On the stability of the electrical and photoelectrical properties of P3HT and P3HT:PCBM blends thin films

New photoelectrical properties of poly(3-hexylthiophene-2,5-diyl), highly regioregular (P3HT): Methanofullerene Phenyl-C₆₁-Butyric-Acid-Methyl-Ester [60] PCBM films were putted in evidence. For the first time the electrical conductivity dependencies on temperature in dark and under different illuminations were studied for the P3HT and P3HT:PCBM blend films. These dependencies shows reversible processes and a high sensitivity of the P3HT and P3HT:PCBM to light. The decrease of the resistivity at the exposure to light is of 18% for P3HT films and of 20% for P3HT:PCBM blend films, for a irradiation under 0.5 W/m² white light at room temperature. By adding the fullerene molecules, in the 1:0.8 polymer:fullerene ratio, the electrical resistivity at room temperature of the blend films decrease compared to the polymer film by 40% in dark, and by 68% under 250 W/m² white light irradiance.The decrease of the resistivity with the temperature is more pronounced in the presence of light indicating a photon activated process.The existence of the open circuit voltage was evidenced even for planar geometry photodiodes and the values of the open circuit voltage under 1000 W/m² solar light illumination are coherent with the difference between the work functions of the electrodes.     

Organic–inorganic hybrid materials as solution processible gate insulator for organic thin film transistors

We synthesized organic–inorganic hybrid materials (hybrimers) using a simple non-hydrolytic sol–gel reaction and applied the materials as gate insulators in organic thin film transistors (OTFTs). The hybrimer thin films had smooth and hydrophobic surfaces, and were stable with solvents. In addition, the hybrimer thin films had good electrical properties such as low leakage current and high dielectric strength. The performance of the OTFT with hybrimer gate insulator fabricated by drop casting of regioregular poly(3-hexylthiophene) (P3HT) was similar to that of OTFT with hexamethyldisilazane (HMDS) treated thermally grown SiO₂. The hysteresis of RR-P3HT based OTFT with hybrimer gate insulator was negligible.     

Spontaneous growth by sol-gel process of low temperature ZnO as cathode buffer layer in flexible inverted organic solar cells

In this study, the sol–gel method was employed to prepare zinc oxide (ZnO) thin films as cathode buffer layers for inverted organic solar cells (IOSCs). We used a low temperature sol-gel process for the synthesis of ZnO thin films, in which the molar ratio of zinc acetate dihydrate (ZAD) to ethanolamine (MEA) was varied; subsequently, using the thin films, we successfully fabricated inverted solar cells on flexible plastic substrates. A ZnO sol–gel was first prepared by dissolving ZAD and MEA in ethylene glycol monomethyl ether (EGME). The molar ratios of ZAD to MEA were set as 1:1.2, 1:1, and 1:0.8, and we investigated the characteristics of the resulting ZnO thin films. We investigated the optical transmittance, surface roughness, and surface morphology of the films. Then, we discussed the reasons about the improvement of the device efficiency. The devices were fabricated using the ZnO thin films as cathode buffer layers. The results indicated that the morphology of the thin films prepared using the ZAD to MEA ratios of 1:1 and 1:0.8 changed to a rippled nanostructure after two-step annealing. The PCE was enhanced because of the higher light absorption in the active layer caused by the nanostructure. The structure of the inverted device was ITO/ZnO/P3HT:PC₆₁BM/MoO₃/Ag. The short-circuit current densities (8.59 mA/cm² and 8.34 mA/cm²) of the devices with films prepared using the ZAD to MEA ratios of 1:1 and 1:0.8 ratios, respectively, and annealed at 125 °C were higher than that of the device containing the ZnO thin film that was annealed at 150 °C. Inverted solar cells with ZnO films that were prepared using the ZAD to MEA ratios of 1:1 and 1:0.8 and annealed at 125 °C exhibited PCEs of 3.38% and 3.30%, respectively. More than that, PCEs of the flexible device can reach up to 1.53%.     

