Microstructure and Mechanical Properties of CrN Films Deposited by Inductively Coupled Plasma Enhanced Radio Frequency Magnetron Sputtering

CrN films have been synthesized on Si（100） wafer by inductively coupled plasma （ICP）-enhanced radio frequency （RF） magnetron sputtering. The effects of ICP power on microstructure, crystal orientation, nanohardness and stress of the CrN films have been investigated. With the increase of ICP power, the current density at substrate increases and the films exhibit denser structure, while the DC self-bias of target and the deposition rate of films decrease. The films change from crystal structure to amorphous structure with the increase of ICP power. The measured nanohardness and the compressive stress of films reach the topmost at ICP power of 150 W and 200 W, respectively. The mechanical properties of films show strong dependence on the crystalline structure and the density influenced by the ICP power.     

Simulation to Predict Target Erosion of Planar DC Magnetron

Plasma properties in a planar DC magnetron system are simulated by a non-self- consistent particle method in two dimensions. Through tracing the trajectories of the energetic electrons in the specified electric field and the magnetic field, and treating the collision process by Monte Carlo method, the spatial profile of ionization events can be obtained conveniently. Assuming that the ions speed up from the ionization points and bombard the target with the energy at these points, and according to the Yamamura/Tawara method, the target erosion can be predicted. The magnetic field is calculated by the finite element method, and the electric field is estimated according to the self-consistent simulation and measured results. The influence of the time step size on the target erosion profile is analysed first to find a proper step size. Then the influence of electric field estimated on the erosion profile is discussed. The erosion profile may become narrower if the sheath thickness is increased. Finally, considering the dynamic erosion process, the erosion profile may get wider over time for the magnetron with shunt bar.     

Magnetic Field Improvement in End Region of Rectangular Planar DC Magnetron Based on Particle Simulation

For a rectangular planar direct current （DC） magnetron, anomalous target erosion may occur in the curve-out region and inner side of the curved region. One key factor is that the magnetic field in the end region is weaker than that in the straight region, and another important factor may be that there is a circumferential component of the magnetic field in the curved region. Through a calculation of three-dimensional magnetic field for the rectangular magnetron, a magnet structure shimmed by permanent magnet bars and ferromagnetic bars is proposed to solve the above problems. Through a three-dimensional non-self-consistent particle simulation and the Yamamura/Tawara formula, the target erosion profile could be predicted. The simulation results show that for an improved uniformity in magnetic field, the entire target utilization could be much enhanced.     

Numerical Investigation of Flow Fields in Inductively Coupled Plasma Wind Tunnels

Numerical simulations of 10 kW and 110 kW inductively coupled plasma （ICP） wind tunnels were carried out to study physical properties of the flow inside the ICP torch and vacuum chamber with air as tile working gas. Two-dimensional compressible axisymmetric Navier- Stokes （N-S） equations that took into account 11 species and 49 chemical reactions of air, were solved. A heat source model was used to describe the heating phenomenon instead of solving the electromagnetic equations. In the vacuum chamber, a four-temperature model was coupled with N-S equations. Numerical results for tile 10 kW ICP wind tunnel are presented and discussed in detail as a representative case. It was found that the plasma flow in the vacuum chamber tended to be in local thermoehemical equilibrium. To study the influence of operation conditions on the flow field, simulations were carried out for different chamber pressures and/or input powers. The computational results for the above two ICP wind tunnels were compared with corresponding experimental data. The computational and experimental results agree well, therefore the flow fields of ICP wind tunnels can be clearly understood.     

