微图形定向碳纳米管场发射阵列冷阴极的研究

本文介绍了一种微图形化碳纳米管场发射阵列冷阴极,每个图形的直径仅为1μm,构成一个发射单元。制作工艺如下：首先在硅（100）基片上沉积氮化钛缓冲层,然后采用曝光工艺获得直径为1μm的胶孔阵列,沉积催化剂铁,最后采用直流等离子体增强化学气相沉积（DC-PECVD）生长直立的碳纳米管。并对17500个发射单元的阵列阴极进行了表面形貌表征及场发射特性测试。结果表明,碳纳米管阵列阴极的一致性较好;最低开启电场为1 V/μm;电场为17 V/μm时,测得的电流密度已达到90 mA/cm^2;发射电流为550μA时,在2.5 h内的波动小于5.6%。     

ZnO纳米棒/CNTs复合阴极的制备及其场发射性能的研究

采用水热法和喷涂法制备ZnO纳米棒/CNTs复合材料,并测试其场发射性能。首先采用水热法在ITO电极基面生长ZnO纳米棒阵列,随后通过喷涂技术在ZnO纳米棒阵列表面沉积碳纳米管(CNTs)。使用扫描电子显微镜和X-射线衍射分别表征样品的结构和形貌特征。结果表明,经喷涂沉积的CNT薄膜均匀地包裹在ZnO纳米棒尖端。对该复合材料采用二极结构测试其场发射性能,通过测试结果发现,ZnO纳米棒/CNTs复合材料可明显改善ZnO纳米棒阵列及CNT薄膜的场发射性能,该复合材料具有低开启电场强度(约0.96V/μm),高场增强因子(9881)。因此,ZnO纳米棒/CNTs复合材料是最有前景的场发射阴极材料之一。     

纳米金刚石掺混对碳纳米管薄膜场发射性能的影响

为了提高碳纳米管（CNT）阴极膜的场发射均匀性和稳定性,同时改善CNT膜的制作过程,本文提出一种掺混纳米金刚石（D）制作高性能丝网印刷CNT膜的方法．通过掺混碳相纳米金刚石,形成结构匹配的CNT／D复合膜,CNT膜内的间隙势垒减少,发射体分散更均匀,膜层与基底接触面积增加;同时,结合纳米金刚石的负电亲和势和场发射特性,可有效提高CNT阴极膜的导电性,增大有效发射体的密度．场发射特性测试表明CNT／D复合膜能得到1．89V／μm的低开启电场,在2．8V／μm场强下,场发射电流密度远高于普通CNT膜,达到463μA／cm2,与普通CNT阴极膜相比,CNT／D复合膜的场发射稳定性显著提高,在400℃热处理后CNT／D膜激发阳极发光更均匀．     

电泳和电镀法增强碳纳米管场发射特性的研究

碳纳米管(CNT)和衬底的电学接触问题是获得高性能CNT电子器件的一个关键性的问题。本文采用电泳电镀方法制备CNT冷阴极,有效改善了CNT与衬底间接触电阻,增强了碳纳米管场发射性能。电泳电镀法制备的碳纳米管冷阴极场发射的开启电场(电流密度为10μA.cm-2时的电场)由2.95 V.μm-1降低到1.0V.μm-1,在电场为8V.μm-1时电流密度由0.224增加到0.8112mA.cm-2。在电流密度为800μA.cm-2时进行1h的场发射稳定性测试,结果表明,电泳电镀法所得CNT场发射电子源电流密度几乎不变,而且电流密度比较稳定;而只有电泳的方法获得的CNT场发射电子源电流密度波动较大,电流不稳定且呈较快的衰减趋势,1h后减少到原来的75%。采用电泳电镀方法制备CNT阴极,CNT的根部被纳米银颗粒覆盖和包裹,使CNT与衬底接触更加牢固而紧密,又由于银具有很好的导电性,从而大大减小了接触电阻,因此电泳电镀法能大大改善CNT与衬底的电学接触性能。     

一种提高碳纳米管场发射特性方法

针对碳纳米管场发射显示器亮度低、发光均匀性差的问题,提出了氧化锌掺杂的方法.通过将氧化锌(ZBO)颗粒和碳纳米管(CNTs)及其他有机物按比例配成浆料,丝网印刷制作了阴极试样.场发射特性研究结果表明:与具有同样印刷面积的普通CNT试样比较,掺杂试样的开启电场从1.70 V/μm降低到1.17 V/μm;在2.05 V/μm场强下发射电流从185μA上升到510μA.且掺杂氧化锌试样具有较好的发射稳定性和均匀性.通过微观表征和特性测试,初步推断场发射特性的提高的原因:由于混合掺杂试样中氧化锌地填充在碳纳米管之间或者覆盖在顶上,提高了膜层导电性,改善了发射体的热传导性,且增加了有效发射体密度.     

