Extreme-ultraviolet radiation filtering by freestanding transmission gratings

Measurement of energetic neutral atoms fluxes in space requires efficient suppression of exceptionally strong background extreme-ultraviolet (EUV) and UV radiation. Diffraction filters make it possible to separate (transmit) charged and neutral particles from the background radiation (which would be suppressed). Recently developed freestanding transmission gratings look especially promising for implementation in a new family of diffraction EUV/UV filters. The first results of our experimental study of filtering properties of freestanding transmission gratings with a period of 200 nm are presented. The grating transmission was measured in the 52-131-nm wavelength range, and grating polarization properties were determined at 58.4 nm. It is shown that transmission gratings can be used efficiently as filters and polarizers in the EUV/UV spectral range.     

Efficiencies of master, replica, and multilayer gratings for the soft-x-ray-extreme-ultraviolet range: modeling based on the modified integral method and comparisons with measurements

The near-normal-incidence efficiencies of a 2400-groove/mm holographic master grating, a replica grating, and a multilayer grating are modeled in the soft-x-ray-extreme-ultraviolet (EUV) regions and are compared with efficiencies that are measured with synchrotron radiation. The efficiencies are calculated by the computer program PCGrate, which is based on a rigorous modified integral method. The theory of our integral method is described both for monolayer and multilayer gratings designated for the soft-x-ray-EUV-wavelength range. The calculations account for the groove profile as determined from atomic force microscopy with a depth scaling in the case of the multilayer grating and an average random microroughness (0.7 nm) for the short wavelengths. The refractive indices of the grating substrate and coatings have been taken from different sources because of the wide range of the wavelengths (4.5-50 nm). The measured peak absolute efficiency of 10.4% in the second diffraction order at a wavelength of 11.4 nm is achieved for the multilayer grating and is in good agreement with a computed value of approximately 11.5%. Rigorous modeling of the efficiencies of three similar gratings is in good overall agreement with the measured efficiency over a wide wavelength region. Additional calculations have indicated that relatively high normal incidence efficiency (of at least several percent) and large angular dispersion in the higher orders can be achieved in the 4.5-10.5-nm range by application of various multilayer coatings.     

Broadband transmission masks, gratings and filters for extreme ultraviolet and soft X-ray lithography

Lithography and patterning on a nanometre scale with extreme ultraviolet (EUV) and soft X-ray radiation allow creation of high resolution, high density patterns independent of a substrate type. To realize the full potential of this method, especially for EUV proximity printing and interference lithography, a reliable technology for manufacturing of the transmission masks and gratings should be available. In this paper we present a development of broadband amplitude transmission masks and gratings for extreme ultraviolet and soft X-ray lithography based on free-standing niobium membranes. In comparison with a standard silicon nitride based technology the transmission masks demonstrate high contrast not only for in-band EUV (13.5 nm) radiation but also for wavelengths below Si L-absorption edge (12.4 nm).The masks and filters with free standing areas up to 1000 × 1000 μm² and 100 nm to 300 nm membrane thicknesses are shown. Electron beam structuring of an absorber layer with dense line and dot patterns with sub-50 nm structures is demonstrated. Diffractive and filtering properties of obtained structures are examined with EUV radiation from a gas discharge plasma source.     

Polarization of holographic grating diffraction. II. Experiment

The transmittance, ellipsometric parameters, and depolarization of transmission, diffraction, and reflection of two volume holographic gratings (VHGs) are measured at a wavelength of 632.8 nm. The measured data are in good agreement with the theoretical simulated results, which demonstrated the correlation between the diffraction strength and the polarization properties of a VHG. Vector electromagnetic theory and polarization characterization are necessary for complete interpretation of the diffraction property of a VHG. The diffraction efficiency is measured at 532 nm in a polarization-sensing experiment. The measured data and theoretical simulation have demonstrated the potential application of the holographic beam splitter for polarization-sensor technology.     

