Observation of hole accumulation in Ge/Si core/shell nanowires using off-axis electron holography

Hole accumulation in Ge/Si core/shell nanowires (NWs) has been observed and quantified using off-axis electron holography and other electron microscopy techniques. The epitaxial [110]-oriented Ge/Si core/shell NWs were grown on Si (111) substrates by chemical vapor deposition through the vapor-liquid-solid growth mechanism. High-angle annular-dark-field scanning transmission electron microscopy images and off-axis electron holograms were obtained from specific NWs. The excess phase shifts measured by electron holography across the NWs indicated the presence of holes inside the Ge cores. Calculations based on a simplified coaxial cylindrical model gave hole densities of (0.4 ± 0.2) /nm(3) in the core regions.     

Self-organized growth of Si/Silica/Er2Si2O7 core-shell nanowire heterostructures and their luminescence

Self-organized Si-Er heterostructure nanowires showed promising 1.54 microm Er(3+) optical activity. Si nanowires of about 120-nm diameter were grown vertically on Si substrates by the vapor-liquid-solid mechanism in an Si-Er-Cl-H(2) system using an Au catalyst. Meanwhile, a single-crystalline Er(2)Si(2)O(7) shell sandwiched between nanometer-thin amorphous silica shells was self-organized on the surface of Si nanowires. The nanometer-thin heterostructure shells make it possible to observe a carrier-mediated 1.53 microm Er(3+) photoluminescence spectrum consisting of a series of very sharp peaks. The Er(3+) spectrum and intensity showed absolutely no change as the temperature was increased from 25 to 300 K. The luminescence lifetime at room temperature was found to be 70 micros. The self-organized Si nanowires show great potential as the material basis for developing an Si-based Er light source.     

Transport modulation in Ge/Si core/shell nanowires through controlled synthesis of doped Si shells

Appropriately controlling the properties of the Si shell in Ge/Si core/shell nanowires permits not only passivation of the Ge surface states, but also introduces new interface phenomena, thereby enabling novel nanoelectronics concepts. Here, we report a rational synthesis of Ge/Si core/shell nanowires with doped Si shells. We demonstrate that the morphology and thickness of Si shells can be controlled for different dopant types by tuning the growth parameters during synthesis. We also present distinctly different electrical characteristics that arise from nanowire field-effect transistors fabricated using the synthesized Ge/Si core/shell nanowires with different shell morphologies. Furthermore, a clear transition in the modification of device characteristics is observed for crystalline shell nanowires following removal of the shell using a unique trimming process of successive native oxide formation/etching. Our results demonstrate that the preferred transport path through the nanowire structure can be modulated by appropriately tuning the growth conditions.     

Band-gap modulation in single-crystalline Si1-xGex nanowires

We report the energy band-gap modulation of single-crystalline Si1-xGex (0 相似文献   

Spatial carrier confinement in core-shell and multishell nanowire heterostructures

We have derived an analytical effective-mass model and employed first-principles density functional theory to study the spatial confinement of carriers in core-shell and multishell structured semiconductor nanowires. The band offset effect is analyzed based on the subband charge density distributions, which is strongly dependent upon the strain relaxation. First-principles calculation results for spatially confined Si/Ge and GaN/GaP nanowires indicate accumulation of a Ge-core hole gas and a GaN-core electron gas, respectively, in agreement with experimental observations.     

Core/multishell nanowire heterostructures as multicolor, high-efficiency light-emitting diodes

We report the growth and characterization of core/multishell nanowire radial heterostructures, and their implementation as efficient and synthetically tunable multicolor nanophotonic sources. Core/multishell nanowires were prepared by metal-organic chemical vapor deposition with an n-GaN core and InxGa1-xN/GaN/p-AlGaN/p-GaN shells, where variation of indium mole fraction is used to tune emission wavelength. Cross-sectional transmission electron microscopy studies reveal that the core/multishell nanowires are dislocation-free single crystals with a triangular morphology. Energy-dispersive X-ray spectroscopy clearly shows shells with distinct chemical compositions, and quantitatively confirms that the thickness and composition of individual shells can be well controlled during synthesis. Electrical measurements show that the p-AlGaN/p-GaN shell structure yields reproducible hole conduction, and electroluminescence measurements demonstrate that in forward bias the core/multishell nanowires function as light-emitting diodes, with tunable emission from 365 to 600 nm and high quantum efficiencies. The ability to synthesize rationally III-nitride core/multishell nanowire heterostructures opens up significant potential for integrated nanoscale photonic systems, including multicolor lasers.     

