共查询到19条相似文献,搜索用时 218 毫秒
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一、引言近几年来,离子注入技术在金属方面的研究和应用越来越引起人们的重视。但是金属材料的研究要求注入剂量高(一般在10~(17)离子/平方厘米以上),要求注入的离子种类多,这样对离子注入机的发展提出了新的要求。(即注入机束流强、离子源能引出的离子种类多等)。目前欧美等国正在不断解决这一课题,制造束流强(毫安级)、能注入离子种类多的离子注入机。除此之外,还在探索一种新的离子束工艺,以代替直接将所需离子注入金属内的离子注入工艺。这种工艺 相似文献
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王晨曦 《现代制造技术与装备》2023,(1):145-147
生物医学中的牙种植体表面处理一直是困扰研究者们多年的难题。口腔中牙种植体表面的腐蚀和口腔细菌的滋生是牙种植体失效的主要形式。骨组织与种植体的结合活性差,是影响牙种植体寿命的关键因素。核工业西南物理研究院研制了一台多功能全方位复合离子注入机,基于现有牙种植体产品,利用等离子体浸没注入,对牙种植体表面注入锌、银等离子体进行表面改性,赋予其良好的成骨活性和抗菌性能,以延长牙种植体的使用寿命。 相似文献
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介绍了国外开发的以提高材料疲劳特性为目的的离子注入技术,包括他的原理、工艺和特点,讨论了注入剂量、离子种类和材料成分等对疲劳特性的影响,以及该项技术当前的最新研究动向。 相似文献
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介绍了国外开发的以提高材料疲劳特性为目的的离子注入技术,包括他的原理、工艺和特点,讨论了注入剂量、离子种类和材料成分等对疲劳特性的影响,以及该项技术当前的最新研究动向。 相似文献
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刘遵礼 《仪表技术与传感器》1979,(2)
LZ-70型离子注入机是由温州自动化研究所和温州潜水泵厂研制和生产的。一、用途和特点LZ一70型离子注入机是半导体工业生产专用的低能硼离子注入的专用注入机,主要用于MOS型集成电路、微波三极管等器件的生产 相似文献
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An ion beam deceleration system was studied for the high-current ion implanter at the Laboratório de Aceleradores e Tecnologias de Radiação at the Campus Tecnológico e Nuclear, of Instituto Superior Técnico. The installed system consists of a target plate and one electrostatic focusing lens with one electrode. This article describes the results of the evaluation of the new system. With this upgrade, the ion implanter provides enhanced versatility for decelerating to 5 keV a high current ion beam at the µA level. This implantation provides a wide area and allows for a continuous magnetic beam scanning, extending the energy range to lower values, opening up a wider set of applications. 相似文献
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Fretting wear behavior of nitrogen ion implanted titanium alloys in bovine serum lubrication 总被引:1,自引:0,他引:1
Nitrogen ion implantation was performed on biomedical titanium alloys by using of the PBII technology to improve the surface mechanical properties for the application of artificial joints. The titanium nitride phase was characterized with X-ray photoelectron spectroscopy (XPS). The nanohardness of the titanium alloys and implanted samples were measured by using of in-situ nano-mechanical testing system (TriboIndenter). Then, the fretting wear of nitrogen ion implanted titanium alloys was done on the universal multifunctional tester (UMT) with ball-on-flat fretting style in bovine serum lubrication. The fretting wear mechanism was investigated with scanning electron microscopy (SEM) and 3D surface profiler. The XPS analysis results indicate that nitrogen diffuses into the titanium alloy and forms a hard TiN layer on the Ti6Al4V alloys. The nanohardness increases from 6.40 to 7.7 GPa at the normal load of 2 mN, which reveals that nitrogen ion implantation is an effective way to enhance the surface hardness of Ti6Al4V. The coefficients of friction for Ti6Al4V alloy in bovine serum are obviously lower than that in dry friction, but the coefficients of friction for nitrogen ion implanted Ti6Al4V alloy in bovine serum are higher than that in dry friction. Fatigue wear controls the fretting failure mechanism of nitrogen ion implanted Ti6Al4V alloy fretting in bovine serum. The testing results in this paper prove that nitrogen ion implantation can effectively increase the fretting wear resistance for Ti6Al4V alloy in dry friction, and has a considerable improvement for Ti6Al4V alloy in bovine serum lubrication. 相似文献
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N. Saklakoglu I.E. Saklakoglu V. Ceyhun O.R. Monteiro I.G. Brown 《Tribology International》2007,40(5):794-799
The wear and friction characteristics of zirconium-ion-implanted AISI D3 tool steel have been investigated using pin-on-disc methods. Ion implantation was carried out using a vacuum-arc-based ion implanter to form multicharged zirconium ion beams at a mean ion energy of 130 keV, and the implantation doses investigated were approximately 3.6×1016, 5×1016 and 1×1017 ions cm−2. It was found that Zr implantation decreased both the wear and the coefficient of friction. The beneficial effects of Zr implantation in terms of associated Auger electron spectroscopy, Rutherford backscattering spectroscopy and scanning electron microscopy microprobe analyses are described. 相似文献
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SEM electron channelling patterns as a technique for the characterization of ion-implantation damage
