MBE-growth of heteropolytypic low-dimensional structures of SiC

The controlled growth of SiC heteropolytypic structures consisting of hexagonal (-) and cubic (3C-) polytypes has been performed by solid-source molecular beam epitaxy. On on-axis substrates, 4H/3C/4H-SiC(0001) and 6H/3C/6H-SiC(0001) structures were obtained by first growing some nanometers thick 3C-SiC layer at lower temperatures (1550 K) and Si-rich conditions, and subsequent growth of -SiC on top of the 3C-SiC layer at higher temperatures (1600 K) under more C-rich conditions. On off-axis substrates, multi-heterostructures consisting of 4H/3C- or 6H/3C-stacking sequences were also obtained by first nucleating selectively wire-like 3C-SiC nuclei on the terraces of well-prepared off-axis -SiC(0001) substrates at low T (<1500 K). Next, SiC was grown further in a step-flow growth mode at higher T and Si-rich condition. After the growth many wire-like regions consisting of 3C-SiC were found within the hexagonal SiC layer material matrix indicating a simultaneous step-flow growth of both the cubic and the hexagonal SiC material.     

Photoluminescence investigation of GaAs1 − xBix/GaAs heterostructures

In this work the impact of doped GaAs buffer and cap layers on the bismide photoluminescence (PL) spectra has been studied. For this study three types of heterostructures were grown: a thin GaAsBi layer deposited directly onto the nominally undoped GaAs buffer layer, a GaAsBi layer grown onto the GaAs:Be layer, and a GaAsBi layer deposited onto the GaAs:Be layer and capped with the GaAs:Be layer. It has been demonstrated that p-type doping of the GaAs buffer and cap layers is resulting in a significant increase of the PL intensity. This enhancement was explained by a better photoexcited electron and hole confinement in the GaAsBi layer.     

Stranski–Krastanov growth of Si on SiC(0001)

The molecular beam epitaxial growth of Si on SiC(0001), exhibiting a Stranski–Krastanov mode, was investigated by reflection high-energy electron diffraction. Several surface superstructures were observed in the initial stage of growth. After exceeding a critical coverage, Si island formation sets in. Under near-equilibrium conditions, the critical coverage was 1.4 monolayers and corresponds to the occurrence of a 3×3 superstructure remaining as a wetting layer after the island formation. Island formation at high deposition rates (R) and low temperatures (T) is kinetically delayed, which can be described as function of R and the diffusivity D by a relationship . Si islands, which were relatively uniform size of several nm with a density of 10¹¹ cm⁻², were obtained under these conditions. At lower R values the critical thickness is only a function of T, indicating that the incorporation time of adatoms is the relevant time scale for surface diffusion. Ordered arrays of small dots were also grown on vicinal surfaces at higher T and lower R values, which can be attributed to a lower diffusivity at step edges, acting as perfect sinks for the Si adatoms. Furthermore, two different kinds of islands were found with a (111)/(0001) and (110)/(0001) epitaxial relationship.     

Properties of ZnO single quantum wells in ZnMgO nanocolumns grown on Si (1 1 1)

In this paper, we report a method of growing of the catalyst-free self-organized ZnMgO nanocolumns with single quantum well on Si (1 1 1) substrates by plasma-assisted molecular beam epitaxy technique (PA-MBE). The structures were grown without buffer layers. Optical properties of the ZnMgO/ZnO/ZnMgO quantum wells were studied by photo (PL)- and cathodoluminescence (CL) spectroscopy. A detailed analysis of the optical properties has been carried out, including quantum confinement effect and temperature dependence of excitonic emission. The structures reveal intense near band edge emission in PL as well as in CL. Blue shift of excitonic emission from the wells in comparison to bulk ZnO due to the quantum confinement effect is observed. Cross-sectional SEM–CL mapping shows that the ZnO/ZnMgO single quantum wells with different well widths are located in ZnMgO nanocolumns. The crystalline quality of the heterostructure was characterized by X-ray diffraction (XRD). No phase separation in ZnO/ZnMgO quantum structures was found.     

Structural characterization of molecular beam epitaxy grown ZnSe-based layers on GaAs substrates for blue–green laser diodes

ZnSe films and fully developed p-on-n laser structures, including CdZnSe-active and ZnSSe-guiding layers were grown by molecular beam epitaxy (MBE) on lattice matched p-GaAs, p-AlGaAs and p-GaInP buffer layers. The structural characteristics of these layers were studied by combined cross-section and planar view transmission electron microscopy (TEM). The defect density of the ZnS_xSe_1−x epilayers was shown to be very low, <10⁵ cm⁻². However, on their interfaces with the GaAs substrate, a high density of small dislocation loops and clusters of the order of 3×10¹⁰ cm⁻² was observed. In situ TEM experiments revealed that dislocations and stacking faults (SFs) were generated under the electron beam influence. From them, the perfect dislocations were confined at the ZnSe/GaAs interface, while the SFs propagated to the ZnSe overgrowth or the GaAs substrate, having one of their partial dislocations at the interface. The generation of dislocations under the electron beam was not related to radiation damage but to thermal strain, which was developed by the heating effect due to differential thermal dilatation. Defects around the active zone of fully developed p-on-n laser structures were also studied. The nature of such defects was defined by Burgers vector determination experiments. The critical role of growth variations, such as compositional changes resulting in strain, in the MBE process of II–VI materials was demonstrated. The destructive role of the defected guiding layers in the laser structure was shown.     

