偏压对AlTiN涂层的物性及车削GH4169性能的影响

目的 研究不同基体偏压对AlTiN涂层性能的影响,以得到车削高温合金性能最佳的AlTiN涂层。方法 采用多弧离子镀技术,在不同偏压下在WC-Co硬质合金表面沉积AlTiN涂层。通过扫描电子显微镜(SEM)及其所附能谱仪(EDS)观察涂层的表面和截面形貌以及分析涂层的成分,X射线衍射仪分析涂层的物相结构及内应力,用CSM纳米硬度计测试涂层的纳米硬度H、弹性模量E、抗塑形变形因子H³/E*²、显微硬度耗散系数MDP等性能指标。对比不同偏压制备的AlTiN涂层车削高温合金GH4169的切削性能表现,并分析其切削失效形式,同时探究涂层物性对月牙洼磨损失效的影响。结果 不同偏压制备的AlTiN涂层结构致密,物相均为NaCl型面心立方结构,–40 V偏压制备的涂层以(200)方向择优,–120 V制备的涂层以(111)方向择优。不同偏压制备的涂层均为压应力,其内应力随着偏压的增大而增大。与–80 V及–120 V制备的涂层相比,–40 V偏压制备的涂层表现出更低的硬度与更优的韧性。在车削高温合金GH4169时,–80 V偏压制备的涂层抗月牙洼磨损能力最好,–40 V与–120 V的切削性能相当。结论 对AlTiN涂层而言,–80 V偏压制备的涂层硬度与应力之间达到平衡,硬度与应力间的平衡有助于提升涂层的抗月牙洼磨损能力。在车削GH4169时,–80 V偏压制备的AlTiN切削性能表现最优。     

等离子体增强磁控溅射制备TiAlVSiCN涂层的抗冲蚀性能

目的 提高不锈钢基体的抗固体颗粒冲蚀性能.方法 在不锈钢基体表面,通过等离子体增强磁控溅射系统(PEMS),采用不同偏压工艺制备TiAlVSiCN纳米复合涂层.通过SEM、HRTEM观察涂层的微观形貌与组织,利用XRD、SAD分析涂层的物相组成与晶体结构,并通过划痕仪、纳米硬度计以及冲蚀试验机探究不同工艺涂层的结合强度、纳米硬度以及抗冲蚀性能差异.结果 采用PEMS制备出一系列不同偏压条件下的TiAlVSiCN涂层,涂层组织致密,呈柱状,主要包括纳米晶Ti(Al,V)(C,N)相和非晶相.偏压显著影响涂层的晶粒尺寸和非晶相分布,高偏压下的涂层主要由20～50 nm的Ti(Al,V)(C,N)纳米晶及其周围弥散分布的非晶相组成,而低偏压下的涂层主要由100 nm的Ti(Al,V)(C,N)纳米晶和连续分布的非晶相组成.高偏压下制备的涂层厚度超过20μm,纳米硬度可达(34.6±14.1)GPa,具有优良的结合强度(>65 N)和抗冲蚀性能,其抗冲蚀性能相比不锈钢基体提高近8倍.结论 通过与偏压参数的匹配控制,PEMS可有效调控纳米复合涂层的组织结构,实现硬度与弹性模量的良好匹配,制备出具有优良抗冲蚀性能、厚度达到20μm以上的TiAlVSiCN纳米晶-非晶复合涂层.     

65Mn钢基体CrTiAlN微纳米复合膜的制备与抗高温磨损性能研究

采用多弧离子镀在活塞环65Mn钢基体表面制备CrTiAlN微纳米复合膜,研究了CrNx过渡缓冲层与工作负偏压对CrTiAlN微纳米复合膜性能的影响规律,采用X射线衍射(XRD)、扫描电子显微镜(SEM)、划痕仪、纳米硬度仪和发动机台架试验装置,系统分析了薄膜相结构、表面形貌、纳米硬度和抗高温摩擦磨损性能。结果表明:当N2含量为45%时,CrNx薄膜中主要以CrN(220)相为主,此时复合膜结合强度相对较高;复合膜厚度随负偏压增大而减小,纳米硬度随负偏压增大而增大,当偏压为–200V时,CrTiAlN微纳米复合膜的晶粒较为细小。采用优化工艺沉积的CrTiAlN复合膜具有优异的抗高温粘着磨损性能,优于CrN膜和电镀Cr,最后对3种活塞环涂层的抗高温磨损机理进行了分析讨论。     