Vertically standing Ge nanowires on GaAs(110) substrates

The growth of epitaxial Ge nanowires is investigated on (100), (111) B and (110) GaAs substrates in the growth temperature range from 300 to 380?°C. Unlike epitaxial Ge nanowires on Ge or Si substrates, Ge nanowires on GaAs substrates grow predominantly along the [Formula: see text] direction. Using this unique property, vertical [Formula: see text] Ge nanowires epitaxially grown on GaAs(110) surface are realized. In addition, these Ge nanowires exhibit minimal tapering and uniform diameters, regardless of growth temperatures, which is an advantageous property for device applications. Ge nanowires growing along the [Formula: see text] directions are particularly attractive candidates for forming nanobridge devices on conventional (100) surfaces.     

Site-controlled fabrication of dimension-tunable Si nanowire arrays on patterned (001)Si substrates

In this study, we fabricated well-ordered arrays of site-controlled, vertically-aligned Si nanowires on the desired areas of pre-patterned (001)Si substrates by employing the nanosphere lithographic technique in combination with the Au-assisted selective etching process. The results of transmission electron microscopy and selected-area electron diffraction analysis show that the Si nanowires that fabricated on the patterned (001)Si substrates have a single-crystalline nature and form along the [001] direction. The length of the Si nanowires was found to increase linearly with the Au-assisted etching time. Scanning electron microscopy images clearly revealed that by adjusting the sizes of the nanosphere template and the etching temperature and time, the diameter and length of the patterned Si nanowires could be effectively tuned and accurately controlled. Furthermore, the diameters of the Si nanowires produced at various temperatures and time were found to be relatively uniform over the entire length. The combined approach presented here provides the capability to fabricate a variety of size-, length-tunable 1D Si-based nanostructures on various patterned Si-based substrates.     

Diffusion in Si(x)Ge(1-x)/Si nanowire heterostructures

Si0.48Ge0.52/Si tip/nanowire heterostructures were grown by pulsed laser vaporization (PLV) at a growth temperature of 1100 degrees C. Ge diffusion in [111]-growth Si nanowires was studied for different post-synthesis annealing temperatures from 200 degrees C to 800 degrees C. Ge composition profiles were quantified by energy-dispersive X-ray spectroscopy in a transmission electron microscope. The compositional profiles were modeled by a limited-source diffusion model to extract temperature-dependent diffusion coefficients. The Ge diffusion coefficients followed an Arrhenius relationship with an activation energy of 0.622 +/- 0.050 eV. This rather low activation energy barrier is similar to the previously reported activation energy barrier of 0.67 eV for Ge surface diffusion on Si, suggesting that surface diffusion may dominate in nanowires at this length scale.     

Stranski-Krastanow growth of germanium on silicon nanowires

There have been extensive studies of germanium (Ge) grown on planar silicon (Si) substrates by the Stranski-Krastanow (S-K) mechanism. In this study, we present S-K growth of Ge on Si nanowires. The Si nanowires were grown at 500 degrees C by a vapor-liquid-solid (VLS) method, using silane (SiH4) as the gaseous precursor. By switching the gas source from SiH4 to germane (GeH4) during the growth and maintaining the growth conditions, epitaxial Ge islands deposited on the outer surface of the initially formed Si nanowires. Transmission electron microscopy (TEM), scanning TEM, and energy-dispersive X-ray spectroscopy techniques were utilized to identify the thin wetting layer and the three-dimensional Ge islands formed around the Si core nanowires. Cross-sectional TEM verified the surface faceting of the Si core nanowires as well as the Ge islands.     

