Enhanced acetone detection using Au doped ZnO thin film sensor

Zinc oxide (ZnO) thin films are prepared using sol–gel method for acetone vapor sensing. Zinc acetate dihydrate (Zn(CH₃COO)₂·2H₂O) was taken as starting material and a stable and homogeneous solution was prepared in ethanol by deliquescing the zinc acetate and distinct amount of monoethanolamine as a stabilizing agent. The prepared solution was then coated on silicon substrates by spin coating method and then annealed at 650 °C for preparing ZnO thin films. The thickness of the film was maintained at 410 nm. The structural, morphological and optical studies were done for the synthesized ZnO thin films. The operating temperature and sensor response is considered to be an important parameter for the gas sensing behavior of any material. Therefore, the present study examined the effect of sensing behavior of 3% v/v gold (Au) doped ZnO thin films as a sensor. The response characteristics of 410 nm ZnO thin film for temperature ranging from 180 to 360 °C were determined for the acetone vapors. The reported study provides a significant development towards acetone sensors, where a very high sensitivity with rapid response and recovery times are reported with lowered optimal operating temperature as compared to bare ZnO nano-chains like structured thin films. In comparison to the bare ZnO thin films giving a response of 63 at an operating temperature of 320 °C, a much better response of 132.3 was observed for the Au doped ZnO thin films at an optimised operating temperature of 280 °C for a concentration of 500 ppm of acetone vapors.     

Vertically aligned nanocrystalline Cu–ZnO thin films for photoelectrochemical splitting of water

Cu-incorporated nanocrystalline ZnO thin films were deposited on glass substrate by sol–gel. To a solution of zinc acetate 2-hydrate in dimethyl formamide, calculated quantities of copper acetate were added. The clear solution, obtained after 2 h of continuous stirring, was coated on ITO plates. Pre-annealing at 250 °C was followed by sintering at 400, 500, and 600 °C. XRD analysis revealed dominant evolution of hexagonal ZnO with a possible simultaneous growth of meta-stable cubic ZnO. AFM and SEM analysis indicated preferential growth of nanocrystallites along c-axis. Optical characterization led to two prominent absorption thresholds in the UV region; one matching with the band gap of bulk ZnO and the second at slightly higher energy, suggesting quantum confinement effect in nanocrystallites. Cu incorporation influenced the two band gap energies differently. Photoelectrochemical splitting of water using 1% at. Cu–ZnO film sintered at 600 °C resulted in 141% gain in photocurrent at zero bias.     

Optical characterization of ZnO thin films deposited by Sol-gel method

In this paper, ZnO thin film is deposited on Pt/TiO₂/SiO₂/Si substrate using the sol-gel method and the effect of annealing temperature on the structural morphology and optical properties of ZnO thin films is investigated. The ZnO thin films are crystallized by the heat treatment at over 400°C. The ZnO thin film annealed at 600°C exhibits the greatest c-axis orientation and the Full-Width-Half-Maximum (FWHM) of X-ray peak is 0.4360°. A dense ZnO thin film is deposited by the growth of uniform grains with the increase of annealing temperature but when the annealing temperature increases to 700°C, the surface morphology of ZnO thin film becomes worse by the aggregation of ZnO particles. In the results of surface morphology of ZnO thin film using atomic force microscope (AFM), the surface roughness of ZnO thin film annealed at 600°C is smallest, that is, approximately 1.048 nm. For the PL characteristics of ZnO thin film, it is observed that ZnO thin film annealed at 600°C exhibits the greatest UV (ultraviolet) exciton emission at approximately 378 nm, and the smallest visible emission at approximately 510 nm among ZnO thin films annealed at various temperatures. It is deduced that ZnO thin film annealed at 600°C is formed most stoichiometrically, since the visible emission at approximately 510 nm comes from either oxygen vacancies or impurities.     

CO<Subscript>2</Subscript> gas sensitivity of sputtered zinc oxide thin films

For the first time, sputtered zinc oxide (ZnO) thin films have been used as a CO₂ gas sensor. Zinc oxide thin films have been synthesized using reactive d.c. sputtering method for gas sensor applications, in the deposition temperature range from 130–153°C at a chamber pressure of 8·5 mbar for 18 h. Argon and oxygen gases were used as sputtering and reactive gases, respectively. ZnO phase could be crystallized using a pure metal target of zinc. The structure of the films determined by means of X-ray diffraction method indicates that the zinc oxide single phase can be fabricated in this substrate temperature range. The sensitivity of the film synthesized at substrate temperature of 130°C is 2·17 in the presence of CO₂ gas at a measuring temperature of 100°C.     

