大型环抛机蜡盘平面度的测量

针对大口径平面光学元件全频谱面形技术指标的高效率、高精度收敛,研究了环形抛光技术。考虑环抛机沥青蜡盘的平面度直接影响工件面形的收敛效率,本文利用准直激光束作为参考,设计研制了测量精度高,重复性精度达到±1μm的大型环抛机抛光蜡盘平面度测量专用装置。分析了环抛过程中蜡盘表面平面度和工件面型PV值之间的变化规律和相关性,根据测量数据得出了蜡盘平面度数据和工件面形的对应关系。实验显示:当平面度和面形曲线相差较大时,工件面形可快速收敛至1λ左右,并由粗抛向精抛工序快速过渡。提出的大型环抛机抛光蜡盘平面度监测装置实现了对湿滑胶体平面的高精度、快速测量,为环抛的确定性抛光工艺提供了重要的技术支持。     

Research on unbounded abrasive polishing process with assisted ultrasonic vibration of workpiece

Ultrasonic-assisted machining was an effective method to improve the material removal quality especially to difficult-to-cut metal materials. The ultrasonic vibration was usually superimposed on the machining tool but seldom on the workpiece, although the ultrasonic vibration of workpiece could improve the processability of material more effectively. In this paper, a rectangle hexahedron ultrasonic sonotrode with optimized slots was developed as a platform to realize the assisted ultrasonic vibration of workpiece and the ultrasonic-assisted polishing process of austenitic stainless steel was also studied. The unbounded abrasive was selected as polishing medium, and the path compensation strategy of soft polishing tool was carried out for getting uniform polishing force. The orthogonal experiments were designed to study the optimization of ultrasonic polishing parameters and the relation between different types of ultrasonic polishing path and polishing quality. The results appear that the horizontal ultrasonic vibration of workpiece can reduce polishing force and improve polished surface roughness, which can also reinforce the proportion of plastic shear effect in the material removal process. The ultrasonic polishing path keeping consistent with workpiece vibration direction can get more uniform polishing force and better surface roughness. And the 45° oblique crossing ultrasonic path can get the maximum average polishing force reduction by 75.2 %.     

基于喷射抛光实验研究结果的异形抛光实验台设计

介绍了标准的液体喷射抛光实验,提出了近壁面附近固液两相流中的颗粒作用导致的流体摩擦剪切去除材料的机制假设,然后通过实验研究了抛光时间、样品表面初始粗糙度、喷头形状、喷射距离、喷射压力和pH值对抛光结果的影响。结果表明,抛光结果随时间趋于稳定并与初始粗糙度无关,圆形喷头比扇形喷头抛光效率高,喷射距离和压力影响一致,pH值越低影响越大。最后基于理论假设和实验结果设计了一个可以用于精密光学制造中异形表面抛光的实验装置。     

应用双摆动技术加工离轴碳化硅反射镜

研究了用双摆动技术抛光离轴非球面的工艺。介绍了用双摆动抛光加工离轴非球面的原理,分析了双摆动抛光过程中抛光盘与工件的相对运动特性及各个工艺参数对相对运动路径的影响。建立了双摆动抛光运动的数学模型,进行了计算机仿真,并对不同参数下的仿真结果进行了比较。给出了抛光模形状模型,实验验证了不同形状抛光模的材料去除特性。应用双摆动技术加工了一个224mm×108mm离轴碳化硅反射镜,结果显示:应用该技术加工离轴非球面镜可以有效抑制光学表面中频误差,具有较高的材料去除效率,面形精度可以稳定达到λ/30(rms,@633nm)。因此,双摆动抛光技术的研究有助于推动离轴非球面制造技术的发展。     

集群磁流变变间隙动压平坦化加工试验研究

为了提高光电晶片集群磁流变平坦化加工效果,提出集群磁流变变间隙动压平坦化加工方法,探究各工艺参数对加工效果的影响规律。以蓝宝石晶片为研究对象开展了集群磁流变变间隙动压平坦化加工和集群磁流变抛光对比试验,通过检测加工表面粗糙度、材料去除率,观测加工表面形貌、集群磁流变抛光垫中磁链串受动态挤压前后形态变化,研究挤压幅值、工件盘转速、挤压频率以及最小加工间隙等工艺参数对加工效果的影响规律。试验结果表明：集群磁流变平坦化加工在施加工件轴向微幅低频振动后,集群磁流变抛光垫中形成的磁链串更粗壮,不但使其沿工件的径向流动实现磨粒动态更新、促使加工界面内有效磨粒数增多,而且在工件与抛光盘之间的加工间隙产生动态抛光压力、使磨粒与加工表面划擦过程柔和微量化,形成了提高材料去除效率、降低加工表面粗糙度的机制。对于2英寸蓝宝石晶电（1英寸=2.54 cm）集群磁流变变间隙动压平坦化加工与集群磁流变抛光加工效果相比,材料去除率提高19.5%,表面粗糙度降低了42.96%,在挤压振动频率1 Hz、最小加工间隙1 mm、挤压幅值0.5 mm、工件盘转速500 r/min的工艺参数下进行抛光可获得表面粗糙度为Ra0.45 nm的超光滑表面,材料去除率达到3.28 nm/min。证明了集群磁流变变间隙动压平坦化加工方法可行有效。     

