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采用射频反应溅射法在玻璃衬底上制得均匀透明的TiO2纳米薄膜,然后采用金(Au)离子溅射镀膜法制得金包覆TiO2复合薄膜。利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)等研究了金包覆TiO2薄膜的结晶特性和表面形貌。研究显示,射频功率为200W时,射频薄膜表面光滑平整,由锐钛矿型TiO2纳米微粒构成,其微粒直径在20~100nm。Au离子溅射镀膜和真空退火后薄膜的表面形貌没有明显的变化。采用细菌涂布培养法对金掺杂TiO2纳米薄膜的光催化杀菌性能进行研究,结果表明金包覆TiO2纳米复合薄膜较单一TiO2纳米薄膜在光催化杀菌范围、速度及效率上具有明显的增强,对枯草芽孢杆菌在10min内的杀菌率均达到90%以上。根据实验结果,讨论了金包覆TiO2纳米薄膜光催化杀菌机理。 相似文献
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《微纳电子技术》2019,(12):1005-1009
分别采用溶液法和磁控溅射法制备了TiO_2薄膜。其中对采用磁控溅射法制备的样品进行了退火。用扫描电子显微镜(SEM)观察了薄膜的表面形貌,表征结果发现,与溶液法制备的TiO_2薄膜相比,采用磁控溅射法制备的薄膜更加致密,表面粗糙度更低。X射线衍射(XRD)测试结果说明,溶液法制备的薄膜是多晶结构,而磁控溅射制备的薄膜是非晶结构,经过500℃退火后溅射的样品也只有一个(101)峰。在制备好的TiO_2薄膜上旋涂钙钛矿层,将其制备成太阳电池,并测试其光电性能。I-V曲线表明,采用磁控溅射法制备的TiO_2薄膜制备的电池具有更高的开路电压。 相似文献
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以多元金属纳米薄膜(金、银)为基底,利用飞秒激光加工技术制备得到多元等离子体纳米结构,并研究了其局域表面等离子体共振效应(Local Surface Plasmon Resonance,LSPR)和表面增强拉曼散射(Surface Enhanced Raman Scattering,SERS)性能。利用时域有限差分(Finite Difference Time Domain,FDTD)软件模拟了不同情况下(单层金膜、金银双层金属薄膜的平面以及阵列结构)的电场分布情况。根据仿真结果,相较于平面金属膜来说,飞秒激光制备的微纳结构阵列附近区域产生电磁场增强,集中在结构边缘处,且其强度变化与预期结果基本保持一致。此外,使用浓度为10-4 M和10-6 M的罗丹明(R6G)溶液进行SERS性能测试。测试的结果表明,单层平面金膜基本没有SERS峰值信号出现,而单层金膜上制备的等离子体纳米结构附近出现峰值信号,双层金属薄膜上制备的等离子体纳米结构展现出更高的SERS峰值信号。多元金属等离子体纳米结构展示出更强的局域表面等离子体共振效应,从而在表面增强拉曼散射、光催化、生物传感等领域具有广泛的应用。 相似文献
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微等离子法制备原位生长TiO2薄膜电极研究 总被引:1,自引:1,他引:0
采用微等离子体氧化法制备用于染料敏化太阳能电池的原位生长TiO2薄膜电极。筛选适合制备较高光电性能原位生长TiO2薄膜电极的电解液,利用扫描电镜(SEM)、X射线衍射(XRD)和交流阻抗谱(EIS)考察电解液类型对所得TiO2薄膜电极的表面形貌、晶相组成和内部阻抗的影响,并利用X射线光电子能谱(XPS)和红外吸收(IR)研究染料敏化剂与TiO2薄膜表面的相互作用。结果表明,以(NH4)2SO4为电解液制备TiO2薄膜的光电性能高于硫酸体系所得TiO2薄膜的光电性能,短路电流、开路电压和光电转换效率分别为49μA/cm2,652mV和0.095%。薄膜主要由大量的金红石和少量的锐钛矿和钛组成,并且以(NH4)2SO4为电解液制备的薄膜中,TiO2含量较高。膜层较厚,约为7.5μm。薄膜的内部阻抗相对较小,有利于染料敏化太阳能电池光电性能的提高。所得TiO2薄膜电极的光电性能较高;cis-Ru(dcbpy)2(NCS)2染料可以吸附在微等离子氧化法制备的TiO2薄膜表面。染料cis-Ru(dcbpy)2(NCS)2敏化后的TiO2薄膜XPS谱中出现了O=C-O基团中的C1s吸收峰,说明染料可以吸附在微等离子氧化法制备的TiO2薄膜表面。在红外光谱中,在1 737nm处出现了一个吸收峰,应为酯键羰基振动所引起的,由此可以推断染料与TiO2表面应以类酯键形式结合。 相似文献
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利用激光化学气相沉积(LCVD)方法,以钛金属有机化合物为前驱体,以O2为反应气体,在激光功率PL为0~200 w、基板预热温度为400~700℃的条件下,制备出了金红石型TiO2薄膜和金红石型与锐钛矿型混合TiO2薄膜.研究表明,激光功率和基板预热温度对所沉积的TiO2薄膜的物相组成、截面组织,表面形貌和薄膜生长速度均有着显著的影响. 相似文献
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采用电子束蒸发和射频磁控溅射技术沉积了Y2 O3 :Eu电致发光薄膜 ,对膜进行了不同温度的大气热处理。用原子力显微镜 (AFM)观察了Y2 O3 :Eu膜的表面形貌 ,用X射线 (XRD)分析了Y2 O3 :Eu膜的结构 ,并对两种Y2 O3 :Eu膜的微结构和表面形貌进行了比较。结果表明 ,射频磁控溅射Y2 O3 :Eu膜与电子束蒸发Y2 O3 :Eu膜相比 ,结构更致密 ,表面更平滑 ,而且 ,在 90 0°C高温热处理后 ,溅射膜呈现单斜晶系结构 ,具有该结构的Y2 O3 :Eu膜适宜于作电致发光膜。 相似文献
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L. T. Romano B. S. Krusor R. Singh T. D. Moustakas 《Journal of Electronic Materials》1997,26(3):285-289
GaN films grown by electron-cyclotron resonance plasma-assisted molecular beam epitaxy were studied by transmission electron
microscopy and x-ray diffraction (XRD). Two sets of films were compared that were grown under identical conditions except
for the ratio of the Ga to N flux. Films with a 30% higher Ga to N ratio (A films) were found to contain inversion domains
(IDs). No IDs were found in films grown with a lower Ga to N ratio (B films), but instead the zinc-blende GaN was found near
the film substrate interface. A narrower XRD rocking curve width along the (0002) direction and a broader rocking curve width
along the asymmetric (1102) axis were found for A films compared to B films. 相似文献