衬底电极对丝网印刷CNT阴极场发射性能的影响

通过丝网印刷技术,将碳纳米管(carbon nanotube,CNT)浆料直接转移到CrCuCr薄膜衬底电极、掺Sn的In_2O_3(indium tin oxides,ITO)透明导电薄膜衬底电极和Ag浆导电厚膜衬底电极上,高温烧结后得到CNT阴极,并对CNT阴极进行表面形貌和场发射性能的研究.结果表明,不同衬底电极对CNT阴极场发射性能的影响不一样,CrCuCr薄膜衬底电极CNT阴极、ITO透明导电薄膜衬底电极CNT阴极及Ag浆厚膜导电衬底电极CNT阴极场发射的开启电场分别为0.99、2.05和2.46V/μm;当电场为3.0V/μm时,它们的亮度分别为2472、1889、587cd/m~2.CrCuCr薄膜衬底电极CNT阴极的场发射性能最优,ITO透明导电薄膜衬底电极CNT阴极次之,Ag浆厚膜导电衬底电极CNT阴极最差,并根据金属-半导体理论模型分析了原因.     

碳纳米管/二氧化硅复合材料制备及场发射特性研究

采用溶胶-凝胶法制备了碳纳米管/二氧化硅复合材料,并对复合材料的场发射特性进行了研究,结果表明:复合材料有很好的场发射特性,含有10%(质量分数)CNTs的复合材料开启场较低(0.98V/μm).研究了用稀HF溶液处理复合材料表面后场发射性能,发现场发射性能明显改善,开启场由0.98V/μm下降到0.73V/μm,发射电流为1mA/cm2时的电场由2.1V/μm下降到1.0V/μm.研究表明碳纳米管/二氧化硅复合材料非常适用于场发射平面显示器中的阴极.     

金属基底上定向碳纳米管阵列的生长及其场发射性质

在金属基底上,以铁为催化剂,硅做过镀层,乙烯为源气体,通过普通的化学气相沉积方法生长出垂直基底排列的碳纳米管(CNT)阵列.扫描电子显微镜和透射电镜观察表明,生长的CNT具有阵列形貌和多缺陷的结构.对CNT阵列的场发射性质进行了测量,在10 μA/cm2时不锈钢和镍基底上的开启电场分别为1.25 V/μm 和1.57 V/μm.     

阴阳极间距对碳纳米管薄膜强流脉冲发射的影响

采用酞菁铁高温裂解法在镀有镍金缓冲层的硅基底上生长了碳纳米管薄膜(CNTs),并采用二极结构在单脉冲模式下研究了其强流脉冲发射特性。结果表明:在脉冲电场峰值相同的条件下(~12.1V/μm),阴阳极间距越小,冷阴极的发射电流越大,且冷阴极的开启场强越小;当阴阳极间距为14cm时,CNTs薄膜的强流脉冲发射电流峰值为312A(电流密度为15.9A/cm~2),对应的开启场强为4.3 V/μm;当阴阳极间距为12.8cm时,CNTs薄膜的强流脉冲发射电流峰值为747.2A(电流密度为38.OA/cm~2),对应的开启场强为4.0 V/μm。     

碳纳米管场发射阴极的制备及其场发射特性

采用电泳法将碳纳米管组装到电化学淀积的银台阵列上作为场发射阴极并研究了它的场发射特性.场发射特性测试结果表明:该阴极具有优异的场发射特性,开启电场为2.8V/μm,在应用电场为5.5V/μm时,发射电流密度达到1.7mA/cm2.具有优异的发射性能的原因可以归结到银台的边缘和银台类山状的表面增强了碳纳米管的场致电子发射.该阴极制备工艺简单、发射特性优异,且容易实现大面积制备,可以应用到大面积场发射显示器件中.     

