脉冲激光气相沉积技术现状与进展

介绍了脉冲激光沉积法(PLD)制备薄膜技术的原理、特点和这一研究领域的现状，着重介绍了脉冲激光沉积薄膜技术的研究动态和进展情况。大量研究表明，脉冲激光沉积法是一种最好的制备薄膜的方法之一。     

脉冲激光沉积(PLD)的研究动态与新发展

介绍了脉冲激光沉积薄膜技术的原理、特点,详细探讨了脉冲激光沉积的研究动态和发展趋势.大量研究表明,PLD技术是目前制备薄膜的最好方法之一.     

脉冲激光沉积法制备VO_2热致变色薄膜研究进展

基于半导体和金属间的相变特性,伴随着温度、电场、压力的变化,具有相关智能特性的VO_2薄膜材料具有较大的应用潜力.本文主要阐述脉冲激光沉积技术在制备金属氧化物方面的物理过程和技术特点,详细介绍脉冲激光沉积制备VO_2薄膜材料的工艺参数和国内外研究进展,并与几种常规制备方法进行对比,给出脉冲激光沉积掺杂对VO_2薄膜材料特性的影响,以及采用脉冲激光沉积制备VO_2纳米材料,讨论了脉冲激光沉积制备具有智能特性的VO_2薄膜材料存在的问题和发展方向.     

大功率脉冲激光纳米薄膜制备技术

讨论脉冲激光薄膜沉积技术的基本物理过程、独具的优点及可能的应用，并介绍了一些激光制备薄膜实验的结果。     

大功率脉冲激光纳米薄膜制备技术

讨论脉冲激光薄膜沉积技术的基本物理过程，独具的优点及可能的应用，并介绍了一些激光制备薄膜实验的结果。     

脉冲激光沉积技术在磁性薄膜制备中的应用

脉冲激光沉积制膜（PLD）是近年来迅速发展起来的制膜新技术，首先简要介绍了脉冲激光沉积技术的原理、特点和优势以及在磁性功能薄膜研究中的应用，最后说明了该技术的最新发展趋势。     

脉冲激光沉积有机薄膜

脉冲激光沉积(PLD)技术是一门新兴的薄膜制备技术,在无机薄膜的制备和研究方面取得了令人满意的成果,技术也比较成熟.但利用脉冲激光沉积技术制备和研究有机膜方面的工作开展较晚,工作也比较少,尚未形成一个比较系统的体系.因此开展有机薄膜的脉冲激光沉积研究将具有重要的意义.     

物理气相沉积制备锂离子电池正极薄膜研究进展

薄膜锂离子电池是锂离子电池发展的最新领域,正极材料的薄膜化是薄膜锂离子电池的重要部分.综述了近年来国内外物理气相沉积在薄膜锂离子电池正极薄膜方面的研究新进展,着重介绍了射频磁控溅射、脉冲激光沉积、电子束沉积等制备技术的工作原理、特点及发展,并对这些制备技术在锂离子电池正极薄膜制备中的应用进行了分析、比较和评价.     

AZO透明导电薄膜的制备技术及应用进展

概述了国内外AZO透明导电薄膜的多种制备技术和开发应用进展。详细介绍了磁控溅射、溶胶-凝胶、脉冲激光沉积、真空蒸镀、化学气相沉积等工艺在AZO薄膜制备中的研究现状,并且在对AZO膜与ITO膜性能比较的基础上,指出AZO薄膜的产业化前景好。     

ZnO薄膜气相法制备

ZnO薄膜具有压电、光电、压敏、气敏、发光等多种特性,应用十分广泛。介绍了ZnO薄膜气相法制备原理中的各类主要方法,包括脉冲激光沉积、磁控溅射、分子束外延、金属有机化合物化学气相沉积、单源化学气相沉积和等离子体增强化学气相沉积等技术;分析了这些方法的优缺点;展望了ZnO薄膜今后的研究方向。     

Morphological, optical and electrical properties of samarium oxide thin films

We present here results on samarium oxide thin films, obtained by pulsed laser deposition and by radio frequency assisted pulsed laser deposition. Three different substrate types were used: silicon, platinum covered silicon and titanium covered silicon. The influence of the deposition parameters (oxygen pressure and laser fluence) on the structure and morphology of the thin films was studied. The substrate-thin film interface zone was investigated; the optical and electrical properties (the losses, dielectric constant and leakage currents) were also determined.     

