InGaAsP/InP photodiodes antireflectively coated with InP native oxide

Usefulness of the anodically grown native oxide film in InP surface is demonstrated as an antireflection coating of InGaAsP/InP DH photodiodes. The reflection of the InP is 30 percent, while that with coating is 2.8 percent in the wavelength region considered. The quantum efficiencies of 64 percent for the uncoated diode and 82 percent for the coated one were obtained. Some important optical properties of the anodically oxidized film are also measured.     

Growth of ternary InAlP and InGaP self-assembled quantum dots by metalorganic chemical vapor deposition

We report the characteristics of ternary InAlP and InGaP self-assembled quantum dots grown by metalorganic chemical vapor deposition. The structural and optical properties of these ternary quantum dots are compared with the characteristics of binary InP quantum dots grown under similar conditions. Because these ternary quantum dots have different bandgaps, strain, and composition compared to binary InP quantum dots, the ternary quantum-dot optical and physical properties are markedly different. The quantum-dot structures are grown uncapped (exposed QDs) and capped (embedded QDs) and characterized by atomic force microscopy (AFM) and photoluminescence (PL). InAlP quantum dots have higher densities and smaller sizes and InGaP quantum dots have smaller densities, as compared with InP quantum dots grown under similar conditions. Also, a random and broad size distribution is observed for InGaP quantum dots and the luminescence from InGaP dots is broader than for InP quantum dots.     

Stability of thin films of microcrystalline silicon under light soaking

As an absorption layer in solar cells ,hydrogenatedmicrocrystalline silicon (μc-Si :H) has attracted consid-erable attention due to some of its unique properties .Currently,it is observed that the best cell performancehas been achievedfor silicon materia…     

Green InP/ZnSeS/ZnS Core Multi-Shelled Quantum Dots Synthesized with Aminophosphine for Effective Display Applications

InP quantum dots (QDs) are emerging as promising materials for replacing cadmium-based QDs in view of their heavy metal-free and tunable luminescence. However, the development of InP QD materials still lags due to the expensive and flammable phosphorus precursors, and also the unsatisfactory repeatability caused by the fast nucleation rate. Adopting lowly reactive P precursor aminophosphine can overcome this issue, but their low photoluminescence quantum yield (PLQY) and widening line widths do not apply to the practical application. Through engineering, the core-shell structure of QD, significantly promoted green emissions of QDs were obtained with PLQY of 95% and full width and half maximum (FWHM) of 45 nm, which demonstrated the highest PLQY record obtained from the aminophosphine system. Moreover, due to the residue halogen atoms on the QD surface as inorganic ligands to prevent further oxidization, these InP QDs demonstrated the ultra-long operational lifetime (over 1000 h) for QDs based color enhancement film. By optimizing the device structure, an inverted green InP quantum dot light-emitting diode (QLED) with external quantum efficiency (EQE) of 7.06% was also demonstrated, which showed a significant promise of these InP QDs in highly effective optoelectronic devices.     

Influence of reaction temperature on the formation process of ZnO quantum dots and the optical properties

ZnO quantum dots (QDs)with the sizes of 3.0-5.6 nm are synthesized by solution-phase method at different temperatures. We find that temperature has great influence on the size of ZnO QDs. The growth process is the most sensitive to temperature, and the process is well explained by Lifshitz-Slyozov-Wagner (LSW) model. By photoluminescence (PL) spectra of the quantum dots at different temperatures and reactive time, we come to a conclusion that ultraviolet emission is mainly due to surface defects, and the or...     

Optical spot-size converters for low-loss coupling between fibersand optoelectronic semiconductor devices

Structures of spot size converters that allow low loss and easy coupling between an optical semiconductor device and a fiber are proposed and designed theoretically. These spot-size converters have a tapered small core for expanding the mode field. They also have a double cladding region which consists of an n⁺-doped InP substrate as the outer cladding and a p-doped or nondoped InP layer as the inner cladding with a ridge structure. This double cladding utilizes the plasma effect of a carrier which makes the refractive index of highly doped n-InP lower than that of p-doped or nondoped InP. The double-cladding structure can tightly confine an expanded mode field in the inner cladding, and results in low radiation loss at the tapered waveguide, in addition, this structure reforms the mode field shape into a Gaussian-like shape and achieves a low loss coupling of less than 1 dB with a large misalignment tolerance for fiber coupling. These spot-size converters are easily fabricated and applicable to all types of optical semiconductor devices     

采用As2和As4模式的新型全固源InAsP分子束外延生长

在国产分子束外延设备的基础上,利用新型阀控裂解As源炉,对As2和As4的生长特性进行了全面的研究.以As2和As4两种模式,在(001)InP衬底上生长了高质量的InAsP体材料和InAsyP1-y/InP多量子阱样品.材料质量用X射线衍射(XRD)以及室温和低温的光致发光(PL)测定.实验发现,两种模式生长的样品的晶体结构质量相当,但As2的吸附系数明显大于As4的吸附系数.另外,用As2模式生长的多量子阱样品的室温光学特性优于As4模式生长的样品,但在低温时,二者几乎相同,这是由As4较为复杂的生长机制所引入的缺陷造成的.     