Electron emission properties of CNT arrays grown with micro-molding in capillary (MIMIC) assisted process

We have selectively fabricated carbon nanotubes (CNTs) emitter arrays with a micro mold in capillary (MIMIC) assisted process. The electron emitter growth site was fabricated by resist patterning using the MIMIC process. The pattern was uniformly transferred to the substrate and well aligned CNTs were grown. The emitter produces a turn-on field of 2.7 V/μm with a field emission current of 10 μA/cm². The electron emission current can be controlled by emitter pattern width and pitch variation.     

Silicon rice-straw array emitters and their superior electron field emission

Free standing and vertically aligned silicon rice-straw- like array emitters were fabricated by modified electroless metal deposition (EMD), using HF-H(2)O(2) as an etching solution to reduce the emitter density and to make the emitter end of the formed silicon rice-straw arrays shaper than those formed by conventional EMD. These silicon rice-straw array emitters can be turned on at E(0) = 4.7 V/μm, yielding an EFE (electron field emission) current density of J(e) = 139 μA/cm(2) in an applied field of 12.8 V/μm. According to a simple simulation, the excellent EFE performance of the silicon rice-straw array emitters originates in not only the favorable distribution of emitter arrays, but also the shape of the emitter apexes. The modified-EMD method is easily scaled up without expensive equipment, so silicon rice-straw array emitters are a promising alternative to silicon-based field emitters.     

Growth of carbon nanotubes on cobalt catalyst film using electron cyclotron resonance chemical vapour deposition without thermal heating

This paper demonstrates that carbon nanotubes (CNTs) can be synthesized on a cobalt coated silicon substrate using electron cyclotron chemical vapour deposition and without intentionally heating the substrate. With the mixed gases of C(3)H(8)/N(2), CNTs with a multi-walled structure and a diameter up to 70?nm have been observed. Results show that the diameter of the CNTs increases with the thickness of the cobalt catalyst film and the amount of nitrogen incorporated in the CNT films considerably influences the structures of the CNTs. Vertically aligned CNTs can be fabricated with a microwave power as low as 300?W and the flow rate ratio of C(3)H(8)/N(2) = 20/20?sccm. The CNTs exhibit a turn-on field of 0.2?V?μm(-1) determined at the emission current density of 10?μA?cm(-2).     

X-ray image resolution of carbon nanotube emitters grown with resist-assisted patterning process

We obtained X-ray images using carbon nanotube arrays. The electron emitter was fabricated using the resist-assisted patterning (RAP) process. The X-ray image was obtained with a current of 300 μA at an anode bias of 30 kVp. The emitter had a pattern width of 5 μm and a pitch of 40 μm producing a turn-on field of 1.5 V/μm with a field emission current of 10 μA/cm². The resulting X-ray image clearly shows micrometer scale lines on an integrated circuit chip bonded in a printed circuit board.     

Single-crystal SnO(2) nanoshuttles: shape-controlled synthesis, perfect flexibility and high-performance field emission

Vertically aligned single-crystal SnO(2) nanoshuttle arrays with uniform morphology and a relatively high aspect ratio were synthesized by a simple hot-wall chemical vapor deposition (CVD) method. It was found that regulating the growth temperature gradient could change the shape of the SnO(2) nanostructure from nanoshuttles to nanochisels and nanoneedles, and a self-catalyzing growth process was responsible for tunable morphologies of SnO(2) nanostructures. The as-synthesized SnO(2) nanoshuttles showed ultrahigh flexibility and strong toughness with a large elastic strain of ～ 6.2, which is much higher than reported for Si and ZnO nanowire as well as most crystalline metallic materials. The field emitter fabricated using SnO(2) nanoshuttle arrays has a low turn-on electric field of around 0.6 V μm(-1), and a high field emission current density of above 10 mA cm(-2), which is comparable with the highest emission current density of carbon nanotube and nanowire field emitters.     

Ion-beam processing of single crystal diamond using SOG mask

Various ion-beam etching characteristics of diamond and selectivity between diamond and spin-on-glass (SOG) were examined. The maximum selectivity of diamond and SOG was 12.7 in oxygen reactive ion-beam etching process at 100 V acceleration voltage. Using this etching condition and dot-shaped SOG mask, conical diamond field electron emitter arrays with 30 nm curvature radius, 2.58 μm base radius and 5.86 μm height were fabricated.     