Optical Emission Spectroscopic Studies of ICP Ar Plasma

The ion line of 434.8 nm and atom line of 419.8 nm of Ar plasma produced by an inductively coupled plasma （ICP） were measured by optical emission spectroscopy and the influences from the working gas pressure, radio-frequency （RF） power and different positions in the discharge chamber on the line intensities were investigated in this study. It was found that the intensity of Ar atom line increased firstly and then saturated with the increase of the pressure. The line intensity of Ar^＋, on the other hand, reached a maximum value and then decreased along with the pressure. The intensity of the line in an RF discharge also demonstrated a jumping mode and a hysteresis phenomenon with the RF power. When the RF power increased to 400 W, the discharge jumped from the E-mode to the H-mode where the line intensity of Ar atom demonstrated a sudden increase, while the intensity of Ar^＋ ion only changed slightly. If the RF power decreased from a high value, e.g., 1000 W, the discharge would jump from the H-mode back to the E-mode at a power of 300 W. At this time the intensities of Ar and Ar^＋ lines would also decrease sharply. It was also noticed in this paper that the intensity of the ion line depended on the detective location in the chamber, namely at the bottom of the chamber the line was more intense than that in the middle of the chamber, but less intense than at the top, which is considered to be related to the capacitance coupling ability of the ICP plasma in different discharge areas.     

Surface Modification of Nanometre Silicon Carbide Powder with Polystyrene by Inductively Coupled Plasma

An investigation was made into polystyrene （PS） grafted onto nanometre silicon carbide （SIC） particles. In our experiment, the grafting polymerization reaction was induced by a radio frequency （RF） inductively coupled plasma （ICP） treatment of the nanometre powder. FTIR （Fourier transform infrared spectrum） and XPS （X-ray photoelectron spectroscopy） results reveal that PS is grafted onto the surface of silicon carbide powder. An analysis is presented on the effectiveness of this approach as a function of plasma operating variables including the plasma treating power, treating time, and grafting reaction temperature and time.     

Electrochromic Properties of Sputtered Ti-Doped WO3 Films

Ti-doped WO3 films were prepared by the mid-frequency dual-target magnetron sputtering method. The structure and electrochromic properties of the Ti-doped WO3 films were analysed by X-Ray diffraction （XRD）, Raman spectroscopy, spectrophotometer, cyclic chronoam- perometry and atomic force microscopy （AFM）. The results indicate that the erystallinity decrease after the doping of titanium, the channels for ion injection and extraction increase, the responding speed with 5.1% titanium doped becomes faster, and its circle life increases more than four times compared with the undoped WO3 film. In the coloured state, the W-O-W bonds decrease, but the W = O bonds increase. Since the W-O-W bonds break down for Li＋ ions＇ injection and more W = O bonds form, it is more convenient to inject Li＋ ions into the Ti-doped film than undoped film because more W-O-W bonds break down in the coloured state.     

Cu Films Deposited by Unbalanced Magnetron Sputtering Enhanced by ICP and External Magnetic Field Confinement

Metallic copper（Cu） films were deposited on a Si （100） substrate by unbalanced magnetron sputtering enhanced by radio-frequency plasma and external magnetic field confinement. The morphology and structure of the films were examined by scanning electron microscopy （SEM）, atomic force microscope （AFM） and X-ray diffraction （XRD）. The surface average roughness of the deposited Cu films was characterized by AFM data and resistivity was measured by a four-point probe. The results show that the Cu films deposited with radio-frequency discharge enhanced ionization and external magnetic field confinement have a smooth surface, low surface roughness and low resistivity. The reasons may be that the radio-frequency discharge and external magnetic field enhance the plasma density, which further improves the ion bombardment effect under the same bias voltage conditions. Ion bombardment can obviously influence the growth features and characteristics of the deposited Cu films.     

Effect of N2-Gas Partial Pressure on the Structure and Properties of Copper Nitride Films by DC Reactive Magnetron Sputtering

Copper nitride thin films were deposited on glass substrates by reactive direct current （DC） magnetron sputtering at various N2-gas partial pressures and room temperature. Xray diffraction measurements showed that the films were composed of Cu3N crystallites and exhibited a preferential orientation of the [111] direction at a low nitrogen gas （N2） partial pressure. The film growth preferred the [111] and the [100] direction at a high N2 partial pressure. Such preferential film growth is interpreted as being due to the variation in the Copper （Cu） nitrification rate with the N2 pressure. The N2 partial pressure affects not only the crystal structure of the film but also the deposition rate and the resistivity of the Cu3N film. In our experiment, the deposition rate of Cu3N films was 18 nm/min to 30 nm/min and increased with the N2 partial pressure. The resistivity of the Cu3N films increased sharply with the increasing N2 partial pressure. At a low N2 partial pressure, the Cu3N films showed a metallic conduction mechanism through the Cu path, and at a high N2 partial pressure, the conductivity of the Cu3N films showed a semiconductor conduction mechanism.     

