Lithium ion intercalation in partially crystalline TiO2 electrodeposited on platinum from aqueous solution of titanium(IV) oxalate complexes

Starting from the aqueous solution of titanium(IV) oxalate complexes and controlling electrochemical conditions using a cyclic voltammetry (CV) method, the thin layers of TiO₂ on platinum were obtained, which after additional heat treatment, at 450 °C, were still of amorphous nature. The amorphous state of the samples, containing an admixture of crystalline anatase, was confirmed by Raman spectroscopy and by a variety of electrochemical techniques. The new electrochemical procedure allows preparing the oxide with different morphologies. By the comparison with the peroxotitanium route, the oxalate precursor method offers the possibility of the synthesis of amorphous TiO₂ at higher temperatures that is the essential key for the cycling stability of the oxide if one is used as an anode material in lithium ion batteries. The results from cycling voltammetry revealed that electrodeposited TiO₂ reversibly and fast intercalates lithium ions due to its high internal surface area. Therefore, the nanostructural morphology facilitates lithium ion intercalation which was monitored and confirmed in all electrochemical testing. The specific capacity of the TiO₂ approaches the value of 145 mAh g⁻¹ at 8 C-rate in the best case. From the electrochemical impedance spectroscopy (EIS) measurements in connection with SEM investigations, it was concluded that Li⁺ diffusion is the finite space process and its rate is depending on the size of the crystallites building the oxide films. Evaluated values of the D-coefficients are of the order of 10⁻¹⁴ cm² s⁻¹.     

Optical and electrochromic properties of oxygen sputtered tungsten oxide (WO3) thin films

Thin films of tungsten oxide (WO₃) were deposited onto glass, ITO coated glass and silicon substrates by pulsed DC magnetron sputtering (in active arc suppression mode) of tungsten metal with pure oxygen as sputter gas. The films were deposited at various oxygen pressures in the range 1.5×10⁻²−5.2×10⁻² mbar. The influence of oxygen sputters gas pressure on the structural, optical and electrochromic properties of the WO₃ thin films has been investigated. All the films grown at various oxygen pressures were found to be amorphous and near stoichiometric. A high refractive index of 2.1 (at λ=550 nm) was obtained for the film deposited at a sputtering pressure of 5.2×10⁻² mbar and it decreases at lower oxygen sputter pressure. The maximum optical band gap of 3.14 eV was obtained for the film deposited at 3.1×10⁻² mbar, and it decreases with increasing sputter pressure. The decrease in band gap and increase in refractive index for the films deposited at 5.2×10⁻² mbar is attributed to the densification of films due to ‘negative ion effects’ in sputter deposition of highly oxygenated targets. The electrochromic studies were performed by protonic intercalation/de-intercalation in the films using 0.5 M HCl dissolved in distilled water as electrolyte. The films deposited at high oxygen pressure are found to exhibit better electrochromic properties with high optical modulation (75%), high coloration efficiency (CE) (141.0 cm²/C) and less switching time at λ=550 nm; the enhanced electrochromism in these films is attributed to their low film density, smaller particle size and larger thickness. However, the faster color/bleach dynamics is these films is ascribed to the large insertion/removal of protons, as evident from the contact potential measurements (CPD) using Kelvin probe. The work function of the films deposited at 1.5 and 5.2×10⁻² mbar are 4.41 and 4.30 eV, respectively.     

Promotion of microcrystallization by argon in moderately hydrogen diluted silane plasma

Using argon as a diluent of SiH₄, undoped hydrogenated microcrystalline silicon (μc-Si:H) films, having σ_D10⁻⁵ S cm⁻¹, were prepared at a very high deposition rate of 36 Å/min. Micrograins were identified with several well-defined crystallographic orientations. The effect of variation of Ar-dilution on the electrical and structural properties of Si:H films were studied systematically. Addition of H₂ to the Ar-diluted SiH₄ plasma improved the network structure by eliminating defects, introducing structural reorientation and grain growth, although, reducing the deposition rate. Accordingly, highly conducting (σ_D10⁻³S cm⁻¹) undoped μc-Si:H film was achieved utilizing energy released by de-excitation of metastable state of Ar (denoted as Ar*), in association with network modulation by atomic hydrogen in the plasma.     

