Formation and characterization of DLC:Cr:Cu multi-layers coating using cathodic arc evaporation

Chromium and copper-doped diamond-like carbon (DLC:Cr:Cu) films were deposited on SKH 51 tool steel. We have prepared multilayers of DLC:Cr and DLC:Cu by cathodic arc evaporation process using chromium (Cr) and copper (Cu) target arc sources to provide Cr and Cu in the DLC. Acetylene reactive gases were also activated at a pressure of 5 mTorr to 25 mTorr and a temperature fixed at 180 °C to provide the DLC. The resulting DLC:Cr:Cu film contained Cr_xCu_y as well as Cr_xC_y nanoparticles vital for the film mechanical properties. The crystal structure was investigated using X-ray diffraction (XRD) and transmission electron microscopy, while the surface morphology and chemical composition were studied by field emission scanning electron microscopy and X-ray photoelectron spectroscopy. The process parameters were compared by studying the various mechanical properties of the films such as microhardness and residual stress. The result of this process enhanced the DLC:Cr:Cu composite coatings for high toughness and lower friction coefficient (0.08). The profiles of sp³/sp² (XPS) ratios corresponded to the change of microhardness profile by varying the pressure of the hydrocarbon gases (C₂H₂).     

Mechanical and tribological properties of diamond-like carbon films prepared on steel by ECR-CVD process

Diamond-like carbon (DLC) films were prepared on AISI 440C steel substrates at room temperature by the electron cyclotron resonance chemical vapor deposition (ECR-CVD) process in C₂H₂/Ar plasma under different conditions. In order to prevent the inter-diffusion of carbon and improve the adhesion strength of DLC films, functionally gradient Ti/TiN/TiCN/TiC supporting underlayers were deposited on the steel substrates in advance. Using the designed interfacial transition layers, relatively thick DLC films (1–2 μm) were successfully prepared on the steel substrates without delamination. By optimizing the deposition parameters, DLC films with hardness up to 28 GPa and friction coefficients lower than 0.15 against the 100Cr6 steel ball were obtained. In addition, the specific wear rates of the films were found to be extremely low (∼10⁻¹⁷ m³/Nm). The friction-induced graphitization mechanism of DLC was confirmed by micro-Raman analysis.     

Characteristics of nitrogen doped diamond-like carbon thin films grown by microwave surface-wave plasma CVD

Nitrogen doped diamond-like carbon (DLC:N) thin films were deposited on p-type silicon (p-Si) and quartz substrates by microwave (MW) surface-wave plasma (SWP) chemical vapor deposition (CVD) at low temperature (< 100 °C). For films deposition, argon (Ar: 200 sccm), acetylene (C₂H₂:10 sccm) and nitrogen (N: 5 sccm) were used as carrier, source and doping gases respectively. DLC:N thin films were deposited at 1000 W microwave power where as gas composition pressures were ranged from 110 Pa to 50 Pa. Analytical methods such as X-ray photoelectron spectroscopy (XPS), UV-visible spectroscopy, FTIR and Raman spectroscopy were employed to investigate the chemical, optical and structural properties of the DLC:N films respectively. The lowest optical gap of the film was found to be 1.6 eV at 50 Pa gas composition pressure.     

Electro-deposition of adherent films of H2-free quality diamond-like carbon materials on SS-304 substrates using nanocrystalline SnO2 interlayer

H₂-free diamond-like carbon (DLC) films are deposited on bare as well as nanocrystalline SnO₂-coated stainless steel (SS) 304 substrates. SnO₂ films are deposited by electrolysis of 10 mM SnCl₂ solution in nitric acid medium and then subsequently heating the sample in oxygen-ambient condition. The carbon films, on the other hand, are prepared by dissociative cleavage of methanol under high DC potential of 1 kV. Deposition conditions are optimised to get the best quality films, which are characterized by Raman spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). It has been observed that films grown on SnO₂ interlayer are much more adherent when compared to those deposited on bare SS. Moreover, the quality of films on coated substrates is found to be much superior to those grown on bare SS. It is believed that the SnO₂ layer acts both as protective barrier against carbon diffusion into the SS substrate and also promotes nucleation due to anchorage of CH₃ and H⁺ radicals (necessary for growth of DLC film) onto its oxygen deficient sites.     