Mg掺杂ZnO纳米棒阵列的场发射性能研究

采用水热法在硝酸锌(Zn(NO3)2·6H2O)与硝酸镁(Mg(NO3)2·6H2O)的生长液中制备了Mg掺杂的Mg/ZnO(MZO)纳米棒,其中生长液中Mg2+的物质的量浓度c(Mg2+)分别为0.05 mol/L、0.10 mol/L、0.25 mol/L和0.50 mol/L.利用场发射电子显微镜(FESEM)、X射线光电子能谱仪(XPS)、X射线衍射仪(XRD)、光致发光谱(PL)测试及场发射测试对所制备的MZO纳米棒的表面形貌、成分、晶体结构、光学性能及场发射性能进行了研究.结果表明:随着生长液中c(Mg2+)的增加,MZO纳米棒的直径逐渐减小、缺陷逐渐增加;且掺入的Mg含量与c(Mg2+)并不成正比关系;当生长液中的c(Mg2+)为0.10 mol/L时,所制备的MZO纳米棒的场发射性能最好,其开启场强为2.85 V/μm.     

Field emission of Co nanowires in polycarbonate template

The Co nanowire arrays were synthesized by electrodeposition in polycarbonate template (PC) with 4 μm thickness. Electron field emission properties of cobalt nanowires were studied for wires with different aspect ratios, R ranged between 10 and 60, while the diameter of wires was fixed about 50 nm. The field emission properties of the samples showed low turn on electric field (E_to) with values varying between 2.9 and 11.3 V/μm showing a minimum value for R = 20 (E_to < 3 V/μm). On the other hand, the enhancement factor shows a peak for nanowires length about 1 μm. Field emission data using the Fowler-Nordhiem theory showed nearly straight-line nature confirming cold field emission of electrons. The fabricated field emitter arrays of cobalt nanowires in the PC templates opens the possibility of fabricating flexible flat panel displays.     

X-ray images obtained from cold cathodes using carbon nanotubes coated with gallium-doped zinc oxide thin films

X-ray imaging data obtained from cold cathodes using gallium-doped zinc oxide (GZO)-coated CNT emitters are presented. Multi-walled CNTs were directly grown on conical-type (250 μm-diameter) tungsten-tip substrates at 700 °C via inductively coupled plasma-chemical vapor deposition (ICP-CVD). GZO films were deposited on the grown CNTs at room temperature using a pulsed laser deposition (PLD) technique. Field-emission scanning electron microscopy (FESEM) and high-resolution transmission electron microscopy (HRTEM) were used to monitor the variations in the morphology and microstructure of the CNTs before and after GZO coating. The formation of the GZO layers on the CNTs was confirmed using energy-dispersive X-ray spectroscopy (EDX). The CNT-emitter that was coated with a 10-nm-thick GZO film displayed an excellent performance, such as a maximum emission current of 258 μA (at an applied field of 4 V/μm) and a threshold field of 2.20 V/μm (at an emission current of 1.0 μA). The electric-field emission characteristics of the GZO-coated CNT emitter and of the pristine (i.e., non-coated) CNT emitter were compared, and the images from an X-ray system were obtained by using the GZO-coated CNT emitter as the cold cathode for X-ray generation.     

Photolithography-based carbon nanotubes patterning for field emission displays

Carbon nanotubes (CNTs) emitters were successfully patterned in small pixels (50×50 μm²) by using photolithography process on a hard metal electrode for field emission displays (FEDs) application. The CNTs particles in the patterned pixels were uniformly distributed on 2-inch diagonal substrates. The maximum diameter of CNTs particles could be controlled less than 20 μm. After patterning and heat treatment process below 300°C, most of CNTs bundles on the cathode electrode were aligned perpendicular to the substrates. The threshold electric field of emission for patterned CNTs was about 4.2 V μm⁻¹ and the field enhancement factor derived from the Fowler–Nordheim plots of the electron emissions was about 100 000 in the high voltage region. This newly developed process can be applicable to field emitter arrays for high resolution FEDs.