自组织InAs/GaAs与InGaAs/GaAs量子点生长及退火情况的比较

本文采用MBE进行InAs/GaAs与InGaAs/GaAs量子点的生长,利用RHEED进行实时监测,并利用RHEED强度振荡测量生长速率。对生长的InAs/GaAs和InGaAs/GaAs两种量子点生长过程与退火情况进行对比,观察到当RHEED衍射图像由条纹状变为网格斑点时,InAs所需要的时间远小于InGaAs;高温退火下RHEED衍射图像恢复到条纹状所需要的时间InAs比InGaAs要长。     

Explanation of Unusual Photoluminescence Behavior from InAs Quantum Dots with InAlAs Capping

The effect of different kinds of cap layers on optical property of InAs quantum dots (QDs) on GaAs (100) substrate was studied. Temperature dependent photoluminescence (PL) indicates that the PL integrated intensity from the ground state of InAs QDs capped with an intermediate InAIAs layer drops very little as compared to QDs capped with a thin InGaAs or GaAs cap layer from 15 K up to room temperature. PL integrated intensity ratio of the first excited to ground states for InAs QDs capped with an intermediate InAIAs layer is unexpectedly decreased with increasing temperature, which are attributed to phonon bottleneck effect. A virtual barrier is proposed to describe this physics process and shows good agreement with experimental results when fitting the curve with the value of the virtual barrier 30 meV.     

Topographie und elektrische Eigenschaften von InAs‐Quantenpunkten

Topography and electrical properties of InAs quantum dots Self assembled InAs‐islands were grown on GaAs with molecular beam epitaxy in the Stranski‐Krastanow growth mode. The topography of surface quantum dots was investigated by atomic force (AFM) and scanning electron microscopy (SEM). While the AFM enables to determine the dot height of ≈ 10 nm the SEM is best suited to study the lateral dimensions of uncapped islands. The latter technique gives a dot diameter of ≈ 30 nm. Although the size distribution of the islands is convoluted in the capacitance measurements on a dot ensemble, it was possible to determine roughly a Coulomb blockade energy of ≈ 20 meV for the ground state and ≈ 10 meV for the first excited dot level. Taking advantage of AFM‐lithography we were able to study electron transport through a single InAs island. Here we got a Coulomb blockade energy of 12 meV when electrons tunnel through the first excited state of the dot.     

Molecular beam epitaxy growth methods of wavelength control for InAs/(In)GaAsN/GaAs heterostructures

We discuss the molecular beam epitaxy (MBE) growth methods of emission wavelength control and property investigations for different types of InAs/(In)GaAsN/GaAs heterostructures containing InGaAsN quantum-size layers: (1) InGaAsN quantum wells deposited by the conventional mode in a GaAs matrix, (2) InAs quantum dots deposited in a GaAsN matrix or covered by an InGaAs(N) layer, and (3) InAs/InGaAsN/GaAsN strain-compensated superlattices with quantum wells and quantum dots. The structures under investigation have demonstrated photoluminescence emission in a wavelength range of ～1.3-1.8?μm at room temperature without essential deterioration of the radiative properties.     

Self-assembling InAs and InP quantum dots for optoelectronic devices

Stranski–Krastanov growth in molecular beam epitaxy allows the preparation of self assembling InAs and InP quantum dots on GaAs and Ga_0.52In_0.48P buffer layers, respectively. InAs dots in GaAs prepared by slow growth rates and low temperature overgrowth provide intense photoluminescence at the technologically important wavelength of 1.3 μm at room temperature. Strain induced vertical alignment, size modification and material interdiffusion for stacked dot layers are studied. A blue shift of the ground state transition energy is observed for the slowly deposited stacked InAs dots. This is ascribed to enhanced strain driven intermixing in vertically aligned islands. For very small densely stacked InP and InAs dots the reduced confinement shift causes a red shift of the ground state emission. The InP quantum dots show intense and narrow photoluminescence at room temperature in the visible red spectral range. First InP/Ga_0.52In_0.48P quantum dot injection lasers are prepared using threefold stacked InP dots. We observe lasing at room temperature in the wavelength range between 690–705 nm depending on the size of the stacked InP dots.     