Investigation and optimization of InGaAs/InP heterointerfaces grown by chemical beam epitaxy using spectroscopic ellipsometry and photoluminescence

Spectroscopic ellipsometry (SE) has been used to investigate transition layers for InGaAs/InP heterointerfaces. For the case of InGaAs on InP, we have found that the samples can be best modeled by a strained In_xGa_1-xAs film with the possible presence of a thin interface region (15Å). We are unable to conclusively determine the existence of such a thin transition region. For InP on InGaAs, we find clear indications of As contamination in the bulk film, and that the addition of a thin interface region of In_0.75Gao_0.25As_0.5P_0.5 improves both the numerical fit and shape of the dielectric response curves, especially around E₁ and E₁ + Δ₁ where the effects of a transition region are most pronounced. However, difficulties in modeling the dielectric response of the contaminated InP film make identification of an interface transition region only speculative at this point. Multiple single quantum well structures have also been grown and analyzed with 7K photoluminescence. The quality of the quantum wells shows strong dependence on the gas switching sequence used at the heterointerfaces. The best switching sequence produced a 0.5 nm well with a 7K FWHM of only 12.3 meV. Multiple quantum wells have also been grown to investigate the uniformity and repeatability of our system. Twenty period MQWs with a well width of 1.6 nm display a 14K FWHM of 7.9 meV.     

Teleportation of an arbitrary unknown N -qubit entangled state under the controlling of M controllers

A new quantum protocol to teleport an arbitrary unknown N-qubit entangled state from a sender to a fixed receiver under M controllers（M 〈 N） is proposed. The quantum resources required are M non-maximally entangled Greenberger-Home- Zeilinger （GHZ） state and N-M non-maximally entangled Einstein-Podolsky-Rosen （EPR） pairs. The sender performs N generalized Bell-state measurements on the 2N particles. Controllers take M single-particle measurement along x-axis, and the receiver needs to introduce one auxiliary two-level particle to extract quantum information probabilistically with the fidelity unit if controllers cooperate with it.     

High-power superfluorescent source of Yb^3＋ -doped double-cladding photonic crystal fiber

A new type of high-power broadband superfluorescent source of Yb^3＋ -doped double-cladding photonic crystal fiber is reported experimentally, which is pumped at 976 nm by a high-power laser diode with the end-coupling method. We have obtained a smooth broadband output of superfluorescence The maximum output power is 1.649 W with a slope efficiency of 56.7%. The 3 dB bandwidth is 22.4 nm To the best of our knowledge, this is the first report about SFS with such high output power of 1.649 W.     

Growth and characterizations of InP self-assembled quantum dots embedded in InAIP grown on GaAs substrates

We report the characteristics of InP self-assembled quantum dots embedded in In_0.5Al_0.5P on GaAs substrates grown by metalorganic chemical vapor deposition. The InP quantum dots show increased average dot sizes and decreased dot densities, as the growth temperature increases from 475°C to 600°C with constant growth time. Above the growth temperature of 600°C, however, dramatically smaller and densely distributed self-assembled InP quantum dots are formed. The small InP quantum dots grown at 650°C are dislocation-free “coherent” regions with an average size of ∼20 nm (height) and a density of ∼1.5 × 10⁸ mm⁻². These InP quantum dots have a broad range of luminescence corresponding to red or organge in the visible spectrum.     

InAs/InP量子点激光器制备工艺研究

报道了通过化学湿刻蚀制备窄脊条InAs/InP量子点激光器的方法。激光器脊条主要是由半导体材料InGaAs和InP构成,通过选择合适配比的H2SO4∶H2O2∶H2O和H3PO4∶HCl腐蚀溶液和InP的腐蚀方向,在室温下选择性地腐蚀了InGaAs和InP,获得了窄脊条宽为6μm的量子点激光器。此激光器能够在室温连续波模式下工作,激射波长在光纤通信重要窗口1.55μm,单面最大输出功率超过12mW。     

InP胶体量子点的合成及光谱性质

以三辛基氧化膦(TOPO)作为溶剂,利用无水InCl3和P(Si(CH3)3)3之间的脱卤硅烷基反应合成了InP胶体量子点.其中,TOPO既作为反应溶剂又作为量子点的包覆剂和稳定剂,在反应后期加入十二胺作为表面活性剂.利用粉末X射线衍射仪及透射电子显微镜测量了量子点的结晶性、晶格结构、晶粒尺寸、表面形貌以及晶粒尺寸分布,利用光致发光(PL)光谱仪和紫外可见分光光度计分析了其光学性质.测试结果显示,量子点具有较好的结晶性及一定的尺寸分布,平均直径为2.5nm,标准偏差为7.4%,表现出明显的量子限制效应.     

