Ag和Ta离子双注入Ti6Al4V合金表面改性

采用先注入1×1017ion/cm2Ag离子,注入能量为64.2keV;后注入1.5×1017ion/cm2Ta离子,注入能量为146.5keV对Ti6Al4V合金进行离子双注入表面改性。采用X射线衍射分析离子双注入前后Ti6Al4V合金表面的物相;利用X射线光电子能谱研究离子双注入前后Ti6Al4V合金表面元素化合态以及离子双注入Ti6Al4V合金表面元素浓度沿深度方向的分布。结果表明,离子双注入前后Ti6Al4V合金表面都被氧化了,离子注入前合金表面存在TiO、Ti2O3和Al2O3,离子双注入后Ti6Al4V合金表面有TiO2、Ta2O5、TaOx和AgO2新相生成,且在表面还存在少量V2O5和Al2O3。离子双注入合金表面生成的氧化物层形成了扩散阻挡层,阻挡铝离子和钒离子向外扩散,从而减少Ti6Al4V合金表面铝离子和钒离子的释放量。     

Ta离子注入Ti6Al4V合金耐磨性研究

用5种Ta离子注入剂量(1.2×1016、3×1016、1.5×1017、3×1017、4.5×1017 ions/cm2)对Ti6Al4V合金进行离子注入表面改性.采用纳米硬度计测量Ta离子注入前后Ti6Al4V合金表面硬度随压入深度的变化,利用多功能摩擦磨损试验机研究Ta离子注入前后Ti6Al4V合金材料的耐磨性,利用X射线衍射技术研究Ta离子注入前后Ti6Al4V合金表面的物相分布.结果表明,除Ta离子注入剂量为3×1017 ions/cm2外,Ta离子注入Ti6Al4V合金硬度有一定的提高;Ta离子注入Ti6Al4V合金摩擦系数降低;除Ta离子注入剂量为3×1017 ions/cm2外,Ta离子注入Ti6Al4V合金的耐磨损性能得到了改善.摩擦系数降低和硬度提高、Ta离子注入的固溶强化、单质Ta新相的弥散强化改善了Ti6Al4V合金的耐磨损性能.     

离子注入辅助Al2O3陶瓷表面化学镀镀层特性研究

用金属离子源在96Al2O3陶瓷表面注入不同能量和剂量的Ni离子,然后在镀液中进行化学镀铜.用扫描电镜、卢瑟福背散射能谱和X光电子能谱技术对注入层和镀层进行分析研究.结果表明:Ni离子注入可作为一种新的活化工艺,辅助Al2O3陶瓷化学镀铜;注入参数对后续化学镀覆有显著影响,注入获得表面Ni浓度高的镀覆效果较好,应选用低能量进行高剂量注入;试验条件下优选工艺参数为15keV,2.2×1017ions/cm2,该条件下开始化学镀铜的孕育期仅为45s,镀速达到52.43nm/min,镀层表面粗糙度为0.317μm,所得化学镀铜层均匀、致密,与基体结合紧密.     

Ti离子注入H13钢表面改性研究

利用MEVVA源强流离子注入机将Ti离子注入到H13钢表面,注入剂量和离子能量分别为0.5×1017~5.0×1017ions/cm2和105keV。利用TR IM2003程序模拟计算饱和注入剂量;通过显微硬度仪、磨损试验机、电化学测试系统和扫描电镜测试了注入前后H13钢的表面硬度、磨损性能、摩擦系数和耐蚀性。利用SEM、AES、XPS和EDX等分析手段对注入前后的材料表面形貌、注入元素的化学价态及浓度分布等进行分析。借助XPS考察了注入表面层钛元素的化学状态。结果表明,Ti离子注入显著提高了H13钢的表面硬度、耐磨性和耐蚀性,减轻了磨粒磨损;减轻了表面层铁元素的氧化。通过所测主要性能可知,利用钛离子注入改善H13钢较为经济有效的注入参数分别为1.0×1017ions/cm2和105keV。     

