A novel low power UWB cascode SiGe BiCMOS LNA with current reuse and zero-pole cancellation

A low power cascode SiGe BiCMOS low noise amplifier (LNA) with current reuse and zero-pole cancellation is presented for ultra-wideband (UWB) application. The LNA is composed of cascode input stage and common emitter (CE) output stage with dual loop feedbacks. The novel cascode-CE current reuse topology replaces the traditional two stages topology so as to obtain low power consumption. The emitter degenerative inductor in input stage is adopted to achieve good input impedance matching and noise performance. The two poles are introduced by the emitter inductor, which will degrade the gain performance, are cancelled by the dual loop feedbacks of the resistance-inductor (RL) shunt–shunt feedback and resistance-capacitor (RC) series–series feedback in the output stage. Meanwhile, output impedance matching is also achieved. Based on TSMC 0.35 μm SiGe BiCMOS process, the topology and chip layout of the proposed LNA are designed and post-simulated. The LNA achieves the noise figure of 2.3–4.1 dB, gain of 18.9–20.2 dB, gain flatness of ±0.65 dB, input third order intercept point (IIP₃) of ?7 dBm at 6 GHz, exhibits less than 16 ps of group delay variation, good input and output impedances matching, and unconditionally stable over the whole band. The power consumption is only 18 mW.     

DC and microwave characteristics of Lg 50 nm T-gate InAlN/AlN/GaN HEMT for future high power RF applications

The DC and microwave characteristics of L_g = 50 nm T-gate InAlN/AlN/GaN High Electron Mobility Transistor (HEMT) on SiC substrate with heavily doped n+ GaN source and drain regions have demonstrated using Synopsys TCAD tool. The proposed device features an AlN spacer layer, AlGaN back-barrier and SiN surface passivation. The proposed HEMT exhibits a maximum drain current density of 1.8 A/mm, peak transconductance (g_m) of 650 mS/mm and ft/fmax of 118/210 GHz. At room temperature, the measured carrier mobility, sheet charge carrier density (n_s) and breakdown voltage are 1195 cm²/Vs, 1.6 × 10¹³ cm⁻² and 18 V respectively. The superlatives of the proposed HEMTs are bewitching competitor for future monolithic microwave integrated circuits (MMIC) applications particularly in W-band (75–110 GHz) high power RF applications.     

A UWB CMOS low-noise amplifier with noise reduction and linearity improvement techniques

In this paper, a highly linear CMOS low noise amplifier (LNA) for ultra-wideband applications is presented. The proposed LNA improves both input second- and third-order intercept points (IIP2 and IIP3) by canceling the common-mode part of all intermodulation components from the output current. The proposed LNA structure creates equal common-mode currents with the opposite sign by cascading two differential pairs with a cross-connected output. These currents eliminate each other at the output and improve the linearity. Also, the proposed LNA improves the noise performance by canceling the thermal noise of the input and auxiliary transistors at the output. Detailed analysis is provided to show the effectiveness of the proposed LNA structure. Post-layout circuit level simulation results using a 90 nm RF CMOS process with Spectre-RF reveal 9.5 dB power gain, -3 dB bandwidth (BW_−3dB) of 8 GHz from 2.4 GHz to 10.4 GHz, and mean IIP3 and IIP2 of +13.1 dBm and +42.8 dBm, respectively. The simulated S₁₁ is less than −11 dB in whole frequency range while the LNA consumes 14.8 mW from a single 1.2 V power supply.     

Low power high gain CMOS LNA based on inverter cell and self-body bias for UWB receivers

A low-power low-noise amplifier (LNA) utilized a resistive inverter configuration feedback amplifier to achieve the broadband input matching purposes. To achieve low power consumption and high gain, the proposed LNA utilizes a current-reused technique and a splitting-load inductive peaking technique of a resistive-feedback inverter for input matching. Two wideband LNAs are implemented by TSMC 0.18 μm CMOS technology. The first LNA operates at 2–6 GHz. The minimum noise figure is 3.6 dB. The amplifier provides a maximum gain (S₂₁) of 18.5 dB while drawing 10.3 mW from a 1.5-V supply. This chip area is 1.028×0.921 mm². The second LNA operates at 3.1–10.6 GHz. By using self-forward body bias, it can reduce supply voltage as well as save bias current. The minimum noise figure is 4.8 dB. The amplifier provides a maximum gain (S₂₁) of 17.8 dB while drawing 9.67 mW from a 1.2-V supply. This chip area is 1.274×0.771 mm².     

