Cathodic deposition of molybdenum and vanadium mixed oxyhydroxide films from V-substituted polymolybdophosphate

We report a new electrochemical route for fabricating molybdenum and vanadium mixed oxyhydroxide films on Au electrode from Keggin-type vanadium-substituted polymolybdophosphate. The process involves a potentiodynamic reduction of aqueous 9-molybdo(VI)-3-vanadophosphosphate(V) ([PMo₉V₃O₄₀]⁶⁻) in the potential region between 0 and −0.7 V versus Ag/AgCl. The resulting MoV oxyhydroxide film electrode gave a stable redox behavior in Na₂SO₄ electrolyte of pH 3. X-ray photoelectron spectroscopy revealed that this results from oxidation/reduction of Mo⁵⁺/Mo⁶⁺ in the film which accompanies extraction/insertion of protons for charge compensation. The deposited V ions remained in the film upon repetitive potential cycling without affecting their oxidation state. Voltammetric data in the presence of sodium nitrite showed electrocatalytic activity of the MoV oxyhydroxide toward the electroreduction of nitrite.     

Li-ion diffusion kinetics in LiFePO4 thin film prepared by radio frequency magnetron sputtering

LiFePO₄ thin films were prepared by radio frequency (RF) magnetron sputtering and were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM) and atomic force microscope (AFM). Li-ion chemical diffusion coefficients, , were measured by potentiostatic intermittent titration technique (PITT), electrochemical impedance spectroscopy (EIS), and cyclic voltammetry (CV). The effects of Ag content, film thickness, and film orientation on the electrochemical performance and Li-ion chemical diffusion coefficients of the LiFePO₄ thin films were investigated. values were measured using the liquid electrolyte and the solid electrolyte, and the obtained values were discussed. The values by PITT and EIS were in the range of 10⁻¹⁴ to 10⁻¹² and 10⁻¹⁵ to 10⁻¹² cm² s⁻¹, respectively and that by CV was in the order of 10⁻¹⁴ cm² s⁻¹.     

Li-ion diffusion kinetics in LiMn2O4 thin films prepared by pulsed laser deposition

LiMn₂O₄ thin films were deposited on Au substrates by pulsed laser deposition (PLD). The Li-ion chemical diffusion coefficients of the films, , were measured by cyclic voltammetry (CV), galvanostatic intermittent titration technique (GITT), potentiostatic intermittent titration technique (PITT), and electrochemical impedance spectroscopy (EIS). It was found that the values by CV and PITT were in the order of 10⁻¹³ cm² s⁻¹, and those by EIS and GITT were in the range of 10⁻¹³ to 10⁻¹¹ and 10⁻¹⁴ to 10⁻¹¹ cm² s⁻¹, respectively. These data were compared with the previously reported values.     

Li-intercalation behaviour of vanadium oxide thin film prepared by thermal oxidation of vanadium metal

In order to produce thin films of crystalline V₂O₅, vanadium metal was thermally oxidised at 500 °C under oxygen pressures between 250 and 1000 mbar for 1-5 min. The oxide films were characterised by X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), X-ray diffraction (XRD) and Rutherford backscattering spectrometry (RBS). The lithium intercalation performance of the oxide films was investigated by cyclic voltammetry (CV), chronopotentiometry and electrochemical impedance spectroscopy (EIS). It was shown that the composition, the crystallinity and the related lithium intercalation properties of the thin oxide films were critically dependent on the oxidation conditions. The formation of crystalline V₂O₅ films was stimulated by higher oxygen pressure and longer oxidation time. Exposure for 5 min at 750 mbar O₂ at 500 °C resulted in a surface oxide film composed of V₂O_5, and consisting of crystallites up to 200 nm in lateral size. The thickness of the layer was about 100 nm. This V₂O₅ oxide film was found to have good cycling performance in a potential window between 3.8 and 2.8 V, with a stable capacity of 117 ± 10 mAh/g at an applied current density of 3.4 μA/cm². The diffusion coefficients corresponding to the two plateaus at 3.4 and 3.2 V were determined from the impedance measurements to (5.2 and 3.0) × 10⁻¹³ cm² s⁻¹, respectively. Beneath the V₂O₅ layer, lower oxides (mainly VO₂) were found close to the metal. At lower oxygen pressure and shorter exposure times, the oxide films were less crystalline and the amount of V⁴⁺ increased in the surface oxide film, as revealed by XPS. At intermediate oxygen pressures and exposure times a mixture of crystalline V₂O₅ and V₆O₁₃ was found in the oxide film.     

