UV-induced permanent gratings in sol–gel germanosilicate thin films

Germanosilicate thin films have been elaborated by the sol–gel process and the dip-coating technique. Pulsed or continuous wave UV laser (244 nm) was used to write permanent gratings in these films. In the case of exposure to cw laser, the grating diffraction efficiencies were measured using a focused beam from a He–Ne laser at 633 nm and photo-induced changes in refractive index as high as 4×10⁻³ have been obtained. The thermal behaviour of these gratings has been investigated showing a good stability up to 400°C. Exposure to pulsed fringe pattern led to a glass photo-expansion modulated by a strong corrugation which can be due mainly to photo-ablation at the places of the bright fringes. The waveguide surface at the grating places was investigated through Atomic Force Microscopy (AFM) and microscopic profilometry techniques. Preliminary results on the kinetics of the grating growths are also reported.     

Spectral resolution analysis of resonant grating waveguides

A high spectral resolution analysis of narrowband reflection filters based on resonant grating waveguide structures is presented. A tunable high‐performance dye laser with ～0.15 cm^‐1 line width and a beam analyzing system consisting of three simultaneously controlled CCD cameras were used to investigate grating waveguide resonances at wavelengths ～694 nm and ～633 nm. A reflectivity of 91 % and a line width of ～0.3 nm were measured and theoretically modeled for a resonant reflection filter specifically designed for the ruby laser wavelength 694.2 nm. A resonance shift of several nanometers was observed for a second grating waveguide structure in the region of the helium‐neon laser emission wavelength 632.8 nm by changing the sample temperature. We discuss the potential of grating waveguide devices combining the narrow line width and the tunability of the resonant response as promising candidates for implementation in innovative concepts for reflection filter and sensor applications.     

Polymer-based waveguides and optical switching

The fabrication and linear optical characterization of a Bragg reflector in a planar polymeric waveguide, suitable for an all-optical switching device, is reported. Surface corrugation gratings with a grating constant of 349 nm were produced in different polymeric films of poly(phenylene-vinylene), polydiacetylene and polystyrene by excimer laser photoablation. Furthermore, the gap in the linear transmission spectrum of the modulated waveguide was measured and compared with the result of numerical simulations. A good agreement can only be found if a non-uniform grating with a small chirp is assumed. This small deviation from the uniform grating cannot be resolved with a scanning electron microscope. However, this linear optical investigation helps to further improve the fabrication process and opens the possibility to yield a well-defined grating with a prescribed modulation strength, which is a vital requirement for the proper operation of a nonlinear all-optical switch.     

Direct fabrication of surface relief gratings in chalcogenide glasses by excimer laser interference lithography

In this paper we study the possibility to realise surface relief gratings in thin chalcogenide glass films by holographic exposure using a pulsed KrF excimer laser. Gratings with a period of 540 nm and depths of 100–300 nm were patterned at the surface of 1 μm thick films. Due to coupling of an incident near-infrared laser beam to waveguide modes a resonance-like polarisation dependent decline of transmission was observed at specific incidence angles. Just one laser pulse with a fluence of 12 mJ/cm² per beam was sufficient to achieve the required grating parameters in sulphide glasses with low T _g.     

Tunable distributed feedback lasing from leaky waveguides based on gel-glass dispersed liquid crystal thin films

Different amount of nematic liquid crystal (LC) 4-Cyano-4′-pentylbiphenyl(5CB) was encapsulated in sol–gel derived organically modified silica(ORMOSIL) matrices to fabricate dye doped gel-glass dispersed liquid crystal (GDLC) thin films by co-hydrolyzation/condensation of ethyl triethoxisilane (ETES) and tetraethyl orthosilicate (TEOS) precursors. Distributed feedback (DFB) leaky waveguide lasers from GDLC thin films using a dynamic grating were demonstrated. Tunable laser action from 558 to 570 nm was obtained in the sample with lowest LC concentration of 0.375 mol%. The DFB laser performance of GDLC thin films with various LC concentrations was investigated using the same pumping geometry, and it was shown that the encapsulation of 5CB also led to the red shift of lasing peak.     

