透明导电薄膜材料的研发态势

简述了透明导电薄膜材料的研究现状与发展趋势，特别是对目前研究比较活跃的透明导电氧化物(TCO)及金属基复合多层透明导电膜的研究动态，材料设计原理及其应用进行了重点介绍，并就透明导电薄膜材料目前存在的问题及发展方向进行了分析讨论。     

p型透明导电氧化物薄膜的研究进展

p型透明导电膜是近来发现的一种新型的材料,在透明有源器件、传感器、透明电极和电路等方面具有广泛的潜在应用.近来在这方面的研究取得了一些突出的进展.本文主要综述了关于p型透明导电膜在材料、沉积工艺以及相关器件方面的研究进展.     

介质/金属/介质多层透明导电薄膜研究进展

综述了介质/金属/介质(dielectric/metal/dielectric,D/M/D)多层透明导电膜材料的特点、制备方法、研究进展与应用现状,重点比较讨论了ITO/Ag/ITO、ZnS/Ag/ZnS的膜系结构、光电性能、化学稳定性、热稳定性等特点,以及与国内外的研究差距.ITO/Ag/ITO、ZnS/Ag/ZnS是目前光电性能最好,且无需引入过渡层的两种D/M/D膜系,但有关其热稳定性的评价和研究存在不同的观点.用资源丰富、价格便宜、无毒的掺铝氧化锌(ZAO)薄膜取代含有价格昂贵的贵金属铟的掺锡氧化铟(ITO)薄膜,ZAO/Ag/ZAO膜系结构的设计、薄膜制备、光电性能与IMI的对比研究是目前国内外D/M/D研究中的热点课题和D/M/D发展的主要方向.     

P型透明导电SnO2薄膜的研究进展

SnO2薄膜是一种应用广泛的宽禁带半导体材料.近几年来,随着对SnO2的光电性质及其在光电器件方面应用的开发研究,SnO2薄膜成为研究热点之一.制备掺杂的p型SnO2是形成同质p-n结以及实现其实际应用的重要途径.近年来,国内外在p型SnO2薄膜研究方面取得了较大的进展.目前报道的p型SnO2薄膜的最高电导率为5.952Ω-1cm-1.并且得到了具有较好非线性伏安特性的铟锡氧化物的透明p-n结.本文就其最新进展进行了综述.     

插入NiCr合金层对SnO2/Ag/SnO2多层结构透明导电薄膜热稳定性的影响

室温下通过磁控溅射技术制备了SnO2/Ag/SnO2(SAS)、SnO2/Ag/NiCr/SnO2(SANS)和SnO2/NiCr/Ag/NiCr/SnO2(SNANS)三类多层膜.采用X射线衍射(XRD)、原子力显微镜(AFM)、霍尔效应测量仪和紫外-可见分光光度计研究了大气和真空退火温度与薄膜结构、形貌和透明导电性...     

GZO/Ag/GZO多层薄膜制备、结构与光电特性的研究

采用射频磁控溅射和离子束溅射联合设备在玻璃衬底上制备出了具有良好附着性、低电阻率和高透过率的GZO/Ag/GZO(ZnO掺杂Ga_2O_3简称GZO)多层薄膜.X射线衍射谱表明GZO/Ag/GZO多层薄膜是多晶膜,GZO层具有ZnO的六角纤锌矿结构,最佳取向为(002)方向;Ag层是立方结构,具有(111)取向.在GZO层厚度一定的情况下,研究了Ag层厚度的变化对多层膜结构以及光电特性的影响.研究发现,当Ag层厚度为10nm时,3层膜的电阻率为9×10~(-5)Ω·cm,在可见光范围内平均透过率达到89.7%,薄膜对应的品质因子数值为3.4×10~(-2)Ω~(-1).     

p型透明导电的锡镓氧化物薄膜的制备及其表征

本文通过磁控溅射锡镓合金靶(Ga/Sn=0.2)及热氧化的方法,成功地制备了p型透明导电的锡镓氧化物(TGO)薄膜.X射线衍射(XRD)测试结果表明,TGO薄膜保持SnO2的金红石结构.吸收谱测试表明TGO薄膜在可见光范围内透过率可达到85%以上,其光学禁带宽度Eg约3.8 eV.霍尔效应测试结果表明,TGO薄膜的载流子类型及其浓度与热处理温度密切相关.热氧化温度过高或过低均不利于空穴浓度.当热氧化温度处于(600～700) ℃之间时,可以获得p型透明导电的TGO薄膜,最高空穴浓度高达8.84×1018 cm-3.     

