盐雾腐蚀条件下Ti合金表面功能薄膜的摩擦磨损性能

目的研究Ti6Al4V合金、铬掺杂类金刚石(Cr-DLC)薄膜、钨掺杂类金刚石(W-DLC)薄膜和氮化钛(TiN)薄膜,在干摩擦和盐雾腐蚀气氛摩擦条件下的摩擦磨损性能。方法在商用Ti6Al4V合金表面通过非平衡磁控溅射制备Cr-DLC薄膜和W-DLC薄膜,通过多弧离子镀技术制备TiN薄膜。利用扫描电镜、显微硬度计、摩擦磨损试验机、白光干涉扫描轮廓仪,对薄膜的形貌、硬度、干摩擦和腐蚀摩擦性能、磨痕形貌进行测试分析。结果干摩擦条件下,Ti6Al4V合金表面沉积Cr-DLC、W-DLC和TiN三种薄膜的摩擦系数均比Ti6Al4V合金低;Ti6Al4V合金及其表面制备的三种薄膜在盐雾腐蚀气氛条件下的摩擦系数都比干摩擦条件下有所增加。与Ti6Al4V合金相比,Cr-DLC、W-DLC和TiN三种薄膜在干摩擦和盐雾腐蚀气氛摩擦条件下均减小了磨损体积。干摩擦条件下,W-DLC薄膜的磨损体积为0.0017 mm~3,耐磨性最好;盐雾腐蚀气氛摩擦条件下,TiN薄膜的磨损体积为0.0028 mm~3,表现出最佳的耐腐蚀磨损性能。通过磨痕形貌可以得出,盐雾腐蚀气氛摩擦条件下,Ti6Al4V合金表面制备的金属掺杂类金刚石薄膜的磨损受到磨粒磨损和腐蚀磨损双重机制的影响。结论三种表面功能薄膜在盐雾腐蚀气氛摩擦条件下都较好地保护了Ti合金,极大地减少了磨损损失。     

负偏压对多弧离子镀TiN薄膜的影响

采用不同偏压,在201不锈钢表面进行多弧离子镀TiN薄膜,研究了偏压对薄膜表面形貌、硬度、相结构及耐蚀性的影响.研究表明:薄膜表面存在着许多液滴颗粒,随着偏压的增加,液滴减少,但过大的偏压会使表面出现凹坑;薄膜的显微硬度随偏压的升高先增大后减小,偏压为-200 V时的本征硬度为2 195HV;在3.5％的NaCl溶液中...     

多弧离子镀沉积Ti/TiN多层薄膜的摩擦磨损及电化学性能

软硬交替多层结构的薄膜因其优异的抗摩擦磨损性能和耐腐蚀特性使其在工程领域具有重要的应用价值。利用多弧离子镀在不锈钢和Si(100)表面沉积了Ti N单层薄膜和3种不同Ti/Ti N调制比的多层膜,利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、CSM摩擦磨损试验机和电化学工作站分别分析了薄膜的结构特征、耐磨损性能和电化学性能。结果表明:多层膜层状结构明显,Ti N相出现(111)面择优取向;Ti与Ti N沉积时间比为1∶5的样品具有较低的摩擦因数(0.26)和磨损率(6.6×10–7 mm3·N–1·m–1);在3.5%Na Cl溶液中,多层膜样品的腐蚀电流密度较不锈钢基体降低了两个数量级,腐蚀电位较不锈钢基体明显提高,表明多层膜可以提高不锈钢基体的耐腐蚀性。     

Influences of deposition parameters on the microstructure and properties of nanostructural TiN films synthesized by filtered cathodic arc plasma

Titanium nitride （TIN） films with nanostructure were prepared at ambient temperature on a （111） silicon substrate by the filtered cathodic arc plasma （FCAP） technology with an in-plane ＂S＂ filter. The effects of deposition parameters on the grain size, texture and nano-hardness of the films were systematically investigated. The grain size was obtained through calculation using the Scherrer formula and observed by TEM. The results of X-ray diffraction and electron diffraction indicated that increasing either negative substrate bias or argon flow promoted the formation of （111） preferred orientation. High argon flow leads to biaxial texture. The micro-hardness of the TIN films as a function of grain size showed a behavior according to the Hall-Petch relation under high argon flow.     

