Microstructure and optical band gap control of DLC film deposited by pulsed discharge plasma CVD

DLC films were deposited on silicon and quartz glass substrates by pulsed discharge plasma chemical vapor deposition (CVD), where the plasma was generated by pulsed DC discharge in H₂–CH₄ gas mixture at about 90 Torr in pressure, and the substrates were located near the plasma. The repetition frequency and duty ratio of the pulse were 800 Hz and 20%, respectively. When CH₄ / (CH₄ + H₂) ratio, i.e. methane concentration (Cm), increased from 3 to 40%, C₂ species in the plasma was increased, and corresponding to the increase of C₂, deposition rate of the film was increased from about 0.2 to 2.4 μm/h. The absorption peaks of sp³C–H and sp²C–H structures were observed in the FT-IR spectra, and the peak of sp²C–H structure was increased with increasing Cm, showing that sp² to sp³ bonding ratio was increased when Cm was increased. Corresponding to these structural changes due to the increase of Cm, optical band gap (Eg) was decreased from 3 to 0.5 eV continuously when Cm was increased from 3 to 40%.     

Comparison of the wear particle size distribution of different a-C coatings deposited by vacuum arc

For biomedical application in the field of artificial hip joints diamond-like carbon (DLC) coatings have been widely studied due to their tribological properties. The wear particles as the main factor limiting the life expectancy of hip joints have attracted more and more interest, not only the number of them, but also the distribution of their size. In this study we have deposited DLC coatings on stainless steel (P2000) by a vacuum arc adjustable from anodic to cathodic operation mode, with the anode–cathode diameter ratio of d_a/d_c = 3/1 at a DC bias of − 250 V to − 1000 V. To improve the adhesion of the DLC coating on P2000, titanium as a metallic interlayer was deposited by cathodic vacuum arc evaporation. The internal structure of the coating was investigated by the visible Raman spectroscopy with the four-Gaussian curve fitting method. Comparing the results with the previous work (coatings deposited with d_a/d_c = 1/1), it was found that the anode–cathode diameter ratio has an effect on the structure (e.g. I_D/I_G) as well as the wear particle size distribution. It was shown that the maximum of the frequency distribution e.g. at − 1000 V bias can be shifted to below 1 μm with increasing d_a/d_c.     

Growth of diamond by DC Arcjet Plasma CVD: From nano-sized poly-crystal films to millimeter-sized single crystal grain

A 30 kW-powered DC Arcjet Plasma enhanced chemical-vapor deposition (CVD) system was applied to grow diamonds which included the nano-crystal free-standing film, the nano-/micro-crystal layered free-standing film, the gradient micro-crystal free-standing film and the millimeter-sized grain. The free-standing film quality, such as the roughness, the sp² content, the residual stress and the grain morphology, was studied by an atomic force microscope (AFM), Raman spectra, a scanning electron microscope (SEM) and a high resolution electron microscope (HREM). In large-sized grain deposition, as-grown deposit was obtained about 1 × 1 × 1 mm³ in size under the condition of 10 μm/h of the substrate moving speed without Nitrogen enhancement. Characterized by Raman spectra and Laue back reflection X-ray diffraction, the deposit was proven to be single crystal diamond with small grains coving its surfaces. The growth rate was about 30 μm/h. Optical emission spectrum (OES) was utilized to characterize gas phases in the plasma for diamond deposition. The mean electron temperature (Te) in the plasma was calculated based on the value of the emission intensity ratio of I_Hγ/I_Hβ. Te varied from 0.33 eV to 0.5 eV depending on the concentration of CH₄ in H₂ from 1.0% to 25%. C₂ radical was found to be the dominant carbon source compared with CH radical. The influence of the radical on the morphology of diamond was discussed. It was found that the nano-crystal could be grown when the ratio of the emission intensity, I_C2/I_CH, was larger than 8.     

