Si-nanowire CMOS inverter logic fabricated using gate-all-around (GAA) devices and top-down approach

We present the monolithic integration of gate-all-around (GAA) Si-nanowire FETs into CMOS logic using top-down approach. Inverters are chosen as the test vehicles for demonstration. Empirically optimized designs show sharp ON–OFF transitions with high voltage-gains (e.g., ΔV_OUT/ΔV_IN up to ～45) and symmetric pull-up and pull-down characteristics. The matching of the drive currents of n- and p-MOSFETs is achieved using different number of nanowire channels for N- and P-MOS transistors. The inverter maintains its good transfer characteristics and noise margins for wide range of V_DD tested down to 0.2 V. The detailed experimental characterization is discussed along with the electrical characteristics of the individual transistors comprising the inverter. The performances of the inverters are discussed vis-à-vis those reported in the literature using advanced non-classical device architectures such as FinFETs. The integration potential of GAA Si-nanowire transistors to realize CMOS circuit functionality using top-down approach is thus demonstrated.     

Characterization of ultralow voltage, fully depleted silicon on insulator CMOS device and circuit technology

We present the design, fabrication and characterization of fully depleted silicon on insulator (FDSOI) CMOS devices and circuits for ultralow voltage operation. We have obtained symmetrical threshold voltages for N and P channel devices with an ON–OFF current ratio of 1000:1. A figure of merit of 5 fJ/stage is achieved at 0.25 V on 0.25 μm, 2-input NAND gate FDSOI CMOS ring oscillators. Polysilicon gate depletion and source–drain series resistance limit the performance of the FDSOI CMOS technology. A simplified model combined with high frequency capacitance–voltage measurements at two different frequencies is developed to determine the series resistance and polysilicon gate depletion effects.     

High-quality CMOS in thin (100 nm) silicon on sapphire

Electrical characteristics of enhancement-mode n-channel and p-channel MOSFETs in 100-nm-thick silicon-on-sapphire (SOS) are reported. Channel mobilities (linear operation) of 500 and 200 cm² /V-s, respectively, have been measured in double solid-phase epitaxially (DSPE) improved material. Deep trap levels associated with the Si-sapphire interface were measured in concentrations as low as 1×10¹¹ cm^-2. These results indicate that DSPE-improved SOS films thinned to 100 nm are suitable for application to high-performance down-scaled CMOS circuitry     

High performance and highly reliable novel CMOS devices using accumulation mode multi-gate and fully depleted SOI MOSFETs

In this paper, the electrical characteristics of multi-gate MOSFETs (MUGFETs) using the advanced radical gate oxide and a suppression of Negative bias temperature degradation in accumulation mode FD-SOI MOSFETs are described. Firstly, we experimentally demonstrate that the multi-gate MOSFETs using radical oxide effectively suppress the degradation of S-factor values resulted from its superior oxidation at the sidewall. Secondly, we indicate that the device performance is dramatically improved by introducing MUGFETs device structure originated from its effective channel area. Finally, we reveal the improvement of current drivability and a suppression of Negative bias temperature instability (NBTI) in accumulation mode FD-SOI MOSFETs.     

500 /spl mu/m diameter CMOS compatible avalanche photodiodes with 500 MHz bandwidth

Novel silicon-on-insulator, large area (500 /spl mu/m diameter), CMOS avalanche photodiodes for use with plastic optical fibre are presented. Patterns have been formed on the devices to reduce junction capacitance. Measurements on the patterned devices, at 650 nm and 26 V reverse bias, revealed bandwidths of >500 MHz.     

An enhanced fully scaled 1.2-/spl mu/m CMOS process for analog

An n-well CMOS technology has been developed for high-speed/precision 10-V analog operation while retaining VLSI packaging densities and performance. Several enhancements to a fully scaled 1.2-/spl mu/m CMOS process were made to attain performance levels necessary for state-of-the-art data-conversion applications. The technology incorporates components essential for analog circuit design such as high-gain/low-noise n-p-n BJTs, laser trimmable Cr-Si resistors, and extremely accurate interpoly oxide capacitors. Inclusion of an optimized LDD structure on n-channel transistors has permitted 10-V CMOS capabilities down to 2.5-/spl mu/m drawn gate lengths.     

