微波等离子体化学气相沉积金刚石簿膜

建立了一台微波等离子体化学气相沉积金刚石薄膜的设备。该实验装置由以下几部分组成：微波源及传输系统、反应室、供气系统、真空系统和检测等五部分组成。沉积室是由长７０ｍｍ直径４６ｍｍ的石英管组成的。分别采用ＣＨ４／Ｈ２和ＣＯ／Ｈ２混合气体进行了沉积试验；研究了沉积参数对沉积金刚石膜的影响。在直径３０ｍｍ的单晶硅片和石英片上沉积出了均匀的金刚石膜。采用ＣＨ４／Ｃ２混合气体时，沉积速率在０．５～１．０μｍ／ｈ之间，这与原有的热灯丝方法相近。采用ＣＯ／Ｈ２混合气体时，沉积速率可达到１．７μｍ／ｈ。     

化学气相沉积金刚石膜

详细讨论了金刚石膜的化学气相沉积方法、特性及生长机理。指出了今后的研究重点。     

射频辉光放电等离子体化学气相沉积类金刚石膜的性能研究

用自行设计的RF PCVD(射频辉光放电等离子体化学气相沉积 )设备沉积类金刚石膜 ,并对膜的力学、光学、化学性能进行了分析。表明用该设备制备的类金刚石膜具有显微硬度高、磨擦系数小、膜基结合力高、对红外有良好的增透性 ,并且耐磨耐蚀、化学稳定性好。     

等离子体化学气相法沉积金刚石薄膜

本文介绍和评述了化学气相沉积法制备人造金刚石薄膜及其进展，重点评述了反应机理，发展历史，沉积方法，补底材料，检测手段，论述了有利于形成立方晶系金刚石材料的沉积条件。     

等离子体化学气相法沉积金刚石薄膜

本文介绍和评述了化学气相沉积法制备人造金刚石薄膜及其进展。重点评述了反应机理、发展历史、沉积方法、补底材料、检测手段。论述了有利于形成立方晶系金刚石材料的沉积条件。     

微波等离子体化学气相沉积金刚石膜装置的研究进展

综述了各种微波等离子体化学气相沉积（MPCVD）金刚石膜装置的结构及工作原理,并对它们各自的优缺点做了比较分析;基于MPCVD金刚石膜装置的发展现状,构想设计了一种新型高效的大功率大面积快速沉积CVD金刚石膜装置,并对其可行性做了初步分析研究。     

新型微波等离子体化学气相沉积金刚石薄膜装置

微波等离子体化学气相沉积（ＭＰＣＶＤ）是制备金刚石薄膜的一种重要方法。为了获得金刚石薄膜的高速率大面积沉积，在国内首次研制成功了５ｋＷ带有石英真空窗的天线耦合水冷却不锈钢反应室式ＭＰＣＶＤ装置。初步用该装置成功在硅基片上沉积得到了金刚石薄膜。     

微波等离子体化学气相沉积技术制备金刚石薄膜的研究

介绍了微波等离子体化学气相沉积法（MPCVD）制备金刚石薄膜的研究情况，重点论述了该法的制备工艺对金刚石薄膜质量的影响及其制备金刚石薄膜的应用前景。     

低温等离子体增强化学气相沉积技术制备碳纳米管

由于等离子体在低温下具有高活性的特点,等离子体增强化学气相沉积(PECVD)技术可显著降低薄膜沉积的温度范围.通常条件下,高质量碳纳米管的生长要求800℃以上的基片温度,若能使该温度降到400℃以下,则对许多应用非常有利,如可以在玻璃基片上沉积碳纳米管场发射电极.目前,碳纳米管基纳电子器件的研制这一课题备受关注,如果能实现低温原位制备碳纳米管,则可能将纳电子器件与传统的微电子加工工艺结合并实现超大容量的超大规模集成电路.本文主要介绍近年来生长碳纳米管所采用的各种等离子体化学气相沉积技术,讨论影响碳纳米管生长特性的几个关键因素.     

Effects of oxygen on multiwall carbon nanotubes growth by PECVD

Multiwall carbon nanotubes (MWCNTs) were grown by dielectric barrier discharge (DBD)-type plasma enhanced chemical vapor deposition (PECVD) method in downstream. The temperature was 973 K and the compositions of gases were methane, hydrogen and oxygen in the total pressure of 0.05 MPa. The effect of O₂ concentration in the mixture on the configuration of carbon nanotubes (CNTs) was investigated in detail. Results from scanning electron microscope (SEM) and transmission electron microscope (TEM) showed that CNTs grown in CH₄/H₂ (38.6%/61.4%, volume) mixture have many defects and contained disordered graphitic materials. With the addition of appropriate amount of O₂ (∼0.67%), high-purity CNTs could be obtained. However, no CNT, even no carbon matrix existed under the condition of an excessive oxygen concentration (>1.0%, volume) in the mixture. In order to understand the role of O₂ during CNTs growth, optical emission spectroscopy (OES) was in-situ employed and the results predicted that the improvement of CNTs quality in O₂ addition was attributed to the effect of OH oxidation from the reaction of atomic oxygen with hydrogen in the plasma.     