Effect of gate length in InAs/AlSb HEMTs biased for low power or high gain

The effect of gate-length variation on DC and RF performance of InAs/AlSb HEMTs, biased for low DC power consumption or high gain, is reported. Simultaneously fabricated devices, with gate lengths between 225 nm and 335 nm, have been compared. DC measurements revealed higher output conductance g_ds and slightly increased impact ionization with reduced gate length. When reducing the gate length from 335 nm to 225 nm, the DC power consumption was reduced by approximately 80% at an f_T of 120 GHz. Furthermore, a 225 nm gate-length HEMT biased for high gain exhibited an extrinsic f_T of 165 GHz and an extrinsic f_max of 115 GHz, at a DC power consumption of 100 mW/mm. When biased for low DC power consumption of 20 mW/mm the same HEMT exhibited an extrinsic f_T and f_max of 120 GHz and 110 GHz, respectively.     

A 24-dB Ku-band low-power linearized 90-nm amplifier with a built-in output buffer

In this paper, we present a 90-nm high gain (24 dB) linearized CMOS amplifier suitable for applications requiring high degree of port isolation in the K_u-band (13.2–15.4 GHz). The two-stage design is composed of a low-noise common-gate stage and a gain-boosting cascode block with an integrated output buffer for measurement. Optimization of input stage and load-port buffer parameters improves the front-end's linear coverage, port return-loss, and overall gain without burdening its power demand and noise contribution. With low gate bias voltages (0.65–1.2 V) and an active current source, <?10 dB port reflection loss and 3.25–3.41 dB NF are achieved over the bandwidth. The input reflection loss of the overall amplifier lies between ?35 and ?10 dB and the circuit demonstrates a peak forward gain of 24 dB at 14.2 GHz. The output buffer improves the amplifier's forward gain by ～9 dB and pushes down the minimum output return loss to ?22.5 dB while raising the front-end NF by only 0.05 dB. The effect of layout parasites is considered in detail in the 90-nm process models for accurate RF analysis. Monte Carlo simulation predicts 9% and 8% variation in gain and noise figures resulting from a 10% mismatch in process. The K_u-band amplifier including the buffer block consumes 7.69 mA from a 1.2-V supply. The proposed circuit techniques achieve superior small signal gain, GHz-per-milliwatt, and range of linearity when compared with simulated results of reported microwave amplifiers.     

Study of the leakage current suppression for hybrid-Schottky/ohmic drain AlGaN/GaN HEMT

The leakage current suppression mechanism in AlGaN/GaN High Electron Mobility Transistors (HEMTs) is investigated. It is known that leakage current can cause severe reliability problems for HEMT devices and conventional AlGaN/GaN HEMT devices suffer from detrimental off-state drain leakage current issues, especially under high off-state drain bias. Therefore, a leakage current suppression technique featuring hybrid-Schottky/ohmic-drain contact is discussed. Through the 2-zones leakage current suppression mechanism by the hybrid-Schottky/drain metal including the shielding effect of the rough ohmic-drain metal morphology and the drain side electric field modulation, AlGaN/GaN HEMT featuring this novel technique can significantly enhance the leakage current suppression capability and improve the breakdown voltage. An analytical method using loop-voltage-scanning is proposed to illustrate the optimization procedure of the hybrid-Schottky/ohmic drain metallization on leakage current suppression. Through the comparison of the loop leakage current hysteresis of conventional ohmic drain HEMT and hybrid-Schottky/ohmic drain, the leakage current suppression mechanism is verified through the leakage current considering surface acceptor-like trap charging/discharging model. Device featuring the hybrid-Schottky/ohmic drain technique shows an improvement in breakdown voltage from 450 V (with no Schottky drain metal) to 855 V with a total drift region length of 9 μm, indicating enhanced off-state reliability characteristics for the AlGaN/GaN HEMT devices.     

A resistive-feedback LNA in 65 nm CMOS with a gate inductor for bandwidth extension

In order to get a wideband and flat gain, a resistive-feedback LNA using a gate inductor to extend bandwidth is proposed in this paper. This LNA is based on an improved resistive-feedback topology with a source follower feedback to match input. A relative small inductor is connected in series to transistor׳s gate, which boosts transistor׳s effective transconductance, compensates gain loss and then leads the proposed LNA with a flat gain and wider bandwidth. Moreover, the LNA׳s noise is partially inhibited by the gate inductor, especially at high frequency. Realized in standard 65-nm CMOS process, this LNA dissipates 12 mW from a 1.5-V supply while its core area is 0.076 mm². Across 0.4–10.6 GHz band, the proposed LNA provides 9.5±0.9 dB power gain (S₂₁), better than −11-dB input matching, 3.5-dB minimum noise figure, and higher than −17.2-dBm P_1 dB.     