Sub-10 nm patterning using EUV interference lithography

Extreme ultraviolet (EUV) lithography is currently considered as the leading technology for high-volume manufacturing below sub-20 nm feature sizes. In parallel, EUV interference lithography based on interference transmission gratings has emerged as a powerful tool for industrial and academic research. In this paper, we demonstrate nanopatterning with sub-10 nm resolution using this technique. Highly efficient and optimized molybdenum gratings result in resolved line/space patterns down to 8 nm half-pitch and show modulation down to 6 nm half-pitch. These results show the performance of optical nanopatterning in the sub-10 nm range and currently mark the record for photon-based lithography. Moreover, an efficient phase mask completely suppressing the zeroth-order diffraction and providing 50 nm line/space patterns over large areas is evaluated. Such efficient phase masks pave the way towards table-top EUV interference lithography systems.     

Extreme-ultraviolet efficiency measurements of freestanding transmission gratings

We report new, near-normal-incidence, transmission grating efficiency results at selected extreme-ultraviolet wavelengths between 4.5 and 30.5 nm for two transmission gratings, one with a period of 200 nm and the other with a period of 400 nm. These gratings consist of opaque gold bars separated by open spaces that have been produced by photolithography techniques commonly used to produce electronic components. The gold bars and the open spaces are nominally of the same width. Both gratings have a thickness of 470 nm. The transmission efficiency at the central, first, and, when possible, second order of diffraction was measured. In addition, guided-wave phenomena at nonnormal angles of incidence, as well as transmission differences depending on which side of the grating was illuminated, were investigated. The observed guided-wave effects allow one to selectively enhance the transmission of the grating at desired wavelengths, as is realized with a blazed reflection grating.     

Polarization multiplexing of diffractive elements with metal-stripe grating pixels

Diffractive elements with polarization multiplexing for the visible spectral region are demonstrated. The polarization-multiplexing property of the element is based on the polarization-dependent transmission characteristics of metal-stripe subwavelength period gratings. The proper dimensions of these gratings are estimated by rigorous calculations. The principle of polarization multiplexing by use of metal-stripe subwavelength period gratings is described for a diffractive element that has a binary amplitude transmission per polarization channel and is demonstrated by experimental results.     

Near-normal-incidence extreme-ultraviolet efficiency of a flat crystalline anisotropically etched blazed grating

We have measured the extreme-ultraviolet (EUV) efficiency at an angle of incidence of 10 degrees of a flat crystalline anisotropically etched blazed grating. The measured efficiencies are high for uncoated gratings and agree well with a calculated model derived from a reasonable estimate of the groove profile. The highest groove efficiencies derived from the measurements are 48.8% at 19.07 nm and 64.1% at 16.53 nm for the -2 and -3 orders, respectively, which are comparable to the best values obtained yet from a holographic ion-etched blazed grating. This presents opportunities to instrument designs for high-resolution EUV spectroscopy in astrophysics where high efficiency in high orders is desirable.     

High-efficiency x-ray gratings with asymmetric-cut multilayers

We present the fabrication and analysis of efficient and highly dispersive gratings for the x-ray and extreme ultraviolet (EUV) regime. We show that an asymmetric-cut multilayer structure can act as a near-perfect blazed grating. The precision and high line density are achieved by layer deposition of materials, which can be controlled to the angstrom level. We demonstrate this in the EUV regime with two structures made by cutting and polishing magnetron-sputtered multilayer mirrors of over 2000 bilayers thick, each with a period of 6.88 nm. These were cut at angles of 2.9° and 7.8° to the surface. Within the 3% bandwidth rocking curve of the multilayer, the angular dispersion of the diffracted wave was in agreement with the grating equation for elements with 7250 and 19,700 line pairs/mm, respectively. The dependence of the measured efficiency was in excellent agreement with a formulation of dynamical diffraction theory for multilayered structures. At a wavelength of 13.2 nm, the efficiency of the first-order diffraction was over 95% of the reflectivity of the uncut multilayer. We predict that such structures should also be effective at shorter x-ray wavelengths. Both the Laue (transmitting) and Bragg (reflecting) geometries are incorporated in our formalism, which is applied to the analysis of multilayer Laue lenses and focusing and dispersing Bragg optics.     

