Inversion of the electron population in subbands of dimensional quantization with longitudinal transport in tunnel-coupled quantum wells

The scheme of a laser which can operate in the far-infrared range (λ ∼ 150 μm) is suggested. In order to attain the inversion of the subband population it was suggested that electron transport in three tunnel-coupled quantum wells in a strong electric field, which lies in the plane of quantum wells, be used. An important specific feature of the structure suggested is the presence of a single rough heterointerface. The electron trans-port was simulated by the Monte Carlo method for the Al_xGa_1−x As/GaAs (x=0.2–0.3) heterostructure. The simulation demonstrated that the population inversion in the first and second subbands of dimensional quantization is realized in the field above 1.2 kV/cm at T=4.2 and 77 K. __________ Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 36, No. 6, 2002, pp. 724–729. Original Russian Text Copyright ? 2002 by Aleshkin, Dubinov.     

GaAs solar cells grown on Si substrates for space use

GaAs single‐junction and InGaP/GaAs multi‐junction thin‐film solar cells fabricated on Si substrates have great potential for high‐efficiency, low‐cost, lightweight and large‐area space solar cells. Heteroepitaxy of GaAs thin films on Si substrates has been examined and high‐efficiency GaAs thin‐film solar cells with total‐area efficiencies of 18·3% at AM0 and 20·0% at AM 1·5 on Si substrates (GaAs‐on‐Si solar cells) have been fabricated. In addition, 1‐MeV electron irradiation damage to GaAs‐on‐Si cells has been studied. The GaAs‐on‐Si cells are found to show higher end‐of‐life efficiency than the conventional GaAs cells fabricated on GaAs substrates (GaAs‐ on‐GaAs cells) under high‐fluence 1‐MeV electron irradiation of more than 1 × 10¹⁵ cm⁻². The first space flight to make use of them has been carried out. Forty‐eight 2 × 2 cm GaAs‐on‐Si cells with an average AM0 total‐area efficiency of 16·9% have been evaluated in the Engineering Test Satellite No.6 (ETS‐VI). The GaAs‐on‐Si cells have been demonstrated to be more radiation‐resistant in space than GaAs‐on‐GaAs cells and 50, 100 and 200‐μm‐thick Si cells. These results show that the GaAs‐on‐Si single‐junction and InGaP/GaAs‐on‐Si multi‐junction cells have great potential for space applications. Copyright © 2001 John Wiley & Sons, Ltd.     

Laser annealed Ta/Ge and Ni/Ge ohmic contacts to GaAs

Refractory metal ohmic contacts to n-type GaAs have been developed using epitaxial Ge films and pulsed laser annealing. Laser annealing was carried out with a 22 ns pulse from a Q-switched ruby laser operating in the TEM00mode. The specific contact resistivity of the contacts Ta/Ge and Ni/Ge on 2 × 10¹⁷cm^-3dopes GaAs exhibited sharp minima as a function of laser energy density at 1 × 10^-6Ω-cm²and 2 × 10^-6Ω-cm², respectively, which occurred near the melting point of the layered contacts. Auger electron sputter profiles revealed Ge migration into the GaAs surface after laser annealing at sufficient energy density to form ohmic contact. The contacts have applications to high temperature devices and to devices which experience high channel or contact temperatures, such as power FETs and TEDs.     

GaAs/Si/AlAs异质结的带阶和GaAs生长温度的影响

用分子束外延 (MBE)设备制备了 Ga As/ Al As和 Ga As/ Si/ Al As异质结 ,通过 XPS分别研究了异质结界面处 Si层厚度为 0 .5 ML 和 1ML 对异质结带阶的调节 ,得到最大调节量为 0 .2 e V;通过 C- V法研究了异质结的Ga As层在不同温度下生长对 0 .5 ML Si夹层的影响 ,得到 Si夹层的空间分布随 Ga As层生长温度的升高而扩散增强的温度效应 ,通过深能级瞬态谱 (DL TS)研究了在上述不同温度下生长的 Ga As层的晶体质量 .     