Preparation of diamond like carbon thin films above room temperature and their properties

Diamond like carbon (DLC) thin films were deposited on p-type silicon (p-Si), quartz and ITO substrates by microwave (MW) surface-wave plasma (SWP) chemical vapor deposition (CVD) at different substrate temperatures (RT ∼ 300 °C). Argon (Ar: 200 sccm) was used as carrier gas while acetylene (C₂H₂: 20 sccm) and nitrogen (N: 5 sccm) were used as plasma source. Analytical methods such as X-ray photoelectron spectroscopy (XPS), FT-IR and UV–visible spectroscopy were employed to investigate the structural and optical properties of the DLC thin films respectively. FT-IR spectra show the structural modification of the DLC thin films with substrate temperatures showing the distinct peak around 3350 cm^− 1 wave number; which may corresponds to the sp² C–H bond. Tauc optical gap and film thickness both decreased with increasing substrate temperature. The peaks of XPS core level C 1 s spectra of the DLC thin films shifted towards lower binding energy with substrate temperature. We also got the small photoconductivity action of the film deposited at 300 °C on ITO substrate.     

Fabrication of fluorocarbon terminated DLC thin film using soft X-ray

The control of wettability on a diamond-like carbon (DLC) thin film was carried out by exposing the film to synchrotron radiation (SR) ranging 50–1000 e V under perfluorohexane (C₆F₁₄) gas atmosphere. The contact angle of the DLC surface with a water droplet was found to increase from 73° to 114° by the SR irradiation under C₆F₁₄ gas atmosphere. The chemical components variations of the DLC surface were studied using X-ray photoelectron spectroscopy and the modified DLC film with F was studied using near-edge X-ray absorption fine structure spectroscopy. By mounting the new sample holder for the parallel SR irradiation, we succeeded in preventing secondary reaction of deposited material and controlling the contact angle of the fluorocarbon modified DLC surface.     

Tribological properties of DLC films with different hydrogen contents in water environment

Diamond-like carbon (DLC) films were deposited on silicon wafers by thermal electron excited chemical vapor deposition (CVD). To change the hydrogen content in film, we used three types of carbon source gas (C₇H₈, CH₄, and a CH₄+H₂) and two substrate bias voltages. The hydrogen content in DLC films was analyzed using elastic recoil detection analysis (ERDA). Tribological tests were conducted using a ball-on-plate reciprocating friction tester. The friction surface morphology of DLC films and mating balls was observed using optical microscopy and laser Raman spectroscopy.Hydrogen content in DLC films ranged from 25 to 45 at.%. In a water environment, the friction coefficient and specific wear rate of DLC films were 0.07 and in the range of 10⁻⁸–10⁻⁹ mm³/Nm, respectively. The friction coefficient and specific wear rate of DLC film in water were hardly affected by hydrogen content. The specific wear rate of DLC film with higher hardness was lower than that of film with low hardness. Mating ball wear was negligible and the friction surface features on the mating ball differed clearly between water and air environments, i.e., the friction surface on mating balls in water was covered with more transferred material than that in air.     

Diamond-like carbon thin films by microwave surface-wave plasma CVD aimed for the application of photovoltaic solar cells

The nitrogen doped diamond-like carbon (DLC) thin films were deposited on quartz and silicon substrates by a newly developed microwave surface-wave plasma chemical vapor deposition, aiming the application of the films for photovoltaic solar cells. For film deposition, we used argon as carrier gas, nitrogen as dopant and hydrocarbon source gases, such as camphor (C₁₀H₁₆O) dissolved with ethyl alcohol (C₂H₅OH), methane (CH₄), ethylene (C₂H₄) and acetylene (C₂H₂). The optical and electrical properties of the films were studied using X-ray photoelectron spectroscopy, Nanopics 2100/NPX200 surface profiler, UV/VIS/NIR spectroscopy, atomic force microscope, electrical conductivity and solar simulator measurements. The optical band gap of the films has been lowered from 3.1 to 2.4 eV by nitrogen doping, and from 2.65 to 1.9 eV by experimenting with different hydrocarbon source gases. The nitrogen doped (flow rate: 5 sccm; atomic fraction: 5.16%) film shows semiconducting properties in dark (i.e. 8.1 × 10^{− 4} Ω^{− 1} cm^{− 1}) and under the light illumination (i.e. 9.9 × 10^{− 4} Ω^{− 1} cm^{− 1}). The surface morphology of the both undoped and nitrogen doped films are found to be very smooth (RMS roughness ≤ 0.5 nm). The preliminary investigation on photovoltaic properties of DLC (nitrogen doped)/p-Si structure show that open-circuit voltage of 223 mV and short-circuit current density of 8.3 × 10^{− 3} mA/cm². The power conversion efficiency and fill factor of this structure were found to be 3.6 × 10^{− 4}% and 17.9%, respectively. The use of DLC in photovoltaic solar cells is still in its infancy due to the complicated microstructure of carbon bondings, high defect density, low photoconductivity and difficulties in controlling conduction type. Our research work is in progress to realize cheap, reasonably high efficiency and environmental friendly DLC-based photovoltaic solar cells in the future.     

