溶胶-凝胶法制备Co,Cu共掺杂ZnO薄膜 结构及光学特性

采用溶胶-凝胶法在玻璃基片上制备了纯ZnO薄膜和高浓度Cu掺杂的Co,Cu共掺ZnO(Zn0.90CoxCu0.1-xO,x=0.01,0.03,0.05)薄膜。扫描电镜观察到无论是纯ZnO还是掺杂ZnO薄膜表面都有均匀分布的颗粒,但是在Cu含量较高时均匀性更好。X射线衍射揭示所有样品都具有纤锌矿结构,但是Cu掺杂量的增加使晶格常数略有减小,而晶粒尺寸却略有增大。XPS测试结果表明样品中Co离子的价态为+2价和+3价,Cu离子的价态为+2价和+1价共存。室温光致发光测量在所有样品中均观察到较强的紫外发光峰、蓝光双峰和较弱的绿光发光峰。     

ZnO∶Al薄膜的制备及表征

利用溶胶-凝胶法在蓝宝石（0001）衬底上制备了多晶ZnO∶Al薄膜,薄膜表面具有特殊的交叉链状形貌。随着掺铝浓度的提高,链条有明显变细的趋势。X射线衍射证实,提高掺铝浓度有利于促进薄膜沿（002）方向的生长,并且光学带隙随着掺杂浓度的提高从3.21 eV增大到3.25 eV。光致发光光谱显示,薄膜在390 nm处出现较强的紫外峰,同时还出现了与Zn空位和Zn填隙缺陷能级有关的415 nm和440 nm两个比较弱的蓝峰。对实验结果以及产生的机理进行了分析和讨论。     

自然掺杂及N-Al共掺杂ZnO薄膜的发光特性

采用螺旋波等离子体辅助溅射技术制备了自然掺杂及N-Al共掺杂ZnO薄膜,对两种不同类型掺杂薄膜的低温光致发光(PL)特性进行了研究。实验结果表明,二者均呈现出了较强的与受主能级相关的发光特征,自然掺杂薄膜的光致发光谱在404.0 nm处出现了由于锌空位产生的近带边发光,N-Al共掺杂薄膜的光致发光谱在383.0 nm处出现了N作为受主的施主-受主对(DAP)跃迁发光。两种薄膜的发光特性比较分析表明,N-Al共掺杂技术能够有效提高N的固溶度,N受主能级密度增加使薄膜表现出较强的施主-受主对跃迁发光,表明该技术为实现p型ZnO薄膜制备的有效方法。     

Al-Zr共掺杂ZnO透明导电薄膜制备及光电性能研究

采用直流磁控溅射法,在室温水冷玻璃衬底上制备出Al-Zr共掺杂的ZnO透明导电薄膜。研究结果表明,Ar气压强对Al-Zr共掺杂ZnO透明导电薄膜的结构和电阻率有显著影响。X射线衍射(XRD)表明,Al-Zr共掺杂ZnO透明导电薄膜为六角纤锌矿结构的多晶薄膜,且具有C轴择优取向。扫描电镜(SEM)观察表明,Ar气压强对Al-Zr共掺杂ZnO透明导电薄膜的微观结构影响较大。薄膜的厚度随Ar气压强的增加而变薄,在Ar气压强为2.5Pa时,制备的Al-Zr共掺杂ZnO薄膜电阻率具有最小值1.01×10-3Ω.cm,在可见光区(500～800nm)平均透过率超过93%。     

ZnO:Al薄膜的制备及表征

利用溶胶-凝胶法在蓝宝石(0001)衬底上制备了多晶ZnO:Al薄膜,薄膜表面具有特殊的交叉链状形貌.随着掺铝浓度的提高,链条有明显变细的趋势.X射线衍射证实,提高掺铝浓度有利于促进薄膜沿(002)方向的生长,并且光学带隙随着掺杂浓度的提高从3.21 eV增大到3.25 eV.光致发光光谱显示,薄膜在390 nm处出现较强的紫外峰,同时还出现了与Zn空位和Zn填隙缺陷能级有关的415 nm和440 nm两个比较弱的蓝峰.对实验结果以及产生的机理进行了分析和讨论.     