Anodically formed oxide films and oxygen reduction on electrodeposited ruthenium in acid solution

The impedance of the anodically formed hydrous Ru oxide in the system Ru|oxide film|1 M HClO₄ solution has been studied in the range of potentials where the electrode process occurs by a double electron and proton exchange between the oxide film and the solution. The results allowed us to clearly distinguish between the surface process at higher frequency and the bulk process at lower frequency. The high-frequency charging is found to be coupled to Faradaic charging at the film/solution interface. Evaluation of the impedance data at lower frequency, using diffusion equations for the finite boundary conditions, yields an effective proton diffusion coefficient to be 10⁻¹⁰ to 10⁻¹¹ cm² s⁻¹.Oxygen reduction on the spontaneously oxidized ruthenium electrode was discussed on the basis of a rotating ring-disk voltammetry.     

Electrodeposition of PbTe thin films from acidic nitrate baths

Electrodeposition of PbTe thin films from an acidic nitric bath was systematically investigated to understand the kinetics and the effect of electrodeposition conditions on film composition, crystallographic structure, texture and grain size. The electroanalytical studies employed initially with a rotating disk electrode to investigate the kinetics associated with Te, Pb and PbTe electrodeposition. The results indicated that the PbTe thin films were obtained by the underpotential deposition (UPD) of Pb atoms onto the overpotentially deposited Te atoms on a substrate.Based on these studies, PbTe thin films were potentiostatically electrodeposited using e-beam evaporated gold thin films on silicon substrate to investigate the effect of various deposition conditions on film composition and microstructure. The data indicated that the microstructure, composition and preferred film growth orientation of PbTe thin films strongly depended on the applied potential and electrolyte concentration. At −0.12 V, the film was granular, dense, and preferentially oriented in the [1 0 0] direction. At potentials more negative than −0.15 V, the film was dendritic and preferentially oriented in the [2 1 1] direction. A smooth, dense and crystalline film with nearly stoichiometric composition was obtained at −0.12 V from a solution containing 0.01 M HTeO₂⁺, 0.05 Pb²⁺ and 1 M HNO₃.     

Thermal chemical vapor deposition of fluorocarbon polymer thin films in a hot filament reactor

Formation of fluorocarbon polymer films with a linear (CF₂-CF₂)_n molecular structure similar to polytetrafluoroethylene, PTFE is described by a hot filament chemical vapor deposition method. Growth process is analyzed by infrared absorption and C(1s), O(1s) and F(1s) core level electron spectroscopy of films deposited at −5 and +70 °C. Absorption doublet at 1220 and 1160 cm⁻¹ assigned to C-F₂ asymmetric and symmetric stretches, rock at 518 cm⁻¹ and wag at 637 cm⁻¹ indicate formation of linearly organized CF₂ groups with minimum hindrance to molecular vibration modes in CVD grown films. Absorption bands at 1660 and 3389 cm⁻¹ show O and OH groups in the films which diminish on annealing. The C(1s) components, CF₃, CF and C-CF bonding show branching, cross-liking and defects sites which increase as substrate temperature is increased. The O(1s) line analysis shows O₂ in fluorocarbon films is chemically bonded as C-O and F₂CO with relative ratio depending on the film growth temperature. Both O₂ and OH are the result of additional reaction pathways involving the species generated from fragmentation of CF₃C(O)F. Molecular structure of fluorocarbon polymer films involving these species are discussed which are in conformity with the XPS and IR absorption data.     

