非制冷红外探测器用BST薄膜的制备与性能研究

利用传统陶瓷工艺制备出BST(65/35)倒筒靶,采用射频溅射法沉积薄膜.开展了对Pt/Ti/SiO2/Si基底热处理工艺与BST同质缓冲层研究,总结出了可以确保基底界面性能良好、BST薄膜结构致密的工艺方法.介电性能测试表明BST薄膜的介电常数约为60～70,介电损耗为1.5%～2.5%,居里温度为284K,介电温度系数(TCD)为0.5%.漏电流测试表明在1MV/cm电场下,漏电流密度为1.9×10-6A/cm2.     

利用多阶谐振频率对多层结构背覆薄层厚度的反演

1引言利用超声在固体表面镀层、界面胶层的反射和透射现象研究这些薄层的参量是无损评价的热点问题之一,因此产生了许多的理论模型和实验方法,比     

铅掺杂对BST铁电薄膜性能的影响

为了改善BST铁电薄膜的结晶性能,降低薄膜材料的铁电弛豫和弥散相变特性,采用改进的溶胶-凝胶(sol-gel)方法在Pt/Ti/SiO2/Si基片上制备出了不同铅掺杂的BST薄膜(PBST).研究了PBST薄膜的微观结构及其介电、铁电性能.XRD、AFM分析表明,铅对(101、110)峰的生长促进作用最大,掺入5mol%Pb以上的PBST薄膜的结晶状况得到了明显改善;铅的引入使晶粒增大,降低了薄膜的频率色散现象,相变温区有不同程度紧缩;薄膜的介电、铁电性增强.PBST(0.80/0.20/0.05)薄膜具有适当的相变温区、合适的Tmax值、较小频率色散及比BST薄膜更为明显的介电峰与铁电性等特征,可以作为UFPA系统的探测材料.     

PZT thin film preparation by pulsed DC magnetron sputtering

Pulsed DC magnetron sputtering was used in this study to prepare lead zirconate titanate (Pb(Zr_xTi_1−x)O₃, PZT) thin films. A single metallic target was used for the deposition onto a Pt/Ti/SiO₂/Si substrate and parameters such as: pulse frequency, duty cycle, O₂/Ar flow ratio controlled so as to analyze the effect of the parameters on thin film deposition rate, crystalline structure and morphology. After the deposition, the thin film was annealed in a rapid thermal annealing (RTA) furnace. The experimental results showed that, when the pulse frequency was in the range of 10 kHz-100 kHz, along with the lowering of frequency and the oxygen argon flow rate ratio, the deposition rate gradually increased and the formation of PZT thin film perovskite phase was enhanced; however, if the oxygen argon flow rate ratio was too high, it caused the PZT thin film to generate a pyrochlore phase. However, when the duty cycle was in the range of 95%-75%, the highest deposition rate and better perovskite phase could be obtained in the range of 75%-80%.     

Threshold voltage shift by controlling Ga in solution processed Si-In-Zn-O thin film transistors

The threshold voltage change of solution processed gallium-silicon-indium-zinc oxide (GSIZO) thin film transistors (TFTs) annealed at 200 °C has been investigated depending on gallium ratio. GSIZO thin films were formed with various gallium ratios from 0.01 to 1 M ratio. The 30 nm-thick GSIZO film exhibited optimized electrical characteristics, such as field effect mobility (μ_FE) of 2.2 × 10^− 2 cm²/V·s, subthreshold swing (S.S) of 0.11 V/dec, and on/off current ratio (I_on/off) of above 10⁵. The variation of gallium metal cation has an effect on the threshold voltage (V_th) and the field effect mobility (μ_FE). The V_th was shifted toward positive direction from − 5.2 to − 0.4 V as increasing gallium ratio, and μ_FE was decreased from 2.2 × 10^− 2 to 5 × 10^− 3 cm²/V s. These results indicated that gallium was acted as carrier suppressor by degenerating oxygen vacancy. The electrical property of GSIZO TFTs has been analyzed as a function of the gallium ratio in SIZO system, and it clearly showed that variation of gallium contents could change on the performance of TFTs.     