Electron channelling patterns (ECPs) formed in back-scattered images in the scanning electron microscope (SEM) have been used occasionally to confirm surface amorphization during ion implantation. In order to place such observations on a more quantitative basis, the study reported here has explored the variation of ECP appearance with both specimen damage levels (and thus subsurface structures) and SEM accelerating voltage (i.e. sampled depth). Polished and annealed (0001) single crystal sapphire discs were implanted to various damage levels up to both subsurface and full surface amorphization. Damage levels were measured independently by Rutherford back-scattering (RBS). Selected-area ECPs were obtained in a Jeol-840 electron microscope operating over the range 5–40 kV in 5-kV steps. Progressive ECP degradation—in terms of high-order line disappearance—was observed with increasing dose, culminating in total pattern loss when full surface amorphization occurred. However, ECP information could still be obtained from the damaged near-surface material even when a subsurface amorphous layer was present, thus demonstrating the shallow retrieval depth of information from the ECP technique. Indeed, because the spatial distribution of damage from ion implantation is both calculable and measurable, these experiments have also allowed us, for the first time, to explore and demonstrate the shallow sample depths from which the majority of ECP contrast originates (< 150 nm in sapphire at an accelerating voltage of 35 kV), even when the beam penetration is considerable by comparison (~ 5 μm). Furthermore, the way in which this sampled depth varies with SEM accelerating voltage is both demonstrated and shown to be a powerful diagnostic technique for studying the distribution of near-surface structural damage. 相似文献
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Improved wear resistance of ultra-high molecular weight polyethylene by plasma immersion ion implantation 总被引:3,自引:0,他引:3
Surface modification of ultra-high molecular weight polyethylene (UHMWPE) has been explored using the novel non-line-of-slight plasma immersion ion implantation (PIII) with nitrogen. The modified surfaces were characterised by SEM and a Nano Test 600 testing machine. The tribological behaviour of PIII treated UHMWPE sliding against AISI 316L stainless steel counterfaces was evaluated using a pin-on-disc tribometer under water lubricated conditions. The experimental results show that PIII is a very promising surface engineering technique to improve such surface mechanical properties as surface hardness and elastic modulus of UHMWPE. As a result, the wear resistance of UHMWPE was significantly enhanced by a factor of three following PIII treatment, as compared with untreated material. It was found that the significantly improved wear resistance of PIII treated UHMWPE can be mainly attributed to ion bombardment induced cross-linking, and thus surface hardening. 相似文献
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In the present study, the high-current-density nitrogen ion implantation technique is applied to enhance mechanical properties of thermal sprayed steel coatings. XRD measurements and optical microscopy of ion implanted coatings show clearly the presence of nitrogen solid solutions and precipitates of new phases in the surface layers of coatings. Phases formed are controlled by the temperature of ion beam processing, initial chemical composition and microstructure of coatings. Wear tests demonstrate that properly selected parameters of ion implantation dramatically improve wear and score-resistance of coatings. The influence of the microstructure and phase composition of nitrogen ion implanted layers on tribological properties is discussed. 相似文献
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对渗碳和离子注入两种工艺方法和作用进行了介绍,并对两种工艺方法进行了一定的比较,重点对近年来广泛应用的离子注入技术进行了推介。 相似文献
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金属陶瓷表面处理的研究进展 总被引:3,自引:1,他引:3
对近年来国内外有关金属陶瓷表面处理的研究成果进行了总结和分析。主要介绍了气相沉积技术、氮化处理和离子注入等在金属陶瓷表面处理中的应用及其对材料晶粒度、组织和性能的影响,指出了金属陶瓷表面处理未来的发展方向。 相似文献
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Roy F Abel G Terreault B Reguer A Meunier JL Bolduc M Ross GG 《The Review of scientific instruments》2007,78(2):023905
Surface treatment optimization requires the control of the ion dose and the workpiece temperature, two parameters that are not trivially measurable in plasma-based ion implantation. A temperature and ion fluence monitoring system has been developed and implemented in a plasma-based ion implanter. It is based on the measurement with a thermopile of the radiation emitted from the back face of a thin copper disk inserted in the stainless steel sample holder. Since the incident ions carry practically all the incident power, the measurement of the Cu disk temperature that increases during implantation can provide an evaluation of the ion fluence in real time. A model has been developed for the deconvolution of the temperature data and has been fitted to the temperature behavior during implantation. A good agreement between the total integrated doses, evaluated with Rutherford backscattering spectroscopy characterization, and the ion fluence calculated by means of this model has been obtained with a discrepancy less than 16%. 相似文献