电弧离子镀偏压对TiAlSiN涂层结构及性能的影响

目的 探究脉冲偏压对TiAlSiN涂层结构及力学性能、耐磨性能、抗氧化性能的影响规律及机制。方法 采用阴极电弧离子镀膜技术,调控偏压参数并在M2高速钢上沉积TiAlSiN涂层,利用SEM、XRD、3D轮廓仪、金相显微镜、划痕仪、摩擦磨损试验仪等仪器及高温氧化试验,对涂层结构及性能进行分析表征。结果 偏压为50 V时,涂层主要为AlN相;偏压高于75 V时,涂层以固溶的(Ti,Al)N相为主,TiAlSiN涂层存在较强的(200)面择优取向。偏压由50 V增大至150 V时,涂层的致密性增加,表面粗糙度先降低后上升,涂层结合力先增大后降低。TiAlSiN涂层的磨损方式主要是磨粒磨损,受物相结构、涂层致密性的影响,偏压为100~150 V时,涂层的耐磨性能优异。涂层1000 ℃氧化4 h后,表面氧化程度不同,主要受物相结构、致密性、表面孔隙的多重影响,hcp-AlN相比(Ti,Al)N相更易氧化;偏压增大使得涂层沉积更为致密,氧化层深度变浅;涂层孔隙增加,表面形成的Al2O3团簇增多。结论 偏压100 V下TiAlSiN涂层的综合性能最优,涂层结合力为46.7 V,硬度为3276HV0.025,表面粗糙度最低,耐磨性能较好且高温下抗氧化性能最强。     

脉冲峰值电流对HIPIMS/DCMS共沉积制备AlCrTiN涂层性能的影响

利用HIPIMS与DCMS共沉积技术制备AlCrTiN复合硬质涂层,通过调控Al Cr靶脉冲峰值电流来制备不同峰值电流下的AlCrTiN涂层。采用XRD、SEM等分析手段表征不同峰值电流下AlCrTiN涂层的组织结构及微观形貌;通过纳米压痕、真空退火、高温摩擦磨损试验分析涂层的力学性能、热稳定性能及摩擦学性能。结果表明:AlCrTiN涂层为典型的面心立方结构,随峰值电流的增加,(111)及(200)晶面呈现竞争生长的状态;随真空退火温度上升,各涂层硬度值出现明显下降。1 000℃退火后,各涂层硬度维持在17 GPa附近;随摩擦环境温度的上升,各涂层摩擦因数整体呈下降趋势;280 A所制备涂层因高温抗氧化性能及磨屑排出能力的不足导致其高温磨损率迅速增加,800℃下其磨损的主要形式为氧化磨损和粘着磨损。     

基体偏压对电弧离子镀AlCrSiON涂层结构和热稳定性的影响

为研究基体偏压对AlCrSiON纳米复合涂层结构、力学性能和热稳定性的影响规律及机制,采用电弧离子镀技术在硬质合金基体上沉积AlCrSiON涂层。利用扫描电子显微镜(SEM)、X射线衍射仪(XRD)、透射电子显微镜(TEM)、纳米压痕仪(划痕仪)研究涂层组织结构和力学性能;通过真空退火试验研究涂层的高温稳定性。结果表明:AlCrSiON涂层为致密柱状晶结构,并主要由c-(Al,Cr)N和c-(Al,Cr)(O,N)两相组成,呈现出纳米复合结构。随着偏压的升高,涂层表面的颗粒数目和尺寸减少,组织结构更加致密;硬度和弹性模量均呈现出先增加后减小的趋势,当偏压为–80 V时分别达到最大值30.1 GPa和367.9 GPa。涂层具有良好的高温稳定性,不同偏压下沉积的AlCrSiON涂层经800~950℃热处理后均能够保持良好的结构稳定性及力学性能,但经1 100℃热处理后涂层发生相分解并引发组织结构变化,导致涂层硬度减小。     