Enhanced Work Function of Al-Doped Zinc-Oxide Thin Films by Oxygen Inductively Coupled PlasmaTreatment简

Al-doped zinc-oxide （AZO） thin films treated by oxygen and chlorine inductively coupled plasma （ICP） were compared. Kelvin probe （KP） and X-ray photoelectron spectroscopy （XPS） were employed to characterize the effect of treatment. The results of KP measurement show that the surface work function of AZO thin films can increase up to 5.92 eV after oxygen ICP （O-ICP）＇s treatment, which means that the work function was increased by at least 1.1 eV. However, after the treatment of chlorine ICP （CI-ICP）, the work function increased to 5.44 eV, and the increment was 0.6 eV. And 10 days later, the work function increment was still 0.4 eV after O-ICP＇s treatment, while the work function after Cl-ICP＇s treatment came back to the original value only after 48 hours. The XPS results suggested that the O-ICP treatment was more effective than CI-ICP for enhancing the work function of AZO films, which is well consistent with KP results.     

Study on the Properties of TiN Coatings on Previously Ion-Implanted Pure Magnesium Surface by MEVVA Ion Implantation

A metal vapor vacuum arc （MEVVA） is used in ion implantation for substrate preparation before the deposition process which would ensure the improvement of mechanical properties of the coating. Ti ion is implanted into pure magnesium surface by MEVVA implanter operated with a modified cathode. Implanting energy is kept at 45 keV and dose is set at 3 ×10^17 cm^-2. TiN coatings are deposited by magnetically filtered vacuum-arc plasma source on unimplanted and previously implanted substrates. Microstructure and phase composition are analysed using scanning electron microscopy （SEM） and X-ray diffraction （XRD）. The property of corrosion resistance of TiN coatings was studied by CS300P electrochemistry-corrosion workstation, and the main impact factor of the corrosion resistance was also analyzed.     

Nb元素和Fe元素对锆合金耐腐蚀性能的影响

将几种成分不同的锆合金样品放入高压釜中,在350℃、16.8MPa、70μg/gLi+LiOH水溶液中腐蚀。结果显示:第二相几乎全是Zr-Nb-Fe粒子的3#样品耐腐蚀性能最好,而不含Zr-Nb-Fe粒子的1#和5#样品耐腐蚀性能很差,这说明Zr-Nb-Fe第二相粒子对改善锆合金耐腐蚀性能起着关键作用。只有合金中Nb元素和Fe元素配比合理,才可使合金中第二相主要是Zr-Nb-Fe粒子。     

Polymer Surface Treatment by Atmospheric Pressure Low Temperature Surface Discharge Plasma： Its Characteristics and Comparison with Low Pressure Oxygen Plasma Treatment

The polymer treatment with a low-temperature plasma jet generated on the atmospheric pressure surface discharge （SD） plasma is performed. The change of the surface property over time, in comparison with low pressure oxygen （O2） plasma treatment, is examined. As one compares the treatment by atmospheric pressure plasma to that by the low pressure O2 plasma of PS （polystyrene） the treatment effects were almost in complete agreement. However, when the atmospheric pressure plasma was used for PP（polypropylene）, it produced remarkable hydrophilic effects.     

Heat Transfer Analysis of Two Kinds of Mechanically Jointed GBST1308/CuCrZr Plasma Facing Components of EAST

Doped graphite GBST1308, mechanically jointed to CuCrZr alloys, will be applied on EAST superconducting as plasma facing material （PFM）. Two joint structures called joint-1 and joint-2 were evaluated by means of thermal response tests using electron beam facility. The experimental results showed that the temperature differences of two joints were not significant, and the maximum surface temperature was about 1055℃ at a load of 4 MW/m^2, which had a good agreement with the simulated results by ANSYS code. The results indicated that the doped graphite GBST1308/CuCrZr mock-up can withstand heat flux deposition of 4 MW/m^2 except at the screw-fastened region, and joint-2 could be more suitable to higher heat flux region such as divertor target. But under the higher heat flux, both joints are unacceptable, an advanced PFM and its integration with the heat sink have to be developed, for example, vacuum plasma spraying tungsten coatings on the CuCrZr might be a good choice.     