Threshold voltage instabilities in p-channel power VDMOSFETs under pulsed NBT stress

Threshold voltage instabilities induced in p-channel power VDMOSFETs by pulsed negative bias temperature stressing are presented and compared with corresponding instabilities found after the static NBT stress. Degradation observed under the pulsed stress conditions depends on the frequency and duty cycle of stress voltage pulses, and is generally lower than the one found after the static NBT stress. Optimal frequency and duty cycle ranges for application of investigated devices are proposed as well. By selecting an appropriate combination of frequency range (1 kHz < f < 5 kHz) and duty cycle (about 25%), the pulsed stress-induced ΔV_T can be reduced to a quarter of ΔV_T found after the static NBT stress.     

A novel low voltage very low power CMOS class AB current output stage with ultra high output current drive capability

In this paper a novel low voltage (LV) very low power (VLP) class AB current output stage (COS) with extremely high linearity and high output impedance is presented. A novel current splitting method is used to minimize the transistors gate–source voltages providing LV operation and ultra high current drive capability. High linearity and very high output impedance are achieved employing a novel resistor based current mirror avoiding conventional cascode structures to be used. The operation of the proposed COS has been verified through HSPICE simulations based on TSMC 0.18 μm CMOS technology parameters. Under supply voltage of ±0.7 V and bias current of 5 μA, it can deliver output currents as high as 14 mA with THD better than ?53 dB and extremely high output impedance of 320 MΩ while consuming only 29 μW. This makes the proposed COS to have ultra large current drive ratio (I_outmax/I_bias or the ratio of peak output current to the bias current of output branch transistors) of 2800. By increasing supply voltage to ±0.9 V, it can deliver extremely large output current of ±24 mA corresponding to 3200 current drive ratio while consuming only 42.9 μW and exhibiting high output impedance of 350 MΩ. Interestingly, the proposed COS is the first yet reported one with such extremely high output current and a THD even less than ?45 dB. Such ultra high current drive capability, high linearity and high output impedance make the proposed COS an outstanding choice for LV, VLP and high drive current mode circuits. The superiority of the proposed COS gets more significance by showing in this work that conventional COS can deliver only ±3.29 mA in equal condition. The proposed COS also exhibits high positive and negative power supply rejection ratio (PSRR+/PSRR?) of 125 dB and 130 dB, respectively. That makes it very suitable for LV, VLP mixed mode applications. The Monte Carlo simulation results are provided, which prove the outstanding robust performance of the proposed block versus process tolerances. Favorably the proposed COS resolves the major limitation of current output stages that so far has prevented designing high drive current mode circuits under low supply voltages. In brief, the deliberate combination of so many effective novel methods presents a wonderful phenomenal COS block to the world of science and engineering.     

HCS degradation of 5 nm oxide high-voltage PLDMOS

Hot carrier (HC) injection, inducing drain and gate leakage current increase in 5 nm oxide p-channel LDMOS transistors, is investigated. Devices with two different drain implants are studied. At low gate voltage (V_GS) and high drain voltage (V_DS), reduction of the ON-resistance (R_ON) is observed. At stress times at which R_ON almost reaches its constant level, an increase of the drain leakage in OFF state (V_DS = −60 V, V_GS = 0 V) is observed. Longer stress time leads to increased gate leakage and in some cases oxide breakdown. In contrast to what was reported for devices with 25 nm gate oxide thickness, the threshold voltage of 5 nm gate oxide PLDMOS transistors does not drift. The experimental data can be fully explained by hot carrier injection and the oxide damage can be explained by two different and competing degradation mechanisms. By combining experimental data and TCAD simulations we are further capable to locate the hot spot of maximum oxide damage in the accumulation (Acc) region of the PLDMOS.     