新型耐磨耐高温氧化NiCrAlSiC复合涂层的制备及性能研究

采用"电泳+电沉积"两步法在金属基体上先预沉积CrAlSiC电泳层,再电沉积Ni,制备了NiCrAlSiC复合涂层,并制备不含SiC的NiCrAl涂层为对比样品。采用XRD、SEM、EPMA和TEM对复合涂层进行形貌、结构和成分表征,并研究其高温氧化性能和摩擦磨损性能。结果表明:复合涂层致密并与基体结合良好,涂层内颗粒分散均匀。与不含SiC的NiCrAl复合涂层相比,NiCrAlSiC复合涂层的氧化膜由NiO、NiAl_2O_4和Al_2O_3三层结构转变为NiAl_2O_4和Al_2O_3两层结构,且氧化膜更薄;同时,涂层硬度提高26%,磨损速率下降52%,磨损机制由磨粒磨损转变为黏着磨损。SiC颗粒的加入同时提高了NiCrAl涂层的抗高温氧化性能和耐磨性能。     

偏压对MPP制备AlTiSiN纳米复合涂层结构及性能的影响

目的实现对AlTiSiN纳米复合涂层微观组织结构的调控及力学性能优化。方法利用可调控脉冲磁控溅射技术,通过调控基体偏压(-50～-250 V)制备了不同偏压条件下的AlTiSiN纳米复合涂层。采用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、能量色散谱仪(EDS)、原子力显微镜(AFM)、薄膜综合性能测试仪及球盘摩擦试验仪,测试了涂层的微观组织结构、组成成分、表面形貌、力学性能及摩擦学性能。结果偏压对涂层元素组成影响不大。微观组织结构方面,不同偏压条件下制备AlTiSiN纳米复合涂层的晶面衍射峰宽化现象明显,呈现纳米晶组织结构。-200V条件下制备的涂层的晶面衍射峰呈"馒头峰"形态,表明涂层结晶性能出现明显下降,呈类非晶组织结构;偏压升至-250V时,高能离子对涂层生长表面的持续轰击作用,使得涂层生长表面升温明显,导致结晶性能出现明显改善。涂层表面光滑致密,表面粗糙度最低可达1.753nm。力学性能方面,随基体偏压的升高,涂层硬度在取得最大值后逐渐下降,最高硬度可达25.9 GPa,H/E*系数可达0.13。摩擦学性能方面,偏压为-200 V时,涂层磨损率取得最小值4.7×10~(-15) m~3/(N×m)。结论改变基体偏压,成功实现了涂层微观组织结构的调控生长,进而达到了优化涂层组织结构、力学性能及摩擦学性能的目的。     

活塞环表面CrAlN涂层的微观组织与抗高温氧化性能

采用多弧离子镀在65Mn钢基体上制备了不同Al含量的CrAlN复合涂层,采用X射线衍射(XRD)、扫描电子显微镜(SEM)、能谱仪(EDS)、纳米硬度仪和高温氧化炉,系统分析了CrAlN复合涂层的成分、相结构、表面形貌、纳米硬度和抗高温氧化性能。研究结果表明:添加Al后,CrN涂层的择优取向由(111)转变为(200),随着Al含量的增大,衍射峰向右偏移,晶格常数逐渐减小,涂层的表面粗糙度增大,纳米硬度值增加。与CrN涂层相比,CrAlN复合涂层具有较好的抗高温氧化性能,且随Al含量的增加,抗高温氧化性能增强,其原因是涂层表面形成了铬铝氧化物,减小了高温条件下氧向涂层内部的扩散能力。     

沉积温度对AlCrTiN涂层组织结构与性能的影响∗

AlCrTiN 涂层具有优异的综合性能,然而沉积温度对其组织结构与性能的影响还需进一步研究。 采用电弧离子镀和脉冲直流磁控溅射复合沉积技术,改变沉积温度(300 ℃和 400 ℃ )制备两种不同的 AlCrTiN 涂层。 结果表明:两种 AlCrTiN 涂层主要相均为 fcc-(Al,Ti,Cr)N 相,沿(111)晶面择优生长。 沉积温度为 400 ℃ 时,涂层具有更高的硬度和弹性模量,更低的残余应力、摩擦因数和磨损率,表现出更好的力学性能和抗摩擦磨损性能。 两种涂层经过 700 ℃保温 1 h 后,由于涂层内原子扩散和缺陷愈合,硬度和结合力进一步提高。 切削性能测试表明:300 ℃ 和 400 ℃ 温度下制备的涂层铣刀寿命分别为无涂层铣刀的 3. 2 倍和 3. 5 倍。 无涂层铣刀的失效形式以磨粒磨损为主,涂层铣刀的失效形式为磨粒磨损、黏着磨损和氧化磨损。 研究成果对高性能 AlCrTiN 四元涂层的制备、理论研究与工程化应用具有指导意义。     

