用MWECR CVD系统制备具有非晶/微晶两相结构的硅薄膜研究

用微波电子回旋共振化学气相沉积(MWECR CVD)系统制备了具有非晶/微晶两相结构的硅薄膜,研究了沉积温度和沉积压力等对制备微晶硅薄膜的结构和电学特性的影响.结果表明:较低的反应压和较高的衬底温度有利于获得非晶/微晶两相结构的硅薄膜,当反应压为0.7 Pa、衬底温度为170℃时,得到非晶/微晶两相结构的硅薄膜晶相体积比约为30%;具有这种晶相体积比的非晶/微晶两相结构的硅薄膜,μτ乘积值约为10-5量级左右,比不含微晶成分的氢化非晶硅样品的μτ乘积值大约2个量级,同时这种晶相体积比的非晶/微晶两相结构的硅薄膜的光敏性在103～104左右,其兼具很好的光电导稳定性和优良的光电特性,是制备非晶硅太阳电池的器件级本征层材料.     

电沉积纳米晶Co-B合金膜的影响因素

通过正交试验和单因素试验,发现电沉积纳米晶Co-B合金的镀速随镀液温度的升高、电流密度的增大、pH的增加而增大。在镀液稳定范围内,随硫酸钴、硼氢化钠质量浓度的增加而增大,随酒石酸钠质量浓度的增加而减小,当四硼酸钠达到一定质量浓度时,对镀速影响较小。在研究范围内所得合金膜全部为非晶态,扫描电子显微镜和扫描隧道电子显微镜观察发现,非晶镀层是由纳米相微粒构成微米级的二次颗粒,二次颗粒堆砌形成薄膜。     

分形结构二维金属镍枝晶的制备与分析

以环形金属镍为阳极,石墨芯为阴极,利用点电极电沉积法制备了具有明显分形结构的二维金属镍枝晶;再以平行板金属镍为阳极,石墨板为阴极,用自行设计的试验设备,通过喷射电沉积法制备了准二维金属镍枝晶簇。采用计算机软件,求得点电极电沉积和平行板电极喷射电沉积所得沉积物的分形维数分别为1.556387和1.753856。两种电沉积方法都适用于金属枝晶的研究。点电极电沉积过程中,电流随时间的延长而逐渐增大;平行板电极喷射电沉积过程中,电压随时间的延长而逐渐降低。     

沉积时间对纳米晶Ni-Fe合金电沉积层耐蚀性的影响

采用直流电沉积法在黄铜基体上制备出纳米晶Ni-Fe合金,其成分为:Ni 76.6％±1.2％,Fe 23.4％±1.2％,晶粒尺寸约为9 nm.在质量分数为3.5％的NaCl溶液中,沉积时间为20 min时所得合金镀层的耐蚀性最好,自腐蚀电流密度约为0.453 μA/cm2,涂层电阻约为80 110 Ω;当沉积时间超过...     

电沉积Ni-W非晶态合金

研究电沉积Ni-W合金的非晶化条件,划分出结晶与非晶结构区。由X衍射实验判定,Ni-W合金镀层足以Ni为溶剂、W为济质的置换型固溶体,呈面心立方结构。通过计算晶格畸变度、晶粒直径及其随结构的变化,解释了非晶镀层的形成原因。测定了作品镀层在酸溶液中的腐蚀速率,用X射线光电子能谱仪(XPS)对其在酸溶液中形成的钝化膜进行了测试,钝化膜的化学结构式为i(OH)_2·WO_3、·nH_2O。     

电沉积Co-Mo合金薄膜的结构和热稳定性

通过电沉积,在铜基体上制备了Co-Mo合金薄膜.讨论了薄膜组成与结构以及非晶合金的晶体结构与热处理温度的关系.测定了薄膜磁性能(饱和磁化强度和矫顽力)随热处理温度变化的关系曲线.结果表明,薄膜中钼含量(质量分数)为6.05%～30.03%时,镀态Co-Mo合金薄膜具有非晶态结构;经连续升温到400℃并热处理1.5 h后,Co-Mo非晶态合金发生晶化,且随着薄膜中钼含量的增加,薄膜的晶化温度提高,热稳定性增强;在较高温度(高于500 ℃)下热处理后,Co-Mo非晶态合金晶化,并析出单一的hcp-Co相;热处理后,Co-Mo合金薄膜的软磁性变差.     