Floating body effects model for fault simulation of fully depleted CMOS/SOI circuits

The possibility to perform realistic fault simulations for Silicon-On-Insulator circuits is investigated. A simple but complete fault simulation model (fsm) for a technology specific effect is described. The effect considered known as kink effect is typical for partially depleted devices but can occur in the presence of a floating body or in the sub-threshold region even in fully depleted devices causing wrong performances. The model proposed here comprises of only a single additional transistor with a controlled body current. It is not a real physical transistor but just one to describe the electrical behaviour of the device when the critical kink-effect situation occurs and for this reason does not increase the simulation time. From the comparison with device characterization measurements on a 1 μm technology device a good matching with the fsm was found.     

A fully integrated 5.8 GHz U-NII band 0.18-/spl mu/m CMOS VCO

A fully integrated 5.8 GHz CMOS L-C tank voltage-controlled oscillator (VCO) using a 0.18-/spl mu/m 1P6M standard CMOS process for 5 GHz U-NII band WLAN application is presented. The VCO core circuit uses only PMOS to pursue a better phase noise performance since it has less 1/f noise than NMOS. The measurement is performed by using a FR-4 PCB test fixture. The output frequency of the VCO is from 5860 to 6026 MHz with a 166 MHz tuning range and the phase noise is -96.9 dBc/Hz at 300 kHz (or -110 dBc/Hz at 1 MHz) with V ctrl = 0 V. The power consumption of the VCO excluding buffer amplifiers is 8.1 mW at V/sub DD/ = 1.8 V and the output power is -4 dBm.     

A fully integrated SOC for 802.11b in 0.18-/spl mu/m CMOS

A fully integrated system-on-a-chip (SOC) intended for use in 802.11b applications is built in 0.18-/spl mu/m CMOS. All of the radio building blocks including the power amplifier (PA), the phase-locked loop (PLL) filter, and the antenna switch, as well as the complete baseband physical layer and the medium access control (MAC) sections, have been integrated into a single chip. The radio tuned to 2.4 GHz dissipates 165 mW in the receive mode and 360 mW in the transmit mode from a 1.8-V supply. The receiver achieves a typical noise figure of 6 dB and -88-dBm sensitivity at 11 Mb/s rate. The transmitter delivers a nominal output power of 13 dBm at the antenna. The transmitter 1-dB compression point is 18 dBm and has over 20 dB of gain range.     

A 1.3-V 5-mW fully integrated tunable bandpass filter at 2.1 GHz in 0.35-/spl mu/m CMOS

A 2.1-GHz 1.3-V 5-mW fully integrated Q-enhancement LC bandpass biquad programmable in f/sub o/, Q, and peak gain is implemented in 0.35-/spl mu/m standard CMOS technology. The filter uses a resonator built with spiral inductors and inversion-mode pMOS capacitors that provide frequency tuning. The Q tuning is through an adjustable negative-conductance generator, whereas the peak gain is tuned through an input G/sub m/ stage. Noise and nonlinearity analyses presented demonstrate the design tradeoffs involved. Measured frequency tuning range around 2.1 GHz is 13%. Spiral inductors with Q/sub o/ of 2 at 2.1 GHz limit the spurious-free dynamic range (SFDR) at 31-34 dB within the frequency tuning range. Measurements show that the peak gain can be tuned within a range of around two octaves. The filter sinks 4 mA from a 1.3-V supply providing a Q of 40 at 2.19 GHz with a 1-dB compression point dynamic range of 35 dB. The circuit operates with supply voltages ranging from 1.2 to 3 V. The silicon area is 0.1 mm/sup 2/.     