Two-wave-plate compensator method for full-field retardation measurements

The two-wave-plate compensator (TWC) method is expanded for full-field retardation measurements by use of a polarization microscope. The sample image is projected onto a CCD camera connected to a computer, allowing the retardation to be measured at all pixels. The retardation accuracy of this implementation of the TWC is evaluated to be 0.06 nm. The method is applied to polarization-maintaining fibers and long-period fiber gratings. The measured retardation is in good agreement with the crossed-polarizer images of the fibers. The method achieves a spatial resolution of 0.45 microm and a retardation resolution of 0.07 nm. The full-field TWC method can thus be a useful tool for characterizing and monitoring the fabrication of optical devices.     

Mo/Si multilayers for EUV lithography by ion beam sputter deposition

Mo/Si multilayers for applications in extreme ultraviolet (EUV) lithography have been prepared on Si wafer substrates using ion beam deposition. The multilayers were characterised by transmission electron microscopy, secondary ion mass spectroscopy, atomic force microscopy, photoelectron spectroscopy, X-ray reflectometry at grazing incidence, and EUV-reflectivity measurements at nearly normal incidence. The surface and the interfaces of the multilayers are rather smooth with only small roughness. The material properties of the layers are characterised by some intermixing and silicide formation at the Mo-Si interfaces and a polycrystalline grain structure of the Mo layers, which is in agreement with prior studies. Appearance of multilayer diffraction spots, well-resolved Kiessig fringes and other diffraction evidence indicate very good coherence of the wave fields and in this manner a good reproducibility of the multilayer period of 6.7 nm. Normal incidence peak reflectivities of 64-65% in the EUV spectral range were routinely obtained at 13.4 nm wavelength. This reflectivity value and the formation of an EUV standing wave field are confirmed using photoelectron spectroscopy, and an application for defect particle analysis is proposed. The obtained results are discussed in comparison to literature data of multilayers prepared by other deposition techniques and considering new attempts of interface engineering.     

Transmission grating filtering of 52-140-nm radiation

Filtering extreme UV radiation by gold freestanding transmission gratings was studied experimentally in the 52-140-nm wavelength range. Computer simulations are in good agreement with experimental results.     

Characterization of chromatic dispersion and polarizationsensitivity in fiber gratings

Fiber gratings have already become key passive components in fiber optic communication systems. We have characterized gratings used in reflection for dispersion compensation and long period gratings used in transmission for gain flattening using a low-loss, low-noise experimental setup having a picometer optical wavelength resolution. Our measurements include reflection or transmission response, group delay and polarization dependent loss. We have scanned the spectrum of our devices using a very narrow linewidth tunable laser. A network analyzer is used for the chromatic dispersion measurements. Time delays corresponding to the design values have been measured within the useful bandwidth of the gratings for dispersion compensation and the devices have been found to have reasonably small ripples that increase in magnitude toward the shorter wavelength range. The long period gratings for gain flattening have very small group delays. Polarization dependent loss has been measured for the first time in these devices. A polarization analyzer was used and Jones matrix analysis was applied to obtain the measurements. The gratings for dispersion compensation have small a polarization dependent loss within their useful bandwidth, while the long period gratings exhibit higher values and a stronger wavelength dependency in the polarization dependent loss     

Photoinduced anisotropy and polarization holographic gratings formed in Ag/TiO2 nanocomposite films

Formation of anisotropy and polarization holographic gratings (s-s, p-p, and s-p) in Ag/TiO2 nanocomposite films were investigated using Nd:YAG lasers (532 nm) as pumping and writing source, respectively. The observations can be well explained by the anisotropic photodissolution of Ag nanoparticles, the photomobility and reduction of Ag+ ions, and the light scattering induced by Ag nanoparticles. Taking these effects into account, a phenomenological model based on simultaneous formation of the absorption grating and the two coupling phase gratings is proposed and found to be in good agreement with the measurements. The main differences in the three polarization grating formation processes are also discussed.     