磁流变变间隙动压平坦化加工力特性研究

磁流变变间隙动压平坦化加工利用工件的轴向低频振动使磁流变液产生挤压强化效应,可以有效提高加工效果并使光电晶片快速获得纳米级表面粗糙度。通过旋转式测力仪试验研究不同变间隙参数对磁流变变间隙动压平坦化加工过程中抛光正压力的影响规律,结果表明,在工件轴向低频振动作用下,抛光正压力形成脉冲正值和负值周期性的动态变化过程;将工件轴向低频振动过程分解为下压过程与拉升过程,下压速度和拉升速度对动态抛光力有不同的响应特性;随着最小加工间隙的减小抛光正压力会急剧增大;设置最小加工间隙停留时间观察抛光正压力变化,可以发现在工件最小加工间隙停留期间抛光力从峰值逐渐衰减并趋于平稳;挤压振动幅值对抛光正压力影响较小。建立了磁流变变间隙动压平坦化加工材料去除模型,弄清了在动态压力作用下,磨料更新及其附加运动机制,研究了磁流变变间隙动压平坦化加工过程中磨料颗粒对工件表面柔性划擦和微量去除的作用机理,为磁流变变间隙动压平坦化加工的工艺优化提供了理论依据。     

Analytical determination of friction resistance as a function of normal load and geometry of surface irregularities

A mathematical modeling and simulation of friction during steady state sliding of metals, based on the upper-bound approach, is demonstrated. The existence of wedge-shaped protrusions on the tool surface is assumed. Pressing these protrusions onto the workpiece and sliding the tool along the workpiece produces asperities on the surface of the workpiece. These asperities move in a wave-like motion along the surface layer and cause plastic deformation through a specified depth under the surface. This plastic deformation combines with local friction between the tool and the workpiece along the asperity interface to produce resistance to sliding. The relation between the normal pressure and the sliding resistance is established for the entire range of pressure levels from zero to infinity. The apparent Coulomb coefficient of friction for lower levels of normal pressure and the constant friction factor for excessive load levels are determined. The transition region from Coulomb coefficient of friction to constant friction factor also becomes clear. A mathematical determination is obtained by means of a force equilibrium considering the concept of a contact surface friction ratio. The force of resistance to sliding is related both to the geometry of the asperity of the surface of the tool and to the constant friction factor, which is used for measuring a local frictional force along the interface of each asperity.     

A study on the application of newly developed magneto-elastic abrasive to improving the surface roughness of the bore

Spiral polishing mechanism refers to the technology of applying a high-speed turning screw rod in the process of workpiece surface polishing. For the purpose of increasing the machining effect, a powerful ring magnet was installed around the workpiece. In this study, the new self-developed magneto-elastic abrasive would be used to polish the inner wall of the bore, the so-called workpiece surface, under the attraction of the surrounding magnet and the drive of the turning rod. The new magneto-elastic abrasive not only eased the polishing force by its flexibility but also avoided deep scratches on the workpiece surface. The control of machining parameters on surface roughness and material removal were discussed to look for the best combination of the parameters; at the same time, the effects of each parameter on the workpiece surface topography after the polishing were also examined. The results of the experiment indicated that magnetic flux density and magneto-elastic abrasive concentration affected the surface roughness the most. In addition, the newly developed magneto-elastic abrasive significantly improved the polishing effect of the workpiece surface, at the rate of 94 %.     

未知工件CAD信息的气囊抛光技术研究

为解决传统的气囊抛光操作都需要工件CAD信息所引起的抛光效率低下、操作复杂等问题,现将一种能够在线自动重构工件几何信息技术应用到机械臂气囊抛光系统中。介绍了抛光工件未知曲面在线重构的操作方法,从而获取工件未知曲面的法矢量,提出了抛光气囊头与工件未知曲面接触力的主动控制方案,将传统的力/位并行控制算法模拟人的大脑,试着去识别工件表面的几何变化趋势,建立了具有时变约束的在线最优轨迹规划算法。通过在机械臂气囊抛光实验设备中对一未知几何信息的工件进行了自动抛光操作,对抛光效果和抛光过程中的接触力进行了实验对比和数据分析。结果表明,该策略在应用改进的力/位并行控制算法跟踪和识别一个未知的抛光工件曲面是可行、有效的。     

