Estimation of the average residual reflectance of broadband antireflection coatings

We deal with optimal two-material antireflection (AR) coatings for the visible and adjacent spectral regions. It has been shown before that, for a given set of input parameters (refractive indices of the substrate, ambient medium and high- and low-index coating materials, and for a given spectral width of the AR coating), such designs consist of one or more clusters of layers of approximately constant optical thickness and number of layers. We show that, through the analysis of many different optimal coatings, it is possible to derive two parameters for a simple empirical expression that relates the residual average reflectance in the AR region to the number of clusters. These parameters are given for all possible combinations of relative spectral bandwidth equal to 2, 3, and 4; low-index to ambient-medium index ratio equal to 1.38 and 1.45; and high-to-low index ratio equal to 1.4, 1.5, and 1.7. The agreement between the numerically and the empirically calculated values of residual average reflectance is excellent. From the information presented the optical thin-film designer can quickly calculate the required number of layers and the overall optical thickness of an AR coating having the desired achievable residual average reflectance.     

Toward perfect antireflection coatings. 3. Experimental results obtained with the use of Reststrahlen materials

The equipment and methods used to produce wide-angle antireflection coatings based on Reststrahlen materials are described. The optical constants of the coating materials used in the construction of the multilayers were determined by spectrophotometric ellipsometry and are compared with the literature values. The measured performance of an experimentally produced antireflection coating is compared with the expected calculated performance. The reflectance is low over a wide range of angles, but only in the narrow-wavelength region at which the refractive index of the Reststrahlen material is close to unity.     

Narrow line-width filters based on rugate structure and antireflection coating

Filters that have high transmittance over the passband region of the reflectance spectrum are designed by combining rugate structures and antireflection (AR) coatings. It is found that, under certain conditions, the refractive index of the substrate could be “converted” to the air-side refractive index of the graded-refractive-index coating. A method for the fabrication of graded-index coatings by rapidly alternating deposition of low (SiO₂) and high (Nb₂O₅) refractive index materials is introduced, and this technology was used to fabricate a rugate structure. An AR coating with a refractive index of 1.23 was grown onto the rugate structure by glancing angle deposition technology. Optical measurements of the combined structure show excellent transmittances over the wavelength regions around the reflection band and high reflectances in the stopband.     

New designs for far-infrared beam splitters

We explore theoretically the design of multilayer beam splitters for the far-infrared that are based on coated pellicles as well as on solid substrates. The specific design criterion considered is as high a value as possible of the efficiency E = 4RT throughout the 10-140-μm spectral region. Here R and T are the reflectance and the transmittance of the beam splitter, respectively. In the numerical study the refractive indices of the substrates and coating materials varied between 1.50 and 4.00. To survey the range of designs, we make a number of simplifying assumptions, the significance of which is later investigated. Various potential manufacturing problems are considered. It is shown that the performance of the beam splitters is not sensitive to the accuracy with which the layer thicknesses can be controlled. However, it does depend strongly on the lowest available refractive index of the coating materials. The performance is particularly sensitive to the extinction coefficients of solid substrate materials. Multilayer designs presented should be useful for use in Fourier-transform spectrometers, as well as in other applications that do not require as high a spectral resolution.     

Deposition and spectral performance of an inhomogeneous broadband wide-angular antireflective coating

Gradient index coatings and optical filters are a challenge for fabrication. In a round-robin experiment, basically the same hybrid antireflection coating for the visible spectral region, combining homogeneous refractive index layers of pure materials and linear gradient refractive index layers of material mixtures, has been deposited. The experiment involved three different deposition techniques: electron-beam evaporation, ion-beam sputtering, and radio frequency magnetron sputtering. The material combinations used by these techniques were Nb(2)O(5)/SiO(2), TiO(2)/SiO(2), and Ta(2)O(5)/SiO(2), respectively. The spectral performances of samples coated on one side and on both sides have been compared to the corresponding theoretical spectra of the designed profile. Also, the reproducibility of results for each process is verified. Finally, it is shown that ion-beam sputtering gave the best results in terms of deviation from the theoretical performance and reproducibility.     