Structural and tribological properties of DC reactive magnetron sputtered titanium/titanium nitride (Ti/TiN) multilayered coatings

Ti/TiN multilayered coatings of 200 layers with the thickness of 1.5 μm were deposited by a reactive DC magnetron sputtering technique using a mixture of Ar and N₂ gas. XRD technique was employed to elucidate the structural parameters. The presence of different phases like TiN, TiO_xN_y and TiO₂ were confirmed by XPS analyses. The observation of longitudinal optic (LO) phonon modes in the Raman spectra confirmed the highly crystalline nature of the deposited films. A microhardness value of 25.5 GPa was observed for Ti/TiN multilayers. The observed lower friction coefficient value for the Ti/TiN multilayers on mild steel (MS) indicated that the stack layers have better wear resistance property. Results from the electrochemical polarization and impedance studies showed the favorable behavior of the Ti/TiN multilayers, which have improved the corrosion resistance property of MS in 3.5% NaCl solution. The results of this study demonstrate that these multilayers can improve the corrosion resistance of mild steel substrates.     

低温磁控溅射与普通多弧离子镀TiN薄膜的摩擦学性能比较

采用低温磁控溅射和普通多弧离子镀分别在冷作模具钢基体上制备了TiN薄膜，用纳米压痕法测量了薄膜的表面硬度，并比较了低温磁控溅射与普通多弧离子镀TiN薄膜的摩擦学性能。试验表明，低温磁控溅射TiN薄膜具有与普通多弧离子镀TiN薄膜相近的表面硬度，在多种试验条件下，低温磁控溅射TiN薄膜都有较好的摩擦学性能，摩擦副的磨损率低，摩擦因数小且变化平稳，磨损表面光滑。     

Effects of titanium-implanted pre-treatments on the residual stress of TiN coatings on high-speed steel substrates

This investigation examined how titanium ion implantation pre-treatment affects the residual stress of TiN coatings on M2 high-speed steel. Ions were implanted by metal plasma ion implantation. The adhesion strength of the TiN coatings was enhanced by pre-treatment that implanted Ti into the M2 tool steel substrate. The implanted substrate functioned as a buffer layer between the deposited TiN and the tool steel substrate, resulting in variations of the residual stress. The residual stress determined by glancing-angle XRD demonstrates that the deposited TiN films on ion-implanted substrates exhibited reduced compressive stress, from − 3.95 to − 2.41 GPa, which corresponded to a decrease in the grain size of the TiN films. The texture of the TiN film was clearly transformed from the preferred orientation of (220) to (111), subsequently enhancing wear resistance against a tungsten ball.     

Deposition of TiN thin films on Si(100) by HCD ion plating

Titanium nitride (TiN) films were deposited on Si(100) substrates using a hollow cathode discharge ion plating (HCD-IP) technique. Based on previous experimental results, the optimum deposition conditions were chosen. The thickness of the TiN film and the angle between the specimen surface and the evaporating source (coating angle) were selected as the variable parameters. The purpose of this study is to investigate the effect of these two processing parameters on the properties of TiN films. After deposition, the thin film structure was characterized by X-ray diffraction (XRD), cross-sectional transmission electron microscopy (XTEM), and field-emission-gun scanning electron microscopy (FEG-SEM). N/Ti ratios of the thin films were determined using both X-ray photoelectron spectrometer (XPS) and Rutherford backscattering spectrometer (RBS). The resistivity of the TiN films was measured by a four-point probe. The hardness of the thin films was obtained from nanoindentation tests. An atomic force microscope (AFM) was used to measure the roughness of the thin films. The results showed that (111) was the dominant preferred orientation in the TiN films for most of the deposition conditions and for all coating angles, especially for film thicknesses greater than 1 μm. Hardness values of TiN films were approximately 28 GPa for film thicknesses close to 0.5 μm and above, and did not vary with the coating angle. The hardness can be correlated to the (111) preferred orientation of the TiN film. The hardness increased with the (111) texture coefficient and leveled off as the texture coefficient approached 1. The packing factor had a linear relationship with the film thickness. Resistivity decreased with increasing thickness and increasing packing factor for all coating angles. At a similar thickness or packing factor, specimens coated at angles different from 0° had a much higher resistivity than those coated at 0°.     