Formation of porous anodic titanium oxide films in hot phosphate/glycerol electrolyte

The present study reveals the formation of porous anodic films on titanium at an increased growth rate in hot phosphate/glycerol electrolyte by reducing the water content. A porous titanium oxide film of 12 μm thickness, with a relatively low content of phosphorus species, is developed after anodizing at 5 V for 3.6 ks in 0.6 mol dm⁻³ K₂HPO₄ + 0.2 mol dm⁻³ K₃PO₄/glycerol electrolyte containing only 0.04% water at 433 K. The growth efficiency is reduced by increasing the formation voltage to 20 V, due to formation of crystalline oxide, which induces gas generation during anodizing. The film formed at 20 V consists of two layers, with an increased concentration of phosphorus species in the inner layer. The outer layer, comprising approximately 25% of the film thickness, is developed at low formation voltages, of less than 10 V, during the initial anodizing at a constant current density of 250 A m⁻². The pore diameter is not significantly dependent upon the formation voltage, being ∼10 nm.     

Electrochemical and spectral studies on the catalytic oxidation of nitric oxide and nitrite by high-valent manganese porphyrins at an ITO electrode

Catalytic oxidation of nitric oxide and nitrite by water-soluble manganese(III) meso-tetrakis(N-methylpyridinium-4-yl) porphyrin (Mn(III)(4-TMPyP) was first studied at an indium-tin oxide (ITO) electrode in pH 7.4 phosphate buffer solutions. A stepwise oxidation of Mn(III)(4-TMPyP) through high-valent manganese porphyrin species has been observed by electrochemical and spectroelectrochemical (OTTLE) techniques. The formal potential of 0.63 V for the formation of OMn(IV)(4-TMPyP) has been estimated from OTTLE data. The product, oxoMn(IV) porphyrin, was relatively stable decaying slowly to Mn(III)(4-TMPyP) with a first-order rate constant of 3.7 × 10⁻³ s⁻¹. OMn(IV)(4-TMPyP) has been found to oxidize NO catalytically at potentials about 70 mV more negative than that previously reported for OFe(IV)(4-TMPyP) with good selectivity against nitrite. Nitrite was catalytically oxidized at potentials higher than 1.1 V presumably by OMn(V)(4-TMPyP). OMn(IV)(4-TMPyP) was observed as an intermediate species. Nitrate has been confirmed to be a final product of the electrolysis at 1.2 V, while at 0.8 V nitrite left unchanged, demonstrating that OMn(IV)(4-TMPyP) could not oxidize nitrite. A possible schemes of the catalytic oxidation of NO by OMn^IV(4-TMPyP) and NO₂⁻ by OMn(V)(4-TMPyP) have been proposed.     

Electrochemistry of thorium in LiCl-KCl eutectic melts

This work presents a study of the electrochemical properties of Th chloride ions dissolved in a molten LiCl-KCl eutectic, in a temperature range of 693-823 K. Transient electrochemical techniques such as cyclic voltammetry, chronopotentiommetry and chronoamperometry have been used in order to investigate the reduction mechanism on a tungsten electrode and the diffusion coefficient of dissolved Th ions. All techniques showed that only one valence state was stable in the melt. The reduction into Th metal was found to occur according to a one-step mechanism, through a nucleation-controlled process which requires an overpotential of several 100 mV. At 723 K, the diffusion coefficient is D_Th(723 K) = 3.15 ± 0.15 × 10⁻⁵ cm² s⁻¹. EMF measurements indicated that, at 723 K, the standard apparent potential is (723 K) = −2.582 V versus Cl₂/Cl⁻, and the activity coefficient γThCl₄ (723 K) = 4.6 × 10⁻⁴ on the mole fraction scale (based on a pure liquid reference state).     