Preparation of diamond like carbon thin films above room temperature and their properties

Diamond like carbon (DLC) thin films were deposited on p-type silicon (p-Si), quartz and ITO substrates by microwave (MW) surface-wave plasma (SWP) chemical vapor deposition (CVD) at different substrate temperatures (RT ∼ 300 °C). Argon (Ar: 200 sccm) was used as carrier gas while acetylene (C₂H₂: 20 sccm) and nitrogen (N: 5 sccm) were used as plasma source. Analytical methods such as X-ray photoelectron spectroscopy (XPS), FT-IR and UV–visible spectroscopy were employed to investigate the structural and optical properties of the DLC thin films respectively. FT-IR spectra show the structural modification of the DLC thin films with substrate temperatures showing the distinct peak around 3350 cm^− 1 wave number; which may corresponds to the sp² C–H bond. Tauc optical gap and film thickness both decreased with increasing substrate temperature. The peaks of XPS core level C 1 s spectra of the DLC thin films shifted towards lower binding energy with substrate temperature. We also got the small photoconductivity action of the film deposited at 300 °C on ITO substrate.     

Influence of nitrogen plasma post-treatment on diamond-like carbon films synthesized by RF plasma enhanced chemical vapor deposition

DLC films were synthesized by RF plasma enhanced chemical vapor deposition and the effects of nitrogen plasma post-treatment at different pressures on the structure and properties of DLC films were investigated. Higher roughness was obtained after plasma post-treatment at higher pressures (0.3 and 0.9 torr) and plasma post-treatment at a lower pressure (0.15 torr) resulted in lower roughness than that of original films. The hardness of DLC films decreased with the decrease of post-treatment pressure, which is consistent with the Raman results of I_D/I_G ratio and G peak position. Compared to the original DLC film, the residual stress after plasma post-treatment decreased slightly due to the relatively thin region involved in the plasma post-treatment.     

Cross-sectional hydrogen content and mass density profiles of diamond-like carbon film by neutron and X-ray reflectivity

The cross-sectional profiles of hydrogen content and mass density of diamond-like carbon (DLC) film were investigated using X-ray and neutron reflectivity. DLC films were prepared using a plasma CVD technique by varying the H₂/(H₂ + CH₄) ratio gas source from 0 to 0.9. The cross-sectional hydrogen content and mass density profiles of the films were calculated by neutron and X-ray reflectivity, and the results were compared with those from elastic recoil detection analysis (ERDA).The fitted simulation showed that the mass density gradually decreased with increasing depth, whereas the hydrogen content increased with depth. In both ERDA and reflectivity measurements, the average hydrogen content was more than 30% in all films and tended to increase with the H₂/(CH₄ + H₂) ratio. However, there was a difference in hydrogen content values between the two analyses ranging from 5.1 % to 8.5%.     

Electron field emission from filtered arc deposited diamond-like carbon films using Au and Ti layers

In this work, tetrahedral diamond-like carbon (DLC) films are deposited on Si, Ti/Si and Au/Si substrates by a new plasma deposition technique — filtered arc deposition (FAD). Their electron field emission characteristics and fluorescent displays of the films are tested using a diode structure. It is shown that the substrate can markedly influence the emission behavior of DLC films. An emission current of 0.1 μA is detected at electric field E_DLC/Si=5.6 V/μm, E_DLC/Au/Si=14.3 V/μm, and E_DLC/Ti/Si=5.2 V/μm, respectively. At 14.3 V/μm, an emission current density J_DLC/Si=15.2 μA/cm², J_DLC/Au/Si=0.4 μA/cm², and J_DLC/Ti/Si=175 μA/cm² is achieved, respectively. It is believed that a thin TiC transition layer exists in the interface between the DLC film and Ti/Si substrate.     

Molecular structure of SiOx-incorporated diamond-like carbon films; evidence for phase segregation

Silicon-oxide incorporated amorphous hydrogenated diamond-like carbon films (SiO_x–DLC, 1 ≤ x ≤ 1.5) containing up to 24 at.% of Si (H is excluded from the atomic percentage calculations reported here) were prepared using pulsed direct current plasma-enhanced chemical vapour deposition (DC-PECVD). Molecular structure, optical properties and mechanical properties of these films were assessed as a function of Si concentration. The spectroscopic results indicated two structural regimes. First, for Si contents up to ~ 13 at.%, SiO_x–DLC is formed as a single phase with siloxane, O–Si–C₂, bonding networks. Second, for films with Si concentrations greater than 13 at.%, SiO_x–DLC with siloxane bonding and SiO_x deposit simultaneously as segregated phases. The variations in mechanical properties and optical properties as a function of Si content are consistent with the above changes in the film composition.     