THE EFFECTS OF NEGATIVE BIAS AND FLUX RATIO ON THE PROPERTIES OF TiN THIN FILMS FORMED BY FILTERED CATHODIC ARC PLASMA TECHNIQUE

The filtered cathodic vacuum-arc (FCVA) technique is a supplementary and alternative technique with respect to convendtional physical and chemical vapour deposition which can remove macro-particles effectively and make the deposition process at ambient temperature. In this work, high quality TiN thin films were deposited on silicon substrates at low temperature using the improved filtered cathodic arc plasma (FCAP) technique. AFM, XRD, TEM were employed to characterize the TiN thin films. The effects of the negative substrate bias on the grain size, preferred crystalline orientation, surface roughness of TiN thin films were discussed.     

TiN, TiN gradient and Ti/TiN multi-layer protective coatings on Uranium

Single-layer TiN, gradient TiN and multi-layer Ti/TiN coating were deposited on silicon and uranium substrates by means of arc ion plating technique. The main phase in the single-layer TiN coating was TiN with a (111) preferred orientation. Ti and TiN were observed in the TiN gradient coating and Ti/TiN multi-layer coatings. The single-layer TiN coating has demonstrated the best wear resistance among the three coatings. Compared with the bare U substrate, the corrosion potential E_corr of the multi-layer Ti/TiN coatings is increased by 580 mV, and the corrosion current density I_corr is decreased at least by two orders of magnitude. The multi-layer Ti/TiN coatings possessed the highest corrosion resistance among the three coating in a 0.5 μg/g Cl⁻ solution.     

Effect of Axial Magnetic Field on the Microstructure,Hardness and Wear Resistance of TiN Films Deposited by Arc Ion Plating

TiN films were deposited on stainless steel substrates by arc ion plating. The influence of an axial magnetic field was examined with regard to the microstructure, chemical elemental composition, mechanical properties and wear resistance of the films. The results showed that the magnetic field puts much effect on the preferred orientation, chemical composition, hardness and wear resistance of TiN films. The preferred orientation of the TiN films changed from(111) to(220) and finally to the coexistence of(111) and(220) texture with the increase in the applied magnetic field intensity. The concentration of N atoms in the TiN films increases with the magnetic field intensity, and the concentration of Ti atoms shows an opposite trend. At first, the hardness and elastic modulus of the TiN films increase and reach a maximum value at 5 m T and then decrease with the further increase in the magnetic field intensity. The high hardness was related to the N/Ti atomic ratio and to a well-pronounced preferred orientation of the(111) planes in the crystallites of the film parallel to the substrate surface. The wear resistance of the Ti N films was significantly improved with the application of the magnetic field, and the lowest wear rate was obtained at magnetic field intensity of 5 m T. Moreover, the wear resistance of the films was related to the hardness H and the H3/E*2 ratio in the manner that a higher H3/E*2 ratio was conducive to the enhancement of the wear resistance.     

Corrosion Resistance of PAPVD TiN Coating on AISI 304 Stainless Steel

In this work the corrosion resistance of PAPVD TiN hard coatings on AISI 304 stainless steel with a titanium interlayer has been addressed. Cyclic voltammetry corrosion tests in NaCl 3.5% solutions were performed for samples prepared by depositing TiN/Ti onto steel using different deposition parameters. The surface morphology of the samples was examined by using a scanning electron microscope (SEM) and phase analysis was performed by X-ray diffraction (XRD). The cyclic voltammetry curves showed two distinct behaviours. Firstly, a reduction in corrosion resistance was observed when current density was increased for the whole potential range studied. The second observation, no less important, was the increase in corrosion resistance compared to the uncoated steel. The TiN films deposited showing (III) preferred orientation showed better corrosion resistance than films presenting other orientations.     

