Structural and mechanical properties of DLC films prepared by bipolar PBII&D

In the present study, diamond-like carbon (DLC) films were prepared by bipolar plasma based ion implantation and deposition (PBII&D), and the structural and mechanical properties of the DLC films deposited on Si substrates were evaluated by Raman spectroscopy. In the PBII&D processing, the positive and negative pulse voltages were varied from 1 to 3 kV and from ? 1 to ? 15 kV, respectively. With an increase in the pulse voltages, the Raman G-peak position and I(D) / I(G) ratio increased, and the G-peak full width at half maximum (FWHM(G)) decreased, indicating graphitization of the DLC films. In the low wavenumber regime, the FWHM(G) increases when the G-peak shifts to higher wavenumbers, reaching a maximum value at around 1540 cm^? 1, and then decreases. This behavior was due to the structural changes occurring in the DLC films with an increase in the wavenumber. DLC to polymer-like carbon (PLC) transition occurred in the low wavenumber regime, and DLC to graphite-like carbon (GLC) transition occurred in the high wavenumber regime. Further, two different trends were observed in the relationship between the mechanical properties (hardness, elastic modulus, and internal stress) of the DLC films and the FWHM(G), originating from the structural change from DLC to GLC and PLC.     

Synthesis and mechanical properties of carbon nanotube/diamond-like carbon composite films

Diamond-like carbon (DLC) coatings were successfully deposited on carbon nanotube (CNT) films with CNT densities of 1 × 10⁹/cm², 3 × 10⁹/cm², and 7 × 10⁹/cm² by a radio frequency plasma-enhanced chemical vapor deposition (CVD). The new composite films consisting of CNT/DLC were synthesized to improve the mechanical properties of DLC coatings especially for toughness. To compare those of the CNT/DLC composite films, the deposition of a DLC coating on a silicon oxide substrate was also carried out. A dynamic ultra micro hardness tester and a ball-on-disk type friction tester were used to investigate the mechanical properties of the CNT/DLC composite films. A scanning electron microscopic (SEM) image of the indentation region of the CNT/DLC composite film showed a triangle shape of the indenter, however, chippings of the DLC coating were observed in the indentation region. This result suggests the improvement of the toughness of the CNT/DLC composite films. The elastic modulus and dynamic hardness of the CNT/DLC composite films decreased linearly with the increase of their CNT density. Friction coefficients of all the CNT/DLC composite films were close to that of the DLC coating.     

Deposition and characterization of diamond-like carbon films by microwave resonator microplasma at one atmosphere

Diamond-like carbon (DLC) films have been deposited at atmospheric pressure by microwave-induced microplasma for the first time. Typical precursor gas mixtures are 250 ppm of C₂H₂ in atmospheric pressure He. Chemically resistant DLC films result if the Si (100) or glass substrate is in close contact with the microplasma, typically at a standoff distance of 0.26 mm. The films deposited under this condition have been characterized by various spectroscopic techniques. The presence of sp³ CH bonds and ‘D’ and ‘G’ bands were observed from FTIR and Raman spectroscopy, respectively. The surface morphology has been derived from SEM and AFM and shows columnar growth with column diameters of approximately 100 nm. Likely due to the low energy of ions striking the surface, the hardness and Young's modulus for the films were found to be 1.5 ± 0.3 GPa and 60 ± 15 GPa respectively with a film thickness of 2 μm. The hypothesis that a high flux of low energy ions can replace energetic ion bombardment is examined by probing the plasma. Rapid deposition rates of 4–7 μm per minute suggest that the method may be scalable to continuous coating systems.     

Electron field emission from filtered arc deposited diamond-like carbon films using Au and Ti layers

In this work, tetrahedral diamond-like carbon (DLC) films are deposited on Si, Ti/Si and Au/Si substrates by a new plasma deposition technique — filtered arc deposition (FAD). Their electron field emission characteristics and fluorescent displays of the films are tested using a diode structure. It is shown that the substrate can markedly influence the emission behavior of DLC films. An emission current of 0.1 μA is detected at electric field E_DLC/Si=5.6 V/μm, E_DLC/Au/Si=14.3 V/μm, and E_DLC/Ti/Si=5.2 V/μm, respectively. At 14.3 V/μm, an emission current density J_DLC/Si=15.2 μA/cm², J_DLC/Au/Si=0.4 μA/cm², and J_DLC/Ti/Si=175 μA/cm² is achieved, respectively. It is believed that a thin TiC transition layer exists in the interface between the DLC film and Ti/Si substrate.     