掺杂与非掺杂ZnO薄膜的对比分析

TCO薄膜具有高电导率、高可见光区透射率等特点,ZnO薄膜在透明导电材料（TCO）领域如太阳能电池、半导体激光器（LD）、发光二极管（LED）等光电嚣件上得到了广泛应用。为制备高质量的TCO薄膜,我们选择合适的衬底材料和良好的制备技术及工艺。本文采用磁控溅射实验方法。在相同溅射条件下制备出了Al-N共掺ZnO薄膜和无掺杂ZnO薄膜,然后对这两种薄膜进行了AFM、XRD、Hau测试对比分析,确定了掺杂与非掺杂ZnO薄膜优缺点,实验结果表明掺杂为Al—N共掺ZnO薄膜的各项性能指标均优于未掺杂ZnO薄膜,为进一步研究ZnO薄膜在实际应用打下一定的基础。     

溶胶-凝胶法制备ZnO薄膜及表征

采用溶胶-凝胶法在石英玻璃衬底上使用旋转涂覆技术生长了ZnO薄膜.对薄膜的XRD分析表明ZnO薄膜为纤锌矿结构并沿c轴取向生长.透射光谱表明薄膜的禁带宽度为3.28eV,与ZnO体材料的禁带宽度3.30eV基本相同.用光致发光谱分析了经过500～700℃热处理获得的ZnO薄膜,结果表明ZnO薄膜在室温下有较强的紫外带边发射,但当热处理温度高于700℃时,可见光波段发射明显增加.     

超声喷雾热解法制备ZnO：Eu薄膜

以醋酸锌（Zn（CH3COO）2）、氯化铕（EuCl3）水溶液为前驱体,采用超声喷雾热解（USP）方法在ITO导电玻璃衬底上沉积Eu掺杂ZnO（ZnO：Eu）薄膜。通过扫描电镜（SEM）、X射线衍射（XRD）和光致发光（PL）谱对ZnO：Eu薄膜的形貌、结构和光学性质进行了研究。SEM测试结果表明,超声喷雾热解法制备的...     

溶胶-凝胶法制备ZnO薄膜及表征

采用溶胶-凝胶法在石英玻璃衬底上使用旋转涂覆技术生长了Zn O薄膜.对薄膜的XRD分析表明Zn O薄膜为纤锌矿结构并沿c轴取向生长.透射光谱表明薄膜的禁带宽度为3.2 8e V ,与Zn O体材料的禁带宽度3.30 e V基本相同.用光致发光谱分析了经过5 0 0～70 0℃热处理获得的Zn O薄膜,结果表明Zn O薄膜在室温下有较强的紫外带边发射,但当热处理温度高于70 0℃时,可见光波段发射明显增加     

In掺杂对ZnO薄膜结构及光学特性的影响

通过射频反应溅射法在硅衬底上制备了具有c轴择优取向和小晶格失配的In掺杂ZnO薄膜.在室温下测量样品的光致发光(PL)光谱,观察到波长位于415nm(3.02eV)和430nm(2.88eV)附近的蓝紫发光双峰.研究了不同In掺杂量对ZnO薄膜的结构和发光特性的影响.当In片面积为靶总面积的3%时,样品具有高度的c轴择优取向和较小的晶格失配(0.16%);同时在PL谱中观察到波长位于415nm(3.02eV)和433nm(2.86eV)处的强蓝紫光双峰.     