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用化学溶液沉积法在Si衬底上制备了La0.5Sr0.5CoO 3(LSCO)导电薄膜.X-射线衍射结果表明退火温度600℃可以使LSCO薄膜晶化,薄膜没 有明显的择优取向并呈单一的钙钛矿相.原子力显微镜研究结果表明LSCO薄膜表面平整、无 裂纹及晶粒尺寸较大.用椭偏光谱仪测量了波长300~1700nm范围内LSCO薄膜的椭偏光谱.用适当的拟合模型进行拟合,获得了LSCO 薄膜的光学常数(包括折射率,消光系数,吸收系数等)谱. 相似文献
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化学溶液法制备的Ba0.9Sr0.1TiO3薄膜的结构及光学特性研究 总被引:7,自引:0,他引:7
采用高度稀释的前驱体溶液在LaNiO3(LNO)薄膜上沉积了Ba0.9Sr0.1TiO3(BST)薄膜。X-射线衍射分析表明BST薄膜呈高度的(100)择优取向。原子力显微镜测量发现制备的BST薄膜具有大的晶粒尺寸80-200nm。用椭偏光谱仪测量了光子能量为0.7-3.4eV范围内BST薄膜的椭偏光谱,用Cauchy模型描述BST薄膜的光学性质,获得了BST薄膜的光学常数谱和禁带宽度Eg=3.36eV。 相似文献
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铝基板阳极氧化成膜温度与膜层结构 总被引:3,自引:0,他引:3
对铝基板在草酸体系下阳极氧化成膜温度进行了研究,发现膜的起始破坏温度为32.5℃,而与草酸电解液的浓度关系不大。通过XRD、SEM对膜层进行了分析,并测试了膜层的绝缘性能。结果表明:氧化膜层是以非晶态形式存在的,膜表面存在直径80nm左右的针状物,形成Al(OH)3水合物。较高溶液温度下,草酸的溶解作用加剧了膜层断面开裂、膜质疏松等缺陷,严重影响着膜层的绝缘性能,温度不超过32.5℃,能得到均匀、致密的膜层。 相似文献
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In this work, the photoelectric properties of nanostructured amorphous hydrogenated carbon films was studied; these films are a variation of diamond-like carbon films. For this study, carbon films with different compositions were deposited and their electrical and optical proprieties were analyzed. These films were deposited by reactive magnetron sputtering using a pure graphite target and methane, nitrogen, carbon tetrafluorine and argon as processing gases. The amorphous carbon films are naturally nanostructured and show amount of optical proprieties as photoemission in the visible range and photoelectric effects. To enhance these effects in this work, the selective etching of the carbon films was promoted, and a nanopores and nanoholes was obtained. These defects show characteristics of potential gaps and modify the carbon films properties. Plasma etching performs the generation of the nanopores and nanoholes in the carbon films. The characteristics of these films were observed by photoluminescence analyze, optical absorbance, electro-optic analyzes. In this study, the development of the new structure for optical analyses of the nanoporous carbon films was necessary. For this, an auto-aligned test structure based in interdigital electrodes was developed. 相似文献
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在无氧气氛下,采用射频磁控溅射法制备了PLzT系列薄膜,对原位溅射薄膜进行了快速退火及常规退火处理,深入研究了退火工艺对铁电薄膜结构与性能的影响。认为采用常规退火工艺处理无氧溅射的薄膜时,铁电薄膜具有更好的晶体结构和铁电性能。 相似文献
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Nickel hydroxide films were deposited using a facile ammonia-induced method. The deposited films were composed of stacking structures without using templates or surfactants. The microstructures of the deposited films and subsequently calcined NiO films were characterized using X-ray diffraction, scanning electron microscopy and transmission electron microscopy. The electrical properties were also investigated. The deposited films consisted of triangular stacks of single crystal hexagonal Ni(OH)2 and their microstructures were highly affected by the substrate type. A preference for orientation along the (001) plane was observed in the Ni(OH)2 films deposited onto indium tin oxide (ITO) substrates with a high texture coefficient of 4.5. These characteristics were not found in Ni(OH)2 films deposited onto glass and silicon substrates. Calcined films did not show a strong preference in orientation and were found to be n-type NiO. 相似文献