一种0.1-1.2GHz的CMOS射频收发开关芯片设计

本文设计了一种低插入损耗、高隔离度的全集成超宽带CMOS射频收发开关芯片。该电路采用深N阱体悬浮技术,在1.8V电压供电下,该射频开关收发两路在0.1-1.2GHz内的测试结果具有0.7dB的插入损耗、优于-20dB的回波损耗以及-37dB以下的隔离度。本开关采用GLOBALFOUNDRIES 0.18μm CMOS工艺,芯片总面积为0.53mm2。本文网络版地址:http://www.eepw.com.cn/article/233865.htm     

一种100 MHz~12 GHz高功率SPDT射频开关

基于0.13 μm CMOS SOI工艺,设计并实现了一种100 MHz~12 GHz高功率SPDT射频开关。该射频开关为吸收式射频开关,开关支路为串并联的拓扑结构。采用负压偏置设计,减小了插入损耗,提高了隔离度。采用多级开关管堆叠设计,提高了开关的输入1 dB 压缩点。测试结果表明,在100 MHz~12 GHz频率范围内,该射频开关插入损耗小于1.5 dB,隔离度大于31 dB,输入1 dB 压缩点大于40 dBm。芯片尺寸为1.1 mm ×1.1 mm。     

基于M型六角铁氧体Ba(ZnHf)0.08Fe11.92O19的自偏置微带环行器设计

电子信息技术的发展对环行器提出了低损耗、高隔离度及小型化的要求，采用具有高剩磁比(M_r/M_s)和强各向异性场(H_a)的BaM自偏置铁氧体材料有利于提高环行器性能和减小器件尺寸。在阐述高度取向M型六角铁氧体Ba(ZnHf)_0.08Fe_11.92O₁₉制备工艺的基础上，表征了材料的相结构、微观形貌和磁性能。根据环行器设计理论，基于0.25 mm厚度的BaM铁氧体材料仿真设计了工作于Ku波段的双Y结和开槽多Y结环行器。仿真结果表明，两种环行器均在12.44 GHz处显示出良好的环行功能，电压驻波比均小于1.22。在中心频率附近，双Y结环行器插入损耗为0.61 dB,相应的隔离度为26 dB,20 dB带宽为1.3 GHz;开槽多Y结环行器插入损耗为0.505 dB,相应的隔离度为36 dB,20 dB带宽为1.03 GHz。相比于双Y结环行器，开槽多Y结环行器在保证器件性能的前提下，能够有效改善插入损耗和隔离度等性能，并有利于减小环行器尺寸。     

射频微机械CPW开关的研究

本文采用聚酰亚胺牺牲层技术和二氧化硅介质隔离技术,成功地在绝缘多晶硅衬底上研制出一种射频微机械CPW开关.初步测试结果如下:开态电容为0.21pF,关态电容为6.1pF,致动电压为22V,关态下的隔离度为35dB,开态下插入损耗为3dB.该工艺完全与硅基IC工艺兼容,这为射频微机械CPW开关与IC实现单片集成化,降低体积提高可靠性打下了基础.     

基于Q-MMIC技术的W波段低成本PIN管开关（英文）

采用低成本方法设计了一款W波段单刀单掷开关.通过在单独加工的石英基片无源电路上安装倒装PIN管,获得了一款W波段准毫米波单片(Q-MMIC)开关.为了获得低损耗、高隔离度性能,开关设计中采用了3-D PIN管模型和电路补偿结构.测试结果表明开关在88 GHz时插入损耗最小,最小值为0.5 dB;在80~101 GHz频率范围内,开关导通时的插入损耗小于2 dB;在84~104 GHz频率范围内,开关隔离度大于30 dB.整个开关电路尺寸为1.5 mm×3.0 mm.     

一种基于MMIC技术的S波段GaAs单刀单掷开关

射频开关作为一个系统的重要组成部分其性能直接影响整个系统的指标和功能。其中插入损耗和隔离度以及开关速度是射频开关最重要的几个指标。在实际测试中,S波段脉冲信号源需要产生快前沿的窄脉冲信号。在此基于上述需求,利用了射频开关模块设计的基本原理,并结合了PCB上微带线的特性阻抗分析,且设计了合适的开关驱动电路,最终设计出一种高隔离度,低插入损耗,高速射频开关,开关控制电压为（0,-5V）。在频率2～4GHz的条件下,插入损耗小于1．7dB,隔离度大于48dB,结果满足设计要求。     