添加离子强度对LBL聚电解质多层膜组装的影响

应用层层自组装技术(LBL)构筑聚电解质多层膜的过程中,组装溶液的离子强度对组装过程有特殊影响。采用紫外分光光度计与椭偏仪同时监测聚电解质沉积时间,聚阳离子(PDDA)浓度,特别是添加氯化钠(NaCl)对聚电解质成膜的影响。聚电解质分别沉积在石英基底和硅基底上,聚电解质膜厚度与聚电解质层数呈现良好的线性关系;随着聚电解质沉积时间的增加,聚电解质膜厚度逐渐增加,沉积时间为10min时聚电解质膜厚度最大;聚电解质膜的厚度随着PDDA浓度的增加呈现增长趋势;聚电解质溶液中加入NaCl,组装层数不大于10层时,聚电解质膜厚度随着NaCl浓度的增加而呈现线性增长。     

氢在微晶硅薄膜低温沉积及退火过程中的影响

采用等离子体增强化学气相沉积(PECVD)法,在玻璃衬底上不同的氢稀释比下低温制备了微晶硅(μc-Si:H)薄膜.利用拉曼(Raman)散射谱研究显示当H2稀释比从95%升高到99%,所得硅膜晶粒大小从2.98 nm增加8.79 nm,晶化率从24%增加到91%;暗电导测试结果从1.32×10-6scm-1增加到7.24×10-3scm-1;沉积速率却大大降低.沉积出的薄膜在进行高温炉退火后,扫描电镜(SEM)显示样品表面孔洞变大增多,推测是氢逸出所致.     

电沉积Co–Mo合金薄膜的结构和热稳定性

通过电沉积,在铜基体上制备了Co–Mo合金薄膜。讨论了薄膜组成与结构以及非晶合金的晶体结构与热处理温度的关系。测定了薄膜磁性能(饱和磁化强度和矫顽力)随热处理温度变化的关系曲线。结果表明,薄膜中钼含量(质量分数)为6.05%~30.03%时,镀态Co–Mo合金薄膜具有非晶态结构;经连续升温到400°C并热处理1.5h后,Co–Mo非晶态合金发生晶化,且随着薄膜中钼含量的增加,薄膜的晶化温度提高,热稳定性增强;在较高温度(高于500°C)下热处理后,Co–Mo非晶态合金晶化,并析出单一的hcp-Co相;热处理后,Co–Mo合金薄膜的软磁性变差。     

有机弱碱体系中介孔分子筛MCM-41的合成与表征

在有机弱碱无水乙二胺为碱介质的条件下(pH≈10) ,以阳离子表面活性剂十六烷基三甲基溴化铵(CTAB)为模板剂,以正硅酸乙酯(TEOS)为硅源,在室温下合成了介孔分子筛MCM-41。与在强碱水热体系中合成的样品相比,室温弱碱体系中合成的样品具有孔道短程有序度高等特点。详细考察了晶化时间、表面活性剂浓度和晶化温度对产物结构的影响。用XRD对所合成的产物进行表征,结果表明,晶化时间越长,所得到产物的有序度越高;随着表面活性剂质量分数的增加,所合成产物的结构和晶型的完整性越高,但并不是表面活性剂的质量分数越大越好,当表面活性剂的质量分数大于6%时,就呈现下降的趋势;随着晶化温度的升高,所得样品的规整性变差,但晶格参数a₀随温度的升高而呈现变大的趋势。     

Determination of the nitrogen compound balance between the atmosphere and a Norway spruce forest ecosystem