Diffraction by dual-period gratings

The dynamical characteristics of dual-period perfectly conducting gratings are explored. Gratings with several grooves (reflection) or slits (transmission) within each period are considered. A scalar approach is proposed to derive the general characteristics of the diffracted response. It was found that compound gratings can be designed to cancel as well as to intensify a given diffraction order. These preliminary estimations for finite gratings are validated by numerical examples for infinitely periodic reflection and transmission gratings with finite thickness, performed using an extension of the rigorous modal method to compound gratings, for both polarization cases.     

近地空间下X/EUV透射光栅的热力学有限元分析

为了实现极紫外透射光栅光谱仪在近地空间的应用,针对其核心色散元件2000线/毫米X/EUV透射光栅,本文采用有限元方法建立了机械模型并对其热学性能和耦合特性进行计算机模拟计算,通过模拟热膨胀系数不同的材料构成的薄膜光栅在近地空间受到太阳辐照后的温度场,得到该光栅表面的热形变分布.结果表明,在高真空热环境下,该透射光栅表面形变量平均可达0.56μm,而影响光栅周期的纵向形变平均值则为71.5 nm.由于热形变会对光栅衍射效率产生重要影响并导致光谱仪精度和性能的下降,利用有限元分析模拟的结果,进一步优化光栅的封装和设计制作,使其栅线处纵向热形变趋近于零,为2000线/毫米X/EUV透射光栅在太阳极紫外辐射探测器上得到应用提供了科学依据和有效支持.     

A non-contact technique for determining the depth of zero-order gratings

Abstract

In this work we present a simple, non-contact method for characterizing the depth of deep zero-order diffraction gratings using standard visible optics. Form birefringence exhibited by zero-order structures alters the polarization state of light transmitted through them. The amount of change is dependent on several factors including the depth of the grating grooves. By recording the polarization changes of laser light transmitted through the sample we demonstrate how the depth of any grating with a known pitch may be determined. Results for many different gratings have been analysed and show good agreement with groove depths measured from scanning electron micrographs. From these results a universal relationship between the amount of polarization change and the depth of the grating grooves has been determined.     

Determining conditions for 13.5-nm radiation generation by a supersonic-xenon-jet laser plasma source

We propose and justify a simple calculation method for (i) evaluating the optimum conditions for the generation of extreme ultraviolet (EUV) emission by a laser plasma source employing a supersonic xenon jet and (ii) finding ways to increase in the efficiency of such sources. The main processes involved in the interaction of laser radiation with a xenon jet target, which account for the EUV emission with a wavelength of 13.5 nm, are taken into account. It is shown that one of the main factors that decreases the output efficiency of such EUV sources is the absorption of generated radiation by the gas target. Qualitative calculations of the optimum conditions for the generation at 13.5 nm have been performed for three lasers with various wavelengths. The most promising results can be expected for a CO₂ laser, for which the radiation conversion efficiency on the order of 3% at a xenon pressure of 10–15 Torr can be achieved.     

Nanopatterning with interferometric lithography using a compact /spl lambda/=46.9-nm laser

We report the imprinting of nanometer-scale gratings by interferometric lithography at /spl lambda/=46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd's mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications.     

Production and evaluation of silicon immersion gratings for infrared astronomy

Immersion gratings, diffraction gratings where the incident radiation strikes the grooves while immersed in a dielectric medium, offer significant compactness and performance advantages over front-surface gratings. These advantages become particularly large for high-resolution spectroscopy in the near-IR. The production and evaluation of immersion gratings produced by fabricating grooves in silicon substrates using photolithographic patterning and anisotropic etching is described. The gratings produced under this program accommodate beams up to 25 mm in diameter (grating areas to 55 mm x 75 mm). Several devices are complete with appropriate reflective and antireflection coatings. All gratings were tested as front-surface devices as well as immersed gratings. The results of the testing show that the echelles behave according to the predictions of the scalar efficiency model and that tests done on front surfaces are in good agreement with tests done in immersion. The relative efficiencies range from 59% to 75% at 632.8 nm. Tests of fully completed devices in immersion show that the gratings have reached the level where they compete with and, in some cases, exceed the performance of commercially available conventional diffraction gratings (relative efficiencies up to 71%). Several diffraction gratings on silicon substrates up to 75 mm in diameter having been produced, the current state of the silicon grating technology is evaluated.