Photoluminescence studies of InAs/GaAs quantum dots covered by InGaAs layers

Photoluminescence (PL), PL excitation (PLE), and time-resolved PL were used to study effects of InGaAs layers on the optical properties of InAs/GaAs quantum dots (QDs). A rich fine structure in the excited states of confined excitons (up to n = 4 quantum states) was observed, providing useful information to study the quantum states in the InAs/GaAs QDs. A significant redshift of the PL peak energy for the QDs covered by InGaAs layers was observed, attributing to the decrease of the QD strain and the lowing of the quantum confinement.     

Structural characterization of GaSb-capped InAs/GaAs quantum dots with a GaAs intermediate layer

GaSb incorporation to InAs/GaAs quantum dots is considered for improving the opto-electronic properties of the systems. In order to optimize these properties, the introduction of an intermediate GaAs layer is considered a good approach. In this work, we study the effect of the introduction of a GaAs intermediate layer between InAs quantum dots and a GaSb capping layer on structural and crystalline quality of these heterostructures. As the thickness of the GaAs intermediate layer increases, a reduction of defect density has been observed as well as changes of quantum dots sizes. This approach suggests a promising method to improve the incorporation of Sb to InAs heterostructures.     

Growth of InAs Quantum Dots on GaAs (511)A Substrates: The Competition between Thermal Dynamics and Kinetics

The growth process of InAs quantum dots grown on GaAs (511)A substrates has been studied by atomic force microscopy. According to the atomic force microscopy studies for quantum dots grown with varying InAs coverage, a noncoherent nucleation of quantum dots is observed. Moreover, due to the long migration length of In atoms, the Ostwald ripening process is aggravated, resulting in the bad uniformity of InAs quantum dots on GaAs (511)A. In order to improve the uniformity of nucleation, the growth rate is increased. By studying the effects of increased growth rates on the growth of InAs quantum dots, it is found that the uniformity of InAs quantum dots is greatly improved as the growth rates increase to 0.14 ML s^?1. However, as the growth rates increase further, the uniformity of InAs quantum dots becomes dual‐mode, which can be attributed to the competition between Ostwald ripening and strain relaxation processes. The results in this work provide insights regarding the competition between thermal dynamical barriers and the growth kinetics in the growth of InAs quantum dots, and give guidance to improve the size uniformity of InAs quantum dots on (N11)A substrates.     

Effect of high energy proton irradiation on InAs/GaAs quantum dots: Enhancement of photoluminescence efficiency (up to ∼7 times) with minimum spectral signature shift

We demonstrate 7-fold increase of photoluminescence efficiency in GaAs/(InAs/GaAs) quantum dot hetero-structure, employing high energy proton irradiation, without any post-annealing treatment. Protons of energy 3–5 MeV with fluence in the range (1.2–7.04) × 10¹² ions/cm² were used for irradiation. X-ray diffraction analysis revealed crystalline quality of the GaAs cap layer improves on proton irradiation. Photoluminescence study conducted at low temperature and low laser excitation density proved the presence of non-radiative recombination centers in the system which gets eliminated on proton irradiation. Shift in photoluminescence emission towards higher wavelength upon irradiation substantiated the reduction in strain field existed between GaAs cap layer and InAs/GaAs quantum dots. The enhancement in PL efficiency is thus attributed to the annihilation of defects/non-radiative recombination centers present in GaAs cap layer as well as in InAs/GaAs quantum dots induced by proton irradiation.     

Analysis of the Vertical and Lateral Interactions in a Multisheet Array of InAs/GaAs Quantum Dots

The vertical and lateral interactions in a multisheet array of InAs/GaAs quantum dots are analyzed by finite element method(FEM).It is shown that due to the effects of vertical interaction,nucleation prefers to happen above buried quantum dots(QDs).Meanwhile,the effects of lateral interaction adjust the spacing of lateral neighboring QDs.The vertical coupling becomes strong with deceasing GaAs spacer height and increasing number of buried layers,while the lateral coupling becomes strong with increasing InAs...     

张应变GaAs层引入使InAs/InP量子点有序化排列的机理研究

采用ＬＰ－ＭＯＶＰＥ技术,在（００１）ＩｎＰ衬底上生长的ＩｎＡｓ／ＩｎＰ自组装量子点是无序的。为了解决这个问题,在ＩｎＰ衬底上先生长张应变的ＧａＡｓ层,然后再生长ＩｎＡｓ层,可得到有序化排列的量子点。本文对张应变ＧａＡｓ层引入使量子点有序化排列的机理进行了分析,为生长有序化、高密度,均匀性好自组装量子点提供了依据。     

Room-temperature photoluminescence at 1.55 μm from heterostructures with InAs/InGaAsN quantum dots on GaAs substrates

Room-temperature photoluminescence (PL) at 1.55 μm from heterostructures with InAs/InGaAsN quantum dots (QDs) grown by MBE on GaAs substrates is demonstrated for the first time. The effect of nitrogen incorporated into InAs/InGaAsN QDs on the PL wavelength and intensity was studied. The integral intensity of PL from the new structure with InAs/(In)GaAsN QDs is comparable to that from a structure with InGaAsN quantum wells emitting at 1.3 μm.     