316不锈钢表面沉积厚类金刚石膜层的性能研究

采用脉冲辉光放电等离子体气相沉积法在316不锈钢表面沉积膜层较厚的类金刚石膜层。利用拉曼光谱仪(Raman)、X射线光电子能谱仪(XPS)、傅里叶变换红外光谱仪(FT-IR)、光学显微镜、显微硬度计和摩擦磨损实验机分别对膜层组成和微观结构及机械性能进行了表征。研究发现,通过脉冲辉光放电等离子体气相沉积法,在316不锈钢表面制备的类金刚石膜层光滑致密;Raman分析得到的ID/IG和IT/IG比值分别为0.72和0.22;FT-IR分析可知膜层含有较多的CHx组成的sp3键;摩擦磨损试验得到膜层的摩擦系数低至0.100,XPS分析膜层sp3含量高达60.7%和光学显微镜测量膜层的厚度达到7mm。由此可知沉积类金刚石膜层后,可以显著地改善316不锈钢表面的机械性能。     

PECVD法生长的氧化锡薄膜的结构与性能研究

非化学计量的二氧化锡是一种 n 型半导体材料,具有良好的光电特性。本文用等离子增强化学气相沉积(PECVD)法生长 SnO_(2-x)薄膜,并进行了生长条件与其结构和性能的研究。结果表明:不同的淀积条件,可以获得从多晶到非晶态不同结构、化学稳定性良好、可见光透射率高、具有不同电导率的 SnO_(2-x)薄膜材料。     

Characterization of a large area scanning PECVD deposition system with small size RF electrodes

We have conducted characterization of a scanning plasma enhanced chemical vapor deposition (PECVD) system for producing controlled non-uniform deposition or etching profiles. Both self-bias and plasma potential showed that the plasma conditions were disturbed significantly when the source was very close to the chamber wall but electron temperature and ion density were not affected significantly. It was found that a very thin but long tail of parasitic deposition was present over the entire large substrate. To eliminate the parasitic deposition an aperture (plasma guarding house) was constructed and was found to eliminate the parasitic plasma deposition. Deposited silicon nitride and silicon oxide thin films using the plasma guarding house in the scanning PECVD system showed very good optical properties similar to those obtained in conventional deposition methods. No multilayer structure was observed in TEM analysis on these films.     

Characterization and tribological application of diamond-like carbon (DLC) films prepared by radio-frequency plasma-enhanced chemical vapor deposition (RF-PECVD) technique

Diamond-like carbon (DLC) films were successfully prepared on glass substrates and surfaces of selenium drums via radio frequency plasma enhanced chemical vapor deposition method. The microstructure, surface morphology, hardness, film adhesion, and tribological properties of the films were characterized and evaluated by X-ray photoelectron spectroscopy, atomic force microscopy, and micro-sclerometer and friction-wear spectrometer. The results showed that DLC films have smooth surfaces, homogeneous particle sizes, and excellent tribological properties, which can be used to improve the surface quality of the selenium drums and prolong their service life.     

Oxygen plasma etching of silver-incorporated diamond-like carbon films

Diamond-like carbon (DLC) film as a solid lubricant coating represents an important area of investigation related to space devices. The environment for such devices involves high vacuum and high concentration of atomic oxygen. The purpose of this paper is to study the behavior of silver-incorporated DLC thin films against oxygen plasma etching. Silver nanoparticles were produced through an electrochemical process and incorporated into DLC bulk during the deposition process using plasma enhanced chemical vapor deposition technique. The presence of silver does not affect significantly DLC quality and reduces by more than 50% the oxygen plasma etching. Our results demonstrated that silver nanoparticles protect DLC films against etching process, which may increase their lifetime in low earth orbit environment.     

The role of hydroxyl and atomic oxygen in multiwall carbon nanotube growth

Multiwall carbon nanotubes (CNTs) were grown by the plasma-enhanced chemical vapor deposition (PECVD) method in downstream on the p-Si (100) substrate. Besides precursors, methane as the carbon source and hydrogen as the ablation, oxygen or H₂O was alternatively inlet into the reactive chamber at the pressure of 0.05 MPa. Given characterizations of the tube structure and tube mass weight, the role of radical atomic O, hydroxyl and perhydroxyl in multiwall CNT growth was explored. In addition to a small amount of O₂ (∼0.67%) or H₂O (∼0.1%), it was found that a high quantity of pure nanotubes can be grown in the downstream. However, no nanotube could be formed or even the carbon matrix generated when the concentration of O₂ or H₂O exceeded a proper value in the mixture. The mechanism of multiwall CNT growth controlled by active radicals was explored in this paper.     

Effect of annealing on diamond-like carbon characteristics by electron spin resonance spectral analysis

We have examined the effect of annealing on physicochemical properties of the diamond-like carbon (DLC) films to produce higher quality films by the electron spin resonance spectral analyses of the immobilized dangling-bond sites (DBS), since amount of DBS reflects the characteristics of DLC films. On heat treatment of DLC deposited from ethylene monomer under anaerobic condition, the DBS decay was clearly shown, as the temperature raised. The decay described by second-order kinetics indicated that the recombination reaction of DBS progressed on heat treatment, suggesting that annealing treatment would accelerate the carbon-carbon covalent bonding network to produce harder films. In fact, the resulted DLC film derived from ethylene monomer showed non-existence of any type of oxygen atom based on X-ray photoelectron spectrum measurement, and water contact angle measurement showed higher hydrophobic surface of the DLC films.     

PECVD法制备类金刚石薄膜的结构和摩擦学性能研究

采用射频一直流等离子体增强化学气相沉积技术在单晶硅衬底上沉积了类金刚石薄膜。用激光拉曼光谱仪和原子力显微镜对薄膜的结构和表面形貌进行了表征，并用纳米压痕仪测定了薄膜的硬度。用UMT微摩擦磨损试验机考察了薄膜在不同的滑行速度下薄膜的摩擦学性能。结果表明：所沉积的薄膜具有典型类金刚石薄膜的结构特征，薄膜表面光滑致密，硬度较高；薄膜与氧化铝陶瓷球对磨显示出良好的摩擦学性能，随着滑行速度的增加，薄膜的摩擦系数单调降低，但磨损寿命先增加后降低。