A Ge/Si heterostructure nanowire-based double quantum dot with integrated charge sensor

One proposal for a solid-state-based quantum bit (qubit) is to control coupled electron spins on adjacent semiconductor quantum dots. Most experiments have focused on quantum dots made from III-V semiconductors; however, the coherence of electron spins in these materials is limited by hyperfine interactions with nuclear spins. Ge/Si core/shell nanowires seem ideally suited to overcome this limitation, because the most abundant nuclei in Ge and Si have spin zero and the nanowires can be chemically synthesized defect-free with tunable properties. Here, we present a double quantum dot based on Ge/Si nanowires in which we can completely control the coupling between the dots and to the leads. We also demonstrate that charge on the double dot can be detected by coupling it capacitively to an adjacent nanowire quantum dot. The double quantum dot and integrated charge sensor serve as an essential building block to form a solid-state qubit free of nuclear spin.     

Lateral, Ge, nanowire growth on SiO2

Vapor-liquid-solid (VLS) nanowires (NWs) typically grow in [111] directions. Previously, the authors have demonstrated guided Si NW growth, engineering the VLS NWs to grow in a [110] direction against a SiO(2) surface. In this work, the authors demonstrate guided high-quality Ge nanowire growth against a SiO(2) surface in the substrate plane to bridge between two Si mesas. The authors explore the interfaces between a Ge NW and the two Si device-layer mesas and report high-quality, epitaxial interfaces between the Ge NW and both Si mesas.     

Long germanium nanowires prepared by electrochemical etching

Germanium (Ge) nanowires have been produced by electrochemical etching of single-crystalline n-type Ge [100] in a HCl-containing aqueous electrolyte. Macropores could be etched at various etching currents after an optimized procedure for homogeneous pore nucleation was used. Because of the narrow band gap of Ge (0.66 eV), the leakage current through pore walls is much higher than that, for example, in Si, leading to a constant dissolution of the pore walls. At sufficiently high current densities, it is then possible to form nanowires with diameters determined by the width of the space charge region, ranging from roughly 50 to 500 nm, and a length of several hundred micrometers. The role of the space charge region for stabilizing pore formation and in the formation of nanowires will be discussed.     

Band-offset driven efficiency of the doping of SiGe core-shell nanowires

Impurity doping of semiconducting nanowires has been predicted to become increasingly inefficient as the wire diameter is reduced, because impurity states get deeper due to quantum and dielectric confinement. We show that efficient n- and p-type doping can be achieved in SiGe core-shell nanowires as thin as 2 nm, taking advantage of the band offset at the Si/Ge interface. A one-dimensional electron (hole) gas is created at the band-edge and the carrier density is uniquely controlled by the impurity concentration with no need of thermal activation. Additionally, SiGe core-shell nanowires provide naturally the separation between the different types of carriers, electron and holes, and are ideally suited for photovoltaic applications.     

Sub-100 nanometer channel length Ge/Si nanowire transistors with potential for 2 THz switching speed

Ge/Si core/shell nanowires (NWs) are attractive and flexible building blocks for nanoelectronics ranging from field-effect transistors (FETs) to low-temperature quantum devices. Here we report the first studies of the size-dependent performance limits of Ge/Si NWFETs in the sub-100 nm channel length regime. Metallic nanoscale electrical contacts were made and used to define sub-100 nm Ge/Si channels by controlled solid-state conversion of Ge/Si NWs to NiSixGe y alloys. Electrical transport measurements and modeling studies demonstrate that the nanoscale metallic contacts overcome deleterious short-channel effects present in lithographically defined sub-100 nm channels. Data acquired on 70 and 40 nm channel length Ge/Si NWFETs with a drain-source bias of 0.5 V yield transconductance values of 78 and 91 microS, respectively, and maximum on-currents of 121 and 152 microA. The scaled transconductance and on-current values for a gate and bias voltage window of 0.5 V were 6.2 mS/microm and 2.1 mA/microm, respectively, for the 40 nm device and exceed the best reported values for planar Si and NW p-type FETs. In addition, analysis of the intrinsic switching delay shows that terahertz intrinsic operation speed is possible when channel length is reduced to 70 nm and that an intrinsic delay of 0.5 ps is achievable in our 40 nm device. Comparison of the experimental data with simulations based on a semiclassical, ballistic transport model suggests that these sub-100 nm Ge/Si NWFETs with integrated high-kappa gate dielectric operate near the ballistic limit.     