Molecular beam epitaxy of c-plane wurtzite GaN on nitridized a-plane β-Ga2O3

Epitaxial growth of GaN on β-Ga₂O₃ single crystal substrates by the molecular beam epitaxy technique is demonstrated for the first time. Standard and in-plane X-ray diffraction evidence the growth of c-plane wurtzite GaN on a-plane β-Ga₂O₃, the epitaxial relationship being 0 1 0_Ga2O3 1 1 2¯ 0_GaN and 0 0 1_Ga2O31¯ 1 0 0_GaN. Epitaxial growth without any buffer layer is achieved after an effective surface nitridation under NH₃ gas.     

Hetero-epitaxy of SrTiO3 on Si and control of the interface

In this article, we address some critical issues to the hetero-epitaxial growth of SrTiO₃ on Si, with emphasis on the interface properties. A two-step growth process allows us to obtain oxide films with high crystallinity, and prevent the formation of an amorphous silicon oxide at the interface. The chemical and structural properties of the interface were evaluated using reflection high energy electron diffraction and X-ray photoelectron spectroscopy. Conditions of hetero-epitaxial growth were first calibrated by a preliminary study of the homo-epitaxial growth of SrTiO₃.     

Properties and applications of MBE grown AlGaN

AlGaN epitaxial films have been grown on sapphire by plasma-induced molecular beam epitaxy (MBE) over the entire composition range from GaN to AlN. Structural and optical properties of the alloys have been investigated by X-ray diffraction (XRD), transmission electron and atomic force microscopy, Raman scattering, ellipsometry, optical transmission, and subgap absorption spectroscopy. Electron spin resonance has been used to study the dependence of intrinsic paramagnetic defects on Al mole fraction. N- and p-type doping with Si and Mg, respectively is found to become increasingly difficult with increasing Al content because of a continuous shift of the donor and acceptor levels deeper into the bandgap. Apart from the use of AlGaN as cladding layers in light emitting diodes, applications in MODFET transistors, solar blind photodetectors, surface acoustic wave devices and Bragg reflectors appear interesting and will be discussed briefly.     

Structural and optical properties of GaN films grown on GaAs substrates by molecular beam epitaxy

GaN films are grown on [0 0 1] GaAs substrates by plasma-assisted molecular beam epitaxy using a three-step process that consists of a substrate nitridation, deposition of a low-temperature buffer layer, and a high-temperature overgrowth. X-ray diffraction and transmission electron microscopy indicate that this method promotes prismatic growth of c-oriented α-GaN. Photoluminescence studies show that the emission from cubic β-GaN inclusions dominates the spectrum.     

Effect of nitridation on crystallinity of GaN grown on GaAs by MBE

GaN films are grown on [0 0 1] GaAs substrates by plasma-assisted molecular beam epitaxy using a three-step process that consists of a substrate nitridation, deposition of a low-temperature buffer layer, and a high-temperature overgrowth. Films are evaluated by X-ray diffraction and the dependence of crystalline quality on the nitridation temperature is studied. It is demonstrated that nitridation has to be performed at low-temperature to achieve c-oriented α-GaN. Higher nitridation temperature promotes formation of mis-oriented domains and β-GaN inclusions     

Effect of the co-deposition of Sb and Si on surface morphology

Scanning tunneling microscopy (STM) is used to observe changes in the surface morphology of a Si (100) surface during the co-deposition of Sb and Si at 500°C. The initial deposition of only 0.01 monolayers of Sb is shown to modify the Si growth mechanism. The roughness of the surface is found to increase during the deposition of Si under a constant Sb flux where the Sb surface coverage is also increasing due to surface segregation. By holding the Sb surface coverage constant and varying the Si deposition, we find that the presence of Sb on the surface inhibits Si attachment at step edges producing three-dimensional stacked island formations. We show that heating the sample for 60 s at 800°C to desorb the surface Sb can return a planar morphology to the Si surface.     

Semiconductor saturable absorbers of laser radiation for the wavelength of 808 nm grown by MBE: Choice of growth conditions

We investigate selected problems of the molecular beam epitaxy (MBE) technology of fabrication of semiconductor saturable absorbers, which are the main parts of broadband saturable absorber mirrors. These mirrors are designed for mode locking of solid-state lasers emitting in 808 nm band. We analyzed growth conditions during the MBE processes of fabrication of test structures containing the central part of the device with a quantum well (QW). Two main parameters were changed in the processes: the growth temperature of InGaAs/GaAs QW and the arsenic to metals flux ratio. Four types of growth conditions were applied during the test processes. Grown structures were tested by optical methods: photoreflectance and pump-probe spectroscopy (pump-probe measurements and saturation measurements). Obtained results enabled us to establish a correspondence between applied growth conditions and main optical parameters of the absorbers.     