在柔性衬底上制备透明导电薄膜ZnO:Zr(英文)

采用射频磁控溅射法在室温柔性衬底PET上制备了掺锆氧化锌(ZZO)透明导电薄膜.利用不同方法提高了ZZO薄膜的电阻率而未使其可见光透过率降低.X射线衍射(XRD)和扫描电子显微镜(SEM)表明,ZZO薄膜为六角纤锌矿结构的多晶薄膜.在有机衬底和玻璃衬底上制备ZZO薄膜的择优取向不同,前者为(100)晶面,而后者为(002)晶面.在有ZnO缓冲层的PET衬底上制备的ZZO薄膜电阻率比直接生长在玻璃衬底样品上的小.通过优化参数,在PET衬底上制备出了最小电阻率为1.7×10-3Ω·cm、可见光透过率超过93%的ZZO薄膜.实验表明,镀膜之前在柔性衬底上沉积ZnO缓冲层能有效地提高ZZO薄膜的质量.     

Polycrystalline ZnO Films Deposited on Glass by RF Reactive Sputtering

Polycrystalline ZnO films were prepared on glass wafer using Zn targets by radio frequency(RF)reactive sputtering technique under different deposition conditions.X-ray diffraction (XRD) and optical transmittance spectrum were employed to analyze the structure and optical character of the films.The strain and stress in films, as well as the packing density are calculated in terms of refractive index of films measured with an elliptic polarization analyzer.It is the deposition conditions that have great effects on the structural and optical properties of ZnO films.Under the optimal conditions,the only evident peak in XRD spectrum was (002) peak with the full width at half maximum (FWHM) of 0.20° showing the grain size of 42.8 nm.The packing density,the stress in (002) plane and the average optical transmittance in the visible region were about 97%,-1.06×10~9 N/m~2 and 92%, respectively.     

射频磁控溅射ZnO薄膜的光致发光

用射频磁控溅射法在硅衬底上沉积出具有良好的择优取向的多晶ZnO薄膜.在室温下进行光致发光测量,观察到明显的紫光发射(波长为402nm)和弱的紫外光发射 (波长为384nm).紫光发射源于氧空位浅施主能级到价带顶的电子跃迁;紫外光发射则源于导带与价带之间的电子跃迁.随着光激发强度的增加,紫光发射强度超线性增强,且稍有蓝移,而紫外光发光强度则近似线性增加.在氧气中高温退火后,薄膜结晶质量明显提高,紫光发射强度变弱,紫外光发射相对增强.     

射频磁控溅射ZnO薄膜的光致发光

用射频磁控溅射法在硅衬底上沉积出具有良好的择优取向的多晶 Zn O薄膜 .在室温下进行光致发光测量 ,观察到明显的紫光发射 (波长为 4 0 2 nm )和弱的紫外光发射 (波长为 384 nm ) .紫光发射源于氧空位浅施主能级到价带顶的电子跃迁 ;紫外光发射则源于导带与价带之间的电子跃迁 .随着光激发强度的增加 ,紫光发射强度超线性增强 ,且稍有蓝移 ,而紫外光发光强度则近似线性增加 .在氧气中高温退火后 ,薄膜结晶质量明显提高 ,紫光发射强度变弱 ,紫外光发射相对增强 .     

Growth and Characterization of Zn-Incorporated Copper Oxide Films

In this work, undoped and Zn-doped copper oxide films were deposited on glass substrates at a substrate temperature of 250 ± 5°C by using an ultrasonic spray pyrolysis technique. Electrical, optical, and structural properties of the films were investigated, and the effect of Zn incorporation on these properties are presented. The variations of electrical conductivities and electrical conduction mechanisms of all films were investigated in the dark and in the light. Optical properties of the produced films were analyzed by transmission, linear absorption coefficient, and reflection spectra. The band gaps of the films were determined by an optical method. The film structures were studied by x-ray diffraction. To obtain information about structural properties in detail, the grain size (D), dislocation density (δ), and lattice parameters for preferential orientations were calculated. The elemental analyses were performed using energy-dispersive x-ray spectroscopy. It was concluded that Zn has a strong effect, especially on the electrical and structural properties, and the undoped and Zn-doped copper oxide (at 3%) films may be used as absorbing layers in solar cells due to their low resistivities and suitable linear absorption coefficient values.     