磁控溅射镀钛提高 AZ31 镁合金耐磨耐蚀性能的研究

目的提高AZ31镁合金的耐磨及耐腐蚀性能。方法采用磁控溅射技术对镁合金进行表面镀钛处理,用扫描电镜研究膜基界面形貌及界面成分,分析结合性能。通过摩擦磨损试验,对比分析镁合金基体和镀Ti膜样品的耐磨性能;通过Tafel极化曲线,对比分析镁合金基体和镀Ti膜样品的耐蚀性能。结果 Ti膜均匀致密,与镁合金基体结合良好。镁合金镀Ti膜后,摩擦系数和磨损失重率下降,腐蚀电位向正方向移动了430 m V,腐蚀电流密度从10.83 m A/cm2下降到2.62×10-7m A/cm2。结论磁控溅射镀Ti膜提高了AZ31镁合金的耐磨和耐蚀性能。     

氮离子注入的Ti6Al4V表面分析

利用表面分析技术(AES,XPS,SIMS)研究了经氮离子注入的外科植入材料Ti6Al4V表面成分与键合态,用轮廓仪的测量结果计算了氮离子注入深度及注入氮离子的Ti6Al4V的刻蚀速率。考虑到该合金的基体效应,对AES的定量结果进行了修正。结果表明,注入到合金中的氮离子与合金中的Ti形成高硬度的TiN,N的分布近似为Gauss形式,注入总深度约为350nm,在距表面约140nm处氮量最大,N与Ti的浓度比可达1.1。     

Ti6A14V合金等离子体基氧离子注入层的层状结构

采用等离子体基氧离子注入技术对Ti6A14V合金进行表面改性.注入负脉冲电压分别为10、20、30、40、50kV,注入剂量为0.6×1017 ions/cm2.用XPS分析了注氧层中元素的分布和化学态.结果显示,注入电压增加,氧的浓度深度分布增加.注入氧元素的浓度深度分布曲线不同于束线式注入氧元素的类高斯分布,表面氧浓度最大,随着深度的增加出现一个略倾斜的氧浓度平台,该平台的宽度随注入电压增加而增加.氧离子注入引起基体元素Ti、Al、V的浓深分布发生变化,近表面区域Ti的原子百分含量减少,Al的含量增高,而V未检测到.并且随着注入电压的增加,近表面区域富集Al的浓度明显增加,富Al贫V的区域也明显加大.注入样品的改性层具有相似的层状结构,由表及里依次为表面污染层、TiO2和Al2O3组成薄的外层、内层在改性层中占的比例最大,由TiO2、Ti2O3、TiO、Ti、Al、Al2O3,V和VO组成.     

铜离子注入Ti6Al7Nb合金的表面改性研究

使用MEVVA强流金属源离子注入机对Ti6Al7Nb合金表面注入能量为80keV、剂量分别为0.5×1017,1×1017,2×1017,4×1017ions/cm2的铜离子,计算得到铜离子饱和注入量为2.15×1017ions/cm2。研究了注入的铜离子对Ti6Al7Nb合金腐蚀性能、显微硬度和磨损行为的影响,采用覆膜法研究了铜离子注入后试样对金黄色葡萄球菌的抗菌性能,并分析了注入剂量与抗菌性能的关系。结果表明,Ti6Al7Nb合金的硬度和耐磨性随着注入剂量的增加而提高,点蚀电位随着注入剂量的提高而下降。抗菌试验显示当注入量达到饱和注入量时,试样的抗菌率达到99%以上。     

同步辐射掠入射X射线衍射法研究TiA1N薄膜离子注入层的微观结构

利用磁过滤阴极电弧镀在硬质合金上沉积厚度约2～3μm的TiA1N薄膜,并用MEVVA源离子对TiA1N薄膜注入金属离子V+和Nb+.应用北京同步辐射装置(BSRF)的同步辐射光源,采用掠入射X射线衍射(GIXRD)的方法对TiA1N薄膜表面离子注入层的微观结构进行分析研究.结果表明:未经过离子注入的TiA1N薄膜主要组成相是没有择优取向的Ti3AlN伴有少量A1N,而较小剂量(1×1017ions/cm2)的离子注入都可以使Ti3AlN产生(111)上的择优取向和细化晶粒,且A1N消失;当离子注入的剂量达到5×1017ions/cm2时,注入V+的Ti3AlN择优取向变为(210),并产生TiN相;注入Nb+的各个衍射峰完全消失,说明TiA1N薄膜表面离子注入层被非晶化,结合透射电镜的研究结果,观察到非晶层的厚度约为80～100 nm.     