Oxidation of double-glow plasma chromising coating on TC4 titanium alloys

Double-glow plasma surface chromising was performed on TC4 (Ti–6Al–4V) alloys, and the isothermal oxidation behaviour of TC4 was investigated at 650, 750, and 850 °C. The surface treatment caused the formation of a Ti–Cr mutual diffusion layer beneath the alloy surface. The chromising coating consisted of Cr, Cr_1.97Ti_1.07, and CrTi₄. During oxidation, Cr, Ti, and Al diffused outward to form multi-layer oxide films, which prevented the diffusion of oxygen.     

Effect of bias voltage on microstructure of DC magnetron sputtered Al coatings on uranium

The effect of different bias voltages on microstructure of Al coatings on uranium was investigated by using scanning electron microscope (SEM), X-ray diffraction (XRD) and X-ray stress analyzer, respectively. The results indicate that the microstructure is influenced strongly by bias voltage. At low bias voltages, especially at -100 V, the structure of Al coatings is more densely packed than that at high bias voltages of - 300 V and - 400 V,where the structure looks like open dentritic. On the whole, the peak (111) orientation is predominant with the increase of bias voltage, but at -400 V, the diffractive intensity of main peaks (111) and (200) is close to the standard reference. The residual stress on Al coatings surface is small, which has a change from tensile to compressive stress with the increase of bias voltage.     

Decomposition kinetics in Ti1-xAlxN coatings as studied by in-situ X-ray diffraction during annealing

The influence of the microstructure of the as-deposited cathodic arc evaporated Ti_1-xAl_xN coatings and, in particular, the influence of the intrinsic lattice strains on their thermal stability were investigated by in-situ synchrotron high temperature glancing angle X-ray diffraction (HT-GAXRD) experiments up to 850 °C. The microstructure of the as-deposited coatings was adjusted by the bias voltage (U_B = −40 V, U_B = −80 V and U_B = −120 V) and by the [Al]/([Ti] + [Al]) ratio (0.4, 0.5 and 0.6) of the used Ti–Al targets. The microstructure evolution during annealing was described in terms of the phase composition of the coatings, the aluminium content, aluminium distribution and residual lattice strains in fcc-(Ti,Al)N. Independent of the deposition parameters ([Al]/([Ti] + [Al]) ratio and bias voltage), all coatings contained a mixture of fcc-(Ti,Al)N, fcc-AlN and w-AlN after annealing at 850 °C. The [Al]/([Ti] + [Al]) ratio was found to control the amount of fcc-(Ti,Al)N, whereas the bias voltage was mainly responsible for the relative amount of fcc-AlN and w-AlN. Finally, the interplay between lattice strains and the kinetics of the spinodal decomposition of fcc-(Ti,Al)N was illustrated.     

Si和Y掺杂对(Ti,Al)N涂层结构和性能的影响

分别在未施加偏压和施加-100 V偏压条件下,利用磁控溅射技术在压气机叶片用1Cr11Ni2W2MoV热强不锈钢基体上沉积了Ti_0.3Al_0.7N和Ti_0.39Al_0.55Si_0.05Y_0.01N硬质涂层.实验结果表明,施加偏压及Si和Y掺杂明显改变了涂层的相结构,提高了涂层致密度,施加-100 V偏压且添加Si和Y的涂层为非晶结构,表面更加均匀致密.950℃氧化实验表明:Ti_0.39Al_0.55Si_0.05Y_0.01N涂层表面形成极薄且致密的Al₂O₃保护性氧化膜,大大降低了氧化速率.施加-100 V偏压的（Ti,Al）N和（Ti,Al,Si,Y）N沉积态涂层与未施加偏压的相应涂层相比,硬度均降低,尤其是（Ti,Al,Si,Y）N涂层变化显著.经950℃热处理,施加偏压的（Ti,Al,Si,Y）N涂层硬度略有降低,这是由于形成了硬度较低的B4相,而未施加偏压的（Ti,Al,Si,Y）N涂层硬度显著提高,这归因于B1相固溶体的分解.划痕测试结果表明,在实验载荷（50N）下,所有涂层均未出现连续性的剥落.     