Electrodeposition and Characterization of ZnO Thin Films

Thin films of ZnO were electrodeposited from an aqueous solution of Zn（NO3 ）2 on indium tin oxide（ITO）-covered glass substrate. The analysis of X-ray diffraction（XRD） and scanning electron micrograph （SEM） indicated that the obtained ZnO films had a compact hexagonal wurtzite type structure with preferable （002） growth direction. A sharp near-UV emission peak located at 380 nm and a strong orange-red emission peak located at 593 nm were observed in the photoluminescence, when excited with 325 nm wavelength at room temperature. Then the prepared ZnO films were introduced as anode phosphors into the field emission test. It was found that orange-red cathode-luminescence was observed and the luminescent brightness was enhanced by annealing. When annealing temperature increased about 600 ℃, the photoluminescence with peak of 531 nm and the green cathode-luminescence were observed. The tests showed that the brightness of about 2 × 102 cd/m^2 was obtained at electric field of 2 V/μm for annealed sample. The results revealed that the film could be a good kind of low-voltage drived cathode-luminescence phosphor.     

多层式金刚石膜上沉积ZnO薄膜的研究

提出了一种制作ZnO/金刚石/硅结构声表面波器件的新工艺。利用热丝化学气相沉积(HFCVD)技术,通过逐次调整气压、碳源浓度等生长参数,在硅基片上沉积了晶粒尺寸逐层减小的、光滑的多层式金刚石薄膜,表面粗糙度低于20 nm,厚度大于35μm。在金刚石膜上制作了线宽为8μm的IDT电极。尝试利用射频(RF)磁控溅射法在制备的多层式金刚石膜上生长ZnO薄膜,X-射线衍射(XRD)结果表明,当衬底温度(Th)为250℃、气压(P)为0.4 Pa时,在多层式金刚石薄膜衬底上可沉积高度c轴取向的ZnO薄膜,电阻率接近106Ω.cm,满足制作声表面波器件对衬底材料的要求。     

不同衬底上氧化锌薄膜的金属有机化学气相沉积方法生长

氧化锌薄膜通过金属有机化学气相沉积方法生长在康宁玻璃与α-蓝宝石衬底上,研究了有关薄膜的生长质量与发光特性.通过X光衍射方法测试研究发现,不仅在以α-蓝宝石为衬底的样品中,同时,在以玻璃为衬底的样品中都发现了氧化锌(0 0 2)方向生长的尖峰,表明生长在两种衬底上的样品都是高度的C向生长.对两种样品的荧光谱研究发现,两者的紫外峰位于374 nm附近,在以α-蓝宝石为衬底的样品中,有深能级发射,但在以玻璃为衬底的样品中没有发现,表明在玻璃衬底上我们生长出了高质量的氧化锌薄膜.通过原子力显微镜,对生长在两种衬底上薄膜的表面形貌做了观察,其晶粒的大小与表面粗糙度有一定的差别,表明二者都是以柱状形式生长的.     

Effect of Fe-doping on the structural and optical properties of ZnO thin films prepared by spray pyrolysis

Fe-doped ZnO thin films have been prepared by spray pyrolysis on glass substrates and the influence of Fe-doping concentration on the structural and optical properties of the films has been studied.The X-ray diffraction (XRD) analysis shows that Fe doping has a significant effect on crystalline quality,grain size and strain in the thin films.The best crystalline structure is obtained for 3 at%Fe doping as observed from scanning electron microscopy (SEM) and XRD.However,lower or higher Fe-doping degrades the crystalline quality in turn.Moreover,UV spectroscopy demonstrates the influence of Fe-incorporation on visible range transmittance of ZnO where the best transmittance is obtained for 3 at%doping.The results have been illustrated simultaneously focusing previous results obtained from literature.