Wet, throughfall and stemflow deposition measurements of nitrogen compounds (NH₄ ⁺- and NO₃ ^–-ions) were carried out in a Norway spruce forest in Hungary, together with direct dry deposition and emission estimates (NH₃, NO, NO₂, HNO₃, N₂O gases, NH₄ ⁺ and NO₃ ^– particles). The total deposition of nitrogen compounds from the atmosphere to the forest ecosystem, estimated as the sum of the wet deposition and the measured dry flux, was 1.9 g N m^–2 yr^–1 for the examined period (1996–1998). The net deposition (difference of the deposition and the emission) was 1.8 g N m^–2 yr^–1. About 61% of the deposition is due to dry deposition processes. Ammonia gas dominates in the dry deposition (48%). Soil emission of nitric oxide (NO) and nitrous oxide (N₂O) constitutes only 5% of the total (wet and dry) deposition. From the comparison of directly measured dry deposition figures and the dry deposition calculated as the difference of the throughfall plus stemflow and wet deposition, it is probable that around 60% of the dry deposited nitrogen compounds (36% of the total, dry and wet deposition) are taken up by stomata, mostly in gaseous form. The remaining part (64%) of the deposited nitrogen compounds is leached to the ground where it is partly taken up by the root system, takes part in the soil mineralisation processes, or leaves the ecosystem by ground or surface water run-off.     

Controllable growth of aluminum nanorods using physical vapor deposition

This letter proposes and experimentally demonstrates that oxygen, through action as a surfactant, enables the growth of aluminum nanorods using physical vapor deposition. Based on the mechanism through which oxygen acts, the authors show that the diameter of aluminum nanorods can be controlled from 50 to 500 nm by varying the amount of oxygen present, through modulating the vacuum level, and by varying the substrate temperature. When grown under medium vacuum, the nanorods are in the form of an aluminum metal - aluminum oxide core-shell. The thickness of the oxide shell is ~2 nm as grown and is stable when maintained in ambient for 30 days or annealed in air at 475 K for 1 day. As annealing temperature is increased, the nanorod morphology remains stable while the ratio of oxide shell to metallic core increases, resulting in a fully aluminum oxide nanorod at 1,475 K.     

热油管道最佳蜡沉积厚度研究

热油管道输送含蜡油在管壁出现蜡沉积时,往往频繁使用清防蜡剂或者清管器清管手段予以清除。但是在管道建设初期和运营后期,实际输量小于设计输量,在管壁形成一定厚度的蜡沉积反而有益于提升输送效益。通过分析热油管道蜡沉积前后总传热系数和轴向温降的变化,给出了蜡沉积前后温降计算、经济效益评估、允许最小输量计算等公式。为定量分析蜡沉积最优厚度提供了理论依据,对不同管道确定蜡沉积厚度具有指导意义。     

电化学方法制备生物活性陶瓷

生物活性陶瓷因其优良的生物相容性,广泛应用于临床医学领域。电化学方法开创制备生物活性磷酸钙陶瓷新途径,由于操作简单、条件可控等多方面的优点日益引起重视。介绍了电化学方法制备生物活性磷酸钙陶瓷的原理、工艺进展;讨论了电化学制备方法的特点、影响因素和发展前景。     

Anodic, cathodic and cyclic voltammetric deposition of ruthenium oxides from aqueous RuCl3 solutions

Anodic, cathodic and cyclic voltammetric (CV) deposition of ruthenium oxides from aqueous RuCl₃ solutions have been investigated using stationary and rotating disk electrodes (RDE) in this work. The CV deposition behavior was examined using a RDE to differentiate the contribution of current from the reactions of ruthenium ions in the electrolyte and ruthenium oxides already adsorbed on the electrode. The results indicate that the CV growth of ruthenium oxides within the potential range of aqueous electrolyte decomposition is attributed to the anodic oxidation of ruthenium ions in the electrolyte. Cathodic deposition occurs only at potential negative than −0.30 V versus saturated calomel electrode (SCE) when H₂ evolves on the electrodes. Anodic deposition of ruthenium oxides can be obtained effectively in the potential range of ca. 0.9-1.1 V versus SCE, depending on the pH value of the electrolyte. The optimum anodic and cathodic deposition potential for maximum deposition efficiency is 1.0 and −0.9 V versus SCE, respectively, in the electrolyte solution of pH 2.     