Structure and characteristics of amorphous (Ti,Si)–C:H films deposited by reactive magnetron sputtering

The hydrogenated amorphous carbon films doped with Ti and Si ((Ti,Si)–C:H) were deposited on silicon substrates using reactive magnetron sputtering Ti₈₀Si₂₀ composite target in an argon and methane gas mixture. The structures of the films were analyzed by X-ray photoelectron spectroscopy and Visible Raman spectroscopy. The morphologies were observed by atomic force microscope. The friction coefficients of the films were tested on the ball-on-disc tribometer. The results indicate that the sp³/sp² ratios in the films can be varied from 0.18 to 0.63 by changing Ti and Si contents at various CH₄ flow rates. The surface of the films becomes smoother and more compact as the CH₄ flow rate increases. The lowest friction coefficient is as low as 0.0139 for the film with Ti of 4.5 at.% and Si of 1.0 at.%. Especially, the film exhibits a superlow value (μ < 0.01) under ambient air with 40% relative humidity in friction process. The superlow friction coefficient in ambient air may be, attributable to synergistic effects of a combination of Ti and Si in the film.     

Thin-film nanocomposites of diamond-like carbon and titanium oxide; Osteoblast adhesion and surface properties

Thin films of a novel, nanocomposite material consisting of diamond-like carbon and polycrystalline/amorphous TiO_x (DLC-TiO_x, x ≤ 2) were prepared using pulsed direct-current plasma enhanced chemical vapour deposition (PECVD). Results from Raman spectroscopy indicate that the DLC and TiO_x deposit primarily as segregated phases. Amorphous TiO₂ is found to be present on the surface region of the film and there is evidence for the presence of crystalline TiO in the bulk of the film. The hydrophilicity of the DLC-TiO_x films increased with increasing titanium content. Culture studies with human osteoblasts revealed that the differences in three-day cell adhesion properties (count, morphology and area) between DLC and DLC-TiO_x films containing up to 13 at.% Ti were not statistically significant. However, the cell count was significantly greater for the films containing 3 at.% of Ti in comparison to those containing 13 at.% of Ti. A post-plasma treatment with Ar/O₂ was used to reduce the water contact angle, θ, by nearly 40° on the DLC-TiO_x films containing 3 at.% of Ti. A cell culture study found that the osteoblast count and morphology after three days on these more hydrophilic films did not differ significantly from those of the original DLC-TiO_x films. We compare these results with those for SiO_x-incorporated DLC films and evaluate the long-term osteoblast-like cell viability and proliferation on modified DLC surfaces with water contact angles ranging from 22° to 95°.     

Structure–property–processing relationships of single-wall carbon nanotube thin film piezoresistive sensors

In an investigation of structure–property–processing relationships for SWCNT thin film piezoresistive sensors, the gauge factor of the sensors for a small tensile deformation (less than 2% strain) was found to be close to unity and showed negligible dependence on the film thickness and SWCNT bundle length (L) and diameter (d). However, for a large tensile deformation (20–30% strain), the film thickness and the microstructure of SWCNTs had a compounding effect on the piezoresistive behavior. A gauge factor of ∼5 was obtained for the sensors fabricated with SWCNT bundles of short length and thin diameter (L = 549 nm and d = 3.7 nm) with thicker films. Furthermore, the gauge factor of the sensors was found inversely proportional to the excluded volume V_ex of SWCNT bundles (V_ex ∝ 1/L² d).     

Effect of increasing hardness on Si-containing diamond-like carbon film during tribo-test

In this study, silicon-DLC film has been especially treated by plasma-enhanced chemical vapor deposition (PECVD) process at 500 °C in the same chamber without compound-layer for enhancement of hardness and adhesion. The effects of different levels of silicon content on the silicon-containing DLC films were tested in air condition at room temperature with relative humidity using a ball-on-disk tribometer. After the wear test, Raman spectrum analysis on the tested surface of silicon DLC showed the changed structure on the surface. Especially, it has shown the increasing hardness value in proportional to increase TMS gas rate after wear test. At the same time, it was shown that I_D/I_G values increased higher G-peak values and positions on wear track of silicon-containing DLC surfaces. Therefore, the structure of the coated DLC surface changed between the wear-tested surface and the original surface. High silicon content DLC showed increased I_G value with suddenly increased I_D/I_G value after the wear test.     