Kinetics and mechanism of oxygen reduction at hydrous oxide film-covered platinum electrode in alkaline solution

This study uses rotating ring-disk electrode (RRDE) and linear sweep voltammetry (LSV) to characterize oxygen reduction kinetics in alkaline solution on platinum electrodes with various thickness of hydrous oxide (oxyhydroxy) film. Oxyhydroxy films are created on Pt electrodes by pretreatment in 1.0 mol dm⁻³ KOH at a constant voltage. The pretreatment voltage ranges from −1.2 to 1.0 V and is increased stepwise before each new experimental run to produce seven discreet films. LSV plots show oxyhydroxy film thickness strongly inhibits oxygen reduction and is inversely proportional to RRDE oxygen reduction current I_D for LSV voltages E_D from −0.1 to −0.46 V, but this trend reverses at E_D more negative than −0.46 V so that the worst-performing electrode becomes the best. However, this improvement disappears at around −0.8 V, suggesting this change involves a negatively charged ion, possibly embedded into the metal in the top few atomic layers either interstitially or substitutionally. The 1.0 V-pretreated electrode in the E_D range from −0.46 to −0.9 V of highest oxygen reduction current also exhibits the lowest hydrogen peroxide production, with zero H₂O₂ produced at −0.6 V, indicating the brief presence of the oxyhydroxy film on the Pt surface has strong lingering effects. The post-oxyhydroxy Pt surface is very different than the native Pt for oxygen reduction pathway and efficiency. Reaction order with respect to oxygen is close to 1. The rate constants of the direct O₂ to H₂O electroreduction reaction are increased with decreasing the potential from −0.2 to −0.6 V, but the O₂ to H₂O₂ electroreduction is contrary to this expectation. The rate constants of H₂O₂ decomposition on the oxyhydroxy film-covered Pt electrode are near constant around 1 × 10⁻⁴ cm s⁻¹ at E_D > −0.5 V.     

Electrodeposited PbO2 thin film as positive electrode in PbO2/AC hybrid capacitor

Lead dioxide (PbO₂) thin films were prepared on Ti/SnO₂ substrates by means of electrodeposition method. Galvanostatic technique was applied in PbO₂ film formation process, and the effect of deposition current on morphology and crystalline form of the PbO₂ thin films was studied by means of scanning electron microscopy (SEM) and X-ray diffraction (XRD). The energy storage capacity of the prepared PbO₂ electrode was investigated by means of cyclic voltammetry (CV) and charge/discharge cycles, and a rough surface structure PbO₂ film was selected as positive electrode in the construction of PbO₂/AC hybrid capacitor in a 1.28 g cm⁻³ H₂SO₄ solution. The electrochemical performance was determined by charge/discharge tests and electrochemical impedance spectroscopy (EIS). The results showed that the PbO₂/AC hybrid capacitor exhibited high capacitance, good cycling stability and long cycle life. In the voltage range of 1.8-0.8 V during discharge process, considering the weight of all components of the hybrid capacitor, including the two electrodes, current collectors, H₂SO₄ electrolyte and separator, the specific energy and power of the device were 11.7 Wh kg⁻¹ and 22 W kg⁻¹ at 0.75 mA cm⁻², and 7.8 Wh kg⁻¹ and 258 W kg⁻¹ at 10 mA cm⁻² discharge currents, respectively. The capacity retains 83% of its initial value after 3000 deep cycles at the 4 C rate of charge/discharge.     

Electrodeposition of CdTe thin films onto n-Si(1 0 0): nucleation and growth mechanisms

The mechanisms related to the initial stages of the nucleation and growth of cadmium telluride (CdTe) thin films on the rough face side of a (1 0 0) monocrystalline n-type silicon have been studied as a function of different potential steps that varied from an initial value of −0.200 V to values comprised between −0.515 and −0.600 V versus saturated calomel electrode (SCE). The analysis of the corresponding potentiostatic j/t transients suggests that the main phenomena involved at short times is the formation of a Te-Cd bi-layer (BL). For potentials below −0.540 V, the formation of this bi-layer can be considered independent of potential. At greater times, the mechanisms is controlled by two process: (i) progressive nucleation three dimensional charge transfer controlled growth (PN-3D)_ct and (ii) progressive nucleation three dimensional diffusion controlled growth (PN-3D)_diff, both giving account for the formation of conical and hemispherical nuclei, respectively. Ex situ AFM images of the surface seem to support these assumptions.     