Preparation,characterization and properties of Cr-incorporated DLC films on magnesium alloy

Cr-incorporated diamond-like carbon (Cr-DLC) films were deposited on AZ31 magnesium alloy as protective coatings by a hybrid beams deposition system, which consists of a DC magnetron sputtering of Cr target (99.99%) and a linear ion source (LIS) supplied with CH₄ precursor gas. The Cr concentration (from 2.34 to 31.5 at.%) in the films was controlled by varying the flow ratio of Ar/CH₄. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) were used to investigate the microstructure and composition of Cr-DLC films systematically. An electrochemical system and a ball-on-disk tribotester were applied to test the corrosion and tribological properties of the film on the AZ31 substrate, respectively. At low Cr doping (2.34 at.%), the film mainly exhibited the feature of amorphous carbon, while at high doping (31.5 at.%), chromium carbide crystalline phase occurred in the amorphous carbon matrix of the film. In this study, all the prepared Cr-DLC films showed higher adhesion to AZ31 than the DLC film. Especially for the film with low Cr doping (2.34 at.%), it owned the lowest internal stress and the highest adhesion to substrate among all the films. Furthermore, this film could also improve the wear resistance of magnesium alloy effectively. But, none of the films could improve the corrosion resistance of the magnesium alloy in 3.5 wt.% NaCl solution due to the existence of through-thickness defects in the films.     

Growth and properties of hydrogen-free DLC films deposited by surface-wave-sustained plasma

Hydrogen-free diamond-like carbon (DLC) films were deposited by a new surface-wave-sustained plasma physical vapor deposition (SWP-PVD) system in various conditions. Electron density was measured by a Langmuir probe; the film thickness and hardness were characterized using a surface profilometer and a nanoindenter, respectively. Surface morphology was investigated using an atomic force microscope (AFM). It is found that the electron density and deposition rate increase following the increase in microwave power, target voltage, or gas pressure. The typical electron density and deposition rate are about 1.87 × 10¹¹–2.04 × 10¹² cm^− 3 and 1.61–14.32 nm/min respectively. AFM images indicate that the grain sizes of the films change as the experimental parameters vary. The optical constants, refractive index n and extinction coefficient k, were obtained using an optical ellipsometry. With the increase in microwave power from 150 to 270 W, the extinction coefficient of DLC films increases from 0.05 to 0.27 while the refractive index decreases from 2.31 to 2.11.     

Wear-corrosion behavior of ultra-thin diamond-like carbon nitride films on aluminum alloy

Diamond-like carbon films exhibit high hardness, high wear resistance and a low friction coefficient. They are extensively utilized in the mechanical, electronic and biomedical industries. This work evaluates the effect of the thickness of ultra-thin diamond-like carbon nitride films on their corrosion properties and their wear-corrosion resistance in a mixed 1 M NaCl + 1 M H₂SO₄ solution using electrochemical methods. The corrosion current density and weight loss of all films during and after wear-corrosion test are also recorded. This work employs ion beam-assisted deposition (IBAD) to deposit DLC nitride films of various thicknesses (1.5, 2.0, 2.5 and 3.0 nm), containing 60% nitrogen gas in the form of a gaseous mixture of C₂H₂ + 60%N₂. The thickness of the films was measured using a transmission electron microscope (TEM). The atomic bonding structures of these DLC nitride films are analyzed using a Raman spectrometer and by electron spectroscopy for chemical analysis (ESCA). A scanning electron microscope (SEM) was adopted to elucidate the surface morphologies of the specimens after corrosion and wear-corrosion. The results indicated that all of the nitrogen-containing DLC films excellently protected the 5088 Al–Mg alloy substrate with an electroless plated Ni–P interlayer against corrosion, and that the degree of protection increases with the thickness of the film. In the wear-corrosion tests various potentials were applied during wear in the particular corrosive solution. The results further demonstrated that the wear-corrosion resistance of all the nitrogen-containing DLC films was as effective as corrosion protection, and that the wear-corrosion loss decreased as the film thickness increased.     

Effect of substrate bias voltage on the properties of diamond-like carbon thin films deposited by microwave surface wave plasma CVD

Diamond-like carbon (DLC) thin films were deposited on silicon and ITO substrates with applying different negative bias voltage by microwave surface wave plasma chemical vapor deposition (MW SWP-CVD) system. The influence of negative bias voltage on optical and structural properties of the DLC film were investigated using X-ray photoelectron spectroscopy, UV/VIS/NIR spectroscopy, Fourier transform infrared spectroscopy and Raman spectroscopy. Optical band gap of the films decreased from 2.4 to 1.7 with increasing negative bias voltage (0 to − 200 V). The absorption peaks of sp³ CH and sp² CH bonding structure were observed in FT-IR spectra, showing that the sp²/sp³ ration increases with increasing negative bias voltage. The analysis of Raman spectra corresponds that the films were DLC in nature.     