Microstructure and adhesion characteristics of diamond-like carbon films deposited on steel substrates

For tribological applications, the low friction coefficient and high microhardness of diamond-like carbon (DLC) films give significant advantages in cutting and forming non-ferrous materials. The inherently large residual stress of DLC films, however, prevents the depositing of thicker films. This study designed and implemented a compound interface, comprising a series of metal, metal nitride, and metal carbonitride interlayers deposited in a graded structure, between the DLC (a metal-doped a-C:H) film and M2 steel substrates. The tribological performance of the interface was evaluated using a scratch tester and ball-on-disk tribometer. Meanwhile, the failure mechanism of DLC deposited on M2 steel substrates was examined using SEM/EDS and TEM microscopy. Experimental results demonstrate an improved DLC hard coating with superior adhesion strength on the steel substrates.     

Microstructure and mechanical properties of Mo/DLC nanocomposite films

Mo-doped diamond-like carbon (Mo/DLC) films were deposited on stainless steel and Si wafer substrates via unbalanced magnetron sputtering of molybdenum combined with inductively coupled radio frequency (RF) plasma chemical vapor deposition of CH₄/Ar. The effects of Mo doping and sputtering current on the microstructure and mechanical properties of the as-deposited films were investigated by means of X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), transmission electron microscopy (TEM), Raman spectroscopy, atomic force microscopy (AFM), and nano-indentation. It was found that Mo doping led to increase in the content of sp² carbon, and hence decreased the hardness and elastic modulus of Mo/DLC films as compared with that of DLC films. The content of Mo in the films increased with the increasing sputtering current, and most of Mo reacted with C atoms to form MoC nanocrystallites at a higher sputtering current. Moreover, the Mo-doped DLC films had greatly decreased internal stress and increased adhesion to the substrate than the DLC film, which could be closely related to the unique nanocomposite structure of the Mo-doped films. Namely, the Mo/DLC film was composed of MoC nanoparticles embedded in the cross-linked amorphous carbon matrix, and such a kind of nanostructure was beneficial to retaining the loss of hardness and elastic modulus.     

Duplex DLC coatings fabricated on the inner surface of a tube using plasma immersion ion implantation and deposition

A duplex plasma immersion ion implantation and deposition (PIIID) process, involving carbon ion implantation and diamond-like carbon (DLC) deposition, is proposed to modify the inner surface of a tube. In the research, samples of GCr15 bearing steel were placed inside a tube in the vacuum chamber. After the vacuum chamber was evacuated to a base pressure of 6 × 10^− 3 Pa, C₂H₂ gas was introduced into the chamber, and the tube was biased by a negative pulsed bias. Since a pulsed glow discharge (PGD) plasma can be formed by the bias, carbon ion implantation and DLC film deposition process can be obtained by biasing the tube with a high and low bias, respectively. To synthesize different DLC films, single PIIID processes employing a low voltage (several kV) PGD method and duplex PIIID processes combining the high (several tens kV) and low voltage PGD techniques were carried out. The as-synthesized films were characterized by Raman spectrum, nano-indentation, scratch, tribological and electrochemical tests. Raman results show that duplex DLC films were synthesized by this duplex PIIID process. In addition, compared with the single DLC film synthesized by the low voltage PGD process, the duplex DLC films can obtain a high wear and corrosion resistances. Furthermore, using this duplex PIIID method, batch treatment of outer-rings of the bearing was realized.     

