Sb-modified growth of stacked Ge/Si(100) quantum dots

We report on the Sb induced modifications of the morphology of self assembled Ge/Si(100) quantum dot stacks in a Si matrix grown by a molecular beam epitaxy. It is shown that the size of the quantum dots in the stack and the Si spacer layer uniformity inside the stack are regulated by the amount of deposited Sb. We consider the thin Sb layer at the Ge/Si growth interface as a factor limiting the surface migration of Si and Ge ad-atoms. The surface diffusion coefficients of Si ad-atom on uncovered pyramid shaped Ge island and on a Ge island covered by a single monolayer of Sb are estimated to be 2.4 μm²s⁻¹ and 2.3 × 10⁻⁴ μm²s⁻¹ at a temperature of 600 °C, correspondingly. Based on this remarkable reduction of surface diffusion the morphology of the surface can be preserved when the growth is continued after the single monolayer of Sb is at the surface.     

High quality Ge epitaxial layers on Si by ultrahigh vacuum chemical vapor deposition

Flat, relaxed Ge epitaxial layers with low threading dislocation density (TDD) of 1.94 × 10⁶ cm^− 2 were grown on Si(001) by ultrahigh vacuum chemical vapor deposition. High temperature Ge growth at 500 °C on 45 nm low temperature (LT) Ge buffer layer grown at 300 °C ensured the growth of a flat surface with RMS roughness of 1 nm; however, the growth at 650 °C resulted in rough intermixed SiGe layer irrespective of the use of low temperature Ge buffer layer due to the roughening of LT Ge buffer layer during the temperature ramp and subsequent severe surface diffusion at high temperatures. Two-dimensional Ge layer grown at LT was very crucial in achieving low TDD Ge epitaxial film suitable for device applications.     

Optimization of 3C–SiC/Si heterointerfaces in epitaxial growth

In this article, we present the basic formalism of the S-correlated theory of misfit induced interface superstructures (MIIS) and nucleation centers for misfit dislocation network (NCMDN). Two main properties play an important role in the theory. The first one is the S factor, which is the ratio of effective elastic constants over the material atomic density: this factor can be identified from the standard equations of the elasticity theory which, in our approach, represents the basic background. This implies a realistic lattice dynamics model which enables to interpret the velocity of longitudinal, transverse and shear vibrational waves in solids. The second property, n_S is a geometric parameter related to the extension of MIIS and to the lattice spacing of misfit dislocation network (MDN). We then apply this theory to several heterosystems and we demonstrate that it can be used to optimize heterointerfaces between host materials characterized by large lattice mismatch.     

Laser ablation and growth of Si and Ge

In this work, we investigated the laser ablation and deposition of Si and Ge at room temperature in vacuum by employing nanosecond lasers of 248 nm, 355 nm, 532 nm and 1064 nm. Time-integrated optical emission spectra were obtained for neutrals and ionized Ge and Si species in the plasma at laser fluences from 0.5 to 11 J/cm². The deposited films were characterized by using Raman spectroscopy, scanning electron microscopy and atomic force microscopy. Amorphous Si and Ge films, micron-sized crystalline droplets and nano-sized particles were deposited. The results suggested that ionized species in the plasma promote the process of subsurface implantation for both Si and Ge films while large droplets were produced from the superheated and melted layer of the target. The dependence of the properties of the materials on laser wavelength and fluence were discussed.     

Fabrication of high quality Ge virtual substrates by selective epitaxial growth in shallow trench isolated Si (001) trenches

To further boost the CMOS device performance, Ge has been successfully integrated on shallow trench isolated Si substrates for pMOSFET fabrication. However, the high threading dislocation densities (TDDs) in epitaxial Ge layers on Si cause mobility degradation and increase in junction leakage. In this work, we studied the fabrication of Ge virtual substrates with low TDDs by Ge selective growth and high temperature anneal followed by chemical mechanical polishing (CMP). With this approach, the TDDs in both submicron and wider trenches were simultaneously reduced below 1 × 10⁷ cm^− 2 for 300 nm thick Ge layers. The resulting surface root-mean-square (RMS) roughness is about 0.15 nm. This fabrication scheme provides high quality Ge virtual substrates for pMOSFET devices as well as for III-V selective epitaxial growth in nMOSFET areas. A confined dislocation network was observed at about 50 nm above the Ge/Si interface. This dislocation network was generated as a result of effective threading dislocation glide and annihilation. The separation between the confined threading dislocations was found in the order of 100 nm.     