在聚酰亚胺衬底上低温制备超薄热敏铂膜的研究

通过在聚合物衬底上制备热敏薄膜可以实现非平、屈曲物体表面温度的实时监控和测量。利用脉冲激光沉积技术在聚酰亚胺衬底上低温（250℃左右）制备了超薄铂热敏薄膜,其室温下的电阻温度系数为1．01×10^-3／K。通过增加ZnO过渡层,可使铂薄膜的电阻温度系数增大为1．55×10^-3／K。     

Effect of pulsed laser annealing on optical and structural properties of ZnO:Eu thin film

Journal of Materials Science - ZnO:Eu thin film fabricated by pulsed laser deposition was treated by pulsed UV laser. The effect of laser fluence from 70 to 125 mJ cm?2 on film...     

Matrix assisted pulsed laser evaporation of biomaterial thin films

In this paper, processing of biomaterial thin films using a novel physical vapor deposition process known as matrix assisted pulsed laser evaporation (MAPLE) is reviewed. The matrix assisted pulsed laser evaporation process provides excellent control over several film parameters, including thickness, roughness, homogeneity, and reliability. Deposition of dexamethasone thin films, poly (d, l) lactic acid/dexamethasone bilayer thin films, and chitosan thin films is reviewed. The results highlight the expanding role of matrix assisted pulsed laser evaporation process in biomaterials, drug delivery, and tissue engineering.     

Pulsed laser deposition of hydroxyapatite thin films

Hydroxyapatite is a bioactive ceramic material that mimics the mineral composition of natural bone. This material does not possess acceptable mechanical properties for use as a bulk biomaterial; however, it does demonstrate significant potential for use as a coating on metallic orthopaedic and dental prostheses. This paper reviews recent developments involving pulsed laser deposition of hydroxyapatite thin films for medical and dental applications. The structural, mechanical, and biological properties of hydroxyapatite thin films are described. In addition, future directions in pulsed laser deposition of hydroxyapatite thin films are discussed.     

非晶态铁电薄膜的铁电相转变

用ＡｒＦ脉冲激光在Ｐｔ／Ｔｉ／ＳｉＯ２／Ｓｉ衬底上合成了非晶态ＳｒＢｉ２Ｔａ２Ｏ９铁电薄膜,研究了铁电相转变。采用常规热退火、激光诱导和低温高压水热法使非晶态ＳＢＴ薄膜发生铁电相转变。     

Controlling the phase composition of cadmium sulfide films during pulsed laser deposition

Thin cadmium sulfide films grown by pulsed laser deposition on crystalline and amorphous substrates have been shown to consist of a mixture of a cubic (sphalerite structure) and a hexagonal (wurtzite structure) phase. We have demonstrated the possibility of controlling the percentages of the hexagonal and cubic phases in cadmium sulfide films by varying pulsed laser deposition parameters. Varying the deposition parameters allows one to control the optical and structural parameters and surface morphology of thin cadmium sulfide films.     

UV‐Lasertechnologie in der PLD

Future of UV Lasertechnology in industrial PLD processes The success formula for any thin film technology on the production floor is bridging the gap between precisely depositing a functional thin film and at the same time achieving industrial processing rates. Fortunately, the pulsed laser deposition method has come of age thanks to output power and stability advances in UV excimer laser technology and has become a proven and industrial grade thin film deposition method.