Wear-corrosion behavior of ultra-thin diamond-like carbon nitride films on aluminum alloy

Diamond-like carbon films exhibit high hardness, high wear resistance and a low friction coefficient. They are extensively utilized in the mechanical, electronic and biomedical industries. This work evaluates the effect of the thickness of ultra-thin diamond-like carbon nitride films on their corrosion properties and their wear-corrosion resistance in a mixed 1 M NaCl + 1 M H₂SO₄ solution using electrochemical methods. The corrosion current density and weight loss of all films during and after wear-corrosion test are also recorded. This work employs ion beam-assisted deposition (IBAD) to deposit DLC nitride films of various thicknesses (1.5, 2.0, 2.5 and 3.0 nm), containing 60% nitrogen gas in the form of a gaseous mixture of C₂H₂ + 60%N₂. The thickness of the films was measured using a transmission electron microscope (TEM). The atomic bonding structures of these DLC nitride films are analyzed using a Raman spectrometer and by electron spectroscopy for chemical analysis (ESCA). A scanning electron microscope (SEM) was adopted to elucidate the surface morphologies of the specimens after corrosion and wear-corrosion. The results indicated that all of the nitrogen-containing DLC films excellently protected the 5088 Al–Mg alloy substrate with an electroless plated Ni–P interlayer against corrosion, and that the degree of protection increases with the thickness of the film. In the wear-corrosion tests various potentials were applied during wear in the particular corrosive solution. The results further demonstrated that the wear-corrosion resistance of all the nitrogen-containing DLC films was as effective as corrosion protection, and that the wear-corrosion loss decreased as the film thickness increased.     

Effect of carbonitriding temperature process on the adhesion properties of diamond like-carbon coatings deposited by PECVD on austenitic stainless steel

The deposition of adherent coatings such as diamond-like carbon (DLC) on substrates of iron-based materials is difficult to obtain for two reasons: high residual compressive stress occurs in the inner film formation, and the mismatch of thermal expansion coefficient between steel and DLC film generates delamination effects. In order to determine the carbonitriding temperature prior to film deposition, the steel substrate and the DLC films were analyzed for their microstructure and mechanical properties of adhesion as a function of temperature. The technique used to deposit the coating was DC-pulsed plasma enhanced chemical vapor deposition. The delamination distances and the critical load of the film were obtained by scratch testing. The surface analysis by X-ray diffraction indicated the formation of nitride phases on the steel. Raman spectroscopy showed the fraction of sp³ carbon bonds in DLC films. Hardness profiling was used to verify the extent of the interface modified by carbonitriding along the cross section. For this, the steel sample with the appropriate surface modification to have high adhesion of the DLC film was used.     

The effect of the CH4 level on the morphology,microstructure, phase purity and electrochemical properties of carbon films deposited by microwave-assisted CVD from Ar-rich source gas mixtures

Carbon thin films were deposited on Si substrates by microwave-assisted chemical vapor deposition (CVD) using variable CH₄ levels in an Ar/H₂ (Ar-rich) source gas mixture. The relationship between the CH₄ concentration (0.5 to 3 vol.%) in the source gas and the resulting film morphology, microstructure, phase purity and electrochemical behavior was investigated. The H₂ level was maintained constant at 5% while the Ar level ranged from 92 to 94.5%. The films used in the electrochemical measurements were boron-doped with 2 ppm B₂H₆ while those used in the structural studies were undoped. Boron doping at this level had no detectable effect on the film morphology or microstructure. Relatively smooth ultrananocrystalline diamond (UNCD) thin films, with a nominal grain size of ca. 15 nm, were only formed at a CH₄ concentration of 1%. At the lower CH₄ concentration (0.5%), faceted microcrystalline diamond was the predominant phase formed with a grain size of ca. 0.5 µm. At the higher CH₄ concentration (2%), a diamond-like carbon film was produced with mixture of sp²-bonded carbon and UNCD. Finally, the film grown with 3% CH₄ was essentially nanocrystalline graphite. The characteristic voltammetric features of high quality diamond (low and featureless voltammetric background current, wide potential window, and weak molecular adsorption) were observed for the film grown with 1% CH_4, not the films' grown with higher CH₄ levels. The C₂ dimer level in the source gas was monitored using the Swan band optical emission intensity at 516 nm. The emission intensity and the film growth rate both increased with the CH₄ concentration in the source gas, consistent with the dimer being involved in the film growth. Importantly, C₂ appears to be involved in the growth of the different carbon microstructures including microcrystalline and ultrananocrystalline diamond, amorphous or diamond-like carbon, and nanocrystalline graphite. In summary, the morphology, microstructure, phase purity and electrochemical properties of the carbon films formed varied significantly over a narrow range of CH₄ concentrations in the Ar-rich source gas. The results have important implications for the formation of UNCD from Ar-rich source gas mixtures, and its application in electrochemistry. Characterization data by scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), visible-Raman spectroscopy and electrochemical methods are presented.     