用于模具自由曲面的新型气囊抛光中磨粒场的分析

为提高模具自由曲面抛光的效率和品质,提出一种基于柔性抛光理念的新型气囊抛光技术。研究了气囊抛光接触区内磨粒的运动轨迹、压力分布和抛光力的分布情况,建立了气囊抛光接触区内磨粒的运动模型、压力模型,揭示了气囊抛光接触区内磨粒直径对抛光力和被加工工件内部剪切应力的影响规律,研究了抛光过程中工件内部的剪切应力分布,明确了材料疲劳去除机理。为气囊抛光的应用奠定了理论基础。     

Effect of Rheological Properties of a Magnetosensitive Tool on the Friction and Wear of Polished Surface

The results of an experimental investigation on determining the characteristics of a magnetorheological polishing composition prevailing in the course of the abrasive removal of the material of a treated surface have been presented. The similar character of relative rate of material removal in the course magnetorheological polishing and the friction force increment in the course of the model experiment depending on the strength of the external magnetic field has been revealed. It has been shown that, in the course of magnetorheological polishing, a determining role in the abrasive material removal is played by viscoplastic properties of the magnetorheological matrix formed in the magnetic field.     

Contact force modeling and analysis for robotic tilted-disc polishing of freeform workpieces

This paper investigates the tool-workpiece contact mechanism in the disc polishing process, where the soft polishing disc touches the rigid freeform workpiece with a small tilt angle. The developed contact force model can explain how the contact parameters, including the disc contact depth, the disc tilt angle, the radii of curvature of the disc and the workpiece, affect the normal contact force. Under some reasonable geometric and mechanical assumptions of the disc and the workpiece, an approximated contact force equation is derived in a simple power-law form similar to the Hertzian contact model. The contact force is found to be positively related to the disc contact depth and the disc radius, while negatively related to the disc tilt angle and the workpiece normal curvature that is orthogonal to the feed direction. Both finite element simulations and experiments verify the effectiveness of the proposed contact force model. Furthermore, the material removal process is analyzed and a model-based process parameter planning method is developed to achieve uniform material removal considering the variation of workpiece curvatures.     

超声波磁流变复合抛光中几种工艺参数对材料去除率的影响

提出了一种光学抛光的新方法——超声波磁流变复合抛光。介绍了该抛光方法的基本原理和实验装置,进行了超声波磁流变复合抛光实验,采用轮廓仪实测了光学玻璃超声波磁流变抛光材料去除轮廓曲线。通过该项工艺实验,研究了五种工艺参数(磁场强度、超声振幅、抛光工具头与工件的间隙、抛光工具头转速、工件转速)对光学玻璃材料去除率的影响。在一定实验条件下,获得的材料去除率为0.139 μm/min,并获得了超声波磁流变复合抛光工艺参数与材料去除率的关系曲线,得出了光学玻璃超声波磁流变复合抛光的材料去除规律。     

化学机械抛光过程低 k/铜表面材料去除机制及损伤机制研究进展*

针对低k介质/铜表面在平坦化加工中极易造成材料界面剥离、互连线损伤和表面不平整等问题,国内外学者对CMP过程中的材料去除机制以及损伤机制开展了大量的研究工作。对集成电路平坦化工艺——化学机械抛光过程中低k介质/铜界面的力学行为和摩擦损伤特性研究进展进行综述,介绍异质表面的材料去除行为及去除理论研究现状;展望了化学机械抛光过程低k介质/铜表面去除机制研究的研究趋势,即通过对异质界面的分子原子迁移行为研究,揭示异质表面的微观材料去除机制及损伤形成机制,最终寻找到异质表面平坦化及损伤控制方法。     

时变去除函数在气压砂轮抛光中的应用研究

针对气压砂轮抛光中通过驻留时间控制材料去除量需在模具表面多去除一层材料及抛光效率低等问题,提出了一种基于时变去除函数的抛光材料去除量控制方法。该方法以抛光工具所能达到的最大进给速度在模具表面进行抛光加工,无需多去除材料,通过实时改变抛光工具的去除能力以适应面形误差的变化,极大地缩短了抛光时间;开展了抛光材料去除过程研究,建立了气压砂轮抛光工具进给速度与面形数据和抛光去除函数之间的关系,提出了抛光过程时间的计算方法;针对时变去除能力超出抛光工具最大去除能力的问题,提出了在气压砂轮抛光中对需去除的材料进行分层抛光的思想。最后,通过抛光过程时间对材料去除量控制的两种方法进行了对比分析。研究结果表明,在气压砂轮抛光中采用时变去除函数来控制材料去除量能极大地提高抛光效率。     

