未掺杂半绝缘GaAs中受主及电中性EL2分布的研究

测量了未掺杂半绝缘（ＳＩ）ＬＥＣＧａＡｓ中总的、电中性的ＥＬ２及净受主浓度分布和碳分布。结果表明，总ＥＬ２浓度径向分布呈Ｗ形而不是均匀的，净受主浓度径向分布呈∧形或∩形而不是Ｍ形。电中性ＥＬ２的Ｗ形径向分布由总ＥＬ２浓度的Ｗ形径向分布决定，而不是由于净受主的不均匀分布。有些样品中净受主浓度远大于碳浓度．意味着这些样品中除碳外还存在高浓度的其它受主。     

非有意掺杂LEC SI GaAs中EL2分布特性的研究

测量比较了不同条件下热处理后非有意掺杂半绝缘(SI)LEC GaAs中EL2浓度及其分布的变化,为了分析这一变化,还检测了位错和As沉淀的分布。在实验结果基础上,对EL2分布不均匀性的起源和热处理改善EL2分布均匀性的机理进行了讨论。     

热处理改善未掺杂LEC GaAs中EL2分布均匀性机理的研究

根据ＥＬ２分布的热处理行为和Ａｓ沉淀分布特征的实验结果，讨论了Ａｓ沉淀对ＥＬ２分布的影响和热处理改善ＥＬ２分布均匀性的机理。     

Observation of differences in the quenching of the Photocurrent in GaAs containing EL2 and EL0

The quenching of the photocurrent and photo-Hall effect of several undoped semi-insulating gallium arsenide samples has been measured and compared with the deep-level photoluminescence spectra from neighboring samples. Samples that show either EL2 (0.68 eV) or ELO (0.63 eV) photoluminescence have distinctly different photocurrent quenching behaviors. EL2 samples show a photocurrent decrease of several orders of magnitude, and a change fromn-type to p-type conduction during quenching at 80 K with 1.1 eV light. ELO samples show a reduction in photocurrent of less than an order of magnitude with no change in the carrier type at this temperature. Photo-Hall effect experiments at 80 K indicate that the conduction isn-type for the ELO samples, but changes fromn- to p-type during the quench for the EL2 samples. The temperature dependence of the quenching has also been studied. EL2 samples show little variation in the range 10-80 K, while ELO samples show significant quenching similar to EL2 after the temperature is reduced below 70 K. These results indicate that defects other than EL2 can significantly affect photocurrent quenching experiments.     

掺In GaAs晶体中的EL2缺陷及其热处理

比较了掺Ｉｎ和非掺杂ＬＥＣ－ＧａＡｓ晶体中的ＥＬ２缺陷，分析了掺Ｉｎ量的不同与热处理过程的不同对ＬＥＣ－ＧａＡｓ晶体中ＥＬ２缺陷的影响。     

非掺杂半绝缘LECGaAs中电参数与碳浓度及EL2浓度的关系

利用范德堡方法和光吸收方法研究了非掺杂半绝缘（ＳＩ）ＬＥＣＧａＡｓ 中电参数与碳（Ｃ）浓度及ＥＬ２ 浓度的关系。通过比较实验结果和理论计算结果发现，这种半绝缘晶体中除Ｃ外还存在其它受主在电补偿中起重要作用     

Accurate measurement of capture cross sections in deep level transient spectroscopy: Application to EL2 in GaAs

A rigorous formulation of capacitance changes during trap filling processes is presented and used to accurately determine the electron capture cross section of EL2 in GaAs at a particular temperature, 377K, in this case. The value, σ_n (377K) = 2.7 × 10⁻¹⁶ cm², is compared with that predicted from the emission dependence.     

与GaAs中EL2能级有关的局域振动中心的模型计算

本文试图对与EL_2中心有关的局域模振动的一个最新测量结果给予解释,认为一个填隙的(或偏心代位的)氧原子可能是产生这些局域模振动的原因.设计了一个简单的模型.并在双心键理论的基础上,进一步考虑了晶格弛豫,对模型进行了估算,发现产生所观察的局域模振动是完全可能的.这个分析强烈暗示氧与所观测样品中EL2中心的关系.     