Effect of growth temperature on structural, electrical and optical properties of dual ion beam sputtered ZnO thin films

ZnO epitaxial thin films were grown on p-type Si(100) substrates by dual ion beam sputtering deposition system. The crystalline quality, surface morphology, optical and electrical properties of as-deposited ZnO thin films at different growth temperatures were studied. Substrate temperature was varied from 100 to 600 °C at constant oxygen percentage O₂/(O₂ + Ar) % of 66.67 % in a mixed gas of Ar and O₂ with constant chamber pressure of 2.75 × 10^?4 mBar. X-Ray diffraction analyses revealed that all the films had (002) preferred orientation. The minimum value of stress was reported to be ?0.32 × 10¹⁰ dyne/cm² from ZnO film grown at 200 °C. Photoluminescence measurements demonstrated sharp near-band-edge emission (NBE) was observed at ~375 nm along with deep level emission (DLE) in the visible spectral range at room temperature. The DLE Peak was found to have decrement as ZnO growth temperature was increased from 200 to 600 °C. The minimum FWHM of the NBE peak of 16.76 nm was achieved at 600 °C growth temperature. X-Ray photoelectron spectroscopy study revealed presence of oxygen interstitials and vacancies point defects in ZnO film grown at 400 °C. The ZnO thin film was found to be highly resistive when grown at 100 °C. The ZnO films were found to be n-type conducting with decreasing resistivity on increasing substrate temperature from 200 to 500 °C and again increased for film grown at 600 °C. Based on these studies a correlation between native point defects, optical and electrical properties has been established.     

Properties of nanocrystalline zinc oxide thin films prepared by thermal decomposition of electrodeposited zinc peroxide

Zinc peroxide thin films were electrodeposited from aqueous solution at room temperature using H₂O₂ as the oxidation agent. Nanocrystalline zinc oxide thin films were then obtained from thermal decomposition of zinc peroxide thin films. The grain sizes of ZnO through thermal decomposition of ZnO₂ at 200 °C, 300 °C and 400 °C were estimated from the peak width of ZnO(110) obtained from X-ray diffraction and were 6.3 nm, 9.1 nm and 12.9 nm, respectively. The optical properties of zinc oxide thin films have been studied. The photoluminescence results indicate that ZnO thin films have low Stokes blue shift (about 110 meV) and low oxygen vacancies.     

Effects of substrate parameters on structure and optical properties of ZnO thin films fabricated by pulsed laser deposition

Highly oriented zinc oxide thin films have been grown on quartz, Si (1 1 1) and sapphire substrates by pulsed laser deposition (PLD). The effect of temperature and substrate parameter on structural and optical properties of ZnO thin films has been characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), optical transmission spectra and PL spectra. The experimental results show that the best crystalline thin films grown on different substrate with hexagonal wurtzite structure were achieved at growth temperature 400–500 °C. The growth temperature of ZnO thin film deposited on Si (1 1 1) substrate is lower than that of sapphire and quartz. The band gaps are increasing from 3.2 to 3.31 eV for ZnO thin film fabricated on quartz substrate at growth temperature from 100 to 600 °C. The crystalline quality and UV emission of ZnO thin film grown on sapphire substrate are significantly higher than those of other ZnO thin films grown on different substrates.     

Effect of post annealing on structural and optical properties of ZnO thin films deposited by vacuum coating technique

We report the effect of annealing temperature on structural, electrical and optical properties of polycrystalline zinc oxide thin films grown on p-type silicon (100) and glass substrates by vacuum coating technique. The XRD and AFM measurements confirmed that the thin films grown by this technique have good crystalline hexagonal wurtzite structures and homogenous surfaces. The study also reveals that the rms value of thin film roughness increases from 6 to 16 nm, the optical band gap increases from 3.05 to 3.26 eV and resistivity from 0.3 to 5 Ωcm when the post-deposition annealing temperature is changed from 400 to 600 °C. It is observed that ZnO thin film annealed at 600 °C after deposition provide a smooth and flat texture suited for optoelectronic applications.     