All-plastic organic dye laser with distributed feedback resonator structure

We demonstrated an all-plastic waveguide organic dye laser with distributed feedback (DFB) resonator. We fabricated DFB structure on a surface of SU-8 2002 photoresist polymer using the interference of two beams of a frequency-tripled Nd:YAG pulse laser at 355 nm. The typical grating pitch of fabricated DFB structure was 190, 380 and 570 nm, corresponding to the number of mode m, and each corresponding grating amplitude was ca. 1, 4-5, and 25 nm, respectively. Shallow amplitude of 1 or 4-5 nm is ascribed to the wide incidence angle of the interference beams. Threshold of lasing for m = 3 is lower than that for m = 1 or m = 2 depending on the emission wavelength. DFB structure with the smaller amplitude of gratings at m = 1 and 2 is required for the higher threshold of laser emission. By controlling the grating pitch with nanometer scale, we can tune the wavelength of laser emission with 40 to 60 nm tunability. Effective energy transfer via nonradiative Förster transfer mechanism assists in lowering the threshold of laser emission.     

深蚀刻玻璃光波导光栅的研究

采用全息法制备了光刻胶光栅，并用该光栅掩膜离子蚀刻，刻得槽深为１．６μｍ的玻璃光栅，再采用Ｋ＾＋／Ｎａ＾＋交换法制备玻璃光波导光栅，用６３３ｎｍ波长激光由一端棱镜耦合输入，经过光栅，由另一端面输出，在实验中观察到多级布拉格衍射，一级布拉格衍射效率最高达９０％。     

Photoluminescence and lasing from deoxyribonucleic acid (DNA) thin films doped with sulforhodamine

Thin solid films of salmon deoxyribonucleic acid (DNA) have been fabricated by treatment with a surfactant and used as host for the laser dye sulforhodamine (SRh). The DNA films have an absorption peak at approximately 260 nm owing to absorption by the nitrogenous aromatic bases. The SRh molecules in the DNA films have absorption and emission peaks at 578 and 602 nm, respectively. The maximum emission was obtained at approximately 1 wt. % SRh in DNA, equivalent to approximately 100 DNA base pairs per SRh molecule. A distributed feedback grating structure was fabricated on a SiO(2)-Si substrate using interference lithography. The grating period of 437 nm was selected, corresponding to second-order emission at the amplified spontaneous emission wavelength of 650 nm. Lasing was obtained by pumping with a doubled Nd:YAG laser at 532 nm. The lasing threshold was 3 microJ, corresponding to approximately 30 microJ/cm(2) or 4 kW/cm(2). The emission linewidth decreased from approximately 30 nm in the amplified spontaneous emission mode to <0.4 nm (instrument limited) in the lasing mode. The slope efficiency of the lasing was approximately 1.2%.     

Fabrication of a distributed-feedback dye laser with a grating structure in its plastic waveguide

Two approaches of fabricating grating structures for waveguided plastic dye lasers are described and compared for lasing performance. Rhodamine6G-doped poly(methyl methacrylate) (PMMA) film on a PMMA substrate was used for the waveguide, and a distributed-feedback (DFB) laser operation with a single-propagation mode was demonstrated. The performances of both types of permanent grating structured DFB dye laser were better than those of a DFB dye laser on a plain waveguide with a dynamic grating formed by the interference of two pump beams. Wide tuning range is expected by use of a multistripe DFB laser with different grating pitches.     

Formation of channel waveguide with grating in polymer films based on simultaneous photobleaching and embossing

Channel waveguide with grating is fabricated in nonlinear optical (NLO) polymer thin films by means of simultaneous embossing and photobleaching. A combined structure of mask/master consisting of a photomask part and a grating die part which is made of polyimide is fabricated. Then the mask/master is set on the NLO polymer films and both embossing and photobleaching are performed simultaneously. Profiles of the replica grating and the channel waveguide are estimated.     