Preparation,characterization and properties of Cr-incorporated DLC films on magnesium alloy

Cr-incorporated diamond-like carbon (Cr-DLC) films were deposited on AZ31 magnesium alloy as protective coatings by a hybrid beams deposition system, which consists of a DC magnetron sputtering of Cr target (99.99%) and a linear ion source (LIS) supplied with CH₄ precursor gas. The Cr concentration (from 2.34 to 31.5 at.%) in the films was controlled by varying the flow ratio of Ar/CH₄. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) were used to investigate the microstructure and composition of Cr-DLC films systematically. An electrochemical system and a ball-on-disk tribotester were applied to test the corrosion and tribological properties of the film on the AZ31 substrate, respectively. At low Cr doping (2.34 at.%), the film mainly exhibited the feature of amorphous carbon, while at high doping (31.5 at.%), chromium carbide crystalline phase occurred in the amorphous carbon matrix of the film. In this study, all the prepared Cr-DLC films showed higher adhesion to AZ31 than the DLC film. Especially for the film with low Cr doping (2.34 at.%), it owned the lowest internal stress and the highest adhesion to substrate among all the films. Furthermore, this film could also improve the wear resistance of magnesium alloy effectively. But, none of the films could improve the corrosion resistance of the magnesium alloy in 3.5 wt.% NaCl solution due to the existence of through-thickness defects in the films.     

The effect of CNT content on the surface and mechanical properties of CNTs doped diamond like carbon films

The carbon nanotubes (CNTs) doped diamond like carbon films were carried out by spinning coating multi-walled carbon nanotubes (CNTs) on silicon covered with diamond like carbon films via PECVD with C₂H₂ and H₂. The results show that the I_D/I_G and sp²/sp³ ratios are proportional to the CNT contents. For wettability and hydrogen content, the increase of CNT content results in more hydrophobic and less hydrogen for CNT doped DLC films. As for mechanical properties, the hardness and elastic modulus increases linearly with increasing CNT content. The residual stress is reduced for increasing CNT content. As for the surface property, the friction coefficient is reduced for higher CNT content. For CNT doped DLC films, the inclusion of horizontal CNT into DLC films increases the hardness, elastic modulus and reduces the hydrogen content, friction coefficient and residual stress. Like the light element and metal doping, the CNT doping has effects on the surface and mechanical properties on DLC which might be useful to specific application.     

Stress and structural properties of diamond-like carbon films deposited by electron beam excited plasma CVD

Diamond-like carbon (DLC) films prepared using CH₄ or C₆H₆ with varying deposition parameters by an electron beam excited plasma CVD system were investigated for the internal stress, dynamic hardness and structural properties such as the film density, total, bonded and unbound hydrogen contents, sp³ ratio and graphite crystallite. From the correlations between internal stress and structural properties, the following conclusions were derived. The fraction of unbound hydrogen to total hydrogen content was the most influential factor for the compressive stress of the DLC films deposited from CH₄. It is suggested that unbound hydrogen may be trapped into the disordered microstructure of graphite crystallites embedded in the network of film. For the DLC films deposited from C₆H₆, it was shown that the compressive stress was correlated with not only the fraction of unbound hydrogen content but also the degree of cross-linking between graphite crystallites in the film.     