LiNbO_3/ZnO:Al集成结构的外延生长及电性能研究

采用脉冲激光沉积(PLD)法在蓝宝石衬底上先后外延生长了ZnO:Al(ZAO)和LiNbO3(LN)薄膜。通过X射线衍射分析(XRD)可知二者之间的外延关系为:LN(001)//ZAO(001)、LN[110]//ZAO[110]、LN[100]//ZAO[120]。制备了Au/LN/ZAO和ZAO/LN/ZAO两种电容器结构,对其进行了电流-电压(J-E)测试和铁电(P-E)分析,结果表明:LN/ZAO集成结构具有整流作用,ZAO/LN/ZAO结构表现出较好的绝缘性能,所制备的LN薄膜在室温下的剩余极化强度(Pr)约为1×10–6C/cm2,温度的升高能够促进电畴的翻转,使Pr增加为3×10–6C/cm2。     

Room‐Temperature Tailoring of Vertical ZnO Nanoarchitecture Morphology for Efficient Hybrid Polymer Solar Cells

A ZnO nanoarchitecture, i.e., ZnO nanosheet (NS) framework, is demonstrated to be a promising electron acceptor and direct electron transport matrix for polymer‐inorganic hybrid solar cells. The ZnO NS framework is constructed on nanoneedles/indium tin oxide substrate via a room‐temperature chemical bath deposition (RT CBD). The framework morphology can be simply tailored by varying the concentration of precursor solution in the RT CBD. The ZnO nanoarchitecture with an appropriate free space between the NSs is consequently demonstrated to facilitate poly(3‐hexylthiophene) (P3HT) infiltration, resulting in superior interface properties, i.e., more efficient charge separation and less charge recombination, in the hybrid. Moreover, apart from the characteristics similar to the ZnO nanorod (NR) array, including vertical feature and single crystalline structure, the ZnO NS framework exhibits a slightly larger absorption edge and a faster electron transport rate. A notable efficiency of 0.88% is therefore attained in the ZnO NS‐P3HT hybrid solar cell, which is higher than that of the ZnO NR‐P3HT hybrid solar cell.     

PEDOT修饰对Ag/P3HT/ITO样品载流子注入特性的改善

通过分析Ag/P3HT/ITO结构样品的载流子注入特性,研究了PEDOT(3,4-Ethylene-dioxythiophene thiophene)的界面修饰对样品薄膜注入特性的影响,其中,P3HT(Poly(3-hexyl-thiophene))薄膜采用旋涂法制备,P3HT溶液浓度为30mg/ml(氯仿为溶剂)。测试结果表明:1)P3HT的退火温度对其本身性能影响很大,退火温度越高,导电性能越差,在373K时,性能达到最佳,单位面积电流可达0.092A/cm2;2)PEDOT的界面修饰作用使Ag与P3HT功函数不匹配的问题得到明显改善。实验结果与理论分析基本吻合,样品注入特性改善比在1.15～1.30之间。同样的样品在退火温度为373K时性能达到最佳,单位面积电流可达0.106A/cm2。     

铜掺杂氧化锌薄膜的阻变特性

采用脉冲激光沉积法在SnO<,2>:F(FTO)衬底上制备了单一c轴取向生长的ZnO和ZnO:Cu薄膜,并对具有Au/ZnO/FTO和Au/ZnO:Cu/FTO三明治结构的器件进行了阻变特性测试.结果显示:两种器件在室温电场作用下均显示出双极可逆变阻特性;Cu掺杂使ZnO薄膜的开关比大幅增加,电流-电压曲线拟合结果显示...     