NiTi合金基TiN薄膜的血液相容性和耐腐蚀性研究

采用电弧离子镀法在NiTi形状记忆合金表面制备了TiN薄膜，利用X射线衍射、扫描电子显微镜和原子力显微镜研究了TiN薄膜的相组成及表面特性；在生物体外，研究比较了镀膜和未镀膜的NiTi合金的血液相容性和耐腐蚀性。结果表明：TiN薄膜提高了NiTi合金的血液相容性，并使Ni离子的释放率约降低了1个数量级，有效地提高了NiTi合金的耐腐蚀性。薄膜越厚性能提高的效果越显著。     

The corrosion and wear behavior of TiN and TiAlN coated AISI 316 L stainless steel

In this study, TiN and TiAlN coatings were deposited on AISI 316 L stainless steel substrates by PVD techniques. The composition and crystalline structure of the as-deposited coatings were analyzed by energy dispersive X-ray analysis (EDX) and X-ray diffraction (XRD) methods, respectively. The corrosion resistance studies of TiN-coated and TiAlN-coated samples were carried out in 0.9 wt % NaCl and SBF solutions using the electrochemical potentiodynamic polarization method and the wear behavior was evaluated with the ball-on-disk wear method at a sliding speed rate of 0.3 m/s under 2.5 N load in a dry medium. It was found that both TiN and TiAlN coatings exhibited relatively good corrosion resistance, however, TiAlN coatings showed a better corrosion resistance than TiN coatings. The TiAlN coating contributes positively against corrosion and wear behavior by increasing the surface hardness and by decreasing the friction coefficient of AISI 316 L stainless steel, respectively.     

A study of TiN-coated metal-on-polymer bearing materials for hip prosthesis

The TiN-coated metal-on-polymer hip prosthetic pair has the potential to reduce wear debris of UHMWPE (ultra-high molecular weight polyethylene) and to prevent metallic-ion-induced cytotoxicity. However, high quality and adherent film is a key to the clinical success of hip prostheses. In this study, titanium nitride (TiN) films were deposited on stainless steel using plasma immersion ion implantation & deposition (PIII&D) technique to create high-quality film and an adherent interface. The chemical state and composition were analyzed by X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) and energy dispersive spectroscopy (EDS). The mechanical properties of the films were characterized using a micro-hardness tester and a pin-on-disk wear tester, and an x-ray diffractometer (XRD) was used for a crystallographic analysis. The PIII&D-treated TiN films showed a stoichiometric and (200) preferred orientation and micro-hardness up to 150 % higher than untreated film. A TiN-coated specimen using the PIII&D process also showed less UHMWPE wear compared to untreated specimens. The volumetric wear rate of UHMWPE could be reduced by as much as 42 % compared to when Co-Cr alloy was used. The results of this study show that advanced TiN-coating via the PIII&D process is a viable means of reducing UHMWPE wear in the metal-on-polymer bearing couple.     

金属和陶瓷配副件条件下TiN薄膜的摩擦学特性

多弧离子镀TiN薄膜具有广泛的应用.采用多弧离子镀技术在不锈钢衬底表面沉积了TiN薄膜.用显微硬度计测试了TiN薄膜的硬度,用往复球-盘式摩擦磨损试验机评价了在GCr15和Si3N4两种不同配副件及空气中干摩擦条件下TiN薄膜的摩擦学性能,用表面轮廓仪测试了磨痕处的磨痕轮廓,用配有能谱仪(EDS)的扫描电镜(SEM)和X射线光电子能谱(XPS)观察和测试了磨痕形貌和磨痕处主要化学元素组成,用金相显微镜观察了配副件磨损表面形貌.结果表明:在不同配副件条件下,TiN薄膜的摩擦因数随速度和载荷的增加均出现了降低的趋势.而在相同速度和载荷下,以GCr15为配副件时TiN薄膜的摩擦因数小于以Si3N4为配副件时的摩擦因数.以Si3N4为配副件时TiN薄膜主要表现为磨粒磨损.以GCr15为配副件时TiN薄膜几乎没有磨损,而配副件GCr15主要表现为磨粒与粘着磨损.     