Reactive DC sputter-deposited tantalum oxide thin film for all-solid-state switchable mirror

We have developed an all-solid-state switchable mirror of Mg₄Ni/Pd/Ta₂O₅/WO₃/ITO on glass. Each material of Mg₄Ni, Pd, and Ta₂O₅ in the device acts as an optical switching, a proton injector and a solid electrolyte, respectively. The initial state of the device is a reflective state as a mirror and the state changes to a transparent one by applying voltage. In this work, solid electrolyte of Ta₂O₅ thin film was deposited on the WO₃/ITO/glass substrate by reactive DC magnetron sputtering with Ar/O₂ mixture gases. The effect of Ar/O₂ ratio on the electrochemical property of Ta₂O₅ thin film and the optical switching property of the device were investigated. The film deposited at Ar/O₂ of 4.7 had better electrochemical property than that of other films. The transmittance at a wavelength of 670 nm of the device using Ta₂O₅ thin film deposited at Ar/O₂ of 4.7 was reached from the reflective state of 0.1% to the transparent state of 44% less than 15 s by applying voltage of 5 V. The device showed a stable durability of up to 1000 switching cycles.     

直流磁控溅射制备铝薄膜的工艺研究

采用直流磁控溅射方法，以高纯Al为靶材，高纯Ar为溅射气体，在玻璃衬底上成功地制备了铝薄膜，并对铝膜的沉积速率、结构和表面形貌进行了研究。结果表明：A1膜的沉积速率随着溅射功率的增大先几乎呈线性增大而后缓慢增大；随着溅射气压的增加，沉积速率先增大，在一定气压时达到峰值后继续随气压的增大而减小。X射线衍射图谱表明Al膜结构为多晶态；用扫描电子显微镜对薄膜进行表面形貌的观察，溅射功率为2600W，溅射气压为0．4Pa时制备的Al膜较均匀致密。     

Characteristics of tin oxide-based thin film transistors prepared by DC magnetron sputtering

Here we demonstrate the fabrication of SnO(x) thin-film transistors (TFTs), where SnO(x) thin films are deposited as an active channel layer by DC magnetron sputtering. We analyzed the effects of the oxygen partial pressure ratio and post-deposition heat treatment (PDHT) on the characteristics of the SnO(x) thin films. We found improved performance of the TFTs obtained by using interface modification with the optimized deposition condition of SnO(x) thin films. These results are helpful for fabricating oxide-TFTs, including simple binary oxide semiconductors, as an active channel layer.     

Fabrication of LiCoO2 thin film cathodes by DC magnetron sputtering method

LiCoO₂ thin films were fabricated on Al substrate by direct current magnetron sputtering method. The effects of Ar/O₂ gas rates and annealing temperatures were investigated. Crystal structures and surface morphologies of the deposited films were investigated by X-ray diffraction, Raman scattering spectroscopy and field emission scanning electron microscopy. The as-deposited LiCoO₂ thin films exhibited amorphous structure. The crystallization starts at the annealing temperature over 400 °C. However, the annealed films have the partially disordered structure without completely ordered crystalline structure even at 600 °C annealing. The electrochemical properties of the LiCoO₂ films were investigated by the charge–discharge and cycle measurements. The 500 °C annealing film has the highest capacity retention rate of 78.2% at 100th cycles.     

Determination of mechanical properties of electroplated Ni thin film using the resonance method

This paper addresses a relatively simple method of measuring the mechanical properties such as Young's modulus and residual stress of electroplated Ni thin film using the resonance method of Atomic Force Microscope. Thin layer of nickel to be measured is electroplated onto the tip side of AFM silicon cantilever and plating thicknesses were measured at the end of each plating step. The measured Young's modulus of nickel at the end of each plating step ranged from 148.04 GPa to 159.90 GPa with the maximum standard deviation of 3.47. The end deflection of electroplated AFM cantilever is also measured as a function of the plated Ni thickness, which is converted into the film stress by appropriate mechanics.     