Effect of Pulse Width and Frequency of Bias DC Voltage on the Microstructure of Pure Cr Coatings by Magnetron Sputter Ion Plating

Pure Cr coatings were deposited onto the pieces of silicon wafer at different pulse width and frequency of bias voltage by magnetron sputter ion plating.The microstructure and preferential orientation of pure Cr coatings were analyzed by SEM and XRD respectively.Results show that the diffusion ability of atoms on the coating surface was improved due to the substrate temperature rise effect caused by the ion bombardment with the pulse width increased.However,the effect of frequency of bias DC voltage on the microstructure of pure Cr coatings was particularly significant.The bombardment ions action on the coating surface were more uniformly and more dispersed compared with the nucleation rate of Cr atoms and the density of pure Cr coatings both improved with the frequency increased are the main reasons that the microstructure of pure Cr coatings changed from dense,granular columnar grain outcrops to uniformity,small nano-crystalline particles.     

脉冲偏压对贫铀表面磁控溅射CrN_x薄膜结构与性能的影响

为改善金属铀基体的抗腐蚀性能,采用非平衡磁控溅射离子镀技术在不同偏压下于金属铀表面制备CrNx薄膜。采用SEM和AFM研究了薄膜形貌和表面粗糙度,采用X射线光电子能谱研究了薄膜表面的元素分布及化学价态。试验结果表明,采用磁控溅射在较低脉冲偏压下沉积的CrNx薄膜晶粒较细小,偏压越高,表面粗糙度越大。生成的薄膜为Cr+CrN+Cr2N混合结构,并含有少量的Cr2O3,随着偏压的升高,金属态Cr的含量减少,而铬的氮化物的含量增加,所制备薄膜的自然腐蚀电位升高,腐蚀电流密度减小。偏压为-800 V时,所制备的薄膜具有较好的抗腐蚀性能。     

Fabrication of Cr coating on AZ31 magnesium alloy by magnetron sputtering

Chromium-plating is considered an effective method to improve surface properties of metal materials.Magnetron sputtering was applied to prepare Cr coating on AZ31 magnesium alloy and the influence of bias voltage on properties of Cr coating was investigated.The obtained coatings present an(110) preferred texture and have a developed columnar structure.With increasing bias voltage,the surface structure of Cr coating becomes denser.All of the Cr-coated AZ31 have much higher surface microhardness than bare ...     

Effect of the aluminium content and the bias voltage on the microstructure formation in Ti1 − xAlxN protective coatings grown by cathodic arc evaporation

The effect of aluminium contents and bias voltage on the microstructure of cathodic arc evaporated Ti_1 − xAl_xN coatings was investigated with the aid of X-ray diffraction experiments and transmission electron microscopy. The coatings were deposited from mixed Ti-Al targets with different Ti:Al ratios (60:40, 50:50, 40:60 and 33:67) at bias voltages ranging between − 20 V and − 120 V. The microstructure of the coatings was described in terms of the phase composition, crystallite size and residual stress and related to the indentation hardness. The microstructure features were found to be related to the uniformity of the local distribution of Ti and Al in (Ti,Al)N, which was controlled, for a certain overall chemical composition of the coatings, by the bias voltage. The consequences of large local fluctuations of the Ti and Al concentrations in Ti_1 − xAl_xN that occurred at higher bias voltages were the phase segregation, which was indicated through the formation of the fcc-(Ti,Al)N/fcc-AlN nanocomposites and the increase of the compressive residual stress in the face-centred cubic (Ti,Al)N. Concurrently, the increasing bias voltage contributed significantly to the reduction of the crystallite size. Higher residual stress and smaller crystallite size increased the hardness of the coatings. The overall chemical composition of the coatings influenced mainly their phase composition. The high concentration of Al in (Ti,Al)N led to the formation of wurtzitic AlN in the coatings.     

Oxidation Performance and Interdiffusion Behaviour of two MCrAlY Coatings on a Fourth-Generation Single-Crystal Superalloy

The oxidation behaviour of a fourth-generation single-crystal superalloy without coating and with two types of MCrAlY coatings at 1140 °C was studied. The results showed that both coatings greatly improved the oxidation resistance of the superalloy, and the addition of Hf further improved the oxidation resistance by pinning the oxide layer into the coating. Before and after oxidation, obvious Cr and Al interdiffusion was detected. Inward Cr diffusion induces the precipitation of a topologically close-packed phase, while the diffusion of Al affects the structure of the γ/γ' phase, the solubility of refractory elements, and the formation of an interdiffusion zone.