Analysis of ion diffusion and charging in electronically conducting polydicarbazole films by impedance methods

An electrochemical impedance analysis of the doping kinetics of polydicarbazole films is reported. Polymer films of varying thickness were analyzed using an impedance model that considers spatially-restricted diffusion of ionic species. The main bulk parameters for diffusion and charge accumulation during doping were determined from fits. These parameters resulted independent of film thickness after considering the experimental error. The equilibrium (bulk) capacitance C₀ varies in the range of 100-800 F cm⁻³. The chemical diffusion coefficient D varies within the range of 10⁻¹⁰ to 10⁻⁸ cm² s⁻¹ and increases as the steady-state potential reaches the oxidation peak potential.     

Electroreduction of peroxycitric acid coexisting with hydrogen peroxide in aqueous solution

The electrochemical reduction of peroxycitric acid (PCA) coexisting with citric acid and hydrogen peroxide (H₂O₂) in the equilibrium mixture was extensively studied at a gold electrode in acetate buffer solutions containing 0.1 M Na₂SO₄ (pH 2.0-6.0) using cyclic and hydrodynamic voltammetric, and hydrodynamic chronocoulometric measurements. The reduction of PCA was characterized to be an irreversible, diffusion-controlled process, and the cyclic voltammetric reduction peak potential () was found to be more positive by ca. 1.0 V than that of the coexisting H₂O₂, e.g., the values obtained at 0.1 V s⁻¹ for PCA and H₂O₂ were 0.35 and −0.35 V, respectively, vs. Ag|AgCl|KCl (sat.) at pH 3.3. The of PCA was found to depend on pH, i.e., at pH > 4.5, the plot of vs. pH gave the slope (−64 mV decade⁻¹) which is close to the theoretical value (−59 mV decade⁻¹) for an electrode process involving the equal number of electron and proton in the rate-determining step, while at pH < 4.5, the was almost independent of pH. The relevant electrochemical parameters, Tafel slope, number of electrons, formal potential (E⁰′), cathodic transfer coefficient and standard heterogeneous rate constant (k⁰′) for the reduction of PCA and the diffusion coefficient of PCA were determined to be ca. 100 mV decade⁻¹, 2, 1.53 V (at pH 2.6), 0.29, 1.2 × 10⁻¹² cm s⁻¹ and 0.29 × 10⁻⁵ cm² s⁻¹, respectively, and except for E⁰′, the obtained values were almost independent of the solution pH. The overall mechanism of the reduction of PCA was discussed.     

Rapid formation of high-quality self-assembled monolayers of dodecanethiol on polycrystalline gold under ultrasonic irradiation

Self-assembled monolayers of dodecanethiol (C₁₂SH-SAMs) on polycrystalline gold were prepared under ultrasonic irradiation at 100 W (the actual ultrasonic power intensity is about 0.1 W cm⁻² including the heat loss) for different time and investigated by cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS). CV experiments show that the differential capacitance C_d values of the C₁₂SH-SAM prepared under ultrasonic irradiation at 100 W (0.1 W cm⁻²) for 15 min are independent of the scan rate, the thickness d value of this monolayer is 17.5 Å, the tilt angle φ value of the molecules in this monolayer from the gold surface normal was calculated to be 30° and the difference value of the current density at −0.2 and 0.5 V (Δi_p) is only 0.69 μA cm⁻². From the EIS experiments, we find that the phase angle value at 1 Hz Φ_1 Hz of the C₁₂SH-SAM prepared under ultrasonic irradiation at 100 W (0.1 W cm⁻²) for 15 min is 89°, the charge transfer resistance R_ct value of this monolayer is 1.40 × 10⁶ Ω cm² and the surface coverage θ value of this monolayer was calculated to be 99.997% from R_ct. These results indicate that the C₁₂SH-SAM of almost defect-free structure and very low ionic permeability can be formed under ultrasonic irradiation at 100 W (0.1 W cm⁻²) in a short time (15 min).     

