首页 | 本学科首页   官方微博 | 高级检索  
相似文献
 共查询到20条相似文献,搜索用时 62 毫秒
1.
采用室温直流磁控溅射Fe-Si组合靶的方法,经过后续Ar气氛围退火,在单晶Si(111)衬底上生长β-FeSi2薄膜。研究了溅射功率、工作气压、Ar气流量、沉积时间等工艺参数对β-FeSi2薄膜结构特性及电学特性的影响,通过Raman、Hall、X射线衍射(XRD)等测试对其性能进行表征,对工艺参数进行了优化,在溅射功率为80W、工作气压为1.3Pa和Ar气流量为35SCCM时溅射沉积Fe-Si薄膜,不仅可以得到单一相的β-FeSi2,而且薄膜结晶质量较好。最终,在上述实验条件下制备得到的未掺杂的β-FeSi2薄膜是n型导电的,β-FeSi2薄膜中载流子浓度约为3.3×1016cm-3,迁移率为381cm2/Vs。  相似文献   

2.
通过控制室温下射频磁控溅射过程中不同的氩气工作气压、溅射功率和沉积时间,在石英玻璃上沉积Al掺杂ZnO(AZO)薄膜,探究了三种工艺条件对制备的AZO薄膜的微结构及光电性能的影响。所制备的AZO薄膜经500℃退火后均为六方纤锌矿结构,具有优异的透明度,在可见光范围内的平均透过率均在86%以上。在气压0.25 Pa、功率200 W下,溅射时间为10 min时,薄膜的电阻率低至5.04×10-3Ω·cm,而溅射时间为15 min时,Haacke性能指数最优,为0.314×10-3Ω-1。结果表明,磁控溅射制备的AZO薄膜的晶体结构、方阻和透过率等特性与制备过程中的气压、功率和时间密切相关,通过评价性能指数可指导优化AZO薄膜的制备工艺。  相似文献   

3.
在无氧气氛下,采用射频磁控溅射法制备了PLzT系列薄膜,对原位溅射薄膜进行了快速退火及常规退火处理,深入研究了退火工艺对铁电薄膜结构与性能的影响。认为采用常规退火工艺处理无氧溅射的薄膜时,铁电薄膜具有更好的晶体结构和铁电性能。  相似文献   

4.
王陆一  蒋向东  李建国  石兵 《半导体光电》2012,33(6):822-825,829
采用射频磁控溅射的方法制备了用于液晶光阀光导层的氢化非晶硅薄膜,研究了工艺参数对氢化非晶硅薄膜透过率及光电导性能的影响。结果表明,薄膜的沉积速率随着溅射功率和衬底温度的升高呈先增加后减小的趋势,在衬底温度为300℃,溅射功率为300W左右沉积速率达到最大,在溅射2h后沉积速率随着溅射时间的增加而下降;薄膜的光吸收系数随衬底温度的升高而增大,随溅射功率的增加而减小;交流电导率随衬底温度和溅射功率的升高而下降;薄膜在可见光范围内透过率随着H分压的增大而增大,且吸收边发生蓝移。  相似文献   

5.
通过射频(RF)磁控溅射分别在光学玻璃基底上和多晶硅薄膜层上沉积了氧化铟锡(ITO)薄膜,采用Hall效应测试仪测试了ITO薄膜的电阻率和载流子浓度等参数,研究溅射功率和溅射时间等参数对ITO薄膜的光电特性影响.测试多晶Si对称结构沉积ITO薄膜前后及退火后的隐开路电压和反向饱和电流密度等参数,研究ITO薄膜对n型晶硅...  相似文献   

6.
非晶硅薄膜(a-Si)是目前重要的光敏材料,在很多领域得到广泛应用。直流磁控溅射具有工艺简单.沉积温度低等优点,是制备薄膜的一种重要技术。采用直流磁控溅射工艺在玻璃基板上沉积薄膜,并对样品进行了退火处理。研究了沉积速率与溅射功率的关系。结果表明薄膜的沉积速率与溅射功率近似有线性关系。利用X射线衍射(XRD)对薄膜进行了分析鉴定,结果表明溅射的薄膜是非晶硅薄膜。利用扫描电子显微镜(SEM)对非晶硅薄膜的表面形貌进行了观察和分析,与X射线衍射测试的结果一致。所以.利用直流磁控溅射工艺能在常温下能快速制备出良好的非晶硅薄膜。  相似文献   