BST薄膜漏电流温度特性研究

采用射频溅射制备Ba0.8Sr0.2TiO3(BST)薄膜,研究了测试温度(295～375K)对BST薄膜J-V(电流密度-电压)特性的影响.实验发现:J∝Vm在低场下(V＜1.8V)m≈1,高场下(V＞1.8V)m≈8.随着测试温度升高,在低场下电流密度增大,指数m值保持不变;而在高场下电流密度减小,指数m值减小.通过进一步分析发现:电流密度和温度的关系在低场下满足lnJ∝-1T,在高场下满足logJ∝1t.     

Electron spin resonance in thin film silicon after low temperature electron irradiation

Paramagnetic defects in amorphous and microcrystalline silicon (a-Si:H and μc-Si:H) with various structure compositions and doping levels were investigated by electron spin resonance (ESR). Samples were prepared by PECVD. The defect density was varied with 2 MeV electron bombardment at 100 K and stepwise annealing in the range of 80 K-433 K. In intrinsic material the spin density of the dominant ESR signal, presumably originating from dangling bonds (db), increases by up to 3 orders of magnitude after irradiation. In doped μc-Si:H material the pronounced conduction electron (CE) resonance disappears after irradiation and is replaced by the db resonance like in the irradiated intrinsic material. Generally the initial spin density and the line shape can be restored upon annealing at 433 K. Additional features at g-values of g ≈ 2.010 and g ≈ 2.000 in the ESR spectra are observed after irradiation together with the strongly enhanced Si db line at about g = 2.004-2.005. These features decrease rapidly on the first annealing steps and cannot be observed after the final annealing stage.     

反渗透和纳滤膜的研制与应用

本文介绍了基于联苯多元酰氯单体的聚酰胺反渗透和纳滤复合膜材料体系。通过系统研究聚合物的官能团含量、取代基位置等因素对反渗透复合膜性能的影响,揭示了有价值的实验规律： a.通过调节酰氯单体的官能度,可以实现对反渗透复合膜的性质,包括表面形貌、表面化学组成、表面荷电性质的调控,从而实现对复合膜分离性能及抗污染性能的调控;b.可以利用联苯多元酰氯单体制备得到纳滤复合膜,所得纳滤膜的孔径和荷电性质可以通过调节制膜工艺实现调控。这些结果,为进一步优化制膜工艺,提供可供产业化生产的新型反渗透和纳滤复合膜制备技术奠定了基础。     

界面聚合正渗透膜结构参数的调控

<正>渗透过程是以渗透压差为驱动力的膜过程.其中膜的结构参数是决定膜的传质阻力和水通量的关键因素.本文系统介绍了本课题组在调控界面聚合正渗透膜材料结构参数方面的研究进展.利用共混亲水高分子材料调节基膜的亲水性,利用双层刮膜技术调节基膜的孔结构.结果表明利用亲水基膜和具有贯通孔结构的基膜获得FO膜具有更低的膜结构参数,其正渗透性能也更高.     

直流溅射工艺参数对Mo薄膜结构及电性能的影响

采用直流磁控溅射法在SLG衬底上沉积Mo薄膜,对不同溅射功率和溅射工作气压下沉积的薄膜进行X射线衍射、SEM(扫描电子显微镜)、电阻率测试,讨论了工艺参数对沉积Mo薄膜相结构、表面微观形貌、薄膜沉积速率和电学性能的影响。结果表明,随着溅射功率的增加,薄膜的结晶性能变好,沉积速率提高,在沉积功率范围内薄膜均匀致密,表面无空隙,电阻率较低;随着溅射工作气压增加,薄膜结晶性能变差,沉积速率先增加后降低,在沉积工作气压范围内,薄膜致密;随气压降低,电阻率急剧减小。因此,较高的溅射功率和较低的工作气压沉积的Mo薄膜更适合作CIGS薄膜太阳电池的BC层(背接触层)。     