Warping a single Mn acceptor wavefunction by straining the GaAs host

Transition-metal dopants such as Mn determine the ferromagnetism in dilute magnetic semiconductors such as Ga(1-x)Mn(x)As. Recently, the acceptor states of Mn dopants in GaAs were found to be highly anisotropic owing to the symmetry of the host crystal. Here, we show how the shape of such a state can be modified by local strain. The Mn acceptors near InAs quantum dots are mapped at room temperature by scanning tunnelling microscopy. Dramatic distortions and a reduction in the symmetry of the wavefunction of the hole bound to the Mn acceptor are observed originating from strain induced by quantum dots. Calculations of the acceptor-state wavefunction in the presence of strain, within a tight-binding model and within an effective-mass model, agree with the experimentally observed shape. The magnetic easy axes of strained lightly doped Ga(1-x)Mn(x)As can be explained on the basis of the observed local density of states for the single Mn spin.     

InAs quantum dots capped by GaAs,In0.4Ga0.6As dots,and In0.2Ga0.8As well

We have fabricated and characterized three types of InAs quantum dots (QDs) with different InxGa1-xAs capping layers. Post-growth atomic force microscopy measurements show that the In0.2Ga0.8As/InAs structure has a smooth surface (dot-in-well structure), whereas the In0.4Ga0.6As/InAs structure revealed large QDs with a density similar to that underneath InAs QDs on GaAs (dot-in-dot). With increasing In mole fraction of the capping layer and increasing In0.4Ga0.6As thickness, the energy position of the room-temperature photoluminescence (PL) peak is red-shifted. The quantum dot-in-dot structure emits stronger room-temperature PL than does the quantum dot-in-well structure. With a spatially distributed strain in the InAs quantum dot, we have solved the three-dimensional Schr?dinger equation by the Green's function theory for the eigenvalues and eigen wave functions. It is concluded that the ground state increases its wave function penetration into the low-barrier InxGa1-xAs capping layer so that its energy position is red-shifted. The reduced PL peak intensity of the dot-in-well (compared with GaAs covered dots) is due to the reduced overlapping between the ground state and the extended states above the GaAs barrier. The overlapping reduction in the dot-in-dot is over compensated for by the reduced relaxation energy (full width at half-maximum), indicating the importance of the sample quality in determining the PL intensity.     

Room-temperature photoconductivity in the 1–2.6 µm range in InAs/GaAs heterostructures with quantum dots

We have studied the room-temperature photoconductivity in the wavelength range 1–2.6 μm in InAs/GaAs heterostructures with quantum dots (QDs). Specific features of these heterostructures grown using the metalorganic vapor phase epitaxy (MOVPE) were an increase in the amount of InAs during the formation of a sheet of QDs and the use of alternating low-and-high-temperature regimes during their overgrowth with a GaAs barrier layer. For the first time, the MOVPE-grown multilayer InAs/GaAs heterostructures with quantum dots exhibited photoluminescence in a wavelength range of up to 1.6 μm and the photoconductivity up to 2.6 μm at room temperature. The heterostructures exhibited a room-temperature voltage sensitivity of 3 × 10³ V/W (within a Si-plate filter bandwidth) and a specific detectivity of 9 × 10⁸ cm Hz^1/2 W^?1.     

Growth of InAs quantum dots on focussed ion beam implanted GaAs(100)

The growth of self-assembled InAs quantum dots on implantation doped GaAs was studied. Be and Si ions were implanted in a combined ion implantation/molecular beam epitaxy process to generate p- and n-type GaAs, respectively. The quality of the InAs quantum dots was investigated by photoluminescence spectroscopy and scanning electron microscopy. By employing an in situ annealing step before re-growth it was possible to fabricate high quality InAs quantum dots on ion doped GaAs for Be doses up to 1.4×10¹⁴ cm⁻². The sheet resistance of the Be doped GaAs was as low as 1 kΩ at 300 K and 0.6 kΩ at 4.2 K, respectively. Only for rather low Si doses up to 5×10¹³ cm⁻² acceptable photoluminescence could be detected. The sheet resistance for these doses was 1 kΩ at 300 K and 1.7 kΩ at 4.2K.     