Operational frequency degradation induced trapping in scaled GaN HEMTs

Cut-off frequency increase from 12.1 GHz to 26.4 GHz, 52.1 GHz and 91.4 GHz is observed when the 1 μm gate length GaN HEMT is laterally scaled down to L_G = 0.5 μm, L_G = 0.25 μm and L_G = 0.125 μm, respectively. The study is based on accurately calibrated transfer characteristics (I_D-V_GS) of the 1 μm gate length device using Silvaco TCAD. If the scaling is also performed horizontally, proportionally to the lateral (full scaling), the maximum drain current is reduced by 38.2% when the gate-to-channel separation scales from 33 nm to 8.25 nm. Degradation of the RF performance of a GaN HEMT due to the electric field induced acceptor traps experienced under a high electrical stress is found to be about 8% for 1 μm gate length device. The degradation of scaled HEMTs reduces to 3.5% and 7.3% for the 0.25 μm and 0.125 gate length devices, respectively. The traps at energy level of E_T = E_V + 0.9 eV (carbon) with concentrations of N_IT = 5 × 10¹⁶cm^− 3, N_IT = 5 × 10¹⁷cm^− 3 and N_IT = 5 × 10¹⁸cm^− 3 are located in the drain access region where highest electrical field is expected. The effect of traps on the cut-off frequency is reduced for devices with shorter gate lengths down to 0.125 μm.     

New insight on negative bias temperature instability degradation with drain bias of 28 nm High-K Metal Gate p-MOSFET devices

The degradation of negative bias temperature instability (NBTI) on 28 nm High-K Metal Gate (HKMG) p-MOSFET devices under non-uniform stress condition has been systematically studied. We found the asymmetry between forward and reverse Idsat shift under non-uniform stress condition is significant for long channel devices even under low drain bias stress (e.g., Vds = −0.1 V and gate channel length L = 1 μm), and seems to be dominated by a minimally required critical length (L = 0.2 μm derived from the experimental data). To the authors’ best knowledge, these are new phenomena reported. We attribute these anomalous NBTI characteristics with drain bias to the local self-heating (LSH) activated NBTI degradation mechanism. One semi-empirical analytical model, which fits well with our experimental data, is then proposed in this paper.     

Influence of processing and annealing steps on electrical properties of InAlN/GaN high electron mobility transistor with Al2O3 gate insulation and passivation

We report on preparation and electrical characterization of InAlN/AlN/GaN metal–oxide–semiconductor high electron mobility transistors (MOS HEMTs) with Al₂O₃ gate insulation and surface passivation. About 12 nm thin high-κ dielectric film was deposited by MOCVD. Before and after the dielectric deposition, the samples were treated by different processing steps. We monitored and analyzed the steps by sequential device testing. It was found that both intentional (ex situ) and unintentional (in situ before Al₂O₃ growth) InAlN surface oxidation increases the channel sheet resistance and causes a current collapse. Post deposition annealing decreases the sheet resistance of the MOS HEMT devices and effectively suppresses the current collapse. Transistors dimensions were source-to-drain distance 8 μm and gate width 2 μm. A maximum transconductance of 110 mS/mm, a drain current of ～0.6 A/mm (V_GS = 1 V) and a gate leakage current reduction from 4 to 6 orders of magnitude compared to Schottky barrier (SB) HEMTs was achieved for MOS HEMT with 1 h annealing at 700 °C in forming gas ambient. Moreover, InAlN/GaN MOS HEMTs with deposited Al₂O₃ dielectric film were found highly thermally stable by resisting 5 h 700 °C annealing.     

On the origin of dynamic Ron in commercial GaN-on-Si HEMTs

There are huge differences in dynamic on-resistance R_on, also known as current-collapse, between current GaN power HEMT technologies. Here we illustrate this fact with dynamic R_on measurements on two commercially available devices from 2 different manufacturers, with one showing more than a factor of 2 increase in dynamic R_on after OFF-state drain bias (type 1) and the other one < 15% change. HTRB stress for 1000 h and 3000 h on type 1 and type 2 respectively was found to only make subtle changes to dynamic R_on, with type 1 still showing a much larger dynamic R_on than type 2. A model for dynamic R_on is presented based on a floating, highly resistive, epitaxial buffer whose potential is determined by parasitic leakage paths. The difficulty in controlling local leakage paths can explain the problems that manufacturers are still finding in suppressing dynamic R_on.     