An investigation of the Li1+δMn2−δO4 cathode material for rechargeable lithium ion batteries Part I: Composition and structure analyses

The Hunter's chemical delithiating process has been applied for the first time to produce Li⁺-extracted materials from δ spinel lithium manganese oxides. The composition and structure of these Li⁺-extracted materials have been analyzed by X-ray diffraction (XRD), infra-red spectroscopy (IR) and atomic absorption spectroscopy techniques. The results show that these Li⁺-extracted materials keep cubic symmetry structure and the host framework Mn_2−δO₄ of the starting material, Li_1+δMn_2−δO₄ (δ=0.044). However, somewhat contraction of the framework occurs during the delithiating process and thus the lattice parameter, a, changes regionally with the lithium content in Li⁺-extracted materials. Furthermore, the present work demonstrates that the amount of lithium ions in octahedral sites remain intact.     

Low-temperature deposition of polycrystalline silicon thin films by hot-wire CVD

Polycrystalline silicon films have been prepared by hot-wire chemical vapor deposition (HWCVD) at a relatively low substrate temperature of 430°C. The material properties have been optimized for photovoltaic applications by varying the hydrogen dilution of the silane feedstock gas, the gas pressure and the wire temperature. The optimized material has 95% crystalline volume fraction and an average grain size of 70 nm. The grains have a preferential orientation along the (2 2 0) direction. The optical band gap calculated from optical absorption by photothermal deflection spectroscopy (PDS) showed a value of 1.1 eV, equal to crystalline silicon. An activation energy of 0.54 eV for the electrical transport confirmed the intrinsic nature of the films. The material has a low dangling bond-defect density of 10¹⁷ cm³. A photo conductivity of 1.9 × 10⁻⁵ Ω⁻¹cm⁻¹ and a photoresponse (σ_ph/σ_d) of 1.4 × 10² were achieved. A high minority-carrier diffusion length of 334 nm as measured by the steady-state photocarrier grating technique (SSPG) and a large majority-carrier mobility-lifetime (μτ) product of 7.1 × 10⁻⁷cm²V⁻¹ from steady-state photoconductivity measurement ensure that the poly-Si : H films possess device quality. A single junction n---i---p cell made in the configuration n⁺-c-Si/i-poly-Si: H/p-μc-Si : H/ITO yielded 3.15% efficiency under 100 mW/cm² AM 1.5 illumination.     

Highly conducting transparent nanocrystalline Cd1−xSnxS thin film synthesized by RF magnetron sputtering and studies on its optical, electrical and field emission properties

Transparent conducting Cd_1−xSn_xS thin films have been synthesized by radio frequency magnetron sputtering technique on glass and Si substrates for various tin concentrations in the films. X-ray diffraction studies showed broadening of peaks due to smaller crystal size of the Cd_1−xSn_xS films, and SEM micrographs showed fine particles with average size of 100 nm. Sn concentration in the films was varied from 0% to 12.6% as determined from energy-dispersive X-ray analysis. The room-temperature electrical conductivity was found to vary from 8.086 to 939.7 S cm⁻¹ and corresponding activation energy varied from 0.226 to 0.076 eV. The optimum Sn concentration for obtaining maximum conductivity was found to be 9.3%. The corresponding electrical conductivity was found to be 939.7 S cm⁻¹, and the mobility 49.7 cm² V⁻¹ s⁻¹. Hall measurement showed very high carrier concentrations in the films lying in the range of 8.0218×10¹⁸–1.7225×10²⁰ cm⁻³. The conducting Cd_1−xSn_xS thin films also showed good field emission properties with a turn on field 4.74–7.86 V μm⁻¹ with variation of electrode distance 60–100 μm. UV–Vis–NIR spectrophotometric studies of the films showed not needed the optical band gap energy increased from 2.62 to 2.80 eV with increase of Sn concentration in the range 0–12.6%. The optical band gap was Burstein–Moss shifted, and the corresponding carrier concentration obtained from the shift also well matched with that obtained from Hall measurement.     