预氧化在离子注入与水热处理制备羟基磷灰石活性层中的作用

分别将钙、磷离子以110 keV、80 keV的能量和2×1017ion/cm2、1×1017ion/cm2的剂量注入纯钛基体,并与水热处理结合制备钛表面羟基磷灰石(HAp)改性层.为研究预氧化在离子注入与水热处理制备羟基磷灰石活性层中的作用,将预氧化试样与未氧化抛光试样一起进行了钙、磷离子注入和水热处理,并利用SEM进行形貌观察,AES、EDS、XRD和FTIR进行元素及物相结构分析.结果表明,经过预氧化处理的试样表面生成了球状HAp改性层.另外,水热处理温度、压强和钙、磷注入顺序也会对HAp的形成产生影响.     

表面处理对PEEK GF30磁控溅射镀Cu金属化的影响

目的 赋予基材PEEKGF30良好的导电性。方法 以磁控溅射镀膜技术在表面沉积Cu膜。分别采用离子注入和等离子体活化两种技术对基材进行界面处理,通过接触角测试、红外光谱测试和界面微观形貌观察,与原始基材展开表面状态对比。再在此基础上进行金属化处理,并对3种不同界面状态下所制膜层的相结构、表面及断口形貌和成分、膜基结合强度进行判定和分析,探讨界面状态的影响因素以及对膜基结合性能的作用机理。结果 注入金属Ti后,表面Ti含量得到了有效提高,但表面润湿性能无明显改变,活化处理后表面极性基团增加、润湿性能大幅提升,为镀膜提供了良好的界面状态。在原始状态、注入和活化后3种不同界面状态下制备的Cu膜均沿Cu(225)择优生长,活化后所制膜层的结晶度最优。原始状态下所制膜层平整性欠佳、膜基交界处异种材料差异明显,涂层附着力保持为5级,结合力<0.1 N;注入后所制膜层平整致密,交界处有Ti微粒产生“锚扎”强化效果,涂层附着力保持为1级,结合力<0.1N;活化后所制膜层规则均匀,交界处出现缓冲层,金属微粒“锚扎”强化深度和强度效果最佳,涂层附着力保持为0级,结合力提升至15.45 N。结论...     

高能离子刻蚀前处理对AlTiSiN涂层切削性能的影响

目的提高AlTiSiN涂层与刀具基材的结合强度,降低涂层表面的粗糙度,减少切削过程中涂层的剥落,改善涂层刀具的切削寿命。方法采用离子源增强的多弧离子镀设备刻蚀清理基体材料,并制备AlTiSiN涂层。利用X射线衍射仪(XRD)、扫描电镜(SEM)、粗糙度仪、划痕仪和铣削实验探讨涂层沉积前不同Ar离子刻蚀清洗工艺对AlTiSiN涂层结构、膜基结合力和涂层表面形貌的的影响,探究不同刻蚀清洗工艺对涂层刀具切削机理和切削性能的影响。结果 AlTiSiN涂层的相结构主要由(Al,Ti)N固溶体相组成,涂层沿着基体呈现柱状生长。随着高能Ar离子刻蚀电流由40 A增加至100 A,涂层的表面粗糙度降低,Ra值由140 nm降至69 nm,Sq值由226 nm降至117 nm;涂层与基体之间的结合强度增加,Lc2由41 N增加至52 N;切削加工DC53模具钢结果显示,当清洗电流增加至100 A,涂层的剥落几率降低,涂层刀具的切削寿命增加,由11 m增加至23 m。结论高能离子刻蚀前处理过程可有效增加涂层与基体之间的结合强度,降低涂层表面粗糙度,进而提高涂层刀具的切削寿命。刻蚀清洗所用电流强度越大,清洗效果越好,刀具涂层切削性能提高越明显。     