Inhomogeneity of the deep center el2 in GaAs observed by direct infra-red imaging

The distribution of the dominant deep trap EL2 in 7.5cm diameter crystals of semi-insulating GaAs is studied by whole slice infrared imaging. Very significant fluctuations in the neutral EL2 concentration ([EL2]ℴ) are observed, corresponding at most to variations in [EL2]ℴ of up to 80%. The different sorts of fine structure, namely cell structure and bands of high infrared absorption ("sheets" and “streamers”) lying in (110) planes running down the <001> growth directions, are described.     

EL2能级对GaAs MESFET夹断电压的影响

在建立的理论模型基础之上,定量地分析了ＥＬ２能级对ＧａＡｓ ＭＥＳＦＥＴ夹断电压的影响,指出位于本征费米能级以下的ＥＬ２能级是影响ＧａＡｓ ＭＥＳＦＥＴ夹断电压大小的主要因素,ＥＬ２能级对ＧａＡｓ ＭＥＳＦＥＴ夹断电压的影响程度与ＥＬ２能给的缺陷密度呈线性关系。     

Structural and infrared absorption properties of self-organized InGaAs/GaAs quantum dots multilayers

Self-organized InGaAs/GaAs quantum dots (QDs) stacked multilayers have been prepared by solid source molecular beam epitaxy. Cross-sectional transmission electron microscopy shows that the InGaAs QDs are nearly perfectly vertically aligned in the growth direction [100]. The filtering effect on the QDs distribution is found to be the dominant mechanism leading to vertical alignment and a highly uniform size distribution. Moreover, we observe a distinct infrared absorption from the sample in the range of 8.6–10.7 μm. This indicates the potential of QDs multilayer structure for use as infrared photodetector.     

EL2能级和光电离截面的计算

我们采用EHT法计算了EL2缺陷模型的电子能级及其波函数,集团包含41个原子,用群论方法约化久期行列式。同时计算了该缺陷能级的光电离截面,计算结果与实验结果相符。     

热处理和淬火的未掺杂半绝缘LEC GaAs的均匀性

对未掺杂原生ＬＥＣＳＩＧａＡｓ单晶在５００～１１７０℃温度范围进行了单步、两步和三步热处理及淬火，研究了这种热处理对ＥＬ２分布的影响，并检测了位错和Ａｓ沉淀的变化。结果表明，６５０℃以上温度的热处理可以改善ＥＬ２分布均匀性，且在６５０～９５０℃温度范围的热处理中，ＥＬ２均匀性的改善与热处理后的降温速率无明显联系。此外，两步或三步热处理的样品中ＥＬ２分布甚至比单步热处理样品中更优。９５０℃以下的热处理和淬火对位错和Ａｓ沉淀无明显影响。但是１１７０℃热处理井淬火后位错密度增加大约３０％，Ａｓ沉淀消失。对经１１７０℃淬火的样品再进行８０Ｏ℃或９５０℃的热处理，Ａｓ沉淀重新出现。ＥＬ２分布的变化可能与点缺陷、位错和Ａｓ沉淀的相互作用有关。文中提出了这种相互作用的模型，利用该模型可解释不同条件热处理后ＥＬ２分布的变化。     

STUDY OF MORPHOLOGICAL DISTRIBUTION OF DEFECTS IN GaAs WAFERS BY INFRARED DIGITAL IMAGE PROCESSING

A new method is applied to characterize the defects in GaAs material(e.g.the absorption ofEL2 centres).The method consists of transmitting a laser beam(λ=1.1-1.5μm)through the GaAs wa-fer of 4—8 mm thickness and 50 mm diameter.The image is received by the TOSHIBA 8844 cameraand entered into the DATASUD computer image processing system.This image is displayed on amonitor permitting to observe the inhomogeneity(like cross,cells and volutes)of theEL2 and dislocation defects.This paper will introduce a specific image processing software for GaAs materi-al,called ZHIMAG(ZHang IMAGe)and its application to GaAs wafer.The software can bealso applied to any other types of image processing.     

