1.17-μm highly strained GaInAs-GaAs quantum-well laser

Excellent lasing properties and temperature characteristic of a highly strained 1.17-μm GaInAs-GaAs double-quantum-well laser are reported. We show that a strained buffer layer, which is employed in the device, has no tradeoff on the device performance. For a 1500-μm-long laser with cleaved facets a threshold current density of 200 A/cm² is achieved. A transparency current density of 180 A/cm² is estimated for as cleaved devices. A record high characteristic temperature in this wavelength range of 150 K is achieved     

Characteristics dependence on confinement structure and single-modeoperation in 2-μm compressively strained InGaAs-lnGaAsP quantum-welllasers

The optimum confinement layer structure in 2-μm compressively strained InGaAs-InGaAsP lasers is experimentally studied. Beside the carrier overflow and absorption loss in the confinement layers, the intervalence band absorption and/or Auger recombination play an important role in laser characteristics. More attention should be paid to the confinement structure to reduce the carrier density. We obtained a better laser performance with an energy difference between the bandgap of the optical confinement layer and the laser transition energy of 280-300 meV. A distributed-feedback (DFB) laser operating at 2.043 μm has been realized with the threshold current as low as 6 mA and the maximum output power of 6 mW. The differential quantum efficiency and the characteristic temperature are 16% and 59 K, respectively     

Theoretical investigation of gain and linewidth enhancement factorfor 1.55-μm tensile strained quantum-well lasers

The performance of quantum-well laser diodes with tensile strained wells was theoretically calculated. Using 4×4 Luttinger-Kohn Hamiltonian, valence band dispersion was calculated and used for the calculation of material gain. Linewidth enhancement factor was obtained by calculating the change of refractive index due to interband transition and free carrier plasma motion. The tensile well shows smaller material and differential gain compared to the compressive strained one. But smaller linewidth enhancement factor is obtained due to the absence of free carrier plasma effect. Linewidth enhancement factor is further reduced by p-type modulation doping in the barrier     

High-power 0.98-μm strained quantum-well lasers fabricated usingin situ monitored reactive ion beam etching

0.98-μm wavelength InGaAs-AlGaAs strained quantum-well buried ridge lasers were fabricated using in situ monitored reactive ion beam etching (RIBE). This technique allowed a very accurate ridge geometry, resulting in high single transverse-mode power more than 250 mW and high-fiber coupled power more than 150 mW     

Analysis of the performance of 1.55-μm InGaAs-InP tensilestrained quantum-well lasers

We fabricated 1.55-μm tensile strained InGaAs quantum-well (QW) lasers into broad-area and ridge waveguide lasers, and their performance was analyzed and compared with compressive strained and lattice-matched QW lasers. It is seen that the limitation on the tensile strain to a value less than 0.7%, which is required to prevent the emission wavelength being shorter than 1.55 μm, imposes restrictions on the performance enhancement in several aspects. Broad-area InGaAs QW lasers with a tensile strain of 0.7% show a larger gain coefficient and smaller transparency current density per well than those with InGaAsP QW lasers with a compressive strain of 1.0%. However, the internal quantum efficiency is much smaller than that for compressive ones and the internal optical loss increases rapidly as the number of QW's increases. These are thought to be caused by a smaller conduction band offset and the onset of dislocation generation at the well-barrier interfaces with the number of QW's, respectively. Ridge waveguide lasers with two QW's with tensile strain of 0.7%, which is designed not to exceed the critical thickness for dislocation generation, show smaller modal gain coefficients and inferior temperature characteristics as compared to those with six 0.7% compressive strained QW's and those with three lattice matched InGaAs QW's. However, the modulation bandwidth is measured to be larger than that for one that is compressively strained. It is believed to originate from the small effective capture time of the carriers due to thicker wells     

A 0.15-μm 60-GHz high-power composite channel GaInAs/InP HEMTwith low gate current

This letter presents recent improvements and experimental results provided by GaInAs/InP composite channel high electron mobility transistors (HEMT). The devices exhibit good dc and rf performance. The 0.15-μm gate length devices have saturation current density of 750 mA/mm at V_GS=+0 V. The Schottky characteristic is a typical reverse gate-to-drain breakdown voltage of -8 V. Gate current issued from impact ionization has been studied in these devices, in the first instance, versus drain extension. At 60 GHz, an output power of 385 mW/mm has been obtained in such a device with a 5.3 dB linear gain and 41% drain efficiency which constitutes the state-of-the-art. These results studied are the first reported for a composite channel Al_0.65In_0.35As/Ga_0.47In_0.53 As/InP HEMT on an InP substrate     

1.95-μm strained InGaAs-InGaAsP-InP distributed-feedbackquantum-well lasers

Distributed-feedback emission from strained InGaAs-InGaAsP-InP quantum well lasers has been examined over a temperature range of 130 K to 300 K. Continuous single-mode output from 190 to 300 K with a side-mode-suppression ratio of about 10 dB was observed. The wavelength was 1.95 μm at 273 K and tuned at a rate of 0.13 nm/K. The current-tuning rate was 0.0043 nm/mA (-340 MHz/mA) at 273 and 283 K     