Modified Stranski-Krastanov growth in Ge/Si heterostructures via nanostenciled pulsed laser deposition

The combination of nanostenciling with pulsed laser deposition (PLD) provides a flexible, fast approach for patterning the growth of Ge on Si. Within each stencilled site, the morphological evolution of the Ge structures with deposition follows a modified Stranski-Krastanov (SK) growth mode. By systematically varying the PLD parameters (laser repetition rate and number of pulses) on two different substrate orientations (111 and 100), we have observed corresponding changes in growth morphology, strain and elemental composition using scanning electron microscopy, atomic force microscopy and μ-Raman spectroscopy. The growth behaviour is well predicted within a classical SK scheme, although the Si(100) growth exhibits significant relaxation and ripening with increasing coverage. Other novel aspects of the growth include the increased thickness of the wetting layer and the kinetic control of Si/Ge intermixing via the PLD repetition rate.     

Computer simulation of coherent island growth in Ge/Si and InAs/GaAs systems

The nucleation and growth of coherent nanodimensional island arrays in the course of molecular beam epitaxy in Ge/Si and InAs/GaAs semiconductor systems have been studied using computer simulation methods. The parameters of nanoisland arrays are determined as functions of the growth conditions (substrate temperature and deposition rate). The results of calculations are compared to the available experimental data.     

Three-dimensional Si/Ge quantum dot crystals

Modern nanotechnology offers routes to create new artificial materials, widening the functionality of devices in physics, chemistry, and biology. Templated self-organization has been recognized as a possible route to achieve exact positioning of quantum dots to create quantum dot arrays, molecules, and crystals. Here we employ extreme ultraviolet interference lithography (EUV-IL) at a wavelength of lambda = 13.5 nm for fast, large-area exposure of templates with perfect periodicity. Si(001) substrates have been patterned with two-dimensional hole arrays using EUV-IL and reactive ion etching. On these substrates, three-dimensionally ordered SiGe quantum dot crystals with the so far smallest quantum dot sizes and periods both in lateral and vertical directions have been grown by molecular beam epitaxy. X-ray diffractometry from a sample volume corresponding to about 3.6 x 10(7) dots and atomic force microscopy (AFM) reveal an up to now unmatched structural perfection of the quantum dot crystal and a narrow quantum dot size distribution. Intense interband photoluminescence has been observed up to room temperature, indicating a low defect density in the three-dimensional (3D) SiGe quantum dot crystals. Using the Ge concentration and dot shapes determined by X-ray and AFM measurements as input parameters for 3D band structure calculations, an excellent quantitative agreement between measured and calculated PL energies is obtained. The calculations show that the band structure of the 3D ordered quantum dot crystal is significantly modified by the artificial periodicity. A calculation of the variation of the eigenenergies based on the statistical variation in the dot dimensions as determined experimentally (+/-10% in linear dimensions) shows that the calculated electronic coupling between neighboring dots is not destroyed due to the quantum dot size variations. Thus, not only from a structural point of view but also with respect to the band structure, the 3D ordered quantum dots can be regarded as artificial crystal.     

Island formation in Ge/Si epitaxy

We review current understanding of the island formation process, and outline some of the remaining problems. The initial island formation is coherent, with islands stabilised by the elastic relaxation associated with deformation of the substrate. We use finite element analysis to demonstrate the degree of relaxation associated with these deformations. The islands then relax further by introduction of dislocations. The first dislocations introduced in the large coherent islands are shown to be inclined burgers vectors (about 60°) adopting a nearly semicircular path around the island perimeter. The outstanding anomaly in Ge/Si growth is the temperature dependence of islanding, with slower relaxation rates and greater metastability associated with higher temperatures. We describe various possible explanations for this problem.     