热处理和淬火影响GaAs中EL2浓度机理的研究

对非掺杂(ND)半绝缘(SI)液封直拉(LEC)GaAs单晶在500～1170℃温度范围进行了单步和多步的热处理和淬火,研究了热处理及淬火对GaAs中EL2浓度的影响,讨论了热处理及淬火影响EL2浓度的机理.     

GaAs对脉冲Nd:YAG激光器的调Q和锁模

本文分析半导体材料GaAs对1064nm激光的可饱和吸收特性,在闪光灯抽运的平凹腔和平凸腔Nd:YAG激光器中,插入GaAs样品作为调Q器件,实现了激光器的被动调Q运转,分别获得脉冲宽度32.7ns(平凹腔)和30.9ns(平凸腔)的激光脉冲。实验上研究了平凹腔腔长和输出镜透过率对调Q激光输出性能的影响。当平凹腔腔长增加到125cm时,观察到GaAs对1064nm激光的被动锁模。对上述实验结果给予了合理的理论解释。     

Identification of the acceptor level V3+/2+ in GaAs and a new experimental observation of V2 in “low spin” ground state in GaAs

The results of optical absorption and deel level transient spectroscopy on various V-doped GaAs materials (n type Bridgman, n and p type liquid encapsulated Czochralski,n andp type liquid phase epitaxy) are reported. It is definitively shown that the single acceptor state of isolated vanadium is located atE _c -0.14 eV and that no mid gap-level related to isolated vanadium which could explain same reported semi-insulating properties of V-doped GaAs has been detected. From the analysis of the absolute photoionization cross section gs/sk _n ^o of the above level it is shown that V²⁺ is in a low spin state in accordance with recent theoretical predictions.     

Excitation photocapacitance study of EL2 in n-GaAs and its relation to non-stoichiometry

The excitation photocapacitance measurements are performed on n-GaAs to obtain charge transition characteristics of EL2 defects in a full spectral region. It is shown that the threshold photon energy for EL2⁺⁺ to EL2⁺ transition is changed as a function of the primary excitation photon energy. It is also shown that the Frank–Condon shifts (d_FC) changed. It is considered that the lattice relaxation around the EL2 defect is affected by the deviation from the stoichiometric composition.     

用1553nm激光脉冲触发GaAs光电导开关的研究

用1553nm飞秒光纤激光器触发半绝缘GaAs光电导开关的实验表明,当光电导开关处于3.33～10.3kV/cm的直流偏置电场并被脉冲宽度200fs且单脉冲能量0.2nJ的激光脉冲照射时,开关表现为线性工作模式,开关输出峰值电压为0.8mV.分析表明,开关对波长为1553nm触发激光脉冲表现出的弱光电导现象起因于半绝缘GaAs材料EL2深能级的作用.     

Peculiar Photoconduction in Semi-Insulating GaAs Photoconductive Switch Triggered by 1064nm Laser Pulse

The peculiar photoconduction in semi-insulating GaAs photoconductive switch being triggered by 1064nm laser pulse is reported.The gap between two electrodes of the switch is 4mm.When it is triggered by laser pulse with energy of 0.8mJ and the pulse width of 5ns,and operated at biased electric field of 2.0 and 6.0kV／cm,both linear and nonlinear modes of the switch are observed respectively.Whereas the biased electric field adds to 9.5kV／cm,and the triggered laser is in range of 0.5～1.0mJ,the peculiar performed characteristic is observed:the switch gives a linear waveform firstly,and then after a delaytime of about 20～250ns,it outputs a nonlinear waveform again.The physical mechanism of this specific phenomenon is associated with the anti-sitedefects of semi-insulating GaAs and two-step-single-photon absorption.The delay time between linear waveform and nonlinear waveform is calculated,and the result matches the experiments.