1.5-μm InGaAs/InAlGaAs quantum-well microdisk lasers

Microdisk lasers with three InGaAs/InAlGaAs quantum wells were demonstrated for the first time. The selective etching method used to fabricate the laser structure is discussed. Lasers 20 μm in diameter lased with single mode at 1.5-μm wavelength when optically pumped by a pulsed argon-ion laser at 80 K     

Aging time dependence of catastrophic optical damage (COD) failureof a 0.98-μm GaInAs-GaInP strained quantum-well laser

In this paper, we studied the aging time dependence of the catastrophic optical damage (COD) failure of an Al-free uncoated 0.98-μm GaInAs-GaInP strained quantum-well laser with an injection current as a parameter. Based on the stress-strength model, we first investigated experimentally the dependence of the critical power level (CPL) at which COD would take place upon the aging time. Then applying a statistical treatment to this result, we found for the first time that CPL data at each aging time could be considered to distribute according to the Weibull statistics, and the decrease rate of the CPL with the aging time depended very strongly on the injection current. Finally, using the relationship between the decrease rate of the CPL with the aging time and the current, we predicted roughly the time of a COD failure occurrence for both large and small current cases. As a result, we clarified that for our Al-free uncoated 0.98-μm laser, a COD failure became a fatal problem in the case of a large-current (high-power) operation     

All-selective MOVPE-grown 1.3-μm strained multi-quantum-wellburied-heterostructure laser diodes

Strained InGaAsP multi-quantum-well (MQW) double-channel planar-buried-hetero (DC-PBH) laser diodes (LDs) were fabricated by selective metalorganic-vapor-phase epitaxy (MOVPE). In the laser fabrication process, both the strained MQW active layer and current blocking structure were directly formed by selective MOVPE without any semiconductor etching process. The LDs are called all-selective MOVPE-grown BH LDs. The laser fabrication process can achieve both a precisely controlled gain waveguide structure and an excellent current blocking configuration, realizing the optimized DC-PBH structure. These aspects are essential to the high-performance and low-cost LD, which is strongly demanded for optical access network systems or fiber-to-the-home networks. This paper will show the excellent high-temperature characteristics for 1.3-μm Fabry-Perot LDs which have a record threshold current of 18 mA with a low-operation current of 56 mA for 10 mW, and 74 mA for 15 mW at 100°C with extremely high uniformity. Furthermore, reliable long-term operation at high temperature (85°C) and high-output power of 15 mW has been demonstrated for the first time     

Epitaxial liftoff microcavities for 1.55-μm quantum-well spatiallight modulators

Microcavities operating at 1.55 μm have been realized according to the epitaxial liftoff (ELO) technique. The process is described and characterized. No significant variation of the optical properties of the grafted devices has been found. The technique is then applied to a spatial light modulator made by inserting a 3-μm multiple-quantum-well device in a short asymmetric Fabry-Perot microcavity. An enhancement by a factor 1000 of the performances of the switching component is obtained. The input diffraction efficiency reaches 2% in a degenerated four wave mixing configuration with a pulse energy of 1 μJ/cm² and without any applied electric field     

0.1-μm T-gate Al-free InP/InGaAs/InP pHEMTs for W-bandapplications using a nitrogen carrier for LP-MOCVD growth

We report on the DC and RF performance of HEMTs based on the Al-free material system InP/InGaAs/InP. These structures were grown by LP-MOCVD using a nitrogen carrier. The influence of gate length and channel composition on the performance of these devices is investigated. We demonstrate that optimum DC and RF performance using highly strained channels can be obtained only if additional composite channels are grown. The cutoff frequencies f_T=160 GHz and f_max=260 GHz for a 0.1-μm T-gate device indicate the suitability of our devices for W-band applications     

1.58-μm lattice-matched and strained digital alloy AlGaInAs-InPmultiple-quantum-well lasers

A versatile, digital-alloy molecular beam epitaxy (MBE) technique is employed to grow lattice-matched and strained AlGaInAs multiple-quantum well (MQW) 1.58-μm laser diodes on InP. A threshold current density as low as 510 A/cm² has been demonstrated for broad area lasers with 1% strained AlGaInAs MQWs, which is the best MBE result in this material system. A single facet pulsed power as high as 0.56 W is obtained. It is also found that the efficiency and internal loss of digital alloy AlGaInAs QW devices are comparable to lasers grown by conventional MBE     

Low-threshold current, high-efficiency 1.3-μm wavelengthaluminum-free InGaAsN-based quantum-well lasers

We demonstrate high-performance Al-free InGaAsN-GaAs-InGaP-based long-wavelength quantum-well (QW) lasers grown on GaAs substrates by gas-source molecular beam epitaxy using a RF plasma nitrogen source. Continuous wave (CW) operation of InGaAsN-GaAs QW lasers is demonstrated at λ=1.3 μm at a threshold current density of only J_TH =1.32 kA/cm². These narrow ridge (W=8.5 μm) lasers also exhibit an internal loss of only 3.1 cm^-1 and an internal efficiency of 60%. Also, a characteristic temperature of T₀=150 K from 10°C to 60°C was measured, representing a significant improvement over conventional λ=1.3 μm InGaAsP-InP lasers. Under pulsed operation, a record high maximum operating temperature of 125°C and output powers greater than 300 mW (pulsed) and 120 mW (CW) were also achieved     