Surface-grating distributed bragg reflector quantum-well lasers fabricated in AlGaAs-GaAs asymmetric epitaxial waveguides

Ridge waveguide lasers, integrated with single deep-surface distributed Bragg reflectors (DBR's) in the passive section, were fabricated with a GaAs-AlGaAs double-quantum-well structure in an asymmetric waveguide. Third-order gratings, with a period of 389 nm and defined by holographic lithography, were formed by low-damage reactive ion etching processes. The grating losses and optical coupling coefficients were estimated, in particular, by use of the relationship between the real and the effective grating lengths that were computed and reexamined by measurements of grating periodicity and mode spacing. By use of two different geometries, we produced guide lines for obtaining high-performance lasing properties for these surface-grating DBR lasers. Additionally, a detailed analysis of lasing wavelength shifts was carried out for this study. It was found that injected-carrier-induced effects shift the lasing wavelength much more than gain-loss competition within an extended DBR laser cavity.     

Narrowband Bragg reflectors in Ti:LiNbO3 optical waveguides

Bragg grating reflectors etched in amorphous silicon overlay films have been integrated with Ti:LiNbO3 optical waveguides to obtain a narrow (0.05 nm) reflectance spectrum with a > 20 dB dip in the transmittance spectrum. These results were realized at a wavelength of 1542.7 nm for TE polarization on an x-cut, y-propagating substrate with gratings etched to a depth of approximately 93 nm in a 105 nm thick silicon film over a length of 12.5 mm. The reflectance in the channel waveguides is found to be strongly dependent on the depth of the etched grating. The effect of the Bragg waveguide loss factor on the transmittance and reflectance spectra is investigated by using a model for contradirectional coupling that includes an attenuation coefficient. The values for coupling constants kappa and amplitude attenuation constants alpha of samples etched for different time durations to control the grating depths are obtained from the model through the use of the depth of the dips in the transmittance spectra and the spectral widths of the reflectance peaks. It is concluded that the corrugated Si overlay film increases the insertion loss by approximately 2.7 dB, and the loss is not significantly affected by the grating depth.     

Embossed Bragg Gratings Based on Organically Modified Silane Waveguides in InP

Considering the large variety of applications for optical glass waveguide gratings, the effective production method of embossing for micropatterning, and the unique advantages of InP-based materials, we expect that hybridization of embossed optical glass waveguide gratings and InP substrates will inevitably lead to new applications in integrated optics. We present our preliminary results of research toward the development of solgel-derived glass waveguide gratings made by embossing on InP. Theoretically, the dependence of the stop-band FWHM and transmission contrast of the grating filter on the grating length, and the relationship between the Bragg grating's reflective wavelength and the dopant concentration in the solgel waveguide, are obtained. Experimentally, using organically modified silane, we solve the problem of mismatching of SiO(2) and InP, and successfully fabricate an embossed glass grating with a second-order Bragg reflection wavelength of 1580 nm and a FWHM of 0.7 nm fabricated upon a solgel waveguide on an InP substrate.     

A simplified broadband coupling approach applied to chemically robust sol-gel, planar integrated optical waveguides

A new generation waveguide spectrometer with broadband coupling capabilities has been developed. As opposed to previous devices, this attenuated total reflection (ATR) spectrometer is much simpler in design, is more chemically robust, and transmits light down to at least 400 nm. The attenuated total reflection element consists of a single-mode, planar integrated optical waveguide fabricated by dip-coating a approximately 300 nm thick, sol-gel composite layer on a glass substrate. A commercially available prism is used as the incoupler with an integral holographic diffraction grating acting as the dispersive outcoupling element. The transmission of narrow band-pass filters was used to compare the response of the waveguide spectrometer to that of a conventional transmission instrument. Spectral resolution was assessed by measuring the fwhm of various laser lines, which were found to range from 0.5 to 1.3 nm. The measured limits of detection for the waveguide spectrometer from 400 to 600 nm are 8.0 and 10.1 milliabsorbance units for TE and TM polarizations, respectively. Finally, to demonstrate the application of this technology to a molecular film confined to a solid-liquid interface, visible ATR spectra of an adsorbed submonolayer of horse heart cytochrome c were acquired. A procedure to correct the waveguide spectra for the wavelength dependence in ATR path length is described.     