Facile Preparation and Characterization of Poly (3-hexylthiophene)/Multiwalled Carbon Nanotube Thermoelectric Composite Films

This paper reports a novel, cost-effective, scalable, and simple method for preparing poly(3-hexylthiophene)/multiwalled carbon nanotube (P3HT/MWCNT) nanocomposite films. The P3HT/MWCNT films were prepared by oxidative polymerization of 3-hexylthiophene in chloroform solution containing dispersed MWCNT. The phase composition and microstructure of the composite films were analyzed by x-ray diffraction (XRD), Fourier-transform infrared spectroscopy, Raman spectroscopy, thermogravimetric analysis, and field-emission scanning electron microscopy. The composite films were smooth, dense, and uniform. The thermoelectric properties of the composite films were measured at room temperature. The electrical conductivity and Seebeck coefficient of the films with MWCNT content of 5?wt.% were ~1.3?×?10^?3?S/cm and 131.0???V/K, respectively.     

Effect of Zn/Cd ratio on the optical constants and photoconductive gain of ZnO–CdO crystalline thin films

Optical and photo-electrical properties of ZnO–CdO films with the ratio of Zn/Cd=1:0, 3:1, 1:1, 1:3 and 0:1 has been studied. XRD study confirms the combination of hexagonal ZnO and cubic CdO phase present in the polycrystalline sample. Atomic force microscopy results indicate that the crystal grains are agglomerated and surface roughness enhanced due to higher Cd concentration in ZnO. From optical studies, it is found that the transmittance and the band gap decreased as Cd content increased. Photoluminescence studies on ZnO–CdO films showed intense near-band edge emissions at room temperature and is attributed to recombination of excitons localized within band tail states likely caused by non-uniform Cd distribution in ZnO–CdO matrix. The dispersion of refractive index was analyzed by the Wemple–DiDomenico single-oscillator model. The third-order nonlinear polarizability is found high with higher concentration of cadmium at higher photon energies. Some other optical parameters such as dissipation factor, optical conductivity, interband transition strength, surface and volume energy loss have been calculated depending on dielectric constant evaluated from optical data. Finally, photoconductive gain and carrier lifetime have been calculated and found dependent on Zn/Cd ratio.     

掺钛氧化锌透明导电薄膜的制备及特性研究

利用直流磁控溅射法在室温水冷玻璃衬底上成功地制备出了掺钛氧化锌(ZnO:Ti)透明导电薄膜.研究了靶衬间距对ZnO:Ti薄膜结构、形貌和光电性能的影响.研究结果表明,靶衬间距对ZnO:Ti薄膜的结构和电阻率有显著影响.X射线衍射(XRD)表明,ZnO:Ti薄膜为六角纤锌矿结构的多晶薄膜,且具有c轴择优取向.在靶衬间距为4.6 cm时,实验获得的ZnO:Ti薄膜电阻率具有最小值4.18×10-4Ω·cm.实验制备的ZnO:Ti薄膜具有良好的附着性能,可见光区平均透过率超过92%.ZnO:Ti薄膜可以用作薄膜太阳能电池和液晶显示器的透明电极.     

On the mode of operation in electrolyte-gated thin film transistors based on different substituted polythiophenes

Organic Thin Film Transistors (OTFT), gated through an aqueous electrolyte, have extensively been studied as sensors in various applications. These water-gated devices are known to work both as electrochemical (Organic ElectroChemical Transistor – OECT) and field-effect (Organic Field-Effect Transistor – OFET) devices. To properly model and predict the response of water-gated OTFT sensors it is important to distinguish between the mechanism, field-effect or electrochemical, by which the transistor is modulated and thus how the gate signal can be affected by the analyte. In this present study we explore three organic polymer semiconductors, poly-(3-hexyl-thiophene) (P3HT), poly-(3-carboxy-pentyl-thiphene) (P3CPT) and a co-polymer P3HT–co-poly-(3-ethoxypentanoic acid-thiophene) (monomer ratio 1:6, P3HT–COOH15) in water-gated OTFT structures. We report a set of transistor characteristics, including standard output parameters, impedance spectroscopy and current transients, to investigate the origin of the mode of operation in these water-gated OTFTs. Impedance characteristics, including both frequency and voltage dependence, were recorded for capacitor stacks corresponding to the gate/electrolyte/semiconductor/source structure. It is shown that P3HT as well as P3HT–COOH15 both can function as semiconductors in water gated OTFT devices operating in field-effect mode. P3CPT on the other hand shows typical signs of electrochemical mode of operation. The –COOH side group has been suggested as a possible anchoring site for biorecognition elements in EGOFET sensors, rendering P3HT–COOH15 a possible candidate for such applications.     