TO与ITO透明导电薄膜光学性质研究

研究了非标准配比SnO_x(TO)及In_2O_3重掺杂锡(ITO)的透明导电薄膜的光学性质,采用透-反射法及透射法确定了它们的光学常数n与k,讨论了透-反法中的多值问题。俄歇电子分析表明ITO中Sn原子浓度约6.5%。     

透明导电InSnGaMo氧化物薄膜光电性能研究

利用脉冲激光沉积法在石英衬底上制备出了可见光透过率高、电阻率极低的Ga,Mo共掺杂ITO基InSnGaMo复合氧化物薄膜。研究了衬底温度对薄膜结构、表面形貌、光电性能的影响。实验结果表明:衬底温度对InSnGaMo复合氧化物薄膜形貌、光电性能均有很大影响。X射线衍射、扫描电镜和霍尔测试结果表明,随着衬底温度的升高,薄膜晶粒度增大,电阻率快速下降,可见光平均透过率明显提高。当衬底温度为450℃时,InSnGaMo复合氧化物薄膜的电阻率最低为4.15×10-4Ω.cm,载流子浓度和迁移率最大分别为3×1020cm-3,45 cm2V-1s-1,在可见及近红外区平均透过率达92%,特别地,波长为362 nm时,最高透射率可达99%。     

可调的透明导电膜研究进展

简述了透明导电薄膜材料,特别是对目前研究比较活跃的透明导电氧化物（TCO）及金属基复合透明导电多层膜的发展现状和趋势;同时从选材、膜层设计、制备方法到工艺制定,研究透明导电膜光电性能诸多影响因素和规律,探讨D／M／D多层膜的微观结构与其光电性能的内在联系,以及多层膜的热稳定性和界面反应等问题,并采用电介质TiO2与金属Ag交替生成TiO2／Ag／TiO2三明治结构制备了几种具有优异光电性能的透明导电膜。经优化设计的纳米多层膜具有奇特的光电性能可调性,根据需要,用于平面显示器透明电极、太阳能电池板等的在可见光区具有高的透过率（T550≥90％）和在红外光区高的反射率（R2500≥90％）,其方块电阻仅为～5Ω／sq;而用于紫外固化的则在紫外固化的主峰365 nm处具有高的透射率（T365≥80％）,而在1600 nm的红外波段反射率也超过了90％。     

Boron-doped transparent conducting nanodiamond films

Boron-doped nanodiamond (ND) films on silica substrates have been obtained by the method of microwave plasma-enhanced chemical vapor deposition (MWPECVD). Using special technological regimes ensuring the growth of boron-doped ND films after the deposition of an initial ND nucleation layer with small roughness (<15 nm) and a large number of diamond phase nucleation centers per unit surface area (>10¹⁰ cm⁻²), it is possible to obtain conducting ND films transparent in the UV spectral range. Dependence of the transparency and conductivity of the obtained films on the boron concentration and methane content in the working methane-hydrogen mixture has been studied.     

Properties of multilayer transparent conducting oxide films

Multilayered transparent conducting oxide (TCO) film structures have been designed and fabricated to achieve both high conductivity and high transmittance in the visible spectrum. Double-layered TCO structures consisting of Sn-doped CdO and Sn-doped CdIn₂O₄, Cd-rich Cd₂SnO₄, or Ga-doped ZnO are discussed. By optimizing the thickness of the individual layers and the doping levels within those layers, an effective conductivity of 20 600 S/cm and an average transmittance larger than 85% in the 400-700 nm range have been achieved for films epitaxially grown on MgO substrates. Bi-layer films consisting of Sn-doped CdO and Ga-doped ZnO have also been deposited on plastic substrates at room temperature with resistivities of ∼1×10⁻⁴ Ω cm and an average transmittance of 80-85% in the visible range. These properties are attractive for future TCO applications.     