Thermal Properties of GaN Films Grown on Si Substrates

GaN films grown on Si substrates by molecular beam epitaxy with different nitridation times have been investigated. The GaN/Si structural and optical properties were evaluated by transmission electron microscopy, X-ray diffraction, atomic force microscopy, and photoluminescence. The effective thermal conductivity of the GaN/Si system was obtained using the photoacoustic technique, and from these results the nitridation time dependence of the interface thermal conductivity (η) can be evaluated using a two-layer model. An optimal nitridation time for which the GaN crystal quality can be improved was obtained. The variation of the parameter η for different nitridation times can be related to the interface phonon scattering process by the presence of disorder at the GaN/Si interface.     

Plasma assisted molecular beam epitaxy growth of GaN

The growth of GaN on sapphire by plasma assisted molecular beam epitaxy (MBE) is investigated with the object of optimizing the material quality. The V/III flux ratio as well as the growth temperature are discussed in relation to their impact on electrical, optical and structural layer properties. Samples grown under nearly stoichiometric conditions exhibit both the highest mobilities and the highest photoluminescence efficiencies. Growth temperatures above 800°C were found to result in narrow reflections in X-ray diffraction. However, the chemical decomposition of GaN at temperatures above 850°C limits the suitable temperature range for the growth under high vacuum conditions.     

Epitaxial growth and thermal stability of silicon layers on crystalline gadolinium oxide

In this work, an unconventional approach for epitaxial growth of Si on single-crystalline rare-earth oxide is presented using molecular beam epitaxy under ultra-high vacuum. Surface and bulk crystalline structures as well as chemical content were examined. Silicon-on-insulator layers were fabricated by encapsulated solid phase epitaxy on Si(111) substrate. The gadolinium oxide capping layer was removed by wet-chemical etching. The remaining silicon layer is single crystalline without any impurities and exhibits 7 × 7 reconstructed surface after annealing in very low silicon flux in the growth chamber. The thermal stability of the fabricated silicon-on-insulator structure was studied by step-wise heating under ultra-high vacuum conditions. The fabricated ultra-thin (10-15 nm) silicon-on-oxide layers remain structurally and chemically stable up to 900 °C.     

Growth-induced atomic step ordering on patterned and non-patterned Si(111)

Atomic step configurations on the vicinal surfaces of patterned and non-patterned Si(111) during homoepitaxial step-flow growth were studied as a function of film thickness, deposition temperature, deposition rate, and substrate miscut. We found, for the first time, that step-flow growth on the vicinal surfaces of Si(111) miscut toward the [11 ] direction results in the formation of collective, in-phase zigzag arrays of [2 ]- and [1̄21̄]-type steps. We also found that step-flow growth on the lower-level region around the edge of Si(111) mesa ridges significantly improves period uniformity. We explained the shape of atomic steps on the basis of the stability of surface reconstruction on Si(111), and the atomic step ordering on the assumption of the anisotropic barrier for diffusion at the growing steps.     

Low-temperature growth of Ge1 − xSnx thin films with strain control by molecular beam epitaxy

High-quality Ge_1 − xSn_x thin films on InGaAs buffer layers have been demonstrated using low-temperature growth by molecular beam epitaxy. X-ray diffraction and secondary ion mass spectrometry are used to determine the strain and Sn concentration. Up to 10.5% Sn has been incorporated into the Ge_1 − xSn_x thin film without Sn precipitation, as verified by transmission electron microscopy. Roughened surfaces are found for tensile strained Ge_1 − xSn_x layers.     

用于掺铒光纤放大器泵浦源的高性能980nm InGaAs应变量子阱激光器

利用分子束外延方法研制出了高质量的ＩｎＧａＡｓ／ＡｌＧａＡｓ庆变量子阱激光器外延材料，其最低的阈值电流密度可达到１２０Ａ／ｃｍ＾２，激光波长在９８０ｎｍ左右。获得了高性能的适合于掺铒光纤放大器用的９８０ｎｍ量子阱激光器泵浦源，其典型的阈值电流为１５ｍＡ，外微分量子效率的典型值和最好值分别为０．８ｍＷ／ｍＡ和１．０ｍＷ／ｍＡ，线性输出功率大于１２０ｍＷ，在２０℃－５０℃的特征温度Ｔ０为１２５Ｋ。器件     

Nucleation and evolution of Si1−xGex islands on Si(001)

In this study, we report a systematic investigation of the metastable morphologies of Si_1−xGe_x layers obtained by the interplay of kinetics and thermodynamics during growth on Si(001). We show that three main growth regimes can be distinguished as a function of the misfit and of the deposited thickness. They correspond to three equilibrium steady state morphologies that consist of (105)-facetted hut islands, huts and domes in co-existence, and a bimodal size distribution of domes, respectively. The shape transitions between these states are attributed to different levels of relaxation.