Corrosion behaviour of as deposited and PMMA treated TiN coating systems deposited by cathodic arc technique

Abstract

Vapour deposited coatings usually contain microscopic defects, which can provide corrosive media with easy access to the substrate. Consequently, formation of galvanic cells between the coating and substrate can initiate localised corrosion at the defective sites. In this study, TiN coatings were deposited on mild steel (MS) and stainless steel (SS) substrates using a cathodic arc technique. A post-deposition treatment with polymethyl methacrylate (PMMA) was applied to both TiN/MS and TiN/SS systems to block access of corrosion media to the substrates through the coating defects. The as deposited and PMMA treated coating systems were subjected to electrochemical tests in 3·5%NaCl solution. Potentiodynamic polarisation testing results indicated that the PMMA treatment led to a higher corrosion potential and a lower anodic current density for both TiN/MS and TiN/SS systems when compared with their as deposited counterparts. Extended exposure in 3·5%NaCl caused severe localised corrosion in the as deposited TiN/MS due to the presence of coating defects and poor corrosion resistance of the substrate. Electrochemical impedance spectroscopic measurements demonstrated that the PMMA post-deposition treatment significantly improved corrosion resistance of both TiN/MS and TiN/SS systems by effectively sealing the open voids or pores associated with the coating defects.     

Wear, erosion and corrosion resistance of CrTiAlN coating deposited by magnetron sputtering

A nanolayered CrTiAlN coating, which was deposited on Ti6Al4V substrate using unbalanced magnetron sputtering technique, was tested to evaluate its performances against wear, erosion and corrosion. The coating, with a higher hardness compared to CrN, demonstrates significantly higher dry sliding wear resistance than CrN and TiN coatings. Different from the brittle TiN coating, the CrTiAlN coating has a maximum erosion rate at an impingement angle of 45° and shows better erosion resistance than TiN coating at 90°. The CrTiAlN coated Ti6Al4V, when tested in 3.5% NaCl aqueous solution, shows a markedly more noble corrosion potential in comparison with the uncoated Ti6Al4V substrate. Furthermore, it demonstrates a wide passive region with a low current density. All these properties make the CrTiAlN coating a good candidate for a variety of industrial applications.     

TiN Coatings Modified by an Interlayer of Electroplated Chromium on Mild Steel

TiN films on mild steel were deposited by reactive d.c. magnetron sputtering: electroplated chromium was incorporated as an interlayer. Surface hardness, measured by the Knoop indentation method under a load of 25 gf, phase analysis by the X-ray diffraction method and corrosion behaviour by the potentiodynamic measurement technique of these coatings have been evaluated. Surface hardness values were found to increase from about 1000–1100 for TiN coatings on mild steel to about 1800–1900 (HK₂₅) for TiN coatings with chromium as interlayer. Potentiodynamic corrosion tests, performed in IN H₂SO₄ solutions, have shown that with a chromium interlayer the corrosion resistance increases significantly as compared to TiN only sputtered coatings on mild steel samples. No spoiling of TiN coatings was observed during full sweep voltage of -1000 mV to +1000 mV when they were tested with a chromium interlayer.     

MAIP镀TiN薄膜结构形貌的研究

本文用多弧离子镀膜(MAIP)技术在高速钢基片表面镀TiN后,用XRD和SEM对膜层组织结构、形貌进行了分析。结果显示,在高速钢基片表面的为TiN薄膜,该TiN膜致密,但在薄膜表面有少量白色大颗粒和黑点。能谱分析显示,白亮的大颗粒成分与普通膜面几乎相同,大黑点是直通基体的针孔,小黑点是盲孔。结论:这些大颗粒降低了薄膜表面粗糙度,对薄膜的耐磨性产生不利影响,而且针孔的存在,对膜层的耐蚀性有不利影响。