A fully integrated 0.13-/spl mu/m CMOS mixed-signal SoC for DVD player applications

This paper describes a fully integrated single-chip CMOS mixed-signal system on a chip (SoC) for DVD player applications. It integrates one digital signal processor (DSP), two 32-bit CPUs, three dedicated processing units, a partial response maximum likelihood (PRML) read channel with an analog front end (AFE), and many other subsystems on the same die. The AFE includes a fifth-order G/sub m/-C filter and attains over 66 dB C/N overall. PR(3,4,4,3) structure is employed in the PRML read channel. Owing to the PRML signal processing and the mixed-signal system level optimization in the PRML read channel, less than 10/sup -6/ of bit-error rate (BER) is obtained for the focus offset margins over /spl plusmn/0.5 /spl mu/m. This SoC is fabricated in 0.13-/spl mu/m one-poly six-Cu CMOS technology. It contains 24 million transistors in a 63.87 mm/sup 2/ die and consumes 1.5 W at 40 MSample/s data rate, which corresponds to DVD 1.5 times playback operation mode.     

15-GHz fully integrated nMOS switches in a 0.13-/spl mu/m CMOS process

Two fully integrated nMOS switches have been demonstrated at 15 GHz in a 0.13-/spl mu/m CMOS foundry process. One incorporates on-chip LC impedance transformation networks (ITNs) while the second one does not. The switches with and without ITNs achieve the same 1.8-dB insertion loss at 15 GHz, but 21.5 and 15 dBm input P/sub 1dB/, respectively. The degradation of insertion loss due to use of ITNs is compensated by reducing the mismatch loss caused by the bond pad parasitics. The switch without ITNs is suitable for 3.1-10.6 GHz ultra-wide-band (UWB) applications. The switch with ITNs has /spl sim/5 dB worse isolation than the switch without. The difference is due to the larger transistor size of the switch with ITNs, which introduces lower parasitic impedance path between Tx/Rx ports and antenna port.     

Physically based quantum-mechanical compact model of MOS devices substrate-injected tunneling current through ultrathin (EOT /spl sim/ 1 nm) SiO/sub 2/ and high-/spl kappa/ gate stacks

Building on a previously presented compact gate capacitance (C/sub g/-V/sub g/) model, a computationally efficient and accurate physically based compact model of gate substrate-injected tunneling current (I/sub g/-V/sub g/) is provided for both ultrathin SiO/sub 2/ and high-dielectric constant (high-/spl kappa/) gate stacks of equivalent oxide thickness (EOT) down to /spl sim/ 1 nm. Direct and Fowler-Nordheim tunneling from multiple discrete subbands in the strong inversion layer are addressed. Subband energies in the presence of wave function penetration into the gate dielectric, charge distributions among the subbands subject to Fermi-Dirac statistics, and the barrier potential are provided from the compact C/sub g/-V/sub g/ model. A modified version of the conventional Wentzel-Kramer-Brillouin approximation allows for the effects of the abrupt material interfaces and nonparabolicities in complex band structures of the individual dielectrics on the tunneling current. This compact model produces simulation results comparable to those obtained via computationally intense self-consistent Poisson-Schro/spl uml/dinger simulators with the same MOS devices structures and material parameters for 1-nm EOTs of SiO/sub 2/ and high-/spl kappa//SiO/sub 2/ gate stacks on (100) Si, respectively. Comparisons to experimental data for MOS devices with metal and polysilicon gates, ultrathin dielectrics of SiO/sub 2/, Si/sub 3/N/sub 4/, and high-/spl kappa/ (e.g., HfO/sub 2/) gate stacks on (100) Si with EOTs down to /spl sim/ 1-nm show excellent agreement.     

A physically based compact gate C-V model for ultrathin (EOT /spl sim/1 nm and below) gate dielectric MOS devices