Optical properties of hydrogenated hard carbon thin films

Hydrogenated amorphous carbon (a-C:H) films were deposited onto glass, silicon and germanium substrates. The films are transparent in the IR and are extremely hard (Mohs' hardness of about 8). The a-C:H coatings were prepared in an r.f.-excited discharge sustained by various hydrocarbon gases.The thickness, density, refractive index (at 0.3 μm and 2–10 μm) and relative hydrogen content were determined. Variations in the IR refractive index and the relative hydrogen content could be correlated with the deposition conditions. With a refractive index of approximately 2 a-C:H is an ideal antireflection coating for germanium (n = 4).Laser calorimetric measurements of optical absorption at 10.6 μm give a loss as low as 3% for a coating 1.3 μm thick on germanium (λ/4 for n = 2 at 10.6 μm).     

Optical properties of an optically rough coating from inversion of diffuse reflectance measurements

A method is developed for determining the optical properties of an optically rough coating on an opaque substrate from reflectance measurements. A modified Kubelka-Munk two- flux model is used to calculate the reflectance of the coating as a function of the refractive index, absorption coefficient, scattering coefficient, and thickness. The calculated reflectance is then fitted to measurements using a spectral projected gradient algorithm, allowing the optical properties to be obtained. The technique is applied to titanium dioxide coatings on a titanium substrate. Realistic values of refractive index and absorption coefficients are generally obtained. Quantities that are useful for solar water-splitting applications are calculated, including the depth profile of absorption and the proportion of the incident photon flux absorbed in the coating under solar illumination.     

Antireflection coating formed by plasma-enhanced chemical-vapor deposition for terahertz-frequency germanium optics

A method of manufacturing optical coatings for germanium optics used at terahertz frequencies has been developed. The various optical coatings used at terahertz frequencies are difficult to manufacture conventionally because these coatings must be as thick as several tens of micrometers, which is far thicker than those used in the optical region. One way to overcome this problem is to form a silicon oxide layer through plasma-enhanced chemical-vapor deposition, with silane (SiH4) as a source gas. Using this method, I formed 21-microm-thick silicon oxide films as antireflection (AR) layers for germanium optics and obtained low reflection at 1.7 THz (wavelength, lambda = 175 microm). This method is easily applied to large-aperture optics and micro-optics as well as to optics with a complex surface form. The AR coatings can also be formed for photoconductive detectors made from germanium doped with gallium at a low temperature (160 degrees C); this low temperature ensures that the doped impurities in the germanium do not diffuse. Fabrication of optical coatings upon substrates that have refractive indices of 3.84-11.7 may also be possible by control of the refractive indices of the deposited layers.     

Development of optical coatings for 157-nm lithography. I. Coating materials

In a basic study to identify low-loss optics for applications in F2 lithography, five potential coating materials (AlF3, Na3AlF6, MgF2, LaF8, and GdF3) and three deposition methods (thermal evaporation by a resistance heater and by electron beam and ion-beam sputtering) were investigated in the vacuum ultraviolet (VUV) region. Samples were supplied as single-layer coatings on CaF2 substrates by four Japanese coating suppliers. Refractive indices (n) and extinction coefficients (k) of these coatings at 157 nm were evaluated; the transmittance and the reflectance were measured by a VUV spectrometer and were compared. As a result, resistance heating thermal evaporation is seen to be the optimal method for achieving low-loss antireflection coatings. The relation among optical constants, microstructures, and stoichiometry is discussed.     

A study of silicon oxynitride film prepared by ion beam assisted deposition

A SOI-based optoelectronic device needs a high-quality antireflection coating on both faces of the device to minimize the optical reflectance from the face. In this work amorphous silicon oxynitride films were deposited on silicon substrates by ion beam assisted deposition (IBAD). The main purpose was to use silicon oxynitride film as single layer anti-reflection coating for SOI-based optoelectronic devices. This application is primarily based on the ability to tune the silicon oxynitride optical functions to the optimal values by changing deposition parameters. The chemical information was measured by X-ray photoelectron spectroscopy (XPS). Spectroscopic ellipsometry (SE) was applied to measure the refractive index and thickness. Single-side polished silicon substrate that was coated with silicon oxynitride film exhibited low reflectance. Double-side polished silicon substrate that was coated with silicon oxynitride film exhibited high transmittance. In addition, the Fresnel losses could be reduced to 0.08 dB by depositing silicon oxynitride films onto double-side polished silicon substrates. The results suggested silicon oxynitride film was a very attractive single layer anti-reflection coating for SOI-based optoelectronic device.     