Electrical and optical properties of diamond-like carbon films deposited by pulsed laser ablation

Pulsed laser ablation of a graphite target was carried out by ArF excimer laser deposition at a laser wavelength of 193 nm and fluences of 10 and 20 J/cm² to produce diamond-like carbon (DLC) films. DLC films were deposited on silicon and quartz substrates under 1 × 10^? 6 Torr pressure at different temperatures from room temperature to 250 °C. The effect of temperature on the electrical and optical properties of the DLC films was studied. Laser Raman Spectroscopy (LRS) showed that the DLC band showed a slight increase to higher frequency with increasing film deposition temperature. Spectroscopic ellipsometry (SE) and ultraviolet–visible absorption spectroscopy showed that the optical band gap of the DLC films was 0.8–2 eV and decreased with increasing substrate temperature. These results were consistent with the electrical resistivity results, which gave values for the films in the range 1.0 × 10⁴–2.8 × 10⁵ Ω cm and which also decreased with deposition temperature. We conclude that at higher substrate deposition temperatures, DLC films show increasing graphitic characteristics yielding lower electrical resistivity and a smaller optical band gap.     

Influence of nitrogen plasma post-treatment on diamond-like carbon films synthesized by RF plasma enhanced chemical vapor deposition

DLC films were synthesized by RF plasma enhanced chemical vapor deposition and the effects of nitrogen plasma post-treatment at different pressures on the structure and properties of DLC films were investigated. Higher roughness was obtained after plasma post-treatment at higher pressures (0.3 and 0.9 torr) and plasma post-treatment at a lower pressure (0.15 torr) resulted in lower roughness than that of original films. The hardness of DLC films decreased with the decrease of post-treatment pressure, which is consistent with the Raman results of I_D/I_G ratio and G peak position. Compared to the original DLC film, the residual stress after plasma post-treatment decreased slightly due to the relatively thin region involved in the plasma post-treatment.     

High surface area diamond-like carbon electrodes grown on vertically aligned carbon nanotubes

Electrochemically active diamond-like carbon (DLC) electrodes featuring high specific surface area have been prepared by plasma-enhanced chemical vapour deposition (CVD) onto densely packed forests of vertically aligned multiwall carbon nanotubes (VACNTs). The DLC:VACNT composite film exhibits a complex topography with web like features and ridges generated by partial coalescence of the DLC over the CNT arrays. DLC:VACNT electrodes exhibit low background responses over a large potential window, low uncompensated resistance, as well as low charge-transfer impedance in the presence of ferrocyanide as a redox probe. The interfacial capacitance associated with the DLC:VACNT electrode is in the range of 0.6 mF cm⁻², a value two orders of magnitude larger than in conventional flat carbon electrodes. DLC films grown onto single-crystal Si(1 0 0) under identical conditions resulted in essentially insulating layers. Conducting-atomic force microscopy studies reveal that the film electro-activity does not arise from specific topographic features in the highly corrugated film. The ensemble of experimental results suggests that the enhanced electrochemical responses are not connected to areas in which the CNT support is exposed to the electrolyte solution. This is remarkable behaviour considering that no dopants have been included during the DLC film growth.     

A study of hard diamond-like carbon films in mid-frequency dual-magnetron sputtering

A series of hydrogen-free diamond-like carbon (DLC) films were deposited by a mid-frequency dual-magnetron sputtering under basic conditions of Cr and C target power density between 6 and 18 W/cm², bias voltage in a range of − 100 V to − 200 V, and a pure argon atmosphere. Microstructure, microhardness, adhesion, friction and wear properties were investigated for the DLC films to be used as protective films on cutting tools and forming dies, etc. The DLC films exhibited some combined superior properties: high hardness of 30–46 GPa, good adhesion of critical load of 50–65 N, and friction coefficient about 0.1 in air condition. Properties of the magnetron-sputtered carbon films showed a strong dependence on flux and energy of ion bombardment during growth of the films.     