Optical and electrochemical properties of V2O5:Ta Sol–Gel thin films

Vanadium and tantalum-doped vanadium pentoxide, V₂O₅ and V₂O₅:Ta thin films (2.5 and 5 mol% of Ta) were prepared using sol–gel dip-coating technique.The coating solutions were prepared by reacting vanadium (V) oxytripropoxide and tantalum ethoxide (V) as precursors using anhydrous isopropyl alcohol as solvent.The films were deposited on a transparent glass substrate with ITO conducting film by dip-coating technique, with a withdrawal of 20 cm/min from the vanadium–tantalum solution and heat treated at 300 °C for 1 h. The resulting films were characterized by cyclic voltammetry, optical spectroscopy and by X-ray diffraction analysis (XRD). XRD data show that the films thermally treated at 300 °C were crystalline.A charge density of 70 mC/cm² was obtained for the film with 5 mol% of Ta, with an excellent stability up to 1500 cycles.     

Imidazolium-based ionic liquid derivatives for application in electrochromic devices

Novel proton-conducting electrolytes were prepared from the sol–gel precursor 1-[3-(trimethoxy-λ⁴-silyl)propyl]imidazole with the addition of either trifluoroacetic or acetic acid. The presence of trimethoxysilyl groups enabled the solvolysis and condensation reactions of silsesquioxane species. IR spectroscopy revealed that more cube-like species formed in the electrolyte prepared from trifluoroacetic acid, while cube- and ladder-like silsesquioxanes were present in the electrolyte with acetic acid. This assignation was independently confirmed by ²⁹Si NMR analyses revealing the T³ signals of trisiloxane bonding. IR spectroscopy also pointed to the formation of hydrogen bonding in the latter electrolyte, since the frequencies of the observed bands at 1710, 1409, and 1272 cm⁻¹ approached those of acetic acid. In contrast, the IR bands at 1662, 1204, and 1130 cm⁻¹ confirmed the existence of trifluoroacetate anions in the case when the electrolyte was prepared from trifluoroacetic acid. The presence of free trifluoroacetate anions contributed to the moderately higher specific conductivity of this electrolyte (4.6×10⁻⁵ S/cm) compared to that of acetic acid (1.6×10⁻⁵ S/cm). The specific conductivity of the electrolytes could be further increased by the addition of a lithium salt. All electrolytes were employed in electrochromic devices with optically active WO₃ and various inorganic counter-electrodes (CeVO₄, V₂O₅, Ti/V-oxide). Photopic transmittance changes from 30% to 40% were achieved.     

Effect of 8 MeV electron irradiation on electrical properties of CuInSe2 thin films

Radiation damages due to 8 MeV electron irradiation in electrical properties of CuInSe₂ thin films have been investigated. The n-type CuInSe₂ films in which the carrier concentration was about 3×10¹⁶ cm⁻³, were epitaxially grown on a GaAs(0 0 1) substrate by RF diode sputtering. No significant change in the electrical properties was observed under the electron fluence <3×10¹⁶ e cm⁻². As the electron fluence exceeded 10¹⁷ e cm⁻², both the carrier concentration and Hall mobility slightly decreased. The carrier removal rate was estimated to be about 0.8 cm⁻¹, which is slightly lower than that of III–V compound materials.     