Oxygen reduction mechanism on copper in a 0.5 M H2SO4

The mechanism of the oxygen reduction reaction (ORR) in a naturally aerated stagnant 0.5 M H₂SO₄ was studied using electrochemical methods. The cathodic polarization curve showed three different regions; electrochemical impedance spectroscopy (EIS) measurement was used accordingly. The EIS data were analyzed, and the mechanism for the ORR was proposed consequently. The three regions include a limiting current density region with the main transfer of 4e⁻ controlled by diffusion (−0.50 V < E < −0.40 V), a combined kinetic-diffusion region (−0.40 V < E < −0.20 V) with an additional 2e⁻ transfer due to the adsorption of the anions, and a hump phenomenon region (−0.20 V < E < −0.05 V), in which the chemical redox between the anodic intermediate and the cathodic intermediate , together with the electrochemical reaction, synergistically results in the acceleration of the ORR. Therefore, a coupled electrochemical/chemical process (the EC mechanism) in the hump phenomenon region was proposed, and a good agreement was found between the experimental and fitted results. The EC mechanism was confirmed by the deaerated experiments.     

Spectroelectrochemical study of perchloroethylene reduction at copper electrodes in neutral aqueous medium

The potential-dependent chemical reaction of perchloroethylene (PCE) on copper in neutral noncomplexing aqueous media is explored by means of surface-enhanced Raman spectroscopy (SERS), linear sweep voltammetry and preparative electrolysis at controlled potential. Voltammetric peaks associated with copper oxide reduction in Na₂SO₄ solution in the presence and the absence of Cl⁻ are correlated with simultaneously acquired SER spectra. Perchloroethylene undergoes a dechlorination process at potentials at E ≤ −0.3 V vs. Ag/AgCl/KCl (3 M), as shown by the emergence of an intense CuCl stretching band at 290 cm⁻¹ and a CH stretching band together with the presence of Cl⁻ in the catholyte. In the potential region between 0 and −0.9 V vs. Ag/AgCl/KCl (3 M) a broad band assigned to CC structures is observed in the triple-bond region (∼1900 cm⁻¹, FWHM = 180 cm⁻¹). In addition, dichloroethylene (DCE) is detected (but not trichloroethylene (TCE)) in this potential region during preparative electrolysis. At potentials lower than −1 V vs. Ag/AgCl/KCl (3 M) carbon residues are the main product, detected on the copper surface by SERS (and confirmed by XPS), whereas in solution higher levels of dichloroethylene and trichloroethylene are detected with a DCE/TCE ratio below 1.     

Evaluation and origins of the difference between double-layer capacitance behaviour at Au-metal and oxidized Au surfaces

In studies of processes at oxidized compared with unoxidized electrode surfaces by transient methods corrections for double-layer charging are usually required and have often been made by extrapolation of double-layer capacitance (C_dl) data for the metallic surface, e.g. at Au or Pt, into the potential region of oxide-film formation. Voltammetry and impedance spectroscopy provide direct information on C_dl values determined at unoxidized, i.e. metallic, Au surfaces compared with those of anodic oxide films generated potentiostatically to various extents that are stable in time, and characterized by reductive linear-sweep voltammetry. C_dl is derived from constant-phase element (CPE) values and the CPE parameter, ?, which is near unity for most conditions. At oxidized Au surfaces C_dl depends on potential for various extents of oxide formation; it increases from 15 (±1) μF cm⁻² at 1.75 V (RHE) to 25 (±1) μF cm⁻² at 1.45 V (RHE) and is independent of added Cl⁻ or Br⁻ for concentrations 0-10⁻³ M of both anions, while, at unoxidized Au electrodes in the absence of halide anions, C_dl has a maximum value of 60 (±2) μF cm⁻² at 0.80 V (RHE) and is now dependent on concentration of added Cl⁻ or Br⁻ ion. These major differences of C_dl for the oxidized and unoxidized Au surfaces indicate that double-layer charging corrections cannot be made simply by extrapolation of C_dl data for unoxidized Au metal surfaces into the potential region for oxide formation.