法制备纳米WO3/玻璃薄膜,并用UV-Vis法,IR法和XRD方法进行了表征。以10 mg/L罗丹明B为降解对象,考察其光催化性能。结果表明：经500℃灼烧2 h以上制备的厚度为278 nm的两层涂膜,在pH=3.0、鼓入空气、光强为1.81×1016光子/s等条件下薄膜具有最佳光催化活性,对罗丹明B的光催...     

TiO2 纳米薄膜微结构及光催化性能研究

以钛酸丁酯Ti(OBu)4为原料,采用溶胶-凝胶法在普通钠钙玻璃表面制备了TiO2纳米薄膜,用XRD、UV-VIS等技术对薄膜微结构及紫外吸收性能进行了表征,选用食用油光催化降解为模型对TiO2薄膜光催化性能进行了评价。探讨了退火温度对薄膜晶相结构及其光催化活性的影响,450℃退火处理的薄膜呈锐钛矿和金红石型混晶结构,锐钛矿相平均晶粒尺寸为28.8 nm,金红石相平均晶粒尺寸为40.4 nm,700℃退火后为纯金红石相。焙烧温度在450—490℃光催化活性较为理想,480℃附近光催化活性达到最高。涂膜层数增加,光催化活性增强,8层膜的光催化活性最高。     

Fe~(3+)掺杂TiO_2薄膜材料的制备与光催化性能研究

以载玻片为基材,通过溶胶-凝胶技术制备Fe3+离子掺杂的TiO2薄膜。采用甲基橙作为目标降解物,研究Fe3+掺杂薄膜的光催化活性,采用X-射线衍射、扫描电镜和紫外-可见光吸收谱等技术对薄膜相关特征进行了表征。研究表明,当Fe/Ti物质量比为0.25%时,光催化活性最高。经500℃焙烧2h制备TiO2薄膜具有锐钛矿结构,TiO2粒子大小均匀,有孔隙结构。掺杂Fe3+使薄膜TiO2粒子减小,孔隙率增加,而粒子粒径分布不均匀增加,且吸收强度增加吸收边有一定的红移。