离子注入对TC4钛合金TiN/Ti涂层结合力和抗砂尘冲蚀性能的影响

目的通过离子注入提高TiN/Ti涂层的结合力和抗冲蚀性能。方法先采用金属蒸气真空弧(MEVVA)离子源在TC4基体上分别注入四种离子(Mo、Ti、Nb、Co),再用磁过滤真空阴极弧(FCVA)技术制备TiN/Ti涂层。采用非球面测量仪、AFM、XRD和纳米压痕仪,对四种离子注入的TC4基体表面粗糙度、表面形貌、物相结构、纳米硬度和弹性模量进行表征,采用划痕仪测量涂层的结合力,采用涂层冲蚀考核平台对不同试样进行砂尘冲蚀性能试验。结果经过Mo、Ti、Nb离子注入的TiN/Ti涂层的结合力和抗冲蚀性能都有提高,其中Mo离子注入的TiN/Ti涂层的结合力达71 N、耐冲蚀时间为80 min,与未离子注入涂层相比,分别增加31.5%和77.8%,而平均冲蚀率降低39.5%,仅为0.0078mg/g。Co离子注入的TiN/Ti涂层的结合力仅为40 N,平均冲蚀率增大了19.0%,达0.0433 mg/g,其抗砂尘冲蚀性能明显下降。结论离子注入涂层的抗砂尘冲蚀性能与结合力密切相关,随着结合力的增大,TiN/Ti涂层的平均冲蚀率减小,其耐冲蚀时间增加,选择合适的离子注入可提高TiN/Ti涂层的抗冲蚀性能。     

Ti65合金磷酸盐涂层抗高温氧化性能研究

目的通过表面涂层提高高温钛合金Ti65的抗高温氧化性能。方法采用喷涂法在Ti65合金基体上制备以磷酸铝为粘结剂、Al和Al/SiC为填料的两种磷酸盐抗高温氧化复合涂层。研究Ti65合金和涂层样品在650℃准等温、静态空气条件下的氧化动力学行为。用XRD和SEM/EDS分别对涂层样品氧化前后的物相组成、组织形貌和微区成分进行表征分析;用电子探针(EPMA)分析涂层样品的元素分布情况。结果650℃抗高温氧化实验结果表明,磷酸盐涂层样品的准等温氧化动力学曲线均符合抛物线规律,两种涂层样品的抛物线氧化速率常数kp分别为3.922×10^-2、1.768×10^-2 mg/(cm^2·h^1/2)和2.48×10^-2、3.385×10^-4 mg/(cm^2·h^1/2),均小于Ti65合金,氧化增重显著降低。以Al/SiC为填料的磷酸铝涂层的抗氧化性能最好,氧化1000 h,质量增加0.20 mg/cm^2,约为Ti65基体氧化增重(1.13 mg/cm^2)的1/6。微观分析结果表明,两种磷酸盐涂层样品在650℃准等温氧化后,涂层与基体形成扩散层,生成TiAl3金属间化合物,涂层表面均保持完好,没有裂纹和孔隙,有效阻止了氧元素向Ti65基体的扩散,保护基体不受氧化。结论磷酸盐涂层能有效阻止650℃温度下氧向Ti65合金基体的扩散,具有优异的抗高温氧化性能。     

静电纺丝制备连续SiC亚微米/纳米纤维

采用镶嵌靶反应磁控溅射技术,通过调节氮分压及基体偏压在M2高速钢基体表面制备了一系列耐热的(Ti,Al)N硬质薄膜,并用XRD,EDS及纳米压入法、划痕法等方法研究了(Ti,Al)N薄膜的成分、相结构与力学性能的关系。结果表明,氮分压和基体偏压对(Ti,Al)N薄膜取向及Ti、Al、N原子含量有明显影响,从而导致薄膜硬度及膜基结合性能发生变化。研究中,在氮分压为33.3×10-3Pa、基体偏压为-100V时制备的(Ti,Al)N薄膜力学性能最优,其纳米硬度为43.4GPa,达到40GPa超硬薄膜的要求。     

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 利用磁过滤阴极电弧镀分别在硬质合金和高速钢基体上沉积厚度约2～3μm的TiN薄膜,并用MEVVA源离子注入装置对TiN薄膜注入金属离子V+和Nb+。应用北京同步辐射装置（BSRF）的同步辐射光源,采用掠入射X射线衍射（GIXRD）的方法对TiN薄膜表面离子注入层的微观结构进行了分析研究。结果表明：未经过离子注入的TiN薄膜均存在特定方向的择优取向,而较小剂量(1×10ˇ17ions/cm2)的离子注入可以使晶粒细化、择优取向减弱或改变;当离子注入的剂量达到5×10ˇ17ions/cm2时,TiN薄膜表面离子注入层被非晶化。结合透射电镜的研究结果,观察到TiN薄膜表面非晶层的厚度约为50～100nm,并简要地讨论了离子注入过程对微观结构的影响机制。     

Ti Coating on Magnesium Alloy by Arc-Added Glow Discharge Plasma Penetrating Technique