The stability of zinc oxide transparent electrodes fabricated by R.F. magnetron sputtering

The stability of the electrical, optical and mechanical properties of sputtered zinc oxide (ZnO) thin films with resistivities from 10^?2 to 10^?4 ωcm were investigated. No significant changes in these properties are observed for ZnO films exposed to air at room temperature for 10 months. A change in the electrical resistance of the ZnO films with temperature up to 400 °C is observed in various ambients such as vacuum, inert gases and air. After heat treatment in these ambients at 400 °C, the resistivity of the films increased by one to ten orders of magnitude. The increased resistivity can be returned to the resistivity of the virgin state, within one order of magnitude, by heat treatment in a hydrogen ambient at temperatures near 400 °C. For practical use of ZnO films at high temperatures, the increase in the resistivity might become a disadvantage for ZnO transparent electrodes fabricated by r.f. magnetron sputtering.     

Effect of annealing temperature on structural,optical and humidity sensing properties of indium tin oxide (ITO) thin films

Tin doped indium oxide (ITO) thin films were prepared by sol–gel spin coating method with In (NO₃)·3H₂O and SnCl₄·5H₂O as indium and tin sources, respectively. The as deposited samples were annealed at various temperature such as, 300, 400, 500 and 600?°C for 2 h in ambient atmosphere. The grown ITO thin films are polycrystalline in nature with cubic structure of In₂O₃ with the space group La3 and the results are in good agreement with the standard JCPDS data (card no#06-0416). In addition crystalline size increases with increasing annealing temperature from 25 to 55 nm. Polycrystalline with uniform smooth surface was observed by SEM micrographs. The optical band gap energy was found to be decreased from 3.85 to 3.23 eV as the annealing temperature is increased from 300 to 600?°C. The humidity sensing performance (high sensitivity and fast response time) was significantly improved for 600?°C thin films samples, which is probably due to smaller energy band gap and physisorption between the water molecules and the surface of the thin films. The films were further characterized by PL and EDS analysis. The effect of temperature on humidity sensing mechanism of ITO thin films is also discussed.     

Rapid Thermal Annealing of ZnO Nanocrystalline Films for Dye-Sensitized Solar Cells

Nanocrystalline ZnO thin films were prepared by the sol–gel method and annealed at 600 °C by conventional (CTA) and rapid thermal annealing (RTA) processes on fluorine-doped tin oxide (FTO)-coated glass substrates for application as the work electrode for a dye-sensitized solar cell (DSSC). ZnO films were crystallized using a conventional furnace and the proposed RTA process at annealing rates of 5 °C/min and 600 °C/min, respectively. The ZnO thin films were characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM) analyses. Based on the results, the ZnO thin films crystallized by the RTA process presented better crystallization than films crystallized in a conventional furnace. The ZnO films crystallized by RTA showed higher porosity and surface area than those prepared by CTA. The results show that the short-circuit photocurrent (J _sc) and open-circuit voltage (V _oc) values increased from 4.38 mA/cm² and 0.55 V for the DSSC with the CTA-derived ZnO films to 5.88 mA/cm² and 0.61 V, respectively, for the DSSC containing the RTA-derived ZnO films.     

Ethanol gas sensing properties of Al<Subscript>2</Subscript>O<Subscript>3</Subscript>-doped ZnO thick film resistors

The characterization and ethanol gas sensing properties of pure and doped ZnO thick films were investigated. Thick films of pure zinc oxide were prepared by the screen printing technique. Pure zinc oxide was almost insensitive to ethanol. Thick films of Al₂O₃ (1 wt%) doped ZnO were observed to be highly sensitive to ethanol vapours at 300°C. Aluminium oxide grains dispersed around ZnO grains would result into the barrier height among the grains. Upon exposure of ethanol vapours, the barrier height would decrease greatly leading to drastic increase in conductance. It is reported that the surface misfits, calcination temperature and operating temperature can affect the microstructure and gas sensing performance of the sensor. The efforts are, therefore, made to create surface misfits by doping Al₂O₃ into zinc oxide and to study the sensing performance. The quick response and fast recovery are the main features of this sensor. The effects of microstructure and additive concentration on the gas response, selectivity, response time and recovery time of the sensor in the presence of ethanol vapours were studied and discussed.     