Ge/Si nanowire mesoscopic Josephson junctions

The controlled growth of nanowires (NWs) with dimensions comparable to the Fermi wavelengths of the charge carriers allows fundamental investigations of quantum confinement phenomena. Here, we present studies of proximity-induced superconductivity in undoped Ge/Si core/shell NW heterostructures contacted by superconducting leads. By using a top gate electrode to modulate the carrier density in the NW, the critical supercurrent can be tuned from zero to greater than 100 nA. Furthermore, discrete sub-bands form in the NW due to confinement in the radial direction, which results in stepwise increases in the critical current as a function of gate voltage. Transport measurements on these superconductor-NW-superconductor devices reveal high-order (n = 25) resonant multiple Andreev reflections, indicating that the NW channel is smooth and the charge transport is highly coherent. The ability to create and control coherent superconducting ordered states in semiconductor-superconductor hybrid nanostructures allows for new opportunities in the study of fundamental low-dimensional superconductivity.     

Some aspects of substrate pretreatment for epitaxial Si nanowire growth

We report on the influence of the surface pretreatment for vapor-liquid-solid growth of epitaxial silicon nanowires with gold catalyst and silane precursor on Si(111) substrates. In this paper we make it obvious that a thin native oxide layer on the Si substrate-as is present under most technological conditions-or a thin layer of oxide formed on top of the catalytic gold particle restrain nucleation and nanowire growth. High resolution transmission electron microscopy, and electron energy loss spectroscopy were utilized to demonstrate Si diffusion from the substrate through the catalytic Au layer and further the formation of a thin oxide layer atop. Based on this observation we present a sample pretreatment practice, making the catalyst insensitive for further oxide formation, thereby preserving epitaxy for nanowire synthesis.     

Effects of pulsed laser radiation on epitaxial self-assembled Ge quantum dots grown on Si substrates

Laser irradiation of Ge quantum dots (QDs) grown on Si(100) substrates by solid-source molecular beam epitaxy has been performed using a Nd:YAG laser (532 nm wavelength, 5 ns pulse duration) in a vacuum. The evolution of the Ge QD morphology, strain and composition with the number of laser pulses incident on the same part of the surface, have been studied using atomic force microscopy, scanning electron microscopy and Raman spectroscopy. The observed changes in the topographical and structural properties of the QDs are discussed in terms of Ge-Si diffusion processes. Numerical simulations have been developed for the investigation of the temperature evolution of the QDs during laser irradiation. The obtained results indicate that the thermal behaviour and structural variation of the nanostructures differ from conventional thermal annealing treatments and can be controlled by the laser parameters. Moreover, an unusual island motion has been observed under the action of subsequent laser pulses.     

Photocurrent generation in Ge nanocrystal/Si systems

We report on the generation of photocurrent in the visible and ultraviolet range from planar devices built from the Ge nanocrystals grown on a heavy n-doped Si(001) substrate covered with 5 nm thick thermally grown SiO2. These Ge nanostructures/SiO2/n(+)-Si devices are shown to generate photocurrent with an Incident-Photon-to-electron Conversion Efficiency (IPCE) spectral range depending on the Ge nanocrystals size. The increase of the IPCE value of our devices in the 350-600 nm range correlates well with the absorbance of Ge.     

The structure and electrical characteristics of Si/Ge heterojunctions II: The electrical characteristics of Si/Ge heterojunctions

The I–V characteristics of p-Ge/nn⁺ -Si and p-Ge_xSi_1?x/nn⁺ -Si heterojunctions produced by the vacuum epitaxy of germanium onto nn⁺ -Si were determined. The mechanisms of the d.c. and reverse current were investigated.     

