Concomitant wrinkling and buckle-delamination of elastic thin films on compliant substrates

Compressing a thin elastic film attached to a thick compliant substrate can lead to buckling instability. Two commonly observed buckling modes, buckle-delamination and wrinkling, have each been analyzed separately in previous studies. Recent experiments have observed that the two modes can co-exist and co-evolve. In this paper, by analytical and finite element methods, we present a study on concomitant wrinkling and buckle-delamination for an elastic film on a highly compliant substrate. First, without delamination, we present an analytical solution for wrinkling that takes into account the effect of Poisson’s ratio of the substrate. In comparison with a nonlinear finite element analysis, an approximate formula is derived to estimate the normal traction at the interface and to predict initiation of wrinkle-induced delamination. Next, with a pre-existing delamination crack, the critical strain for the onset of buckling instability is predicted by finite element eigenvalue analysis. For an intermediate delamination size, a mixed buckling mode is predicted with the critical compressive strain lower than previous solutions for both wrinkling and buckle-delamination. Post-buckling analyses show a significant shear-lag effect with an effective load transfer length three orders of magnitude greater than the film thickness. Finally, concomitant wrinkling and buckle-delamination is simulated to illustrate the interaction between the two buckling modes, and the results are discussed in view of failure mechanisms and applications in thin film metrology.     

Buckling and cracking of thin films on compliant substrates under compression

It is shown that unless the substrate is at least as stiff as the film, the energy stored in the substrate contributes significantly to the energy release rate of film delamination under compression either with or without cracking. For very compliant substrates, such as polyethylene terephthalate (PET) with a indium tin oxide (ITO) film, the energy release rate allowing for the deformation of the substrate can be more than an order of magnitude greater than the value obtained neglecting the substrate's deformation. The argument that buckling delaminations tunnel at the tip rather than spread sideways because of increase in mode-mixity may need modification; it is still true for stiff substrates, but for compliant substrates the average energy release rate decreases with delamination width and the limitation in buckled width may be due to this stability as much as the increase in mode-mixity.     

The fracture of brittle thin films on compliant substrates in flexible displays

One mechanical issue in flexible organic light emitting displays (OLED) is the fracture of extremely thin brittle conducting transparent oxide films deposited on thin flexible substrates. Understanding the behaviour of these films under flexed condition is essential for designer of flexible OLED. Controlled buckling experiments on the film and substrate have been designed to study the fracture of the films under both tension and compression. Fracture of the film is superficially similar in both tension and compression. However, under tension a channelling crack is formed, while under compression, the film delaminates, buckles and cracks in a tunnelling motion. The fracture toughness of the film and the delamination toughness have been estimated from these experiments. Design to maximise the flexibility of the device is discussed.     

Residual stress in piezoelectric poly(vinylidene-fluoride-co-trifluoroethylene) thin films deposited on silicon substrates

The residual stress and its evolution with time in poly(vinylidene-fluoride-co-trifluoroethylene) (P(VDF-TrFE) (72/28)) piezoelectric polymer thin films deposited on silicon wafers were investigated using the wafer curvature method. Double-side polished silicon wafers with minimized initial wafer warpage were used to replace single-side polished silicon wafers to obtain significantly improved reliability for the measurement of the low residual stress in the P(VDF-TrFE) polymer thin films. Our measurement results showed that all the P(VDF-TrFE) films possessed a tensile residual stress, and the residual stress slowly decreased with time. Our analysis further indicates that the tensile stress could arise from the thermal mismatch between the P(VDF-TrFE) film and the silicon substrate. Besides possible viscoelastic creep mechanism in thermoplastic P(VDF-TrFE) films, microcracks with widths in the range of tens of nanometers appeared to release the tensile residual stress.     

Ion irradiation hardening of C60 thin films

The nanoindentation technique is used to measure the hardness and the Young’s modulus of ion irradiated C₆₀ films, 70 nm thick, deposited on a Silicon substrate. An increase of hardness from 1.3 GPa for the pristine sample to 10 GPa after irradiation with 800 keV Bi⁺ and N²⁺ ions was observed. The Young’s modulus also increases from 60–150 GPa after the irradiation. The results are discussed in terms of the damage and amorphization produced as consequences of the electronic and nuclear energy transference due to the irradiation.     

Surface effects on the wrinkles in a stiff thin film bonded to a compliant substrate

Surface effects are important to predict the mechanical behavior of nanostructures. In this paper, the wrinkling of a stiff thin film bonded to a compliant substrate is studied using an energy method accounting for surface elasticity and residual surface tension. The wavelength, critical buckling strain and amplitude are obtained analytically. These results provide valuable guide to the precise design and control of the wrinkling profile in many applications ranging from stretchable electronics to micro/nano scale surface patterning and precision metrology.     