MAGNESIUM is the8th most abundant element on theearth.Because of that it has some advantageousproperties such as high ratio of strength/weight with adensity that is only2/3that of aluminum and1/4that ofiron,high ratio of rigidity/mass,special characteristicsof electromagnetic shield and shock absorption,excellent cutting and polishing performances,magnesium alloys have been used widely by widely inmany manufacturing industries including aerospace,automobile,electronics and so on.But there i…     

Analysis of Titanium-Coated Glass and Imidex (PI) Laser Bonded Samples

Based on previous results of bond strength, scanning electron microscopy(SEM)/energy dispersive spectroscopy (EDS) and x-ray photoelectron spectroscopy (for thin film thickness in the range of 50 to 200 nm range), it is expected for a moderate film thickness of titanium (over 50 nm) for the system of sputtered Ti-coated glass/polymer two factors play important roles in getting strong bond between Ti/Polyimide interface: (i) mechanical interlocking property and (ii) chemical bond formation such as Ti-C, Ti-O between Ti and imidex (PI) film. In this study, a systematic investigation has been conducted to understand the effects of thin films on bond quality and on failure mechanism of the interface between 400 nm sputtered Ti-coated glass/imidex (PI) system. This article basically studies if for this higher film thickness the failure pattern and bond strength are consistent with the previous data. From previous studies (for thin film thickness of 50 to 200 nm) the conclusion extracted is thin film with thickness of less than 50 nm exhibited low bond strength when compared to film thickness over 50 nm and from the results obtained in this study it is concluded that the bond reliability and failure modes of sputtered Ti film on glass are consistent even for a film thickness as high as 400 nm and three types of failure modes are found : (i) cohesive failure mode, (ii) Ti/glass interface failure mode, and (iii) glass failure mode. The roughness value for this coating thickness is 17 nm.     

Characterization of Failed Surface of Ti and Imidex (PI) Film for Different Inter-layer Thicknesses of Ti Film

For miniaturized biomedical devices, laser joining of dissimilar materials offers excellent potential to make precise joints. An important system for consideration is titanium (Ti) coated glass joined with biocompatible imidex polyimide (PI). Metallic Ti with various thicknesses was deposited on top of pyrex 7740 borosilicate glass by using DC-magnetron sputtering deposition method. Effect of bond strength between Ti coated glass and imidex polyimide (PI), due to thickness variation of sputtered Ti coating was studied. Three different Ti inter-layer thicknesses were considered, 50, 200, and 400?nm. Tests results indicated that the thinner film produced lower shear strength and higher thickness produced higher shear strength. It has been observed that thicker film (200 and 400?nm) enhanced considerably the bond strength with enhancing the film roughness as well. Higher roughness resulted in more contact area at the interface, results higher number of chemical bonds and increased mechanical interlocking; which in turn increase the laser joint strength. For stronger bond with higher thickness, mixed mode failure was observed which included cohesive failure of polymer, interface failure of Ti/glass and failure on the glass itself. On the other hand, for weak bond with thinner film, mostly interface failure was observed for this system of Ti coated glass/imidex. For thicker film, chemical bond of Ti-C and Ti-O were observed. The role of both surface characteristics and chemical bonding for laser joints were investigated by using advanced techniques such as X-ray photoelectron spectroscopy, scanning electron microscopy, and energy dispersive spectroscopy.     

Effect of N-ion implantation and diamond-like carbon coating on fretting wear behaviors of Ti6Al7Nb in artificial saliva

The tribology behaviors of Ti6Al7Nb, its alloy with N-ion implantation, and its alloy with diamond-like carbon (DLC) coating were investigated in artificial saliva. Fretting wear tests of untreated, N-ion implanted and DLC coated Ti6Al7Nb alloys plate against a Si₃N₄ ball were carried out on a reciprocating sliding fretting wear test rig. Based on the analysis of X-ray diffraction, Raman spectroscopy, 3-D profiler, SEM morphologies and frictional kinetics behavior analysis, the damage behavior of surface modification layer was discussed in detail. The results indicated that the fretting wear behavior of Ti6Al7Nb alloy with N-ion implantation was increased with the dose increase of the implanted nitrogen ions. Moreover, the DLC-coated Ti6Al7Nb alloy with low ion implantation could improve the fretting wear behavior greatly. In addition, the Ti6Al7Nb with DLC coating had better corrosion resistance due to the special compact structure. All results suggested that the Ti6Al7Nb with DLC coating had better wear resistance than that with N-ion implantation in artificial saliva.