The microstructure and properties of energetically deposited carbon nitride films

The intrinsic stress, film density and nitrogen content of carbon nitride (CN_x) films deposited from a filtered cathodic vacuum arc were determined as a function of substrate bias, substrate temperature and nitrogen process pressure. Contour plots of the measurements show the deposition conditions required to produce the main structural forms of CN_x including N-doped tetrahedral amorphous carbon (ta-C:N) and a variety of nitrogen containing graphitic carbons. The film with maximum nitrogen content (~ 30%) was deposited at room temperature with 1.0 mTorr N₂ pressure and using an intermediate bias of − 400 V. Higher nitrogen pressure, higher bias and/or higher temperature promoted layering with substitutional nitrogen bonded into graphite-like sheets. As the deposition temperature exceeded 500 °C, the nitrogen content diminished regardless of nitrogen pressure, showing the meta-stability of the carbon–nitrogen bonding in the films. Hardness and ductility measurements revealed a diverse range of mechanical properties in the films, varying from hard ta-C:N (~ 50 GPa) to softer and highly ductile CN_x which contained tangled graphite-like sheets. Through-film current–voltage characteristics showed that the conductance of the carbon nitride films increased with nitrogen content and substrate bias, consistent with the transition to more graphite-like films.     

Investigation of substrate bias effects on the reactively sputtered ZrN diffusion barrier films

ZrN diffusion barrier films were prepared by DC reactive magnetron sputtering under different negative substrate bias. The composition, microstructure, resistivity and diffusion barrier properties of ZrN films, with respect to substrate bias, were studied by means of X-ray diffraction, electron probe microanalyzer, Auger electron spectroscopy, and four point probe method. Results showed that the deposition rate and impurity oxygen content of ZrN films were substantially influenced by the resputtering effects due to the ion bombardment on the film surface. The competition between surface energy and strain energy made the preferred orientation of ZrN films change from (1 1 1) to (2 0 0) and then back to highly (1 1 1) preferred orientation as a function of substrate bias. The application of negative substrate bias could effectively decrease the electrical resistivity due to the decrease of impurity oxygen content and the densification of films, resulting from the moderate-energy ion irradiation. The biased ZrN films could successfully be used as a diffusion barrier layer, between Cu and SiO₂, even up to the high temperature of 800 °C for 30 min.     

The properties of fluorine-containing diamond-like carbon films prepared by pulsed DC plasma-activated chemical vapour deposition

Diamond-like carbon films containing up to 23.1 at. % of fluorine (F-DLC), were deposited onto silicon substrates by low-frequency, pulsed DC, plasma-activated, chemical vapour deposition (PACVD). The influence of fluorine on plasma current density, deposition rate, composition, bonding structure, surface energy, hardness, stress and biocompatibility was investigated and correlated with the fluorine content. X-ray photoelectron spectroscopy (XPS) analysis revealed the presence C–C, C–CF and C–F for F-DLC films with a low fluorine concentration (1.5–12.1 at. %), however for films with a higher fluorine content (23.0 at. %) an additional peak due to CF₂ bonding was detected. The addition of fluorine into the DLC film resulted in lower stress and hardness values. The reduction in these values was attributed to the substitution of strong C=C by weaker C–F bonds which induces a decrease in hardness. Ion scattering spectrometery (ISS) measurements revealed the presence of fluorine atoms in the outmost layer of the F-DLC films and there was no evidence of surface oxygen contamination. The water contact angle was found to increase with increasing fluorine content and has been attributed to the change of the bonding nature in the films, in particularly increasing CF and CF₂ bonds. Biocompatibility tests performed using MG-63 osteoblast-like cell cultures indicated homogeneous and optimal tissue integration for both the DLC and the F-DLC surfaces. This pulsed-PACVD technique has been shown to produce biocompatible DLC and F-DLC coatings with a potential for large area applications.     

A superhard diamond-like carbon film

A superhard hydrogen-free amorphous diamond-like carbon (DLC) film was deposited by pulsed arc discharge using a carbon source accelerator in a vacuum of 2×10⁻⁴ Pa. The growth rate was about 15 nm/min and the optimum ion-plasma energy was about 70 eV. The impact of doping elements (Cu, Zr, Ti, Al, F(Cl), N) on the characteristics of DLC films deposited on metal and silicon substrates was studied aiming at the choice of the optimum coating for low friction couples. The microhardness of thick (≥20 μm) DLC films was studied by Knoop and Vickers indentations, medium thick DLC films (1–3 μm) were investigated using a ‘Fischerscope’, and Young's module of thin films (20–70 nm) was studied by laser induced surface acoustic waves. The bonds in DLC films were investigated by electron energy loss spectroscopy (EELS), X-ray excited Auger electron spectroscopy (XAES), and X-ray photoelectron spectroscopy (XPS). The adhesion of DLC films was defined by the scratch test and Rockwell indentation. The coefficient of friction of the Patinor DLC film was measured by a rubbing cylinders test and by a pin-on-disk test in laboratory air at about 20% humidity and room temperature. The microhardness of the Patinor DLC film was up to 100 GPa and the density of the film was 3.43–3.65 g/cm³. The specific wear rate of the Patinor DLC film is comparable to that of other carbon films.     