Effect of oxides on the adhesion of Cu films deposited onto stainless steel by electron shower and thermal evaporation methods

When Cu films were deposited by thermal evaporation onto stainless steel substrates at 30°C, the oxygen gas in the vacuum chamber (1.5 x 10^-3 Torr) caused the adhesion of Cu films to increase from 3 to 5 MPa. Moreover, it increased further from 13 to 16 MPa when deposited at 300°C. The Cu film was not peeled off when deposited by the electron shower method and the epoxy resin failed (20 MPa), and this was independent of the addition of oxygen gas. As the chemical shift of Cu 2_p3/2 was observed at the interface between the Cu film and the substrate when oxygen gas was added, it is concluded that the adhesion is mainly determined by the chemical bonding, such as CuO and Cu₂O. The depth profile of Cu 2_p3/2 measured by X-ray photoelectron spectroscopy (XPS) using Ar etching showed apparent thermal diffusion of Cu into the substrate. But the Ar etching rate was decreased by Cu oxides at the interface. The amount of oxides depended on the substrate temperature and the deposition method for Cu film. Therefore, the depth profile of Cu measured by XPS did not represent the thermal diffusion of Cu into the substrate correctly. When the etching rate was modified, the diffusion of Cu was almost the same for different samples deposited at the same temperature, and the effect of the thermal diffusion on the adhesion was small. The adhesion on hydrated [Cr(OH)₃.0.4H₂O] and hydroxide [Cr(OH)₃] surfaces was lower than that on the oxide (Cr₂O₃) surface. In other words, the pretreatment of the substrates was very important to the adhesion.     

The effect of refractive index on the friction coefficient of DLC coated polymer substrates

This paper describes the enhanced mechanical performance that can be achieved by the application of diamond-like carbon (DLC) coatings to polymer substrates. The polymers coated are silicone and polyethylene, and the effect on the friction coefficient is studied. Film adhesion is found to depend on the DLC film refractive index (n), whereas the friction is largely independent of n in the range studied. Films were deposited from a He/C₂H₂ mixture at 20 Pa (0.15 Torr) on to the polymer substrates placed on a 10-cm-diameter electrode driven at 13.56 MHz. Film growth was monitored by in-situ ellipsometry (at 675 nm), which was performed on a glass slide placed near the polymer substrate. Friction measurements were obtained using a pin-on-disk tribometer, and measurements were carried out using a stainless-steel pin at a linear speed of 6 cm s⁻¹. Film adhesion was evaluated using a pull-adhesion tester. It was found that DLC coatings adhere well to the polymer substrates and can significantly reduce the friction coefficient of polymers such as silicone. Higher refractive index films (which are harder and have a higher mechanical strength) were found to have a poorer adhesion and provide a slightly increased friction on the polymer surface when compared to lower-index films. This study indicates that DLC may be used to enhance the tribological properties of polymers with potential applications in the biomaterials and light-engineering industries.     

A superhard diamond-like carbon film

A superhard hydrogen-free amorphous diamond-like carbon (DLC) film was deposited by pulsed arc discharge using a carbon source accelerator in a vacuum of 2×10⁻⁴ Pa. The growth rate was about 15 nm/min and the optimum ion-plasma energy was about 70 eV. The impact of doping elements (Cu, Zr, Ti, Al, F(Cl), N) on the characteristics of DLC films deposited on metal and silicon substrates was studied aiming at the choice of the optimum coating for low friction couples. The microhardness of thick (≥20 μm) DLC films was studied by Knoop and Vickers indentations, medium thick DLC films (1–3 μm) were investigated using a ‘Fischerscope’, and Young's module of thin films (20–70 nm) was studied by laser induced surface acoustic waves. The bonds in DLC films were investigated by electron energy loss spectroscopy (EELS), X-ray excited Auger electron spectroscopy (XAES), and X-ray photoelectron spectroscopy (XPS). The adhesion of DLC films was defined by the scratch test and Rockwell indentation. The coefficient of friction of the Patinor DLC film was measured by a rubbing cylinders test and by a pin-on-disk test in laboratory air at about 20% humidity and room temperature. The microhardness of the Patinor DLC film was up to 100 GPa and the density of the film was 3.43–3.65 g/cm³. The specific wear rate of the Patinor DLC film is comparable to that of other carbon films.