Electromagnetic Calculation and Plasma Leakage Rate Analysis of the Magnetically Confined Plasma Rocket

An electromagnetic calculation and the parameters of the magnet system of the magnetically confined plasma rocket were established. By using ANSYS code, it was found that the leakage rate depends on the current intensity of the magnet and the change of the magnet position.     

Effect of High-Frequency Electric Field on Propagation of Electrostatic Wave in a Non-Uniform Relativistic Plasma Waveguide

The effect of a high frequency （HF） electric field on the propagation of electrostatic wave in a 2D non-uniform relativistic plasma waveguide is investigated. A variable separation method is applied to the two-fluid plasma model. An analytical study of the reflection of electrostatic wave propagation along a magnetized non-uniform relativistic plasma slab subjected to an intense HF electric field is presented and compared with the case of a non relativistic plasma. It is found that, when the frequency of the incident wave is close to the relativistic electron plasma frequency, the plasma is less reflective due to the presence of both an HF field and the effect of relativistic electrons. On the other hand, for a low-frequency incident wave the reflection coefficient is directly proportional to the amplitude of the HF field. Also, it is shown that the relativistic electron plasma leads to a decrease in the value of reflection coefficient in comparison with the case of the non relativistic plasma.     

Mixed Wastes Vitrification by Transferred Plasma

Thermal plasma technology provides a stable and long term treatment of mixed wastes through vitrification processes. In this work, a transferred plasma system was realized to vitrify mixed wastes, taking advantage of its high power density, enthalpy and chemical reactivity as well as its rapid quenching and high operation temperatures.
To characterize the plasma discharge, a temperature diagnostic is realized by means of optical emission spectroscopy （OES）. To typify the morphological structure of the wastes samples~ scan- ning electron microscopy （SEM）, and X-ray diffraction （XRD） techniques were applied before and after the plasma treatment.     

Cleaning of HT-7 Tokamak Exposed First Mirrors by Radio Frequency Magnetron Sputtering Plasma

The stainless steel （SS） first mirror pre-exposed in the deposition-dominated envi- ronment of the HT-7 tokamak was cleaned in the newly built radio frequency （RF） magnetron sputtering plasma device. The deposition layer on the FM surface formed during the exposure was successfully removed by argon plasma with a RF power of about 80 W and a gas pressure of 0.087 Pa for 30 min. The total reflectivity of the mirrors was recovered up to 90% in the wavelength range of 300-800 nm, while the diffuse reflectivity showed a little increase, which was attributed to the increase of surface roughness in sputtering, and residual contaminants. The FMs made from single crystal materials could help to achieve a desired recovery of specular reflectivity in the future.     

Experimental Study of Diagnosis Neutral Beam for HT-7 Tokamak

Parametrical effect on plasma discharge and beam extraction in the diagnosis neutral beam （DNB） system for HT-7 tokamak was studied experimentally. Useful results with an improved beam quality were obtained.     

Balmer Hα,Hβ and Hγ Spectral Lines Intensities in High-Power RF Hydrogen Plasmas

Hα（Balmer-alpha）, Hβ （Balmer-beta） and Hγ （Balmer-gamma） spectral line inten- sities in atomic hydrogen plasma are investigated by using a high-power RF source. The intensities of the Hα, Hβ and Hγ spectral lines are detected by increasing the input power （0-6 kW） of ICPs （inductively coupled plasmas）. With the increase of net input power, the intensity of Hα im- proves rapidly （0-2 kW）, and then reaches its dynamic equilibrium; the intensities of Hβ can be divided into three processes： obvious increase （0-2 kW）, rapid increase （2-4 kW）, almost constant （4-6 kW）; while the intensities of Hγ increase very slowly. The energy levels of the excited hydro- gen atoms and the splitting energy levels produced by an obvious Stark effect play an important role in the results.