Improving the POM performance of YBa2Cu3O7−δ membrane reactor by Co doping

The performance of Co doped YBa₂Cu₃O_7−δ (YBCO) membrane reactor have been investigated in a process of the partial oxidation of methane (POM) to syngas. The results shows that doping YBCO membrane with a little Co can enhance its oxygen permeation flux and improve its stability in reducing atmosphere noticeably. At 900 °C, with feed flow at 50 ml/min, CH₄ 6.0 v%, SV = 12,000 h⁻¹, and Ni/ZrO₂ catalyst, CH₄ conversion rate, CO selectivity, and oxygen permeation flux can reach to 98%, 92% and 1.41 ml min⁻¹ cm⁻² respectively.     

Preparation,characterization and properties of Cr-incorporated DLC films on magnesium alloy

Cr-incorporated diamond-like carbon (Cr-DLC) films were deposited on AZ31 magnesium alloy as protective coatings by a hybrid beams deposition system, which consists of a DC magnetron sputtering of Cr target (99.99%) and a linear ion source (LIS) supplied with CH₄ precursor gas. The Cr concentration (from 2.34 to 31.5 at.%) in the films was controlled by varying the flow ratio of Ar/CH₄. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) were used to investigate the microstructure and composition of Cr-DLC films systematically. An electrochemical system and a ball-on-disk tribotester were applied to test the corrosion and tribological properties of the film on the AZ31 substrate, respectively. At low Cr doping (2.34 at.%), the film mainly exhibited the feature of amorphous carbon, while at high doping (31.5 at.%), chromium carbide crystalline phase occurred in the amorphous carbon matrix of the film. In this study, all the prepared Cr-DLC films showed higher adhesion to AZ31 than the DLC film. Especially for the film with low Cr doping (2.34 at.%), it owned the lowest internal stress and the highest adhesion to substrate among all the films. Furthermore, this film could also improve the wear resistance of magnesium alloy effectively. But, none of the films could improve the corrosion resistance of the magnesium alloy in 3.5 wt.% NaCl solution due to the existence of through-thickness defects in the films.     

Production and properties of substituted LaFeO3-perovskite tubular membranes for partial oxidation of methane to syngas

Tubular membranes of La_0.6Ca_0.4Fe_0.75Co_0.25O_3−δ and La_0.5Sr_0.5Fe_1−yTi_yO_3−δ (y = 0, 0.2) for the application of partial oxidation of methane to syngas were produced by thermoplastic extrusion and investigated by oxygen permeation measurements. The optimum ceramic content in the feedstock for extrusion was found to be 51 vol% as a result of rheology measurements. Tubes with an outer diameter of 4.8–5.5 mm and thickness of 0.25–0.47 mm were produced with densities higher than 95% of the theoretical density. The oxygen permeation flux of the tubular membranes was measured with air on one side and Ar or Ar + CH₄ mixture on the other side. The oxygen permeation rate decreased with Ti-substitution while it was considerably increased by introduction of 5% methane into the system. The normalized oxygen fluxes in air/Ar gradient at 900 °C were measured to be 0.06, 0.051, and 0.012 μmol cm⁻² s⁻¹ for LCFC, LSF, and LSFT2, respectively, and 0.18 μmol cm⁻² s⁻¹ for LSFT2 with 5% methane.     

The effect of refractive index on the friction coefficient of DLC coated polymer substrates

This paper describes the enhanced mechanical performance that can be achieved by the application of diamond-like carbon (DLC) coatings to polymer substrates. The polymers coated are silicone and polyethylene, and the effect on the friction coefficient is studied. Film adhesion is found to depend on the DLC film refractive index (n), whereas the friction is largely independent of n in the range studied. Films were deposited from a He/C₂H₂ mixture at 20 Pa (0.15 Torr) on to the polymer substrates placed on a 10-cm-diameter electrode driven at 13.56 MHz. Film growth was monitored by in-situ ellipsometry (at 675 nm), which was performed on a glass slide placed near the polymer substrate. Friction measurements were obtained using a pin-on-disk tribometer, and measurements were carried out using a stainless-steel pin at a linear speed of 6 cm s⁻¹. Film adhesion was evaluated using a pull-adhesion tester. It was found that DLC coatings adhere well to the polymer substrates and can significantly reduce the friction coefficient of polymers such as silicone. Higher refractive index films (which are harder and have a higher mechanical strength) were found to have a poorer adhesion and provide a slightly increased friction on the polymer surface when compared to lower-index films. This study indicates that DLC may be used to enhance the tribological properties of polymers with potential applications in the biomaterials and light-engineering industries.     