Room-temperature pulsed operation of AlGaAs/GaAs vertical-cavitysurface-emitting laser diode on Si substrate

Room-temperature pulsed AlGaAs/GaAs vertical-cavity surface-emitting laser diode (VCSELD) has been grown on Si substrate using metalorganic chemical vapor deposition. The VCSELD structure grown on Si substrate consists of a single quantum well active layer and a 20-pair of AlAs/GaAs distributed Bragg reflector (DBR). The measured reflectivity of the 20-pair of AlAs/GaAs DBR was 93% at the wavelength of 860 nm. The VCSELD on Si substrate exhibited a threshold current of 79 mA and a threshold current density of 4.9 kA/cm² under pulsed condition at room temperature     

Effect of low-temperature interphase charge transport at the Si/SiO2 interface on the photoresponse of silicon barrier structures

The effect of low-temperature electron charge redistribution at the Si/SiO₂ interface between the interphase states and the conduction band of an n-Si crystal on the temperature behavior of conductance, photovoltage, and photocurrent in Si barrier structures with edge surface electron channels was studied in the temperature range of 77–300 K. The dynamics of the channel-current response to the voltage changes in the dark and under illumination can be explained qualitatively by dispersive hopping transport of holes in SiO₂, which induces electron transfer to, and accumulation at, the Si surface near the barrier contact. The leveling off of the photovoltage at low temperatures and the nonmonotonic temperature dependence of the photocurrent are attributed to the nonmonotonically increasing, localized hole density at the Si/SiO₂ interface and the free electron density at the Si surface with decreasing temperature, which reflects changes in the valence of oxygen complexes.     

The interactions between Si/Co films and GaAs(001) substrates

Interfacial reactions of Si/Co films on (001) oriented GaAs substrate, in the temperature range 300–700°C for 30 min, have been investigated using a combination of x-ray diffraction, Auger electron spectroscopy, and transmission electron microscopy. Cobalt starts to react with GaAs and Si at 380°C by formation of Co₂GaAs, and Co₂Si phases, respectively. At 420°C, the entire layer of Co is consumed, and the layer structure is observed with the sequence Si/CoSi/CoGa(CoAs)/Co₂GaAs/GaAs. Contacts produced in this annealing regime are rectifying and the Schottky barrier heights increase from 0.69 eV(as-deposited state) up to 0.81 eV (420°C). In the subsequent reaction, CoSi grows at the expense of the decompositions of CoGa and CoAs at 460°C. In addition, the ternary phase also is decomposed and only the CoSi phase remains upon the GaAs surface at 600°C. Contacts produced at higher temperature regime (>460°C) have low barriers. The interface between CoSi and GaAs is stable up to 700°C. The results of interfacial reactions can be understood from the calculated Si−Co−Ga−As quaternary phase diagram.     

Terahertz luminescence of GaAs-based heterostructures with quantum wells under the optical excitation of donors

Spontaneous emission from selectively doped GaAs/InGaAs:Si and GaAs/InGaAsP:Si heterostructures is studied in the frequency range of ～3–3.5 THz for transitions between the states of the two-dimensional subband and donor center (Si) under the condition of excitation with a CO₂ laser at liquid-helium temperature. It is shown that the population inversion and amplification in an active layer of 100–300 cm^?1 in multilayered structures with quantum wells (50 periods) and a concentration of doping centers N _D ≈ 10¹¹ cm^?2 can be attained under the excitation-flux density 10²³ photons/(cm² s).     

激光辐照单结砷化镓光伏电池的输出特性

选取单结砷化镓光伏电池和工作波长为808 nm的半导体激光器,开展激光无线能量传输的研究,实验测试了光伏电池性能参数与激光功率和电池温度的关系。结果表明,光伏电池效率随激光功率的增大呈单峰曲线,激光平均功率密度为67.5 mW/cm2时效率最大为49.7%。温度升高,开路电压线性下降,从而导致效率线性降低。激光功率越大,开路电压和效率的温度系数越小。     

Terahertz-radiation generation and detection in low-temperature-grown GaAs epitaxial films on GaAs (100) and (111)A substrates

The efficiency of the generation and detection of terahertz radiation in the range up to 3 THz by LT-GaAs films containing equidistant Si doping δ layers and grown by molecular beam epitaxy on GaAs (100) and (111)Ga substrates is studied by terahertz spectroscopy. Microstrip photoconductive antennas are fabricated on the film surface. Terahertz radiation is generated by exposure of the antenna gap to femtosecond optical laser pulses. It is shown that the intensity of terahertz radiation from the photoconductive antenna on LT-GaAs/GaAs (111)Ga is twice as large as the intensity of a similar antenna on LT-GaAs/GaAs(100) and the sensitivity of the antenna on LT-GaAs/GaAs (111)Ga as a terahertz-radiation detector exceeds that of the antenna on LT-GaAs/GaAs(100) by a factor of 1.4.     