Fabrication of TiO2‒Ag nanocomposite thin films via one-step gas-phase deposition

In this work, TiO₂‒Ag nanocomposite thin films were fabricated for the first time via simultaneous plasma-enhanced chemical vapor deposition and physical vapor deposition of TiO₂ and Ag nanoparticles in the gas-phase, respectively. The presence of Ag nanoparticles in the prepared nanocomposites has been confirmed using transmission electron microscopy and energy dispersive X-ray spectrometry techniques. The obtained electron microscopy images showed that the average size of TiO₂‒Ag nanoparticles was larger than that of pristine TiO₂. Moreover, the temperature of the anatase transformation into the rutile phase was decreased due to the presence of Ag nanoparticles in the TiO₂ matrix, while the photocatalytic activity of the produced nanocomposite (estimated by studying the degradation of methylene blue aqueous solution under UV irradiation) was 35% greater than that of pristine TiO₂. Therefore, the addition of Ag nanoparticles into the TiO₂ matrix significantly affected the morphology, phase transformation temperature, and photocatalytic performance of the fabricated material.     

化学沉积纳米晶Co-P合金及其沉积速率影响因素的研究

化学沉积可得到均匀、致密的纳米晶薄膜,是一种较为理想的纳米晶制备方法。采用正交实验优化了化学沉积纳米晶钴磷合金的工艺配方,研究了正交实验5因素如硫酸钴、柠檬酸三钠、硼酸、次磷酸钠和温度及负载因子、沉积时间对沉积速度的影响。研究获得的优化工艺配方和参数为:0 06～0 12mol/LCoSO4·7H2O,0 40～0 55mol/LNaH2PO2·H2O,0 15～0 3mol/LNa3C6H5O7·2H2O,0 3～0 6mol/LH3BO3,50～80℃,负载因子0 4～0 8dm2/L。     

自泳涂料与自泳涂装技术

简要介绍了自泳涂料与自泳涂装技术，分析了自泳涂装的优缺点。     

Role of TiO2 nanoparticles in the dry deposition of NiO micro-sized particles at room temperature

A room-temperature dry-deposition method with TiO₂ powder was used to deposit NiO particles onto a fluorine-doped tin oxide (FTO) substrate. Initially, in the absence of TiO₂ powder, we observed that the NiO particles did not adhere to the substrate; however, the addition of TiO₂ particles facilitated NiO deposition. The volume percentage (vol%) deposition of NiO particles increased with the TiO₂ particle concentration. The inability of the NiO particles to adhere to the FTO substrate was attributed to the absence of deformation and fragmentation in the substrate. This is related to the lower hardness of the FTO substrate, compared with that of the NiO particles. However, the addition of the TiO₂ particles at different vol% during NiO deposition induced deposition, possibly due to the lower hardness of the TiO₂ particles compared with the FTO substrate. The minimum TiO₂ fraction that enabled NiO powder deposition was ~4.8 vol%. Microstructural analysis revealed that TiO₂ powder agglomerates tended to break up as the NiO particles impacted the substrate surface, creating a “deposition complement” from the excess kinetic energy. The deposition mechanism was investigated using microstructural analysis, electron probe microanalysis, and Brunauer–Emmett–Teller (BET) measurements; the results confirmed the influence of the TiO₂ powders on NiO powder deposition, specifically, an improvement in the adhesion and density of the NiO powder and a decrease in the surface roughness of the coating. Therefore, we demonstrated NiO deposition with TiO₂ particles at room temperature, providing potential applications to the supercapacitor and battery industries.     

High-speed epitaxial growth of SrTiO3 films on MgO substrates by laser chemical vapor deposition

Epitaxial (100) and (111) SrTiO₃ films were prepared on (100) and (111) MgO single-crystal substrates, respectively, using laser chemical vapor deposition. The effect of deposition temperature (T_dep) on the orientation and microstructure of the SrTiO₃ films was investigated. On the (100) MgO substrates, SrTiO₃ films showed a (111) orientation at a low T_dep of 1023 K. (100) SrTiO₃ films, which were epitaxially grown at T_dep=1123–1203 K, had dense cross sections and flat surfaces with rectangular-shaped terraces. On the (111) MgO substrates, (111) SrTiO₃ films were epitaxially grown at T_dep=983–1063 K; however, these films' orientations became random at high T_dep of 1063–1113 K. The (111) SrTiO₃ films consisted of columnar grains with triangular pyramidal caps. The deposition rates of the epitaxial (100) and (111) SrTiO₃ films were 13–25 and 18–32 μm h⁻¹, respectively, which is 5–530 times higher than those obtained by MOCVD.