Electron emissions in InAs quantum dots containing a nitrogen incorporation induced defect state: the influence of thermal annealing

With the incorporation of nitrogen (N) into InAs quantum dots (QDs), the carrier distribution near the QD displays electron emissions from a localized N-induced defect state at 0.34?eV and a weak emission at 0.15?eV from the QD. This defect state causes drastic carrier depletion in the neighboring GaAs bottom layer near the QD, which can effectively suppress tunneling emission for the QD excited states. As a result, electrons escape from the QD ground state through thermal emission to near the GaAs conduction band, rather than through thermal emission to the QD first excited state and a subsequent tunneling to the GaAs conduction band, as observed in InAs QDs without N incorporation. Thermal annealing can weaken the defect emission and enhance the QD emission, suggesting a removal of the defect state and a recovery of carriers in the QD. Increasing annealing temperature can significantly decrease the emission time and energy of the QD emission, which is explained by a weakening of tunneling suppression due to the removal of the defect state.     

Quantitative excited state spectroscopy of a single InGaAs quantum dot molecule through multi-million-atom electronic structure calculations

Atomistic electronic structure calculations are performed to study the coherent inter-dot couplings of the electronic states in a single InGaAs quantum dot molecule. The experimentally observed excitonic spectrum by Krenner et al (2005) Phys. Rev. Lett. 94 057402 is quantitatively reproduced, and the correct energy states are identified based on a previously validated atomistic tight binding model. The extended devices are represented explicitly in space with 15-million-atom structures. An excited state spectroscopy technique is applied where the externally applied electric field is swept to probe the ladder of the electronic energy levels (electron or hole) of one quantum dot through anti-crossings with the energy levels of the other quantum dot in a two-quantum-dot molecule. This technique can be used to estimate the spatial electron-hole spacing inside the quantum dot molecule as well as to reverse engineer quantum dot geometry parameters such as the quantum dot separation. Crystal-deformation-induced piezoelectric effects have been discussed in the literature as minor perturbations lifting degeneracies of the electron excited (P and D) states, thus affecting polarization alignment of wavefunction lobes for III-V heterostructures such as single InAs/GaAs quantum dots. In contrast, this work demonstrates the crucial importance of piezoelectricity to resolve the symmetries and energies of the excited states through matching the experimentally measured spectrum in an InGaAs quantum dot molecule under the influence of an electric field. Both linear and quadratic piezoelectric effects are studied for the first time for a quantum dot molecule and demonstrated to be indeed important. The net piezoelectric contribution is found to be critical in determining the correct energy spectrum, which is in contrast to recent studies reporting vanishing net piezoelectric contributions.     

InAs/GaAs multiple quantum dot structures grown by LP-MOVPE

Structures with self-organised InAs quantum dots in a GaAs matrix were grown by the low pressure metal–organic vapour phase epitaxy (LP-MOVPE) technique. Photoluminescence and atomic force microscopy were used as the main characterisation methods for the growth optimisation. The properties of multiple-stacked quantum dot structures are influenced by the thickness of the GaAs separation layers (spacers) between quantum dot-containing InAs layers, by the InAs layer thickness, by arsine partial pressure during growth, and by group III precursor flow interruption time.     

Shape and size control of InAs/InP (113)B quantum dots by Sb deposition during the capping procedure

The role of Sb atoms present on the growth front during capping of InAs/InP (113)B quantum dots (QDs) is investigated by cross-sectional scanning tunnelling microscopy, atomic force microscopy, and photoluminescence spectroscopy. Direct capping of InAs QDs by InP results in partial disassembly of InAs QDs due to the As/P exchange occurring at the surface. However, when Sb atoms are supplied to the growth surface before InP capping layer overgrowth, the QDs preserve their uncapped shape, indicating that QD decomposition is suppressed. When GaAs(0.51)Sb(0.49) layers are deposited on the QDs, conformal growth is observed, despite the strain inhomogeneity existing at the growth front. This indicates that kinetics rather than the strain plays the major role during QD capping with Sb compounds. Thus Sb opens up a new way to control the shape of InAs QDs.