Ferromagnetism in Mn-implanted Ge/Si Nanostructure Material

Multistacked Ge quantum dots (QDs) with Si spacers of different thicknesses have been grown on (100) Si substrates by rapid thermal chemical vapor deposition followed by Mn ion implantation and post-annealing. The presence of ferromagnetic structure was confirmed in the insulating (Si_0.45Ge_0.55)Mn_0.03 diluted magnetic quantum dots (DMQD) and semiconducting (Si_0.45Ge_0.55)Mn_0.05 DMQD. The DMQD materials were found to be homogeneous and to exhibit p-type conductivity and ferromagnetic ordering with a Curie temperature of T _C=350 and 160 K. The x-ray diffraction (XRD) data show that there is a phase separation of Mn₅Ge₃ from the MnGe nanostructure. The temperature-dependent electrical resistivity in semiconducting DMQD material indicates that manganese introduces two acceptor levels in germanium, at 0.14 eV from the valence band and 0.41 eV from the conduction band implying Mn substituting Ge. Therefore, it is likely that the ferromagnetic exchange coupling of DMQD material with T _C=160 K is hole mediated due to formation of bound magnetic polarons and the ferromagnetism in a sample with T _C>300 K is due to Mn₅Ge₃ phase.     

Some practical remarks on the design of experimental systems for expitaxial growth of Si,Ge and SiGe

Epitaxial growth of group IV semiconductors, especially silicon, is an important and very sensitive step in the manufacture of semiconductor devices. The epitaxial layer grows by the addition of atoms to a single crystal substrate in an ordered manner. Any interruption in this order would grow as a fault through many layers and may cause final device failure. The epitaxial system must therefore be designed so as to prevent such faults. Practical considerations concerning a design of an experimental system for growth from the gas phase are described, based on experience gained during its building and operation. The various system components and materials, the necessary instrumentation and system calibration are described. Problems of vacuum tightness of the system and purification of incoming gases are also included. Finally, the basic calculations for obtaining the necessary molar ratios in the reactor chamber so as to achieve the desired layer type and resistivity are reviewed. In the system described layers of Si, Ge or SiGe mixture of desired composition may be grown.     

Anisotropic thermal conductivity of Ge quantum-dot and symmetrically strained Si/Ge superlattices

We report the first experimental results on the temperature dependent in-plane and cross-plane thermal conductivities of a symmetrically strained Si/Ge superlattice and a Ge quantum-dot superlattice measured by the two-wire 3 omega method. The measured thermal conductivity values are highly anisotropic and are significantly reduced compared to the bulk thermal conductivity of the structures. The results can be explained by using heat transport models based on the Boltzmann transport equation with partially diffusive scattering of the phonons at the superlattice interfaces.     

Photovoltaic properties and photoconductivity in multilayer Ge/Si heterostructures with Ge nanoislands

Interband optical transitions in multilayer heterostructures with SiGe nanoislands were investigated using photocurrent spectroscopy and photo-emf. The n-p heterostructures containing Ge nanoislands in the area of the potential barrier were prepared by molecular-beam epitaxy at the temperature about 500 °C. It was shown that electron transitions from the ground state of the valence band in a nanoislands to the conduction band of Si surrounding made the main contribution into the vertical photo-emf in the range 0.75–1.05 eV, which is below the interband absorption edge of Si. The lateral photoconductivity observed in the range 0.63–0.8 eV at 77 K can be attributed to indirect interband transitions from the ground state of a nanoisland to L-state of the conduction band of a nanoisland. Analysis of Raman scattering spectra revealed that the Ge composition x in a nanoisland is about 0.87, while elastic deformation value amounts to ε _xx  = −0.016. The calculated energies of interband transitions from the ground state of a nanoisland to the conduction band of Si surrounding (0.63 eV) and to L-state of the conduction band of a nanoisland (0.81 eV) fit the experimental data with a rather good accuracy.     

Ge/Si纳米多层膜的埋层调制结晶研究

采用磁控溅射设备,当衬底温度为500℃时,在Si(100)基片上磁控溅射生长Ge/Si多层膜样品.使用Raman,AFM和低角X射线技术对样品进行检测和研究,结果表明通过控制Ge埋层的厚度,可以调制Ge膜的结晶及晶粒尺寸,获得晶粒平均尺寸和空间分布较均匀的多晶Ge/Si多层膜.     

Cascade Solar Cells Based on GaP/Si/Ge Nanoheterostructures

Technical Physics Letters - GaP/Si/Ge nanoheterostructures have been obtained using the method of pulsed laser deposition, and an energy band diagram of cascade solar cells based on these...