Gain improvement and microwave operation of 4H–SiC MESFET with a new recessed metal ring structure

A new multi-recessed 4H-SiC MESFET with recessed metal ring for RF embedded circuits is proposed (MR2-MESFET). The key idea in the proposed structure is based on the elimination of the spaces adjacent to gate and stopped the depletion region extending towards drain and source and the reduction of the channel thickness between gate and drain to increase breakdown voltage (V_BR); meanwhile the elimination of the gate depletion layer extension to source/drain to decrease gate-source capacitance (C_gs). The influence of multi-recessed drift region and recessed metal ring structures on the characteristics of the MR2-MESFET is studied by numerical simulation. The optimized results show that the V_BR of the MR2-MESFET is 119% larger than that of the conventional 4H–SiC MESFET (C-MESFET); meanwhile maintain 85% higher saturation drain current. Therefore, the maximum output power density of the MR2-MESFET is 23.1 W/mm compared to 5.5 W/mm of the C-MESFET. Also, the cut-off frequency (f_T) and the maximum oscillation frequency (f_max) of 24.9 and 91.7 GHz are obtained for the MR2-MESFET compared to 11 and 40 GHz of the C-MESFET structure, respectively. The proposed MR2-MESFET shows a maximum stable gain (MSG) exceeding 23.6 dB at 3.1 GHz which is the highest gain yet reported for SiC MESFETs, showing the potential of this device for high power RF applications.     

Fabrication and characterization of Pb1−xYbxTe-based alloy thin-film thermoelectric generators grown by thermal evaporation technique

In this study p-Pb_0.925Yb_0.075Te:Te and n-Pb_0.94Yb_0.06Te powders synthesized by solid-state microwave technique were used to fabricate thermally evaporated thin films. The nanostructure and composition of the films were studied using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and energy dispersive X-ray spectroscopy (EDX). Electrical characterizations of the as-deposited films in terms of the Seebeck coefficient and electrical conductivity and power factor were conducted at a range of 298 K to 523 K. The microthermoelectric devices were composed of 20-pair and 10-pair p-Pb_0.925Yb_0.075Te:Te and n-Pb_0.94Yb_0.06Te thin films on glass substrates. The dimensions of the thin-film thermoelectric generators, which consisted of 20-pair and 10-pair legs connected by aluminum electrodes, were 23 mm×20 mm and 12 mm×10 mm, respectively. The 20-pair p–n thermocouples in series generated a maximum open-circuit voltage output (V_oc) of 0.581 V and a maximum output power of 25.87×10^?8 W at a temperature difference ΔT=164 K, whereas the 10-pair p–n thermocouples generated 0.311 V and 13.71×10^?8 W maximum V_oc and maximum output power, respectively, at ΔT=164 K.     

Evidence for causality between GaN RF HEMT degradation and the EC-0.57 eV trap in GaN

The degradation of industry-supplied GaN high electron mobility transistors (HEMTs) subjected to accelerated life testing (ALT) is directly related to increases in concentrations of two defects with trap energies of E_C-0.57 and E_C-0.75 eV. Pulsed I-V measurements and constant drain current deep level transient spectroscopy were employed to evaluate the quantitative impact of each trap. The trap concentration increases were only observed in devices that showed a 1 dB drop in output power and not the result of the ALT itself indicating that these traps and primarily the E_C-0.57 eV trap are responsible for the output power degradation. Increases from the E_C-0.57 eV level were responsible for 80% of the increased knee walkout while the E_C-0.75 eV contributed only 20%. These traps are located in the drain access region, likely in the GaN buffer, and cause increased knee walkout after the application of drain voltage.     

Efficient biasing circuit strategies for inductorless wideband low noise amplifiers with feedback

This paper presents a comparative study among different biasing circuits of inductorless low-area Low Noise Amplifier (LNAs) with feedback. This study intends to determine the most suitable biasing circuit to achieve the best LNA performance for wideband applications. The main performance metrics are analyzed and a comparison is carried out based on electrical simulations. To this purpose, two different CMOS technology processes are considered: 130 nm and 90 nm. In both cases, the supply voltage is 1.2 V. The best LNA designed in 130 nm achieves a bandwidth of 2.94 GHz with a flat voltage gain (A_v) of 16.5 dB and a power consumption of 3.2 mW. The same LNA topology designed in 90 nm technology has a bandwidth of 11.2 GHz, featuring a voltage gain of 16.6 dB and consuming 1.9 mW. Both LNAs are input-impedance matched and have a noise figure below 2.4 dB measured at 2.4 GHz. As a case study, the layout of the best-performance LNA circuit has been implemented in a 130 nm technology, achieving an area of 0.012 mm², which is near the size of a pad or an inductor. It is demonstrated that the bandwidth of this circuit can be notably increased by simply adding a small inductance in the feedback path.¹