几种Si、Ge纳米线导热系数的原子模拟

采用非平衡分子动力学方法模拟了Si纳米线、Ge纳米线、核-壳结构的Si/Ge纳米线及超晶格结构的Si/Ge纳米线的导热系数,给出了纳米线的温度与导热系数关系曲线,对比了几种纳米线导热特性的差异,研究结果表明,随着温度的升高,各纳米线的导热系数降低;相同温度下,纳米线导热系数的大小顺序为：核-壳结构的Si/Ge纳米线、超晶格结构的Si/Ge纳米线、Si纳米线、Ge纳米线。     

Diameter dependent growth rate and interfacial abruptness in vapor-liquid-solid Si/Si1-xGex heterostructure nanowires

A strong diameter dependence is observed in the interfacial abruptness and growth rates in Si/Si 1- x Ge x axial heterostructure nanowires grown via Au-mediated low pressure CVD using silane and germane precursors. The growth of these nanowires has similarities to that of heterostructure thin films with similar compositional interfacial broadening, which increases with and is on the order with diameter. This broadening may reveal a fundamental challenge to fabrication of abrupt heterostructures via VLS growth.     

Diameter-dependent composition of vapor-liquid-solid grown Si(1-x)Ge(x) nanowires

Diameter-dependent compositions of Si(1-x)Ge(x) nanowires grown by a vapor-liquid-solid mechanism using SiH(4) and GeH(4) precursors are studied by transmission electron microscopy and X-ray energy dispersive spectroscopy. For the growth conditions studied, the Ge concentration in Si(1-x)Ge(x) nanowires shows a strong dependence on nanowire diameter, with the Ge concentration decreasing with decreasing nanowire diameter below approximately 50 nm. The size-dependent nature of Ge concentration in Si(1-x)Ge(x) NWs is strongly suggestive of Gibbs-Thomson effects and highlights another important phenomenon in nanowire growth.     

Electric-field-dependent photoconductivity in CdS nanowires and nanobelts: exciton ionization, Franz-Keldysh, and Stark effects

We report on the electric-field-dependent photoconductivity (PC) near the band-edge region of individual CdS nanowires and nanobelts. The quasi-periodic oscillations above the band edge in nanowires and nanobelts have been attributed to a Franz-Keldesh effect. The exciton peaks in PC spectra of the nanowires and thinner nanobelts show pronounced red-shifting due to the Stark effect as the electric field increases, while the exciton ionization is mainly facilitated by strong electron-longitudinal optical (LO) phonon coupling. However, the band-edge transition of thick nanobelts blue-shifts due to the field-enhanced exciton ionization, suggesting partial exciton ionization as the electron-LO phonon coupling is suppressed in the thicker belts. Large Stark shifts, up to 48 meV in the nanowire and 12 meV in the thinner nanobelts, have been achieved with a moderate electric field on the order of kV/cm, indicating a strong size and dimensionality implication due to confinement and surface depletion.     

Directed self-assembly of Ge nanostructures on very high index, highly anisotropic Si(hkl) surfaces

Families of very high-index planes, such as those which bifurcate spontaneously to form a hill-and-valley structure composed of opposing facets, provide natural templates for the directed growth of position-controlled self-organized nanostructures with shapes determined by the facet width ratio R. For example, deposition of a few ML of Ge on Si(173 100 373), corresponding to R(113/517) = 1.7, results in a field of 40-nm-wide Ge nanowires along [72 187] with a uniform period of 60 nm.