The two-dimensional lateral injection in-plane laser

In this paper, a two-dimensional (2-D) p-n junction was used for population inversion in a GaAs quantum-well laser. The device, incorporating modulation doping within the core of a separate confinement heterostructure, was designed to exploit the amphoteric behavior of silicon in GaAs [doping p-type on (311)A facets and n-type on (100)]. It is believed to be the first lasing device to use an amphoterically doped junction for population inversion. In the first attempted design (described here), CW lasing was achieved at temperatures up to 90 K. The factors affecting the temperature dependence of threshold are discussed in the context of possible design improvements. The device may eventually show improved modulation bandwidth over conventional vertical injection lasers with bulk contacts, since its geometry and the 2-D nature of the injection offer reduced capacitance, HEMT integration, and an elimination of carrier capture problems     

Recent Progress in Mid- and Far-Infrared Semiconductor Detectors

The recent developments of semiconductor infrared detectors in extending the wavelength coverage and improving the focal plane array (FPA) performance are reviewed. The emphasis is on the GeSi/Si heterojunction infrared photoemission detectors (HIPs), GaAs/AlGaAs quantum well infrared photodetecots (QWIPs), Si, Ge and GaAs blocked impurity band detectors (BIBS), and Si and GaAs homojunction interfacial work-function internal photo-emission (HIWIP) far-infrared (FIR) detectors. The advantages, current status, and potential limitations of these infrared detectors have also been discussed.     

Fir spectroscopy on shallow donor states in GaAs:Si

Far infrared spectroscopy experiments on the shallow donor states of GaAs:Si are presented. Transitions between shallow donor levels are induced by F.I.R. radiation from an optically pumped molecular gas laser. The measurements are performed by measuring the electrical conductivity of the GaAs:Si sample at fixed laser frequencies by sweeping an external applied magnetic field up to 12 T. In total about 30 different transitions are observed using radiation between 60 μm and 1.8 mm. In low magnetic fields and at high frequencies a series of photoconductivity signals are observed, which we ascribe to transitions from the ground state towards bound donor levels with hydrogen quantum numbers n, l=n?1, and m=n?1.     

GaAs/Si/AlAs异质结的DLTS实验研究

利用深能级瞬态谱(DLTS)技术研究了Si夹层和GaAs层不同生长温度对GaAs/AlAs异质结晶体品质的影响.发现Si夹层的引入并没有引起明显深能级缺陷,而不同温度下生长的GaAs/Si/AlAs异质结随着温度的降低,深能级缺陷明显增加,并进行了分析,得到深能级是由Ga空位引起的,在600℃时生长的晶体质量最佳.     

Comparison of MBE Growth of InSb on Si (001) and GaAs (001)

We describe the epitaxial growth of InSb films on both Si (001) and GaAs (100) substrates using molecular-beam epitaxy and discuss the structural and electrical properties of the resulting films. The complete 2 μm InSb films on GaAs (001) were grown at temperatures between 340°C and 420°C and with an Sb/In flux ratio of approximately 5 and a growth rate of 0.2 nm/s. The films were characterized in terms of background electron concentration, mobility, and x-ray rocking curve width. Our best results were for a growth temperature of 350°C, resulting in room-temperature mobility of 41,000 cm²/V s.  For the growth of InSb on Si, vicinal Si(001) substrates offcut by 4° toward (110) were used. We investigated growth temperatures between 340°C and 430°C for growth on Si(001). In contrast to growth on GaAs, the best results were achieved at the high end of the range of T _S =  C, resulting in a mobility of 26,100 cm²/V s for a 2 μm film. We also studied the growth and properties of InSb:Mn films on GaAs with Mn content below 1%. Our results showed the presence of ferromagnetic ordering in the samples, opening a new direction in the diluted magnetic semiconductors.     