Infrared filters and coatings for the High Resolution Dynamics Limb Sounder (6-18 microm)

We describe the spectral design and manufacture of the narrow-bandpass filters and 6-18-mum broadband antireflection coatings for the 21-channel High Resolution Dynamics Limb Sounder. A method of combining the measured spectral characteristics of each filter and antireflection coating, together with the spectral response of the other optical elements in the instrument, to obtain a predicted system throughput response is presented. The design methods that are used to define the filter and coating spectral requirements, choice of filter materials, multilayer designs, and deposition techniques are discussed.     

Antireflection coatings designed for two different infrared substrates

It is shown that it is possible to design normal-incidence antireflection coatings that simultaneously reduce the reflectance of two different substrates. Although this is at the expense of some deterioration in performance when compared with that of conventional coatings, it can lead to significant time and cost savings in small thin-film production facilities. Numerical examples are presented for ZnS/ZnSe, Si/Ge, and ZnS/Ge substrate pairs. The experimental measurements on one such coating are in good agreement with the calculated performance.     

Characterization and optimization of absorbing plasma-enhanced chemical vapor deposited antireflection coatings for silicon photovoltaics

We have optimized plasma-enhanced chemical vapor deposition (PECVD) of SiN-based antireflection (AR) coatings with special consideration for the short-wavelength (<600 nm) parasitic absorption in SiN. Spectroscopic ellipsometry was used to measure the dispersion relation for both the refractive index n and the extinction coefficient k, allowing a precise analysis of the trade-off between reflection and absorption in SiN-based AR coatings. Although we focus on photovoltaic applications, this study may be useful for photodetectors, IR optics, and any device for which it is essential to maximize the transmission of light into silicon. We designed and optimized various AR coatings for minimal average (spectrally) weighted reflectance (? R(w) ?) and average weighted absorptance (? A (w) ?), using the air mass 1.5 global solar spectrum. In most situations ? R (w) ? decreased with higher n, but ? A (w) ? increased because k increased with n. For the practical case of a single-layer AR coating for silicon under glass, an optimum refractive index of ~2.23 (at 632.8 nm) was determined. Further simulations revealed that a double-layer SiN stack with an n = 2.42 film underneath an n = 2.03 film gives the minimum total photocurrent loss. Similar optimization of double-layer SiN/SiO(2) coatings for silicon in air revealed an optimum of n = 2.28 for SiN. To determine the allowable tolerance in index and film thickness, we generated isotransmittance plots, which revealed more leeway for n values below the optimum than above because absorption begins to reduce photocurrent for high n values.     

Minimax refining of wideband antireflection coatings for wide angular incidence

The design of antireflection coatings at any light incidence is a challenging task in optics. To this aim, a minimax method is presented: it minimizes the maximum deviation of the spectral reflectance from the desired specifications over the wavelength for a given set of incidence angles. Refining is limited to lossless coatings with assigned refractive indices and undetermined thicknesses; the algorithm consists of iterating appropriate linear optimization steps. In the examples some minimax-refined coatings are compared with coatings reported in the literature.     

Symmetrical periods in antireflective coatings for plastic optics

Plastic optical parts require antireflective as well as hard coatings. A novel design concept for coating plastics combines both functions. Symmetrical three-layer periods with a phase thickness of 3/2pi are arranged in a multilayer to achieve a step-down refractive-index profile. It is shown mathematically that the equivalent index of symmetrical periods can be lower than the lowest refractive index of a material used in the design, if the phase thickness of the symmetrical period is set equal to 3/2pi instead of the usual pi/2. The straightforward application of the concept to the design of antireflection coatings in general is demonstrated by example.     