Evaluation of incipient plasticity from interfaces between ultra-thin gold films and compliant substrates

Nanoindentation experiments were conducted for 30 nm-thick Au films on two types of substrates, polyimide (compliant) and glass (stiff), to clarify the dominant mechanics of incipient plasticity from the interface. A high resolved shear stress τ_r could be effectively applied to the Au/polyimide interface due to the compliant substrate, and plastic deformation was initiated at the interface. The critical resolved shear stress τ_crss at the interface was determined to have a value of 0.4 ∼ 0.5 GPa. On the other hand, in Au/glass, τ_r peaked within the Au film, and the maximum values were 1.1 ∼ 2.2 GPa depending on the tip radius, whereas the values of τ_r at the Au/glass interface were almost identical at 0.5 ∼ 0.7 GPa. Therefore, plastic deformation might be initiated from the Au/glass interface. The values of τ_crss for heterogeneous nucleation at the interfaces were smaller than that for homogeneous nucleation in the Au films.     

Indentation mechanics and its application to thin film characterization

Instrumented indentation mechanics and its applications to thin film characterization are described and discussed. Instrumented nanoindentation has become an outstanding tool for characterizing coatings and treated surfaces. It is routinely used in industry and university allowing for determining the mechanical performance of coated and treated pieces, that is of primary importance for keeping new surface functionality in time. The paper reviews important procedures and concepts that have proved to be very useful to analyse the contact response (elastic unloading, indentation strains and stresses, composite response of coated pieces). Examples are used to illustrate the very wide range of studies that can be carried out.     

Quality improvement of organic thin films deposited on vibrating substrates

Most of the Organic Light-Emitting Diodes (OLEDs) have a multilayered structure composed of functional organic layers sandwiched between two electrodes. Thin films of small molecules are generally deposited by thermal evaporation onto glass or other rigid or flexible substrates. The interface state between two organic layers in OLED device depends on the surface morphology of the layers and affects deeply the OLED performance. The morphology of organic thin films depends mostly on substrate temperature and deposition rate. Generally, the control of the substrate temperature allows improving the quality of the deposited films. For organic compounds substrate temperature cannot be increased too much due to their poor thermal stability. However, studies in inorganic thin films indicate that it is possible to modify the morphology of a film by using substrate vibration without increasing the substrate temperature. In this work, the effect of the resonance vibration of glass and silicon substrates during thermal deposition in high vacuum environment of tris(8-quinolinolate)aluminum(III) (Alq₃) and N,N′-Bis(naphthalene-2-yl)-N,N′-bis(phenyl)-benzidine (β-NPB) organic thin films with different deposition rates was investigated. The vibration used was in the range of hundreds of Hz and the substrates were kept at room temperature during the process. The nucleation and subsequent growth of the organic films on the substrates have been studied by atomic force microscopy technique. For Alq₃ and β-NPB films grown with 0.1 nm/s as deposition rate and using a frequency of 100 Hz with oscillation amplitude of some micrometers, the results indicate a reduction of cluster density and a roughness decreasing. Moreover, OLEDs fabricated with organic films deposited under these conditions improved their power efficiency, driven at 4 mA/cm², passing from 0.11 lm/W to 0.24 lm/W with an increase in their luminance of about 352 cd/m² corresponding to an increase of about 250% in the luminance with respect to the same OLEDs fabricated in the same way and with the same conditions without substrate vibration.     

Nanomechanical characterization of thermally evaporated Cr thin films — FE analysis of the substrate effect

We study the substrate effect on the deformation and hardness behaviour of chromium thin films using nanoindentation technique. Two different substrates namely Si (100) and AISI-304 SS are used in order to obtain a soft film on a hard substrate and a hard film on a soft substrate combination. Typical hardness variations for the two combinations are obtained. It is also observed that Cr thin films deposited on two different substrates deform distinctly. Radial cracks are found to develop in the case of Cr film on Si whereas circumferential cracks are produced in the case of Cr film on SS substrate. Using 2-D finite element analysis, it is found that the substrate not only affects the development of plastic zone but also the stress distribution in the films which results in observed distinct hardness and deformation behaviour.     