Effect of annealing temperature on electrical and nano-structural properties of sol–gel derived ZnO thin films

Zinc oxide (ZnO) thin films have been prepared on silicon substrates by sol–gel spin coating technique with spinning speed of 3,000 rpm. The films were annealed at different temperatures from 200 to 500 °C and found that ZnO films exhibit different nanostructures at different annealing temperatures. The X-ray diffraction (XRD) results showed that the ZnO films convert from amorphous to polycrystalline phase after annealing at 400 °C. The metal oxide semiconductor (MOS) capacitors were fabricated using ZnO films deposited on pre-cleaned silicon (100) substrates and electrical properties such as current versus voltage (I–V) and capacitance versus voltage (C–V) characteristics were studied. The electrical resistivity decreased with increasing annealing temperature. The oxide capacitance was measured at different annealing temperatures and different signal frequencies. The dielectric constant and the loss factor (tanδ) were increased with increase of annealing temperature.     

Annealing effect on the microstructure and photoluminescence of ZnO thin films

Zinc oxide thin films have been obtained by pulsed laser ablation of a ZnO target in O₂ ambient at a pressure of 0.13 Pa using a pulsed Nd:YAG laser. ZnO thin films deposited on Si (1 1 1) substrates were treated at annealing temperatures from 400 °C up to 800 °C after deposition. The structural and optical properties of deposited thin films have been characterized by X-ray diffraction, scanning electron microscopy, transmission electron microscopy, photoluminescence spectra, resistivity and IR absorption spectra. The results show that the obtained thin films possess good single crystalline with hexagonal structure at annealing temperature 600 °C. Two emission peaks have been observed in photoluminescence spectra. As the post-annealing temperature increase, the UV emission peaks at 368 nm is improved and the intensity of blue emission at 462 nm decreases, which corresponds to the increasing of the optical quality of ZnO film and the decreasing of Zn interstitial defect, respectively. The best optical quality for ZnO thin films emerge at post-annealing temperature 600 °C in our experiment. The measurement of resistivity also proves the decrease of defects of ZnO films. The IR absorption spectra of sample show the typical Zn–O bond bending vibration absorption at wavenumber 418 cm⁻¹.     

Influence of annealing temperature on structural,electrical and optical properties of undoped zinc oxide thin films

The undoped zinc oxide thin films were grown on quartz substrate at a substrate temperature of 750 °C by radio frequency magnetron sputtering and post annealed at different temperatures (600–800 °C) for a period of 30 min. The influence of annealing temperature on the structure, electrical and optical properties of undoped ZnO thin films was investigated by X-ray diffraction, Hall-effect, photoluminescence and optical transmission measurements. Results indicated that the electrical properties of the thin films were extremely sensitive to the annealing temperature and the conduction type could be changed dramatically from n-type to p-type, and finally changed to weak p-type when the temperature increased from 600 to 800 °C. Electrical and photoluminescence results indicate that native defects, such as oxygen and zinc vacancies, could play an important role in determining the conductivity of these nominally undoped ZnO thin films. The conversion of the conduction type was attributed to the competition between Zn vacancy acceptor and oxygen vacancy and interstitial Zn donors. At an intermediate annealing temperature of 750 °C, the film behaves the best p-type characteristic, which has the lowest resistivity of 12 Ωcm, hall mobility of 2.0 cm²/V s and carrier concentration of 1.5 × 10¹⁷ cm^?3. The photoluminescence results indicated that the Zn vacancy might be responsible for the intrinsic better p-type characteristic in ZnO thin films.     

Influence of annealing on ZnO films grown by metal–organic chemical vapor deposition

Zinc oxide (ZnO) films were deposited on silica glass substrates using metal–organic chemical vapor deposition (MOCVD) with diethyl zinc (DEZn) as the Zn precursor and ethanol as the oxygen source. Annealing was performed at 600°C for 1 h in air. The X-ray diffraction (XRD) patterns of the samples show sharp diffraction peaks for ZnO (0002), which indicates that the films are highly c-axis oriented. The films were also characterized by measuring the optical transmission spectrum, atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The XPS spectra showed that the ZnO films changed from O-rich to Zn-rich after being annealed.     