High-power external-cavity AlGaAs/GaAs/InGaAs quantum-dimensional heterolasers (λ = 1.06 μm)

Use of an external cavity with a grating ensures effective narrowing of the linewidth (～0.35 nm) of a high-power multimode semiconductor laser with a broad (100 μm) stripe contact. An output power of up to 550 mW has been reached with experimental external-grating-cavity laser diodes. It is demonstrated that a 3-mm-long multimode laser diode based on a quantum-dimensional AlGaAs/GaAs/InGaAs heterostructure (λ = 1.06 μm) can be used with a directly pumped PPLN crystal waveguide to obtain second-harmonic radiation with λ = 0.532 μm.     

Holographic Bragg grating input-output couplers for polymer waveguides at an 850-nm wavelength

Bragg gratings used as input-output couplers in polymeric waveguides have been demonstrated at infrared wavelengths. These Bragg grating couplers were holographically formed volume phase gratings with a near-45 degrees fringe slant angle embedded directly into a waveguide layer. A photopolymer was used for both producing a planar waveguide and constructing the embedded Bragg grating coupler. A coupling efficiency of 23% for input and 5% for output has been achieved at 850 nm. The output-coupling beam profiles are also discussed.     

Fabrication and characterization of epitaxial Ba0.7Sr0.3TiO3 thin films for optical waveguide applications

The optical properties of barium strontium titanate (Ba0.7Sr0.3TiO3; BST) thin films are described. The BST thin films were epitaxially grown upon MgO (001) substrates by pulsed laser deposition. The crystallographic properties of the BST thin films were examined by x-ray diffraction. The BST thin films were highly optically transparent in the visible region. The optical waveguide properties were characterized by a prism coupling technique. An inverse-WBK method was employed to determine the refractive-index profile along the thickness of the BST films. Optical losses were measured by a moving fiber method, and the optical losses were found to be 0.93 dB/cm for the TE0 mode and 1.29 dB/cm for the TM0 mode at 1550 nm. Electro-optic (E-O) properties were measured by a phase-modulation detection method at 632.8 nm, and the BST films exhibited a predominantly quadratic E-O effect with a quadratic E-O coefficient of 6.64 x 10(-18) m2/V2.     

Holographic grating recording in azobenzene polymer films

The photo-induced birefringence grating and the surface grating in azobenzene polymer films were studied. The photo-induced birefringence (about 0.02 at 633 nm) was investigated at various intensities of laser (532 nm) beam. The effect of laser-induced heating has been introduced to the processes of photo-induced reorientation in azo polymer. The holographic grating period and the peak-to-peak value of the sinusoidal surface profile are 0.8 mm and 40 nm, respectively. The maximum diffractive efficiency of the grating is 2%. The mass diffusion responsible for the formation of the surface grating due to the temperature rise is analyzed.     

Photosensitive GeO2-SiO2 films for ultraviolet laser writing of channel waveguides and bragg gratings with Cr-loaded waveguide structure

Irradiation with intense ultraviolet laser pulses induced a large refractive-index change in 30GeO2-70SiO2 waveguide-grade thin films prepared by the plasma-enhanced chemical vapor deposition method, which contained a large amount of photoactive Ge2+ defects. The maximum index change in the as-deposited films by KrF and XeF excimer laser irradiation was estimated to be 1.2 x 10(-3) and 0.28 x 10(-3), respectively. These results clearly indicate that the photorefractivity of GeO2-SiO2 glasses is due to a Ge2+ defect in origin. The channel waveguide and the planar Bragg gratings were directly written in the photoactive Ge(2+)-enriched GeOs-SiO2 thin films by pulsed ultraviolet laser irradiation with a Cr-metal-loaded-type waveguide structure.     

Dual wavelength fibre laser with tunable channel spacing using an SOA and dual AWGs

In this paper, we propose and demonstrate a dual wavelength fibre laser (DWFL) based on the use of an inhomogeneously-broadened semiconductor optical amplifier (SOA) gain medium as well as two arrayed waveguide gratings (AWGs) together with two optical channel selectors (OCSs) and a broadband fibre Bragg grating (FBG) to generate dual wavelength output at variable channel spacings. The widest spacing obtained from the DWFL is 12.21 nm, while the narrowest spacing is 1.16 nm. The DWFL has good stability with only minor power fluctuations of less than 2 dB and a side mode suppression ratio (SMSR) of approximately 38.5 dB with fluctuations of less than 0.5 dB.