Influence of bias voltage on diamond like carbon (DLC) film deposited on polyethylene terephthalate (PET) film surfaces using PECVD and its blood compatibility

In this paper, diamond like carbon (DLC) films were coated on polyethylene terephthalate (PET) film substrate as a function of biasing voltage using plasma enhanced chemical vapour deposition. The surface morphology of the DLC films was analyzed by scanning electron microscopy and atomic force microscopy. The chemical state and structure of the films were analyzed by X-ray photoelectrons spectroscopy and Raman spectroscopy. The micro hardness of the DLC films was also studied. The surface energy of interfacial tension between the DLC and blood protein was investigated using contact angle measurements. In addition, the blood compatibility of the films was examined by in vitro tests. For a higher fraction of sp³ content, maximum hardness and surface smoothness of the DLC films were obtained at an optimized biasing potential of ? 300 V. The in vitro results showed that the blood compatibility of the DLC coated PET film surfaces got enhanced significantly.     

Synthesis of high-quality AZO polycrystalline films via target bias radio frequency magnetron sputtering

The deposition rate, transmittance and resistivity of aluminium-doped zinc oxide (AZO) films deposited via radio frequency (r.f.) sputtering change with target thickness. An effective method to control and maintain AZO film properties was developed. The strategy only involved the regulation of target bias voltage of r.f. magnetron sputtering system. The target bias voltage considerably influenced AZO film resistivity. The resistivity of the as-deposited AZO film was 9.82×10⁻⁴ Ω cm with power density of 2.19 W/cm² at target self-bias of −72 V. However, it decreased to 5.98×10⁻⁴ Ω cm when the target bias voltage was increased to −112 V by applying d.c. voltage. Both growth rate and optical band gap of AZO film increased with the absolute value of target bias voltage – growth rate increased from 10.54 nm/min to 25.14 nm/min, and band gap increased from 3.57eV to 3.71 eV when target bias voltage increased from −72 V to −112 V at r.f. power density of 2.19 W/cm². The morphology of AZO films was slightly affected by the target bias voltage. Regulating target bias voltage is an effective method to obtain high-quality AZO thin films deposited via r.f. magnetron sputtering. It is also a good choice to maintain the quality of AZO film in uptime manufacturing deposition.     

Effect of oxygen plasma treatment on non-thrombogenicity of diamond-like carbon films

The non-thrombogenicity of oxygen-plasma-treated DLC films was investigated as surface coatings for medical devices. DLC films were deposited on polycarbonate substrates by a radio frequency plasma enhanced chemical vapor deposition method using acetylene gas. The deposited DLC films were then treated with plasma of oxygen gas at powers of 15 W, 50 W, and 200 W. Wettability was evaluated by water contact angle measurements and the changes in surface chemistry and roughness were examined by X-ray photoelectron spectroscopy and atomic force microscope analysis, respectively. Each oxygen-plasma-treated DLC film exhibited a hydrophilic nature with water contact angles of 11.1°, 17.7° and 36.8°. The non-thrombogenicity of the samples was evaluated through the incubation with platelet-rich plasma isolated from human whole blood. Non-thrombogenic properties dramatically improved for both 15 W- and 50 W-oxygen-plasma-treated DLC films. These results demonstrate that the oxygen plasma treatment at lower powers promotes the non-thrombogenicity of DLC films with highly hydrophilic surfaces.     

Molecular structure of SiOx-incorporated diamond-like carbon films; evidence for phase segregation

Silicon-oxide incorporated amorphous hydrogenated diamond-like carbon films (SiO_x–DLC, 1 ≤ x ≤ 1.5) containing up to 24 at.% of Si (H is excluded from the atomic percentage calculations reported here) were prepared using pulsed direct current plasma-enhanced chemical vapour deposition (DC-PECVD). Molecular structure, optical properties and mechanical properties of these films were assessed as a function of Si concentration. The spectroscopic results indicated two structural regimes. First, for Si contents up to ~ 13 at.%, SiO_x–DLC is formed as a single phase with siloxane, O–Si–C₂, bonding networks. Second, for films with Si concentrations greater than 13 at.%, SiO_x–DLC with siloxane bonding and SiO_x deposit simultaneously as segregated phases. The variations in mechanical properties and optical properties as a function of Si content are consistent with the above changes in the film composition.