Effects of alumina surrounding in sintering process on ZnO–Bi2O3varistors doped with CoO

Nonlinear current–voltage properties of zinc oxide-bismuth oxide varistors doped with cobalt oxide were investigated. The composition of ZnO doped with 0.5 mol% Bi₂O₃ and 0.75 mol%CoO was prepared and sintered in two different surroundings, zinc oxide–bismuth oxide–cobalt oxide powder and alumina powder. Microstructures and element tracing were studied using scanning electron microscopy with X-ray microanalysis, electron probe microanalysis and X-ray diffraction. Results clearly showed that the alumina surrounding led to bismuth loss from the green body and degraded the nonlinear property of varistors. At sintering temperatures higher than 1150 °C, the alumina-surrounding sintered specimens became ohmic and the electrical resistivity of 200 Ω cm was found in the specimen sintered at 1200 °C.     

Undoped tin oxide thin films obtained by the sol gel technique,starting from a simple precursor solution

In this work, we report the synthesis and the structural, optical and electrical properties of undoped tin oxide thin films obtained by the sol–gel technique. The films have been prepared from a simpler precursor solution than other ones reported; it is based on stannous chloride (SnCl₂·2H₂O), ethanol, glycerol and triethylamine. The films are deposited on glass slide substrates and sintered at temperatures in the 300–550 °C range, in an open atmosphere. A second thermal treatment in vacuum is made in order to decrease the resistivity of the films. The X-ray diffraction patterns show the tetragonal phase of SnO₂ with a small preferential orientation in the (110) plane. All films show high optical transmission (~85%) and a direct band gap value around of 3.8 eV. The minimum resistivity value, 2 × 10⁻¹ Ohm-cm, is obtained for the films sintered at 300 and 350 °C and thermal treated in vacuum at 500 °C for 1 h. The decrease of the resistivity with the thermal treatment in vacuum is associated with an increase in the oxygen vacancies concentration.     

Effect of zinc addition and vacuum annealing time on the properties of spin-coated low-cost transparent conducting 1 at% Ga–ZnO thin films

Abstract

Pure and 1 at% gallium (Ga)-doped zinc oxide (ZnO) thin films have been prepared with a low-cost spin coating technique on quartz substrates and annealed at 500 °C in vacuum ～10^?3 mbar to create anion vacancies and generate charge carriers for photovoltaic application. Also, 0.5–1.5 at% extra zinc species were added in the precursor sol to investigate changes in film growth, morphology, optical absorption, electrical properties and photoluminescence. It is shown that 1 at% Ga–ZnO thin films with 0.5 at% extra zinc content after vacuum annealing for 60 min correspond to wurtzite-type hexagonal structure with (0001) preferred orientation, electrical resistivity of ～9 × 10^?3 Ω cm and optical transparency of ～65–90% in the visible range. Evidence has been advanced for the presence of defect levels within bandgap such as zinc vacancy (V_Zn), zinc interstitial (Zn_i), oxygen vacancy (V_o) and oxygen interstitial (O_i). Further, variation in ZnO optical bandgap occurring with Ga doping and insertion of additional zinc species has been explained by invoking two competing phenomena, namely bandgap widening and renormalization, usually observed in semiconductors with increasing carrier concentration.     

Low indium content In–Zn–O system towards transparent conductive films: structure,properties and comparison with AZO and GZO

In this work, low content indium doped zinc oxide (IZO) thin films were deposited on glass substrates by RF magnetron sputtering using IZO ceramic targets with the In₂O₃ doping content of 2, 6, and 10 wt%, respectively. The influences of In₂O₃ doping content and substrate temperature on the structure and morphology, electrical and optical properties, and environmental stability of IZO thin films were investigated. It was found that the 6 wt% doped IZO thin film deposited at 150?°C exhibited the best crystal quality and the lowest resistivity of 9.87?×?10^?4 Ω cm. The corresponding Hall mobility and carrier densities were 9.20 cm² V^?1 s^?1 and 6.90?×?10²⁰ cm^?3, respectively. Compared with 2 wt% Al₂O₃ doped ZnO and 5 wt% Ga₂O₃ doped ZnO thin films, IZO thin film with the In₂O₃ doping content of 6 wt% featured the lowest surface roughness of 1.3 nm. It also showed the smallest degradation with the sheet resistance increased only about 4.4% at a temperature of 121?°C, a relative humidity of 97% for 30 h. IZO thin film with 6 wt% In₂O₃ doping also showed the smallest deterioration with the sheet resistance increased only about 2.8 times after heating at 500?°C for 30 min in air. The results suggested that low indium content doped ZnO thin films might meet practical requirement in environmental stability needed optoelectronic devices.