柔性衬底氧化物半导体透明导电膜的研究进展

回顾和评述了柔性衬底氧化物透明导电膜（包括锡掺杂的三氧化二铟ITO薄膜、铝掺杂的氧化锌AZO薄膜等）的研究进展情况。报道了在柔性衬底上制备的ITO膜、ZnO膜的光电性质对衬底种类、制备工芑及制备参数的依赖关系，给出了在此领域内应进一步进行的工作。     

可调的透明导电膜研究进展

简述了透明导电薄膜材料，特别是对目前研究比较活跃的透明导电氧化物（TCO）及金属基复合透明导电多层膜的发展现况和趋势：同时从选材、膜层设计、制备方法到工艺制定，研究透明导电膜光电性能诸多影响因素和规律，探讨D／M／D多层膜的微观结构与其光电性能的内在联系，以及多层膜的热稳定性和界面反应等问题，并采用电介质TiO2与金属Ag交替生成TiO2／Ag／TiO2三明治结构制备了几种具有优异光电性能的透明导电膜。经优化设计的纳米多层膜具有奇特的光电性能可调性，根据需要，用于平面显示器透明电极，太阳能电池板等的在可见光区具有高的透过率（T550≥90％）和在红外光区高的反射率（R2500≥90％），其方块电阻仅为5Ω／sq；而用于紫外固化的则在紫外固化的主峰365nm处具有高的透射率（T365≥80％），而在1600nm的红外波段反射率也超过了90％。     

Preparation and properties of reactively co-sputtered transparent conducting films

The method of reactive co-sputtering was used to determine the optimum dopant concentration for low resistivity In₂O₃/SnO₂ and SnO₂/Sb₂O₅ films. The optimum concentration of SnO₂ in In₂O₃ was approximately 10 mol. % and of Sb₂O₅ in SnO₂ about 7 mol. %. The resistivity increased sharply at lower dopant concentrations but changed only slightly at higher dopant concentrations. The lowest resistivity for reactively sputtered highly transparent In₂O₃/SnO₂ films was 1.5 × 10^-3 Ω cm and for SnO₂/Sb₂O₅ films 3 × 10^-3 Ω cm. Reactively sputtered In₂O₃/SnO₂ films show a strong (111) texture and have an extremely smooth surface.     

Annealing effect on properties of transparent and conducting ZnO thin films

This work presents the effect of postdeposition annealing on the structural, electrical and optical properties of undoped ZnO (zinc oxide) thin films, prepared by radio-frequency sputtering method. Two samples, 0.17 and 0.32 µm-thick, were annealed in vacuum from room temperature to 350 °C while another 0.32 µm-thick sample was annealed in air at 300 °C for 1 h. X-ray diffraction analysis revealed that all the films had a c-axis orientation of the wurtzite structure normal to the substrate. Electrical measurements showed that the resistivity of samples annealed in vacuum decreased gradually with the increase of annealing temperature. For the 0.32 µm-thick sample, the gradual decrease of the resistivity was essentially due to a gradual increase in the mobility. On the other hand, the resistivity of the sample annealed in air increased strongly. The average transmission within the visible wavelength region for all films was higher than 80%. The band gap of samples annealed in vacuum increased whereas the band gap of the one annealed in air decreased. The main changes observed in all samples of this study were explained in terms of the effect of oxygen chemisorption and microstructural properties.     

CZTS thin films on transparent conducting electrodes by electrochemical technique

We have fabricated single phase Cu₂ZnSnS₄ (CZTS) films using a specially designed 3-stage electrochemical system. Sequential electrodepositon of constituent metallic layers was carried out on SnO₂/F coated glass substrates using a platinum counter electrode and a saturated calomel reference electrode. Unique bath compositions were formulated for each of these constituents. Sequentially deposited tri-layer stacks were annealed in sulfur environment to get CZTS phase. Detailed structural, morphological and optical characterization experiments were performed using several techniques including x-ray diffraction, Raman and UV-visible spectroscopy, scanning electron microscopy and atomic force microscopy. All characterization experiments indicated that the films are single phase with a measured direct band gap of 1.5 eV.