Residual stresses and Raman shift relation in anatase TiO2 thin film

Anatase TiO₂ film (100-1000 nm thick) grown on glass, sapphire (0001), and Si (100) substrates by pulsed dc-magnetron reactive sputtering were evaluated for stress and strain analysis using Raman spectroscopy and curvature measurement techniques. The X-ray analysis revealed that films prepared for this study were purely anatase, and the measurements indicate that the film exhibit that (101) is the preferred growth orientation of the crystallites, especially for the film thicker than 100 nm. Curvature measurements and Raman spectroscopy, with 514.5 nm excitation wavelength, phonon line shift were used for stress analysis. A comparison between Raman lineshapes and peak shifts yields information on the strain distribution as a function of film thickness. The measurements of residual stresses for crystalline anatase TiO₂ thin film showed that all thin film were under compressive stress. A correlation between Raman shifts and the measured stress from the curvature measurements was established. The behavior of the anatase film on three different substrates shows that the strain in film on glass has a higher value compared to the strain on sapphire and on silicon substrates. The dominant 144 cm^− 1E_g mode in anatase TiO₂ clearly shifts to a higher value by 0.45-5.7 cm^− 1 depending on the type of substrate and film thickness. The measurement of the full width at half maximum values of 0.59-0.80 (2θ°) for the anatase (101) peaks revealed that these values are greater than anatase powder 0.119 (2θ°) and this exhibits strong crystal anisotropy with thermal expansion.     

偏场下薄膜体声波谐振器频率偏移的摄动分析

为准确预测测量力、热场的薄膜体声波谐振器(FBAR)传感器的灵敏度,采用叠加于有限偏场之上的小增量场理论描述,提出一种摄动与有限元联合求解方法。该方法利用COMSOL有限元软件计算FBAR传感器受外界载荷下其压电层AlN的平均偏置应力,进一步在COMSOL中计算FBAR的谐振频率与相应的振型,将有限元的计算数据代入摄动积分公式中,得到FBAR传感器的频率灵敏度。并以一个圆膜片FBAR为案例,介绍该方法用于计算圆膜片FBAR频率-集中力灵敏度的详细过程。采用摄动与有限元联合求解方法得到的频率灵敏度为41.3 MHz/N,与文献报道的实验结果 50 MHz/N接近,验证了方法的可行性。     

Absorbing TiOx thin film enabling laser welding of polyurethane membranes and polyamide fibers

Abstract

We report on the optical properties of thin titanium suboxide (TiO_x) films for applications in laser transmission welding of polymers. Non-absorbing fibers were coated with TiO_x coatings by reactive magnetron sputtering. Plasma process parameters influencing the chemical composition and morphology of the deposited thin films were investigated in order to optimize their absorption properties. Optical absorption spectroscopy showed that the oxygen content of the TiO_x coatings is the main parameter influencing the optical absorbance. Overtreatment (high power plasma input) of the fiber surface leads to high surface roughness and loss of mechanical stability of the fiber. The study shows that thin substoichiometric TiO_x films enable the welding of very thin polyurethane membranes and polyamide fibers with improved adhesion properties.     

Absorbing TiOx thin film enabling laser welding of polyurethane membranes and polyamide fibers

We report on the optical properties of thin titanium suboxide (TiO_x) films for applications in laser transmission welding of polymers. Non-absorbing fibers were coated with TiO_x coatings by reactive magnetron sputtering. Plasma process parameters influencing the chemical composition and morphology of the deposited thin films were investigated in order to optimize their absorption properties. Optical absorption spectroscopy showed that the oxygen content of the TiO_x coatings is the main parameter influencing the optical absorbance. Overtreatment (high power plasma input) of the fiber surface leads to high surface roughness and loss of mechanical stability of the fiber. The study shows that thin substoichiometric TiO_x films enable the welding of very thin polyurethane membranes and polyamide fibers with improved adhesion properties.