Multilayer optical thin films for use at terahertz frequencies: method of fabrication

A new method of fabricating multilayer optical coatings used at terahertz frequencies has been developed. Using plasma-enhanced chemical-vapor deposition, a multilayer antireflection coating for germanium optics at terahertz frequencies was fabricated. The coating consists of amorphous silicon and silicon-oxide layers. The transmittance and structure of the coating were experimentally investigated. The transmittance spectrum of the coating on the Ge substrate shows a wideband antireflection behavior in the 40-120 cm(-1) region.     

The theory of double-layer antireflection coatings

The theory of double-layer antireflection coatings using non-quarter-wave films is reviewed and extended. Normal incidence only is considered.The spectral reflectance of a double-layer coating depends on the refractive indices of the layers and the adjacent media, and on Ø₁ and Ø₂, the phase thickness of the layers. It is known that the reflectance is theoretically zero if the refractive indices satisfy certain inequalities and if the phase thicknesses are those calculated from certain equations.To obtain a fuller appreciation of double-layer coatings, the reflectance throughout the whole (Ø₁, Ø₂) plane is studied analytically. The pattern formed by the lines of constant reflectance exhibits translational symmetry, and the unit pattern which generates the whole pattern has a twofold axis of symmetry. The shape of the unit pattern depends on the refractive indices of the four media. Numerical examples are given to illustrate the similarities and differences between the unit patterns of some double-layer systems.     

Antireflection treatment of metal films for optical lithography

The effects of antireflection coating of thin metal films by surface chemical treatments to reduce reflectance for applications to very-large-scale integrated (VLSI) lithography have been studied. The study includes surface treatments in chemical solutions, thin film deposition and direct thermal reaction with gaseous chemicals. Aluminum and molybdenum films were used as test vehicles for the antireflection coatings. While many chemical compositions were effective in reducing aluminum reflectance, some chemicals produced a color with sufficient uniformity for VLSI applications. H₂O₂ was effective in staining molybdenum films, with a reflectance as low as 10% at a wavelength of 436 nm. Molydbenum nitride films, made by direct reaction with ammonia in the temperature range 500–750°C, also reduced the reflectance and added other beneficial properties. Deposition of transparent dielectrics is only effective in the deep-UV region. An opaque film deposition reduced the reflectance in the optical wavelength range. A thin zinc coating deposited by means of electroless plating showed the greatest reduction in reflectance. Some of these techniques applied to photoresist patterning near a tapered step were found to be useful for VLSI lithography.     

Optical coatings for deuterium fluoride chemical laser systems

The high-power laser system has brought an interesting challenge to the development of optical coatings. A wide variety of coating specifications that are often contradictory have to be fulfilled. The choices of deposition process as well as coating materials are critical to coating loss, damage threshold, long-term stability, and other optical properties. A number of optical coatings being newly applied to deuterium fluoride laser systems are presented. The 3.8-mum laser reflection coatings with high damage threshold, multichromatic beam splitters, antireflection coatings with widely separated dual-wavelength bands, and 0.55-14-mum wide-band reflective coatings have been developed on substrates such as Si, Mo, fused silica, chemical vapor deposition ZnSe. Superior results have been obtained with ion-assisted deposition and electron-beam evaporation. Approaches to coating design and practical aspects of coating development are also discussed.     

Multilayer antireflection coatings for the visible and near-infrared regions

With a high-refractive-index mixed-oxide dielectric material of ZrTiO(4) and ZrO(2) [Substance H2 (Sub2) from E. Merck, Darmstadt, Germany], in combination with magnesium flouride (MgF(2)), design optimization and experimental production of low-loss antireflection (AR) coatings are carried out. Design-optimization studies that make use of these materials as constituents of a seven-layer coating system demonstrate that when the useful bandwidth of an AR coating is extended to cover a wider spectral range, the designs are in general found to have increased integrated reflection loss, higher ripple, and increased spectral instability. The experimental studies on Sub2 material show that the films have excellent optical performance over a wider process window, the advantage of which is demonstrated in the production of different AR coatings on a variety of glasses with refractive indices that range from 1.45 to 1.784 and different mechanical, thermal, and chemical properties. The manufacturing process of AR coatings shows a consistency better than 99% with respect to optical properties and durability.