Interface stress induced hardness enhancement and superelasticity in polytetrafluoroethylene/metal multilayer thin films

Polytetrafluoroethylene (PTFE)/Al, PTFE/Cu, and PTFE/Ti multilayer thin films have been deposited in order to investigate effects of interface energy on mechanical properties. PTFE, which has a low surface energy of 19.2 mJ/m², was used to introduce a large interface energy into multilayer thin films. PTFE thin film was deposited by rf magnetron sputtering using a PTFE sheet target. Al, Cu, and Ti were deposited by dc magnetron sputtering. The multilayer thin films were fabricated sequentially without breaking vacuum. Substrate used was aluminosilicate glass. The modulation period was changed from 6.7 to 200 nm. The total thickness was about 200 nm for all samples. The internal stress of metal layers changed from tensile to compressive and increased with decreasing modulation period for all of PTFE/Al, PTFE/Cu, and PTFE/Ti. Both hardness enhancement and superelasticity were observed in the results of nanoindentation measurements. The energy dissipated during nanoindentation process (one load and unload cycle) decreased with decreasing modulation period. The minimum value of the ratio of dissipated/loaded energy was < 40%, which is smaller than the values obtained for monolithic PTFE or metal films (about 73% for PTFE and 87% for Al, 72% for Cu, and 71% for Ti, respectively). This meant that the PTFE/metal nano-multilayer thin films became more elastic with decreasing modulation period. The tendency of change in the mechanical properties strongly correlated to internal stress. Mechanisms involved in anomalous behaviors in film hardness and elasticity were discussed based on the relationship to interface energy, interface stress, and internal stress, induced by multilayering of the films. It is concluded that a large compressive stress introduced in the thin films increased the energy needed to deform elastically or plastically the thin film during indentation, resulting in the increase in hardness and elasticity. The nanoindentation analysis of the multilayer thin films emphasized that in PTFE/metal multilayer thin films mechanical properties of the films depend on interface stress induced by the accumulated interface energy, being independent of bulk materials properties composing thin films, resulting in increase in hardness and elasticity.     

Effect of substrate roughness on the contact damage of thin brittle films on brittle substrates

The effect of substrate and surface roughness on the contact fracture of diamond-like carbon coatings on brittle soda-lime glass substrates has been investigated. The average surface roughness (R_a) of the examined samples ranged from 15 nm to 571 nm. Contact damage was simulated by means of spherical nanoindentation, and fracture was subsequently assessed by focused ion beam microscopy. It was found that, in the absence of sub-surface damage in the substrate, fracture occurs in the coating in the form of radial, and ring/cone cracks during loading, and lateral cracks during unloading. Increasing the surface roughness results in a decrease in the critical load for crack initiation during loading, and in the suppression of fracture modes during unloading from high loads. When sub-surface damage (lateral cracks) is present in the substrate, severe spalling takes place during loading, causing a large discontinuity in the load-displacement curve. The results have implications concerning the design of damage-tolerant coated systems consisting of a brittle film on a brittle substrate.     

Fracture toughness measurement of thin films on compliant substrate using controlled buckling test

Thin films and multilayered structures are increasingly used in the industry. One of the important mechanical properties of these thin layers is the fracture toughness, which may be quite different from the known value of the bulk sample due to microstructural difference. In the design towards device flexibility and scratch resistance, for example, fracture toughness is an important parameter of consideration. This work presents a testing scheme using controlled buckling experiment to determine the fracture toughness of brittle thin films prepared on compliant substrates. When the film is under tension, steady-state channelling cracks form in parallel to each other. Critical fracture strain can be calculated by the measuring the displacement of the buckled plate. The fracture toughness can then be obtained with the help of finite element calculation. When the substrate experiences plastic deformation, the energy release rate is increased by the degree of plasticity. Fracture toughness measurement of two types of thin film Cu-Sn intermetallic compounds has been given to illustrate the merits of such a test scheme.     

TEM study of the indentation behaviour of thin Au film on GaAs

Au films of 8.9 nm thickness have been sputter deposited onto a (001) GaAs substrate at room temperature. An average grain size of 10 nm and no texture were obtained. Subsequent, nanoindentation tests were performed on the coated specimens and the mechanical response was compared to that of a bulk GaAs sample with the same crystallographic orientation. Furthermore, the loading–unloading curves were analysed in view of transmission electron microscopy plan-view images obtained on the deformed substrate–film specimens and compared to results previously reported in the literature for bulk sample. Constrained plasticity of the films was observed to occur for residual depth to thickness ratio below 0.67. Further, plastic deformation of the substrate happened on coated specimens at loads less than those required to plastically deform bare substrate.     

Laser-ablated plasma for deposition of ZnO thin films on various substrates

We report optical and structural properties of ZnO films deposited by pulsed laser deposition technique on 1100) n-typesilicon and quartz substrates at various pressures of back ground gas. ZnO plasma was created using KrF laser 1248 nm) atvarious pressures of the ambient gas, oxygen. Laser induced plasma at varying fluence on the target was investigated using optical emission spectroscopy and 2-D images of the expanding plumes. X-ray diffraction, atomic force microscopy, and spectro-photometry were used to characterize as grown films.     