Structural and optical characterization of self-formed GaP/InP quantum dots

By growing (GaP)_1.5(InP)_1.88 and (InP)_1.88(GaP)_1.5 short-period superlattices (the former material is the first layer on the GaAs (311) substrate) by gas source MBE, composition-modulated quantum dots were self-formed in both cases. The dot size is about 20 nm in GaP/InP and 22 nm in InP/GaP sample. The photoluminescence energy is higher for the GaP/InP sample, corresponding to the difference in the dot size. The photoluminescence decay time of the InP/GaP sample is less dependent on the emission wavelength and temperature than that of the GaP/InP sample.     

Dual spectral InGaAs=InP quantum-well infrared photodetector focal plane array

The realisation of an InGaAs/InP quantum-well infrared photodetector focal plane array imaging device is reported. The long-wave infrared response is based on the intersubband transition (intraband) in the quantum wells. In addition, a near infrared (interband) response is demonstrated. This work shows the potential of the InGaAs/InP materials system for multi-spectral imaging applications     

Role of a nucleation layer in suppressing interfacial pitting in

In this work, we investigate the role of a low temperature nucleation layer on the interfacial properties of InAs epilayers grown on (100) semi-insulating InP substrates using a two-step metalorganic chemical vapor deposition method. Cross-sectional and plan-view transmission electron microscopy studies were carried out on InAs films of nearly equal total film thicknesses but for different thicknesses of a nucleation layer of InAs deposited at low temperature on the substrate. Our studies show that thermal etchpits are created at the interface between the InAs film, and the InP substrate for thin nucleation layer thicknesses. This is because the low temperature nucleation layer of InAs does not cover completely the surface of the InP substrate. Hence, when the temperature is raised to deposit the bulk of the InAs film, severe thermal pitting is observed at the interface. These thermal etchpits are sources of threading dislocations. To obtain high quality InAs films and suppress interfacial pitting there is an optimum thickness of the nucleation layer. Also, our studies show that there is a relationship between the density of defects in the film and the thickness of the nucleation layer. This in turn relates to the variation of the electronic properties of the InAs films. We have observed that for all nucleation layer thicknesses, the density of threading dislocations is higher close to the interface than at the free surface of the film.     

InP quantum dots in (1 0 0) GaP: Growth and luminescence

We describe the growth and optical emission from strained InP quantum wells and quantum dots grown on GaP substrates using gas-source molecular beam epitaxy. Self-organized quantum dot formation takes place for InP coverage greater than 1.8 monolayers on the (1 0 0) GaP surface. Atomic force and scanning-electron microscopy studies indicate that unburied dots have a lateral size of 60–100 nm and are about 20 nm high, with dot densities in the range of 2–6×10⁸ cm⁻² for InP coverage between 1.9 and 5.8 MLs. Intense photoluminescence is emitted from both the quantum wells and the quantum dots at energies of about 2.2 and 2.0 eV, respectively. Time-resolved measurements indicate rather long carrier lifetimes of about 19 ns in the quantum wells and about 3 ns in the quantum dots. The data indicate that the InP/GaP quantum wells form a type-II band system, with electrons in the X valleys of the GaP recombine with holes in the InP. Furthermore, in the InP/GaP quantum dot system, the conduction band edge in the X valley of the GaP is nearly aligned with that in the Γ valley of the InP. Rapid thermal annealing of the quantum dots results in at least a six-fold enhancement of integrated emission intensity as well as some Ga-In interdiffusion. The low interdiffusion activation energy indicates that the material near the interface between the GaP matrix and the InP dots is not free of defects.     

Effect of postgrowth heat treatment on the structural and optical properties of InP/InAsP/InP nanowires

The effect of the postgrowth annealing of InP/InAsP/InP heterostructural nanowires produced by molecular-beam epitaxy on their structural and optical properties is studied. It is shown that the procedure of short-term (1 min) annealing in an argon atmosphere provides a means for increasing the emission intensity of InAsP quantum dots, suppressing the emission from InAsP quantum wells formed as a result of lateral growth, and substantially reducing the density of structural defects in the nanowires.     

半导体量子点最低导带态的量子限制效应

采用最新计算方法和半导体体材料传统量子计算结果,系统研究了14种半导体(Si,Ge,Sn,AlSb,GaP,GaAs,GaSb,InP,InAs,InSb,ZnS,ZnSe,ZnTe,CdTe)的立方量子点,得到了最低导带态的量子限制效应结果,我们把量子点对尺寸的依赖关系分为三类并详细讨论了它们的差别。     

Strain distribution in InP grown on patterned Si: Direct visualization by cathodoluminescence wavelength imaging

InP has been grown on patterned Si substrates using a low temperature metalorganic chemical vapor deposition process which insures compatibility with integrated circuit technology. Two different patterns are investigated: wet chemically etched V-grooves and SiO₂-masked dry etched grooves. Reduction of feature size leads to drastic defect reduction and quantum efficiencies up to those of homoepitaxially grown InP. Strain relaxation and quantum efficiency are directly visualized by cathololuminescence wavelength imaging. On (001)-and {111}-facets of V-grooves distinct relaxation of the tensile thermally induced strain are found. Surprisingly, in the bottom of V-grooves, close to or even at the InP/Si interface, a high quantum efficiency is found with a recombination time constant typical for thick InP layers of high crystallographic quality.