Methane oxidation by lattice oxygen of CeNbO4+δ

The reactivity of methane with lattice oxygen of cerium niobate, CeNbO_4+δ, was studied by temperature-programmed reduction (TPR) in dry CH₄ flow at 523–1073 K. Phase transformations and reduction of cerium niobate at 900–1023 K lead to a massive release of hyperstoichiometric oxygen, in amounts determined by the intermediate-temperature phase composition dependent on thermal history. In this temperature range, CH₄–TPR shows prevailing formation of carbon monoxide and steam, suggesting that the synthesis gas generation occurs in parallel with extensive oxidation of H₂ on the cerium niobate surface. At 1073 K when δ → 0, the reaction of methane with CeNbO_4+δ selectively yields synthesis gas with H₂/CO ratio close to two.     

Ferroelectric and dielectric properties of manganese-doped Na0.5Bi0.5TiO3 nanocrystalline thin films prepared by metal organic decomposition: A single-layer thickness-dependent study

2 at% Manganese-doped Na_0.5Bi_0.5TiO₃ (NBTMn) thin films with single-layer thicknesses ranging from 15 to 45 nm/l were deposited on the indium tin oxide/glass substrates by a metal organic decomposition process and spin coating technique. The influence of single-layer thickness on the crystal structure, surface morphology, insulating ability, ferroelectric and dielectric properties was mainly investigated. Compared with the other films, NBTMn film with a single-layer thickness of 30 nm/l exhibits the (110)-preferred orientation and dense structure. Also, it shows the enhanced ferroelectricity with a large remanent polarization (P_r) of 38 μC/cm² due to the preferred orientation and low leakage current density. Meanwhile, a high dielectric tunability of 39% for NBTMn with 30 nm/l can be observed by varying the measuring applied voltage and frequency. These results indicate that the suitable layer thickness is beneficial to improve the electrical performances of NBTMn thin film.     

Electrochemical properties of lithium nickel oxide synthesized by the combustion method in an O2 stream

An appropriate mole ratio of urea/nitrate for preheating to synthesize LiNiO₂ was examined by varying the ratio from 1.2 to 9.6. The chemical equation of the combustion reaction was deduced from the XRD analysis result of the mixture after preheating. The XRD pattern of the LiNiO₂ sample calcined at 800 °C for 24 h, after preheating at the mole ratio of urea/nitrate of 3.6 at 400 °C, shows clear split of the 1 0 8 and 1 1 0 peaks, and the largest value of I₀₀₃/I₁₀₄. The sample calcined at 800 °C for 24 h has a relatively high first discharge capacity (164.2 mAh g^?1) and a good cycling performance. Derivative ?dx/|dV| vs. V curve of the LiNiO₂ sample at the voltage range of 2.7–4.4 V for the first cycle exhibits four peaks for charging and discharging, showing that this sample goes through four phase transitions.     

Fabrication of fluorine-terminated diamond-like carbon thin film using a hyperthermal atomic fluorine beam

Surface modification of diamond-like carbon (DLC) film was performed using a hyperthermal atomic fluorine beam on the purpose of production of hydrophobic surface by maintaining the high hardness of DLC film. By the irradiation of atomic fluorine beam of a 1.0 × 10²⁰ atoms/cm², the contact angle of a water drop against the DLC surface increased from 73° to 111°. The formation of CF₃, CF₂ and CF bonding on the modified DLC surface was confirmed from the measurements of X-ray photoelectron spectra and near-edge X-ray absorption fine structure spectra. Irradiation of hyperthermal atomic fluorine beam was concluded to produce insulator fluorine-terminated DLC film, which has high F content on the surface, by the taking of the use of neutral atomic beam as a fluorine source.