Characterization of organic polymer thin films deposited by rf magnetron sputtering

Organic polymer thin films deposited by sputtering using polytetrafluoroethylene (PTFE) and polyimide (PI) targets were investigated with Fourier Transform Infrared Spectroscopy (FTIR), X-ray Photoelectron Spectroscopy (XPS), and Scanning Electron Microscopy (SEM). Films deposited from the PTFE target were poly-hydro-fluoro-carbon. The thin films showed water repellency with an H₂O contact angle of about 110° and were transparent in the visible region. C-F combination states in the films were similar to those of bulk PTFE. Films deposited from the PI target were found to contain C-N bonds and were harder than bulk PI. The color of thin films was dark brown, showing the existence of C-N bonds, such as those in imide and/or amide groups. However, the combination states characterized by FTIR and XPS analyses were considerably different from those of bulk PI. The difference in chemical composition and combination states between the films deposited from PTFE and PI is thought to result from the difference in types of particles sputtered from the targets; in the case of PTFE sputtering, less C-F bonds are broken by collision of Ar ions for sputtering, whereas in the case of PI sputtering, C-H and C-C bonds are broken by collision of Ar ions.     

A numerical analysis of flexure induced cylindrical cracks during indentation of thin hard films on soft substrates

In this paper, the fracture behavior of a thin hard film, perfectly bonded to a soft substrate, containing circumferential (cylindrical) cracks subjected to spherical indentation is studied using the finite element method. These cracks emanate upwards from the film-substrate interface and are driven by the flexure of the film over the soft substrate under indentation. The film is taken to be linear elastic while the substrate obeys an elastic-plastic constitutive model with linear strain hardening. Three values for the substrate yield strength are considered in the analysis. The variation of energy release rate and mode mixity are examined as functions of crack length and load, for cracks located near and away from the indentation axis. The results show that, when the crack length is small, predominantly mode I conditions prevail due to tensile radial stresses near the interface. As the crack length increases, the mode mixity gradually changes from mode I to II. For cracks located near the axis, the crack growth process is stable over a range of crack lengths up to about a third of the film thickness and thereafter becomes unstable. The role of the substrate yield strength on the above issues is investigated.     

Properties of n-type ZnN thin films as channel for transparent thin film transistors

In this work we fabricated, by rf magnetron sputtering from a ZnN target, zinc nitride thin films and examined their properties in order to be used as channel layer in thin film transistors. The films were deposited at 100 W rf power and the Ar pressure was 5 mTorr. The zinc nitride thin films were n-type, and depending on the thickness they exhibited low resistivity (10-10^− 2 Ohm?cm), high carrier concentration (10¹⁸-10²⁰ cm^− 3) and very low transmittance values due to the excess zinc in their structure. After annealing at 300 °C, in flowing nitrogen, the films became more conductive, but annealing at higher temperatures deteriorated the electrical properties and became transparent. Transparent thin film transistor having zinc nitride as channel layer exhibited promising transistor characteristics after nitrogen annealing. Improvements in output transistor characteristics due to both material (zinc nitride) and transistor optimization are addressed.     

Effect of underlying silicon film on the evolution of microstructure and hardness of the high-temperature annealed carbon film on Si substrate

Effects of an amorphous silicon underlayer on the evolution of microstructure and hardness of an amorphous carbon film annealed at 900 °C for 0.5-1.5 h were investigated. The two-layer carbon/silicon film after annealing resulted in higher sp²/sp³ bonding ratio but lower hardness reduction compared to the single carbon film at the same total film thickness. The improved hardness reduction of the high-temperature annealed carbon film is attributed to the formation of polycrystals of the amorphous silicon together with the residual compressive stress of the two-layer C/Si films.     

Surface morphology,elastic modulus and hardness of thin film cathodes for Li-ion rechargeable batteries

In this study, surface morphology, elastic modulus and hardness of two thin film cathode materials, namely layered structured LiNi_1/3Co_1/3Mn_1/3O₂ and spinel structured LiMn₂O₄, during the charge/discharge cycles, are measured by using Scanning Electron Microscopy, Atomic Force Microscopy and nanoindentation experiments. Furthermore, the effects of depth of discharge (DOD) and charging rate (current density) on the changes of elastic modulus and hardness of the spinel structured LiMn₂O₄ are also investigated. The results have shown that both elastic modulus and hardness of the thin film cathodes have been significantly affected by the charge/discharge cycles as well as the condition of the charge/discharge processes. These results suggest the importance of the mechanical properties of the cathode materials to the reliability and integrity of the cathode materials to be used for the Li-ion batteries. The possible mechanisms of the changes in mechanical properties are also discussed.