Laser Annealed and Thermal Annealed Refractory Ohmic Contacts to GaAs

Ohmic contacts to n-type GaAs have been developed for high-temperature device applications up to 300°C. Refractory metallizations were used with epitaxial Ge layers to form the contacts TiW/Ge/GaAs, Ta/Ge/GaAs, Mo/Ge/GaAs, and Ni/Ge/GaAs. Contacts with high dose Si or Se ion implantation (1012 to 1014/cm2) of the Ge/GaAs interface were also investigated. The purpose of this work was to develop refractory ohmic contacts with low specific-contact resistance (~10-6 ?cm2 on 1 x 1017cm-3GaAs) which are free of imperfections, resulting in a uniform n+ doping layer. The contacts were fabricated on epitaxial GaAs layers (n = 2 x 1016 to 2 x 1017 cm-3) grown on n+ ( 2 x 1018 cm-3) or semi-insulating GaAs (at strates. Ohmic contact was formed by both thermal annealing ( at temperatures up to 700°C) and laser annealing (pulsed Ruby). Examination of the Ge/GaAs interface revealed Ge migration into GaAs to form an n+layer. Under optimum laser anneal conditions, the specific contact resistance was in the range 1-5 x 10-6 ?-cm2 (on 2 x 1017cm-3GaAs). Thermally annealed TiW/Ge had a contact resitivity of 1 x 10-6 ? cm2 on 1 x 1017 cm-3 GaAs under optimum anneal conditions. The contacts also showed improved thermal stability over conventional Ni/AuGe contacts at temperatures above 300°C.     

High-power laser diodes of wavelength 808 nm based on various types of asymmetric heterostructures with an ultrawide waveguide

The parameters of high-power multimode laser diodes featuring a radiation wavelength of 808 nm obtained on the basis of asymmetric heterostructures with an ultrawide waveguide in the systems of AlGaAs/GaAs and (Al)GaInP/GaInAsP/GaAs are compared. In the lasers based on an AlGaAs/GaAs system, the maximum optical power was limited by optical degradation of the SiO₂/Si mirrors and amounted to 4.7 W. In the lasers based on an (Al)GaInP/GaInAsP/GaAs system, the maximum optical power was limited by thermal saturation and equaled 7 W. The obtained results show that the (Al)GaInP/GaInAsP/GaAs system is more reliable from the standpoint of an increase in both the maximum optical power and operation life of lasers.     

Se+ ion implantation into encapsulated GaAs

PECVD Si3N4 was deposited on undoped SI (100) GaAs. Se+ ions were implanted with a dose of 1×1014 ions cm?2 at an ion energy of 400 keV through the Si3N4 layer. Annealing was carried out on a dual graphite strip heater at temperatures up to 900°C for 100 s. Transmission electron microscope studies show a large concentration of damage in the form of dense dislocation tangles and long-range strain centres at the Si3N4/GaAs interface. Below this sheet of gross damage the material contains a relatively low density of dislocation loops. Electrical measurements indicate that, for a similar implant condition directly into GaAs, a relatively high electrical activity is measured compared with that of the implants through the Si3N4 encapsulating layer.     

Low-temperature growth of GaAs on Si used for ultrafast photoconductive switches

GaAs was grown directly on silicon by molecular beam epitaxy (MBE) at low substrate temperature (/spl sim/250/spl deg/C). Both the silicon wafer cleaning and the GaAs film growth processes were done at temperatures lower than the Si-Al eutectic temperature to enable monolithic integration of low-temperature-GaAs photoconductive switches with finished Si-CMOS circuits. The film surfaces show less than 1 nm rms roughness and the anti-phase domain density is below the detection limit of X-ray diffraction. Metal-semiconductor-metal photoconductive switches were made using this material and were characterized using a time-resolved electrooptic sampling technique. A full-width at half-maximum switching time of /spl sim/2 ps was achieved and the responsivity of switches made from low-temperature GaAs on Si material was comparable to its counterpart on a GaAs substrate.     

Numerical Simulation of ZnO-Based Terahertz Quantum Cascade Lasers

In this work, a particle-based Monte Carlo model is used to quantify the potential of terahertz sources based on the ZnO-based material system relative to existing devices based on GaAs/AlGaAs quantum wells. Specifically, two otherwise identical quantum cascade structures based on ZnO/MgZnO and GaAs/AlGaAs quantum wells are designed, and their non- equilibrium carrier distributions are then computed as a function of temperature. The simulation results show that, because of their larger optical phonon energy, ZnO/MgZnO quantum cascade laser structures exhibit weaker temperature dependence of the population inversion than in the case of similar structures made of GaAs/AlGaAs. In particular, as the temperature is increased from 10 K to 300 K, population inversion is found to decrease by a factor of 4.48 and 1.50 for the AlGaAs and MgZnO structure, respectively. Based on these results, the MgZnO devices are then predicted to be, in principle, capable of laser action without cryogenic cooling.