基于Q-MMIC技术的W波段低成本PIN管开关

采用低成本方法设计了一款W波段单刀单掷开关。通过在单独加工的石英基片无源电路上安装倒装PIN管,获得了一款W波段准毫米波单片（Q-MMIC）开关。为了获得低损耗、高隔离度性能,开关设计中采用了3-D PIN管模型和电路补偿结构。测试结果表明开关在88GHz时插入损耗最小,最小值为0.5dB;在80-101 GHz频率范围内,开关导通时的插入损耗小于2 dB;在84-104 GHz频率范围内,开关隔离度大于30 dB。整个开关电路尺寸为1.5 mm× 3.0 mm。     

改进K型单刀四掷射频MEMS开关

针对射频器件小型化以及5G通信发展的需求，设计了一款射频微机电系统（RF-MEMS）单刀四掷开关。该开关由一个改进型K型功分器和六个单刀单掷开关级联构成，并基于硅基MEMS工艺进行制造。其中，改进型K型功分器由多个Y型功分器串并联构成。改进的开关各端口具有插入损耗小和隔离度高的特点。最终流片的测试结果显示：该单刀四掷MEMS开关的插入损耗优于2.8 dB，隔离度优于29 dB。     

AlGaAs/GaAs PIN超宽带微波毫米波单刀三掷开关

研制了基于异质结AlGaAs/GaAs PIN二极管的超宽带微波毫米波开关单片。通过异质结外延材料结构的设计和MOCVD生长技术、高台面PIN开关电路制备工艺技术、超宽带模型管S参数测试与电路设计,制作了一款0.05～50 GHz的超宽带PIN单刀三掷开关。测试结果表明：该微波毫米波开关在0.05～18 GHz频带内插入损耗为0.5～0.75 dB,隔离度大于41 dB;18～50 GHz频带内插入损耗为0.75～1.2 dB,隔离度大于27 dB;具有低插入损耗和高隔离度的开关切换特性。     

基于滤波器设计方法的GaN-on-Si毫米波单刀双掷开关

基于滤波器的设计方法，实现了一款适用于毫米波通信的宽频带单刀双掷（SPDT）开关。为了实现宽频带和低插入损耗，采用100 nm GaN-on-Si HEMT器件及行波式开关设计方法，同时采用四枝节的结构，实现对射频信号的全反射，以此获得更高的隔离度。在0 V和-15 V的栅偏置电压下，在室温环境中测试的结果表明：在30～44 GHz频带内，SPDT开关具有良好的回波损耗，其插入损耗低于1.5 dB，隔离度高于34 dB，并且在36 GHz下的输入1 dB功率压缩点优于39.2 dBm。芯片面积为1.7 mm×1.2 mm。     

Characteristics of metal-ferroelectric-insulator-semiconductor structure using Sr0.8Bi2.2Ta2O9 and Sr0.8Bi2.2Ta2O9-BaZrO3 for ferroelectric gates

Characteristics of BaZrO₃ (BZO) modified Sr_0.8Bi_2.2Ta₂O₉ (SBT) thin films fabricated by sol-gel method on HfO₂ coated Si substrates have been investigated in a metal-ferroelectric-insulator-semiconductor (MFIS) structure for potential use in a ferroelectric field effect transistor (FeFET) type memory. MFIS structures consisting of pure SBT and doped with 5 and 7 mol% BZO exhibited memory windows of 0.81, 0.82 and 0.95 V with gate voltage sweeps between −5 and +5 V, respectively. Leakage current density levels of 10⁻⁸ A/cm² for BZO doped SBT gate materials were observed and attributed to the metallic Bi on the surface as well as intrinsic defects and a porous film microstructure. The higher than expected leakage current is attributed to electron trapping/de-trapping, which reduces the data retention time and memory window. Further process improvements are expected to enhance the electronic properties of doped SBT for FeFET.     

In0.52Al0.48As/In0.53Ga0.47As/In0.52Al0.48As abrupt double-heterojunction bipolar transistors

In0.52Al0.48As/In0.53Ga0.47As/In0.52Al0.48As n-p-n abrupt double-heterojunction bipolar transistors grown by molecular beam epitaxy (MBE) have been realized for the first time. DC current gains in excess of 300 have been measured on devices operated in the emitter-up configuration. DC current gains around 50 are obtained on device structures with Be+ implanted extrinsic base regions operated in the emitter-down configuration. The carrier injection and collection behavior of the abrupt InGaAs/InAlAs heterojunctions is discussed.     

Beat-frequency between measurements between C12O216and C12O218lasers

Several beat frequencies in the range below 6 GHz have been measured using a C¹²O2¹⁶laser and a C¹²O2¹⁸laser operating on several pairs of closely spaced lines in the 9.3-μm region.     