A computationally efficient and accurate physically based gate capacitance model of MOS devices with advanced ultrathin equivalent oxide thickness (EOT) oxides (down to 0.5 nm explicitly considered here) is introduced for the current and near future integrated circuit technology nodes. In such a thin gate dielectric regime, the modeling of quantum-mechanical (QM) effects simply with the assumption of an infinite triangular quantum well at the Si-dielectric interface can result in unacceptable underestimates of calculated gate capacitance. With the aid of self-consistent numerical Schro/spl uml/dinger-Poisson calculations, the QM effects have been reconsidered in this model. The 2/3 power law for the lowest quantized energy level versus field relations (E/sub 1//spl prop/F/sub ox//sup 2/3/), often used in compact models, was refined to 0.61 for electrons and 0.64 for holes, respectively, in the substrate in the regimes of moderate to strong inversion and accumulation to address primarily barrier penetration. The filling of excited states consistent with Fermi statistics has been addressed. The quantum-corrected gate capacitance-voltage (C-V) calculations have then been tied directly to the Fermi level shift as per the definition of voltage (rather than, for example, obtained indirectly through calculation of quantum corrections to the charge centroids offset from the interface). The model was implemented and tested by comparisons to both numerical calculations down to 0.5 nm, and to experimental data from n-MOS or p-MOS metal-gate devices with SiO/sub 2/, Si/sub 3/N/sub 4/ and high-/spl kappa/ (e.g., HfO/sub 2/) gate dielectrics on (100) Si with EOTs down to /spl sim/1.3 nm. The compact model has also been adapted to address interface states, and poly depletion and poly accumulation effects on gate capacitance.     

Low-power fully integrated 10-Gb/s SONET/SDH transceiver in 0.13-/spl mu/m CMOS

Here, we present a low-power fully integrated 10-Gb/s transceiver in 0.13-/spl mu/m CMOS. This transceiver comprises full transmit and receive functions, including 1:16 multiplex and demultiplex functions, high-sensitivity limiting amplifier, on-chip 10-GHz clock synthesizer, clock-data recovery, 10-GHz data and clock drivers, and an SFI-4 compliant 16-bit LVDS interface. The transceiver exceeds all SONET/SDH (OC-192/STM-64) jitter requirements with significant margin: receiver high-frequency jitter tolerance exceeds 0.3 UI/sub pp/ and transmitter jitter generation is 30 mUI/sub pp/. All functionality and specifications (core and I/O) are achieved with power dissipation of less than 1 W.     

Evidence of two-dimensional carrier confinement in thin n-channelSOI gate-all-around (GAA) devices

The effect of two-dimensional electron confinement is observed in thin-film, gate-all-around SOI transistors operated at low temperature. Physical 3D confinement in a thin silicon film using the silicon/gate oxide potential barrier (in contrast to heterojunction or electrostatic confinement) is shown for the first time. In these devices volume inversion gives rise to a 2DEG, and the population of the energy subbands can be controlled by the gate voltage. The position of transconductance peaks and valleys, corresponding to the population of different subbands as the gate voltage is increased, is in good agreement with theoretical predictions     

Al/sub 0.3/Ga/sub 0.7/As/In/sub x/Ga/sub 1-x/As (0/spl les/x/spl les/0.25) doped-channel field-effect transistors (DCFET's)

The properties of both lattice-matched and strained doped-channel field-effect transistors (DCFET's) have been investigated in AlGaAs/In/sub x/Ga/sub 1-x/As (0/spl les/x/spl les/0.25) heterostructures with various indium mole fractions. Through electrical characterization of grown layers in conjunction with the dc and microwave device characteristics, we observed that the introduction of a 150-/spl Aring/ thick strained In/sub 0.15/Ga/sub 0.85/As channel can enhance device performance, compared to the lattice-matched one. However, a degradation of device performance was observed for larger indium mole fractions, up to x=0.25, which is associated with strain relaxation in this highly strained channel. DCFET's also preserved a more reliable performance after biased-stress testings.<>     

Elimination of kink effect in fully depleted complementaryburied-channel SOL MOSFET (FD CBCMOS) based on silicon direct bondingtechnology

For the fully depleted complementary buried-channel MOSFET (FD CBCMOS) discussed, although its operational principle is similar, its structure is different from that of the conventional buried-channel MOSFET in which a p-n junction exists at the surface of the channel region. Moreover, the p-n junction is totally eliminated in the device structure for both source and drain. Low interface charges in the silicon-on-insulator/silicon direct bonding (SOI/SDB) structure allow the fabrication of the FD CBCMOS. Numerical simulation and experimental measurement have demonstrated that no kink effect is present and that the device has the potential for VLSI applications due to the absence of the p-n junction and the superior SOI/SDB material quality