Effect of proton irradiation on electrical properties of CuInSe2 thin films

High-energy proton irradiation (380 keV and 1 MeV) on the electrical properties of CuInSe₂ (CIS) thin films has been investigated. The samples were epitaxially grown on GaAs (0 0 1) substrates by Radio Frequency sputtering. As the proton fluence exceeded 1×10¹³ cm⁻², the carrier concentration and mobility of the CIS thin films were decreased. The carrier removal rate with proton fluence was estimated to be about 1000 cm⁻¹. The electrical properties of CIS thin films before and after irradiation were studied between 80 and 300 K. From the temperature dependence of the carrier concentration in CIS thin films, we found N_D=9.5×10¹⁶ cm⁻³, N_A=3.7×10¹⁶ cm⁻³ and E_D=21 meV from the fitting to the experimental data on the basis of the charge balance equation. After irradiation, a defect level was created, and N_T=1×10¹⁷ cm⁻³ for a fluence of 3×10¹³ cm⁻², N_T=5.7×10¹⁷ cm⁻³ for a fluence of 1×10¹⁴ cm⁻² and E_T=95 meV were also obtained from the same fitting. The new defect, which acted as an electron trap, was due to proton irradiation, and the defect density was increased with proton fluence.     

Hybrid organic–inorganic solar cells: Case of the all thin film PMeT(Y)/CdS(X) junctions

Hybrid organic–inorganic all thin film photovoltaic junctions PMeT(Y)/CdS(X) were investigated, where PMeT(Y) is the conducting polymer poly(3-methylthiophene) doped with various anions Y=CF₃SO₃⁻, ClO₄⁻, BF₄⁻, PF₆⁻, and CdS(X) cadmium sulfide doped with various elements X=Cu, Ni, Al, As and Sb. CdS(X) films were spray deposited on conducting and transparent indium-tin oxide (ITO) glass, and PMeT(Y) films were electrodeposited onto the CdS(X) film to form the junction. The electrochemical investigation of the mechanism of electrodeposition and growth of the PMeT(Y) films by means of chronoamperometry, and of the charge transfer behavior of the PMeT(Y)/CdS(X) junctions by means of cyclic voltammetry revealed a strong effect of the nature of Y and X. The same strong effect of Y was also found with PMeT(Y)/ITO junctions, and may have some generality. It was showed that the best quality of contact between the organic and inorganic phases, from an electrochemical viewpoint and in solution, was obtained with the junction, pointing towards a similarly better photovoltaic performance in solid state. This was indeed the case, and it was found that higher short-circuit current, open-circuit photovoltage and energy conversion efficiency, approaching 4%, could be obtained with this junction.     

Annealing effect on electrochromic properties of tungsten oxide nanowires

The effect of thermal annealing on the electrochromic properties of the tungsten oxide (WO_3−x) nanowires deposited on a transparent conducting substrate by vapor evaporation was investigated. The X-ray diffraction (XRD) indicated that the structures of the nanowries annealed below 500 °C had no significant change. The X-ray photoelectron spectroscopy (XPS) analysis suggested that the O/W ratio and the amount of W⁶⁺ ions in the annealed nanowire films could be increased as increasing annealing temperature. Increased annealing temperature could promote the coloration efficiency and contrast of the nanowire films; however, it could also affect the switching speed of the nanowire films.     

In situ hydrogen plasma treatment for improved transport of (4 0 0) oriented polycrystalline silicon films

Polycrystalline silicon (poly-Si) films were deposited on glass by very high-frequency (100 MHz) plasma enhanced chemical vapor deposition from a gaseous mixture of SiF₄ and H₂ with small amounts of SiH₄. (2 2 0) oriented films prepared at small SiF₄/H₂ ratios (<30/40 sccm) showed intrinsic transport properties of poly-Si. However, the room temperature dark conductivity (σ_d) of the (4 0 0) oriented film was very high for intrinsic poly-Si, 7.2×10⁻⁴S/cm. This conductivity exhibited a T^−1/4 behavior, suggesting a high defect density at the grain boundaries. It was found that in situ hydrogen plasma treatment successfully produced (4 0 0) oriented poly-Si with a reasonably low σ_d of 4.5×10⁻⁷S/cm and a good photoconductivity of 1.3×10⁻⁴S/cm.     