Some new FIR laser lines of optically pumped12CH316OH,12CH316OD, and12CH3I,12CH3Br,12CD2Cl2absorption spectroscopy of water and acetonitrile

The wavelength, polarization, and output power of several lines of the optically pumped CW FIR¹²CH3¹⁶OH (methanol) and¹²CH3¹⁶OD (1-D deuterated methanol), methyl iodide, methyl bromide, and deuterated methylene chloride lasers have been determined. In addition to lines already reported in the literature, seven strong lines have been observed. Optimum performance of the laser system is achieved by means of an improved coupling of the CO2pump power into the resonator and extraction of the FIR power from the resonator. Measurements on the power absorption coefficient of water using the laser indicate thatalpha(bar{nu})rises to almost 1100 Np ċ cm^-1at 170 cm^-1, and then shows a gradual fall with an increase in frequency. A strong temperature dependence of the 200 cm^-1peak inalpha(bar{nu})is predicted, with a decrease in the frequency of maximum power absorption coefficient with an increase in temperature. The range of measurements for acetonitrile is extended to lower frequencies so as to overlap with those determined from other millimeter wave techniques. For highly power-absorbing liquids,alpha(bar{nu})is estimated to be within ± 5 percent.     

Laser4F3/2→4I9/2and4F3/2→4I13/2transitions in KY(WO4)2:Nd3+

We report the observation of lasing at 0.9137 μm and 1.3545 μm in neodymium-doped KY(WO4)2at 77 K. Transition cross sections, fluorescent line width, and branching ratios are given.     

Al0.25In0.75P/Al0.48In0.52As/Ga0.35In 0.65As graded channelpseudomorphic HEMT's with high channel-breakdown voltage

A new Al_0.25In_0.75P/Al_0.48In_0.52 As/Ga_0.35In 0_.65As pseudomorphic HEMT where the InAs mole fraction of the Ga_1-xIn_xAs channel was graded (x=0.53→0.65→0.53) is described. The modification of the quantum well channel significantly improved breakdown characteristics. In addition, use of an Al_0.25In_0.75P Schottky layer increased the Schottky barrier height. Devices having 0.5 μm gate-length showed g_m of 520 mS/mm and I_max of 700 mA/mm. The gate-drain (BV_g-d) and source-drain (BV_d-s ) breakdown voltages were as high as -14 and 13 V, respectively. An f_T of 70 GHz and f_max of 90 GHz were obtained     

选频~(14)CO_2-~(12)CO_2同位素激光器

我们研制了一台~(14)CO_2-~(12)CO_2同位素激光器,测量到激光谱线80条,其中40条是~(14)CO_200°1-(10°0,02°0)_I带的激光跃迁谱线,强线输出功率达4.0W以上;实验还观察到同位素的竞争效应,发现即使~(14)CO_2成份低于~(12)CO_2,其激光辐射仍占优势.     

Waveguide In0.53Ga0.47As-In0.52Al0.48As avalanche photodiode

A high-speed waveguide In_0.53Ga_0.47As-In_0.52Al_0.48 As separate absorption, charge, and multiplication avalanche photodiode suitable for operation at 1.55 μm has been demonstrated, a unity-gain bandwidth of 27 GHz was achieved with a gain-bandwidth product of 120 GHz     

Buried-Pt gate InP/In0.52Al0.48As/In0.7Ga0.3As pseudomorphic HEMTs

InP-based high electron mobility transistors (HEMTs) were fabricated by depositing Pt-based multilayer metallization on top of a 6-nm-thick InP etch stop layer and then applying a post-annealing process. The performances of the fabricated 55-nm-gate HEMTs before and after the post-annealing were characterized and were compared to investigate the effect of the penetration of Pt through the very thin InP etch stop layer. After annealing at 250 °C for 5 min, the extrinsic transconductance (G_m) was increased from 1.05 to 1.17 S/mm and Schottky barrier height was increased from 0.63 to 0.66 eV. The unity current gain cutoff frequency (f_T) was increased from 351 to 408 GHz, and the maximum oscillation frequency (f_max) was increased from 225 to 260 GHz. These performance improvements can be attributed to penetration of the Pt through the 6-nm thick InP layer, and making contact on the InAlAs layer. The STEM image of the annealed device clearly shows that the Pt atoms contacted the InAlAs layer after penetrating through the InP layer.     

Temporal stability of circulating current in thin film Tl2Ba2CaCu2O8 and YBa2Cu3O7

The temporal stability of trapped transport current in annular thin film Tl₂Ba₂CaCu₂O₈ (TBCCO) and YBa₂Cu₃O₇ (YBCO) wafers has been accurately measured and has been found to be of suitable quality for the stringent requirements of nuclear magnetic resonance (NMR) magnets. No detectable decay, to the limit of the experimental apparatus (2*10^-14 Ω), was detected in those wafers with transport current at or below the critical current density J_c. The critical current density, as previously determined from 12 μm meander lines, was confirmed in a wafer with a width of 1.9 cm. The profile of trapped magnetic field resulting from induced current was modeled in order to assess its effect on the uniformity of an NMR magnet