理论分析辉光放电对碳纳米管生长速率的影响

利用负偏压增强热丝化学气相沉积 ,在沉积过渡层Ta和催化剂NiFe层的Si衬底上制备了碳纳米管 ,并用扫描电子显微镜研究了它们的形貌。发现辉光放电后 ,碳纳米管的平均长度比无辉光放电时大 ,并且随着负偏压的增大而增大 ,即辉光放电增大了它们的生长速率。结合辉光放电和扩散理论分析了辉光放电对碳纳米管生长速率的影响 ,结果表明在生长碳纳米管的过程中 ,由于辉光放电的产生 ,碳在催化剂中的活度得到增强 ,从而增大了碳纳米管的生长速率。     

Assembly and Applications of Carbon Nanotube Thin Films

The ultimate goal of current research on carbon nanotubes （CNTs） is to make breakthroughs that advance nanotechnological applications of bulk CNT materials. Especially, there has been growing interest in CNT thin films because of their unique and usually enhanced properties and tremendous potential as components for use in nano-electronic and nano-mechanical device applications or as structural elements in various devices. If a synthetic or a post processing method can produce high yield of nanotube thin films, these structures will provide tremendous potential for fundamental research on these devices. This review will address the synthesis, the post processing and the device applications of self-assembled nanotube thin films.     

金属基底上定向碳纳米管阵列的生长及其场发射性质

在金属基底上,以铁为催化剂,硅做过镀层,乙烯为源气体,通过普通的化学气相沉积方法生长出垂直基底排列的碳纳米管(CNT)阵列.扫描电子显微镜和透射电镜观察表明,生长的CNT具有阵列形貌和多缺陷的结构.对CNT阵列的场发射性质进行了测量,在10 μA/cm2时不锈钢和镍基底上的开启电场分别为1.25 V/μm 和1.57 V/μm.