用脉冲激光沉积方法制备的ZnO薄膜的结构及光致发光特性

在从室温到800℃的温度范围内,用脉冲激光沉积方法在Al₂O₃（0001）衬底上制备了ZnO薄膜。采用X射线衍射仪、原子力显微镜以及荧光光谱仪分别研究了衬底温度对ZnO薄膜表面形貌、结晶质量和光致发光特性的影响。X射线衍射仪和原子力显微镜的结果表明,当衬底温度从室温升高到400℃时,ZnO薄膜的结构及结晶质量逐渐提高,而当衬底温度超过400℃时,其结构和结晶质量变差;在400℃下生长的ZnO薄膜具有最佳的表面形貌和结晶质量。室温光致发光的测量结果表明,400℃下生长的ZnO薄膜的紫外发光强度最强,且发光波长最短（386 nm）。     

Al-N共掺杂ZnO:Mn稀磁半导体薄膜的结构与性能

采用反应磁控溅射法在室温下沉积前驱体氮化物,在大气环境、500℃下氧化退火30min后获得了Al-N共掺杂ZnO:Mn薄膜。研究了直流与射频反应磁控溅射对氧化退火薄膜结构和性能的影响。结果表明:两种工艺制备的退火薄膜均具有ZnO纤锌矿结构,且均为n型导电。射频溅射退火样品具有很好的c-轴择优取向,其表面光滑平整,表面粗糙度RMS值为1.2nm,且具有室温铁磁性,饱和磁化强度(Ms)和矫顽力(Hc)分别为46.8A·m–1和4.9×103A·m–1;而直流溅射退火样品表面凹凸不平,RMS值为25.8nm,室温下是反铁磁性的。     

Influences of ZnO buffer layers on the quality of ZnO films synthesized by the metal-organic chemical vapor deposition process

High-quality ZnO thin films were prepared by metal-organic chemical vapor deposition (MOCVD) on a sapphire (a-Al₂O₃) substrate. The synthesis of ZnO films was performed over a substrate temperature of 400–700°C and at chamber pressures of 0.1–10 torr. The structural and optical properties of ZnO films were investigated in terms of deposition conditions, such as substrate temperature, working pressure, and the ratio of Zn precursor (Diethylzinc (DEZn)) to oxygen. The ZnO films, preferentially oriented to 34.42° diffraction because of the (002) plane, were obtained under processing conditions of 700°C and 3 torr. This film shows a full-width at half-maximum (FWHM) of 0.4–0.6°. The results of photoluminescence (PL) spectroscopy also show a strong near band-edge emission at 3.36 eV at 10 K as well as a very weak emission at deep levels around 2.5 eV at room temperature. In addition, we are interested in the introduction of ZnO buffer-layer growth by the sputtering process to reduce lattice mismatch stress. This paper addresses how to advance the crystalline and optical properties of film. The ZnO film grown with the aid of a buffer layer shows a FWHM of 0.06–0.1° in the x-ray diffraction (XRD) pattern. This result indicates that crystalline properties were highly improved by the ZnO buffer layers. The PL spectroscopy data of ZnO film also shows a strong near band-edge emission and very weak deep-level emission similar to films synthesized without a buffer layer. Accordingly, synthesized ZnO films with buffer layers indicate fairly good optical properties and low defect density as well as excellent crystallinity.     

Influence of annealing temperature of ZnO film as the electron transport layer on the performance of polymer solar cells

The surface morphology of ZnO films at different annealing temperatures and the performance of polymer solar cells (PSCs) with ZnO as the electron transport layer are studied. The low temperature sol-gel processed ZnO film has smoother surface than that in higher temperature, which results in the best photovoltaic performance with a power conversion efficiency (PCE) of 3.66% for P3HT:PC61BM based solar cell. With increasing annealing temperature, the photovoltaic performance first deceases and then increases. It could be ascribed to the synergy effects of interface area, the conductivity and surface energy of ZnO film and series resistance of devices.     