磁场分布对多磨头磁流变抛光材料去除的影响

为研究磁场分布对材料去除的影响,设计轴向充磁异向排布、轴向充磁同向排布、径向充磁异向排布、径向充磁同向排布4种磁铁充磁和排布方式,利用有限元软件Maxwell仿真不同磁场的磁力线分布及抛光轮表面的磁感应强度分布,并采用数字特斯拉计测量实际磁感应强度。对单晶硅基片进行定点抛光试验,检测抛光斑沿抛光轮轴向的去除轮廓及峰值点的表面形貌。仿真和实际磁感应强度检测结果表明,不同磁场分布方式对抛光区的磁场分布有很大影响,磁铁轴向充磁同向排布与径向充磁异向排布时,具有较高的磁场强度和较好的多磨头效果。定点抛光试验表明,采用轴向充磁同向排布与径向充磁异向排布这两种方式时,能实现多点加工,其中轴向充磁同向排布时加工效率较高;但采用径向充磁同向排布时,由于抛光区磁感应强度较低,磁流变微磨头无法对工件进行有效地抛光。峰值点表面形貌检测结果表明,采用不同磁场分布方式时,对工件表面均是以塑性去除方式去除。研究表明,通过优化磁铁充磁和排布方式,可实现多磨头磁流变抛光的加工原理。     

光学玻璃磁性复合流体抛光应力与材料去除率的实验研究

根据光学玻璃元件超精密加工技术的需求,研究自旋转式和行星旋转式磁性复合流体(MCF)抛光的应力分布和材料去除率。首先,设计可实现自旋转和行星旋转抛光装置,搭建抛光实验平台;然后,进行自旋转式和行星旋转式MCF抛光实验,通过自行设计抛光应力分布测试实验分析了两种抛光方式的应力分布规律;最后,通过定点抛光实验,对抛光前后的工件表面轮廓进行检测,计算并分析两种抛光方式的材料去除率。实验结果表明,立式的两种抛光方式,正应力均明显大于剪切应力,工件外侧受到的剪切应力大于中心受到的剪切应力,行星式抛光的材料去除率明显大于自旋转式抛光的材料去除率。     

非一致曲率表面下的气压砂轮磨粒剪胀及加工试验研究#br#

针对软固结磨粒气压砂轮在加工异形曲面时,工件所受的切削力以及接触区内磨粒速度因工件曲率发生变化,导致工件不同曲率处材料去除量不均匀的问题, 基于修正的Rowe剪胀理论建立砂轮切削力模型,提出了非一致曲率表面下修正的气压砂轮材料去除模型。通过EDEM软件建立了软固结磨粒气压砂轮模型,分析了砂轮下压量为1.5 mm时工件曲率对接触力以及接触区内磨粒速度的影响。搭建气压砂轮加工试验平台,通过光整加工试验验证修正的材料去除模型。研究结果表明：修正的材料去除模型平均绝对值误差为0.095,而原始的材料去除模型平均绝对值误差为0.291,说明修正的材料去除模型可以用于气压砂轮抛光过程中的定量分析,且工件加工表面划痕明显减少。     

立、卧式磁性复合流体抛光对比实验研究

针对磁性复合流体(MCF)抛光的两种抛光头,进行MCF抛光特性对比实验研究。开展了黄铜H26的平面抛光实验,调查立式和卧式抛光头分别对工件材料去除率、表面形貌与粗糙度以及MCF水分损耗等抛光特性的影响。实验结果表明,卧式MCF抛光能够较快地降低表面粗糙度,获得较高的材料去除率,MCF水分损失相对较快;立式MCF抛光能够在相对较长时间内获得稳定的材料去除率和表面粗糙度,MCF水分损失也较为平稳。     

磨料流微去除力学分析与可控因素影响

研究了磨料流抛光中磨粒微去除力学建模方法以及可控因素影响抛光效果的问题。以力为纽带,提出磨粒去除工件表面微凸材料的动力来源于三个方面--介质作用力、磨粒挤压载荷和磨粒冲击载荷。利用建立的力学模型,分析了磨料流加工的内在因素,其中可控因素包括：加工温度、加工压力、活塞的移动速度、磨料黏度、磨粒物理性质（如尺寸、硬度）等;研究了各可控影响因素与工件表面抛光质量及效率的关系;量化了可控因素的大小对磨粒作用在工件表面的力的影响程度;将磨粒作用在工件表面的力合成并分解为与活塞运动方向相同的轴向力和垂直于工件壁面的切向力,指出微去除效果随轴向力与径向力的比值改变而发生变化,设计出简易的测量轴向力和径向力的方案。用试验验证了所建模型和可控因素对抛光效果影响,以及工件表面的加工纹理方向直接影响工件表面粗糙度的减小率和材料去除率的正确性。