Approximate optical gain formulas for 1.55-μm strainedquaternary quantum-well lasers

We have used an efficient analytical model to calculate the optical gain of the strained quantum-well laser of InGaAsP-InP material system. Based on the anisotropic effective mass theory, empirical formulas delineating the relations between optical gain, emission wavelength, well width and material compositions are obtained for 1.55-μm In_1-xGa_xAs_yP_1-y quaternary strained quantum-well lasers. Results show a logarithmic relation between the peak optical gain and carrier concentration for all possible material compositions of the quaternary system. We show that the logarithmic relation can be derived algebraically     

High-temperature single-mode operation of 1.3-μm strained MQWgain-coupled DFB lasers

Single-mode and high-power operation at temperatures up to 120°C has been achieved in 1.3-μm strained MQW gain-coupled DFB lasers. A stable lasing wavelength is maintained due to a large modal facet loss difference of the two Bragg modes, which is provided by the gain-coupling effect. A very low temperature dependence of the threshold current has been obtained by detuning the lasing wavelength to the long wavelength side of the material gain peak at room temperature, which effectively compensates the waveguide loss at higher temperatures. An infinite characteristic temperature T_o can be realized at certain ranges of temperature depending on the detuning value     

Investigation of broad-band quantum-well infrared photodetectorsfor 8-14-μm detection

Typical quantum-well infrared photodetectors (QWIPs) exhibit a rather narrow spectral bandwidth of 1-2 μm. For certain applications, such as spectroscopy, sensing a broader range of infrared radiation is highly desirable. In this paper, we report the design of four broad-band QWIPs (BB-QWIPs) sensitive over the 8-14-μm spectral range. Two n-type BB-QWIPs, consisting of three and four quantum wells of different thickness and/or composition in a unit cell which is then repeated 20 times to create the BB-QWIP structure, are demonstrated. The three-well n-type In_xGa_1-xAs-Al_yGa_1-yAs BB-QWIP was designed to have a response peak at 10 μm, with a full-width at half-maximum (FWHM) bandwidth that varies with the applied bias. A maximum bandwidth of Δλ/λ_p=21% was obtained for this device at V_b=-2 V. The four-well n-type In_xGa_1-xAs-GaAs BB-QWIP not only exhibits a large responsivity of 2.31 A/W at 10.3 μm and V_b=+4.5 V, but also achieves a bandwidth of Δλ/λ_p=29% that is broader than the three-well device. In addition, two p-type In _xGa_1-xAs-GaAs BB-QWIPs with variable well thickness and composition, sensitive in the 7-14-μm spectral range, are also demonstrated. The variable composition p-type BB-QWIP has a large FWHM bandwidth of Δλ/λ_p=48% at T=40 K and V_b=-1.5 V. The variable thickness p-type BB-QWIP was found to have an even broader FWHM bandwidth of Δλ/λ _p=63% at T=40 K and V_b=1.1 V, with a corresponding peak responsivity of 25 mA/W at 10.2 μm. The results show that a broader and flatter spectral bandwidth was obtained in both p-type BB-QWIP's than in the n-type BS-QWIP's under similar operating conditions     

Comparative study of low-threshold 1.3 μm strained andlattice-matched quantum-well lasers

A study of the effects of biaxial strain on the performance of low-threshold 1.3-μm In_xGa_1-xAs_yP _1-y/InP quantum-well lasers is presented. Lasers with lattice-matched, compressive-strained, and tensile-strained quantum-wells were fabricated to compare the effect of strain on various device parameters. Threshold current densities as low as 187 A/cm² for a two-quantum-well device with 0.85% compressive strain were obtained     

Minority carrier lifetime improvement by single strained layer epitaxy of InP

By applying a single LPE-grown isoelectronically doped strained layer, on top of a conventional InP wafer, a strong reduction of dislocation and deep level density occurs. As a result an improvement in minority carrier lifetime and diffusion length and a better uniformity across the wafer is achieved. This is demonstrated by the comparison of p-n diodes fabricated with and without the strained layer.     

High-power highly strained InGaAs quantum-well lasers operating at1.2 μm

High-power highly strained In_xGa_1-xAs quantum-well lasers operating at 1.2 μm are demonstrated. The edge emitting broad area (BA) laser diode structures are grown by metal organic vapor phase epitaxy at low growth temperatures using trimethylgallium, trimethylindium, and arsine sources. In the laser structure, an InGaAs QW is sandwiched between the GaAs waveguide and AlGaAs cladding layers. The operating wavelength for the laser diode at room temperature (20°C) is about 1206 nm, which redshifts to 1219 nm at 46°C. The transparency current density for the BA laser diodes is as low as 52 A/cm² and the characteristic temperature value is 76 K. High-power laser operation in the pulse mode (about 1.6 W) at room temperature was achieved