柔性衬底硅薄膜太阳电池中ZGO薄膜的应用

在室温下,采用孪生对靶直流磁控溅射工艺,在玻璃衬底上制备出高质量的Ga掺杂ZnO(ZnO:Ga)透明导电膜。研究了薄膜厚度对薄膜的结构、光学及电学特性的影响。制备的ZnO:Ga是具有六角纤锌矿结构的多晶薄膜,最佳择优取向为(002)方向。随着薄膜厚度的增加,衍射峰明显增强,晶粒增大。优化反应条件,薄膜的电阻率达到4.69×10-4Ω.cm,在可见光范围内平均透过率达到了85%以上。将不同厚度的ZnO:Ga薄膜(350～820 nm)在柔性聚酰亚胺衬底nip非晶硅(a-Si)薄膜太阳电池中,随厚度的增加,电池的填充因子和效率都得到了提高,得到聚酰亚胺衬底效率7.09%的a-Si薄膜太阳电池。     

衬底温度对脉冲激光沉积制备ZnO性能的影响

本文采用脉冲激光沉积（PLD）(KrF准分子激光器：波长248 nm,频率5Hz,脉冲宽度20 ns）方法在氧气气氛中以高纯Zn（99.999%）为靶材、在单晶硅和石英衬底表面成功生长了ZnO薄膜。通过X射线衍射仪、表明轮廓仪、荧光光谱仪、紫外可见分光光度计对合成薄膜材料的晶体结构、厚度、光学性质等进行了研究,分析了衬底温度变化对其性能的影响。实验结果表明我们使用PLD法在室温下可以制备出了高度结晶取向、高透过率和近带边发射的高质量ZnO薄膜。     

制备工艺对ZnO薄膜的结构与光学性质的影响

利用射频磁控反应溅射技术生长出具有高度晶面(0002)取向的ZnO外延薄膜。通过AFM、XRD、吸收光谱和荧光光谱等测试手段,分别研究分析了不同衬底、不同溅射气氛和退火对ZnO薄膜结构及光学性质的影响。研究表明,在200℃低温生长的硅基ZnO薄膜具有几百纳米的氧化锌准六角结构外形;当氧氩比为4:1(质量流量比)时,吸收谱激子峰最佳;退火后,激子峰(363 nm)加强,同时出现了402 nm的本征氧空位紫光发射。     

Hybrid ZnO-organic semiconductor interfaces in photodetectors: A comparison of two near-infrared donor-acceptor copolymers

Hybrid organic-inorganic photodiode interfaces have gained significant interest due to their unique physical properties such as mechanical flexibility and high photosensitivity. Two diketopyrrolopyrrole (DPP)-based donor-acceptor copolymers with different backbone conformations are characterized in an inverted non-fullerene photodiode architecture using ZnO nano-patterned films as the electron transport layer. The DPP copolymer with a thienothiophene unit (PBDT-TTDPP) is more planar and rigid compared to the DPP system with a thiophene unit connecting the donor and acceptor moieties within the monomer (PBDT-TDPP). The hybrid interfaces were optimized by using poly(3-hexylthiophene) (P3HT) as the p-type layer for monitoring the critical thickness and morphology of the ZnO layer. The maximum photoresponsivity from a P3HT:ZnO photodiode was found to be 56 mA/W. The photoresponsivity of PBDT-TTDPP:ZnO photodiodes were found to be more than two orders of magnitude higher than PBDT-TDPP:ZnO photodiodes, which is attributed to an enhanced transport of carriers due to the planar backbone conformation of the PBDT-TTDPP copolymer. Capacitance-voltage measurements from hybrid Schottky barrier interfaces further shed light into the nature of photocarriers and device parameters. First-principles time-dependent density-functional theoretical calculations yield a higher absorptivity for the PBDT-TTDPP dimer compared to PBDT-TDPP.