Electrophoretic deposition of dense BaCe0.9Y0.1O3−x electrolyte thick-films on Ni-based anodes for intermediate temperature solid oxide fuel cells

Proton conducting BaCe_0.9Y_0.1O_3−x (BCY10) thick films are deposited on cermet anodes made of nickel–yttrium doped barium cerate using electrophoretic deposition (EPD) technique. BCY10 powders are prepared by the citrate–nitrate auto-combustion method and the cermet anodes are prepared by the evaporation and decomposition solution and suspension method. The EPD parameters are optimized and the deposition time is varied between 1 and 5 min to obtain films with different thicknesses. The anode substrates and electrolyte films are co-sintered at 1550 °C for 2 h to obtain a dense electrolyte film keeping a suitable porosity in the anode, with a single heating treatment. The samples are characterized by field emission scanning electron microscopy (FE-SEM) and energy dispersion spectroscopy (EDS). A prototype fuel cell is prepared depositing a composite La_0.8Sr_0.2Co_0.8Fe_0.2O₃ (LSCF)–BaCe_0.9Yb_0.1O_3−δ (10YbBC) cathode on the co-sintered half cell. Fuel cell tests that are performed at 650 °C on the prototype single cells show a maximum power density of 174 mW cm⁻².     

The electro-optical properties of amorphous indium tin oxide films prepared at room temperature by pulsed laser deposition

The electrical and optical properties of pulsed laser deposited amorphous indium tin oxide films at room temperature are discussed. The films were grown from indium oxide (In₂O₃) targets of different tin (Sn) doping content (0, 5 and 10 wt%) at different oxygen pressures (P_O2) ranging from 1×10⁻³ to 5×10⁻² Torr. The electrical and optical properties of the films were examined by Hall measurements and optical spectrophotometry. It was found that high conductivity amorphous films could be prepared at room temperature irrespective of the Sn doping content. The properties of these films deposited from 0, 5, 10 wt% Sn-doped In₂O₃ targets show a similar response to changes in P_O2. The maximal conductivity of (4.0, 2.1 and 1.8)×10³ S/cm and optical transmittance (visible) higher than 90% were obtained at P_O2 region of (1–1.5)×10⁻² Torr. An undoped In₂O₃ film produced the highest conductivity of 4×10³ S/cm in these studies.     

Electrochemical deposition of Zn3P2 thin film semiconductors on tin oxide substrates

Zn₃P₂ semiconductor thin films were prepared by electrodeposition technique form aqueous solutions. The deposition mechanism was investigated by cyclic voltammetry technique. Crystal structure, morphology and composition of as deposited and annealed Zn₃P₂ thin films grown on SnO₂/glass substrates were determined by X-ray diffraction, scanning electron microscopy, and energy dispersive X-ray analysis. X-ray diffraction data indicated the formation of Zn₃P₂ as the predominant phase for both as-deposited and annealed films. The compositions of the deposited films were controlled by the bath temperature, deposition potential and Zn/P ratio in the solution.The dark current–voltage measurements of SnO₂/Zn₃P₂/C devices indicated a rectifying behavior and a reverse saturation current density of 1.7×10⁻⁷ A/cm², which is in good accordance with that obtained from films prepared using vacuum technique. Also, the capacitance–voltage measurements showed that the number of interface states and the built in potential are in the order of 5×10⁻⁹ cm⁻³ and 0.85 V, respectively. These preliminary results for Zn₃P₂ thin films reveal that, this semiconductor material can be used for solar cell applications.     

Thin films of a-SiGe:H with device quality properties prepared by a novel hollow cathode deposition technique

Using a novel hollow cathode plasma-jet reactive sputtering system in which an intense plasma, ignited in an Ar/H₂ flow, is directed through silicon and germanium nozzles, a series of a-SiGe:H thin films have been prepared on silicon and on glass substrates. These films have been optically characterized by infrared (IR) spectroscopy, surface Raman spectroscopy and spectroscopic ellipsometry (335–1000 nm). Total hydrogen concentrations, as determined by FTIR, varied with deposition conditions and ranged from 2.5×10²¹ to 1.6×10²² atom cm⁻³ and correlated with secondary ion mass spectrometry (SIMS) elemental analyses to within 10%. The ellipsometric spectra of the films have been fitted with a modified Tauc–Lorentz model for the determination of film properties, including thickness (ranging from 400 to 1100 nm) along with film uniformity and surface roughness. Conductivity measurements in the dark and under simulated AM1 solar illumination have indicated that the films grown exhibit device-quality properties. The light-to-dark conductivity ratio has consistently been greater than 1000 for films with bandgaps down to 1.3 eV. Relationships between deposition parameters, light-and-dark conductivity properties, and chemical structural features are discussed.     