7.
相变型VO2薄膜的制备及其特性的研究   总被引:2,自引:1,他引:2  
利用反应离子束溅射和后退火工艺制备一种新的相变型VO2薄膜,对该薄膜进行电学测试、XRD和光学透过率的测试。这种工艺制备出的相变型VO2薄膜相变温度更接近室温,XRD显示这种薄膜中有VO2、V2O5成分的存在。对这种薄膜的光学透过率测试表明,低温下薄膜的透过率是高温下薄膜透过率的近5倍。通过实验可以看出,氧气分压、退火温度、退火时间是影响制备新型相变型VO2薄膜的重要因素。  相似文献   

8.
非晶硅薄膜(a-Si)是目前重要的光敏材料,在很多领域得到广泛应用.直流磁控溅射具有工艺简单,沉积温度低等优点,是制备薄膜的一种重要技术.采用直流磁控溅射工艺在玻璃基板上沉积薄膜,并对样品进行了退火处理.研究了沉积速率与溅射功率的关系.结果表明薄膜的沉积速率与溅射功率近似有线性关系.利用X射线衍射(XRD)对薄膜进行了分析鉴定,结果表明溅射的薄膜是非晶硅薄膜.利用扫描电子显微镜(SEM)对非晶硅薄膜的表面形貌进行了观察和分析,与X射线衍射测试的结果一致.所以,利用直流磁控溅射工艺能在常温下能快速制备出良好的非晶硅薄膜.  相似文献   

9.
王军  林慧  杨刚  蒋亚东  张有润 《半导体光电》2007,28(1):68-71,75
利用直流磁控溅射系统制备ITO薄膜,采用正交试验表格L32(48)安排试验.测试了薄膜的方阻和透过率,分析了8个工艺参数对薄膜电光特性的影响,其中沉积气压、氩氧流量比和退火温度的影响最大.分析得到优化工艺参数为:沉积气压2×133.322 4 mPa、氩氧流量比16∶0.5、退火温度427 ℃、靶基间距15、退火时间1 h、溅射功率300 W、退火氛围为真空、沉积温度227 ℃.在此工艺参数下制备的ITO薄膜方阻为17 Ω/□,电阻率为1.87×10-4Ω·cm,在可见光区域平均透过率为85.13%.  相似文献   

10.
采用射频磁控溅射的方法,用96at%SnO2/4at%Sb2O3陶瓷靶在玻璃表面制备了锑掺杂氧化锡(ATO)薄膜.研究了溅射功率、压强和后退火对薄膜近红外阻隔性能的影响,并采用Uv-Vis-NIR透射光谱、霍尔效应测试仪、XRD和SEM等设备对薄膜的性能和结构进行了测试和分析.结果表明,室温沉积的ATO薄膜近红外透光率较高,但在氮气中退火后,不同溅射压强和溅射功率下沉积的ATO薄膜的近红外透光率均显著降低.在氧含量为10%、压强为1.4Pa、溅射功率为200W时,室温下沉积的ATO薄膜在氮气中500℃下退火1h后,550nm处透光率由80.9%升高至85.8%,2 000 nm处透光率由84.6%下降至23.0%.  相似文献   

11.
DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.  相似文献   

12.
From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.  相似文献   

13.
The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.  相似文献   

14.
The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.  相似文献   

15.
Today, micro-system technology and the development of new MEMS (Micro-Electro-Mechanical Systems) are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.  相似文献   

16.
Waveguide multilayer optical card (WMOC) is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling & processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic (VB) language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.  相似文献   

17.
This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel's.  相似文献   

18.
The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.  相似文献   

19.
Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.  相似文献   

20.
An insert layer structure organic electroluminescent device(OLED) based on a new luminescent material (Zn(salen)) is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn(salen)/Liq/LiF/A1/CuPc/NPD/Zn(salen)/Liq/LiF/A1. Effective insert electrode layers comprising LiF(1nm)/Al(5 nm) are used as a single semitransparent mirror, and bilayer cathode LiF(1 nm)/A1(100 nm) is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.  相似文献   

设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号