Fabrication of stable hydrogenated amorphous silicon from SiH2Cl2 by ECR-hydrogen-plasma

Relatively stable high bandgap hydrogenated amorphous silicon (a-Si:H) films were prepared by the microwave electron cyclotron resonance (ECR) hydrogen plasma CVD method using SiH₂Cl₂ source gas. The substrate position relative to the position of the generation of reactive species affects the structure of these films. The films prepared under optimized condition showed rather high bandgap, 1.83 eV. However, the defect density was low, 3 × 10¹⁵ cm⁻³, and the photosensitivity was greater than 7 orders of magnitudes. The defect density was found to saturate at relatively low values ( 3 × 10¹⁶ cm⁻³) independent of the illumination intensity.     

Epi-n-IZO thin films/1 0 0 Si, GaAs and InP by L-MBE––a novel feasibility study for SIS type solar cells

High quality epitaxial indium zinc oxide (heavily indium oxide doped) (epi-n-IZO) thin films were optimized by laser-molecular beam epitaxy (L-MBE) i.e., pulsed laser deposition (PLD) technique for fabricating novel iso- and hetero-semiconductor–insulator–semiconductor (SIS) type solar cells using Johnson Matthey “specpure”- grade 90% In₂O₃ mixed 10% ZnO (as commercial indium tin oxide (ITO) composition) pellets. The effects of substrate temperatures, substrates and heavy indium oxide incorporation on IZO thin film growth, opto-electronic properties with 1 0 0 silicon (Si), gallium arsenide (GaAs) and indium phosphide (InP) wafers were studied. As well as the feasibility of developing some novel models of iso- and hetero-SIS type solar cells using epi-IZO thin films as transparent conducting oxides (TCOs) and 1 0 0 oriented Si, GaAs and InP wafers as base substrates was also studied simultaneously. The optimized films were highly oriented, uniform, single crystalline approachment, nano-crystalline, anti-reflective (AR) and epitaxially lattice matched with 1 0 0 Si, GaAs and InP wafers without any buffer layers. The optical transmission T (max) 95% is broader and absolute rivals that of other TCOs such as ITO. The highest conductivity observed is σ=0.47×10³ Ω⁻¹ cm⁻¹ (n-type), carrier density n=0.168×10²⁰ cm⁻³ and mobility μ=123 cm²/V s. From opto-electronic characterizations, the solar cell characteristics and feasibilities of fabricating respective epi-n-TCO/1 0 0 wafer SIS type solar cells were confirmed. Also, the essential parameters of these cells were calculated and tabulated. We hope that these data be helpful either as a scientific or technical basis in semiconductor processing.     

Reduction of defects of polycrystalline silicon thin films by heat treatment with high-pressure H2O vapor

An improvement of electrical properties of pulsed laser crystalllized silicon films was achieved by simple heat treatment with high-pressure H₂O vapor. The electrical conductivity of 7.4×10¹⁷ cm⁻³ phosphorus-doped 50-nm-thick pulsed laser crystallized silicon films was markedly increased from 1.6×10⁻⁵ S/cm (as crystallized) to 2 S/cm by heat treatment at 270°C for 3 h with 1.25×10⁶ Pa H₂O vapor because of reduction of density of defect states localized at grain boundaries. Spin density was reduced from 1.7×10¹⁸ cm⁻³ (as crystallized) to 1.2×10¹⁷ cm⁻³ by heat treatment at 310°C for 3 h with 1.25×10⁶ Pa H₂O vapor.