钛合金表面硬化与固体润滑处理层的电化学腐蚀行为研究

分别利用等离子氮化技术和离子束增强沉积(IBED)技术使钛合金表面获得硬质抗磨层和MoS2，MoS2-Ti固体润滑膜层。通过电化学测试技术研究了膜层和钛合金基材在含Cl^-介质中的抗蚀性能和接触腐蚀敏感性：研究结果表明：Ti与MoS2的复合改善了MoS2膜的环境适应性，MoS2—17Ti复合膜层与钛合会接触相容；IBED TiN较钛合金电化学活性低，阳极极化行为与Ti6Al4V合金相近，与钛合金基体间电偶腐蚀敏感性低；钛合金等离子氮化处理层在NaCl水溶液中无论处于自然腐蚀电位还上弱阳极极化状态，均较钛合金电化学活性低，且与钛合金基体间电偶腐蚀敏感性低。     

Outcome measures of a chronic pain program: a prospective statistical study

Ion beam enhanced deposition (IBED) was adopted to synthesize biocompatible titanium oxide film. Structure characteristics of titanium oxide film were investigated by RBS, AES, and XRD. The blood compatibility of the titanium oxide film was studied by measurements of blood clotting time and platelet adhesion. The results show that the anticoagulation property of titanium oxide film is improved significantly. The mechanism of anticoagulation of the titanium oxide film was discussed.     

Synthesis of nanocomposite thin films based on the Mo-Si-C ternary system and compositional tailoring through controlled ion bombardment

A major advantage of sputtering processes compared to evaporation processes is the possibility of synthesizing films that replicate the composition of the source (target) material,particularly in the case of alloy targets. This is related to the unique feature of sputtering, viz, formation of an “altered layer” which facilitates reproduction of the target composition in the thin film. An exciting and novel area of research deals with the synthesis of nanocomposite thin films by sputtering composite targets. In this article, the feasibility of depositing a composite thin film based on the Mo-Si-C temary system through RF magnetron sputtering of a MoSi₂+XSiC target, and the possibility of modifying the film composition by controlled ion bombardment (i.e., “ion plating” or “bias sputtering”), will be discussed. In this context, the role of the sputter yields for Mo, Si, and C will be examined with respect to the ability to vary the composition of as-deposited films. In addition, the modifications which were required to sputter a 58.4-mm-diameter composite target (produced inhouse, by different synthesis reactions) using a 127×381-mm Vac Tec cathode will be discussed. Details of Auger electron spectroscopy (AES) scanning electron microscopy (SEM) and X-ray diffraction (XRD) analyses of the as-deposited films will be presented.     

钛合金表面多弧离子镀TiAlN薄膜微观组织结构及性能研究

采用多弧离子镀技术在TC11钛合金基体上沉积了TiAlN涂层。金相截面组织观察和扫描电镜表面形貌照片显示,制备出的膜层连续、光滑、孑L隙率低、组织致密;X射线衍射分析表明,膜层的相结构中大致含有以下组成相：（Ti,A1）N、Ti2A1N、Ti。用EDS能谱分析对膜层中的元素含量进行了测定,发现Al元素出现了成分负偏析。性能测试表明,TiAlN膜具有较高的硬度和膜／基结合力。     

Structure and Properties of TiO2-CeO2 Films Deposited on Soda-Lime Silicate Glass Substrates by R.F.Magnetron Sputtering

TiO2-CeO2 films were deposited on soda-lime glass substrates at different ratio of O2 to Ar (0.10, 0.15,0.20) by R. F. magnetron sputtering. The structure, surface composition, UV-visible spectrum of the films were measured by scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and spectrometer. The results show that the films are amorphous, and the relative molar ratio of Ce to Ti is higher than that of the target at lower ratio of O2 to Ar. Only tetravalent Ti 4 and Ce 4 ions are present in the films, and the obtained TiO2 -CeO2 films appear good uniformity and high density. The films deposited on the glass can shield ultraviolet light without significant absorption of visible light.     

采用磁控溅射法在细菌纤维素膜上制备高性能的铟锡氧化物薄膜

Microbial cellulose (MC) membranes produced by Acetobacter xylinum NUST4.1, were used as flexible substrates for the fabrication of transparent indium tin oxide (ITO) electrodes. Transparent and conductive ITO thin films were deposited on MC membrane at room temperature using radio frequency (RF) magnetron sputtering. The optimum ITO deposition conditions were achieved by examining crystalline structure, surface morphology and optoelectrical characteristics with X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and UV spectroscopy. The sheet resistance of the samples was measured with a four-point probe and the resistivity of the film was calculated. The results reveal that the preferred orientation of the deposited ITO crystals is strongly dependent upon with oxygen content (O2/Ar, volume ratio) in the sputtering chamber. And the ITO crystalline structure directly determines the conductivity of ITO-deposited films. High conductive [sheet resistance～120Ω.square-1(Ω.sq-1)] and transparent (above 76%)ITO rilms(240 nm thick) were Obtained with a moderate sputtering power (about 60 W) and with an oxygen flow rate of 0.25ml·min-1(sccm) during the deposition. These results show that the ITO-MC electrodes can find their potential application in optoelectrical devices.     

Optical and Micro-Structural Properties of ZnO Thin Films Grown on Silicon Substrate by Pulsed Laser Deposition

ZnO thin films were deposited on n-Si (111) at various substrate temperatures and oxygen pressures by pulsed laser deposition (PLD) using a Nd∶YAG laser with the wavelength of 1064 nm. X-ray diffraction (XRD), photoluminescence (PL), scanning electron microscopy (SEM) and transmission electron microscopy (TEM) were used to analyze the microstructure, optical property and morphology of the ZnO thin films. A comparatively optimal crystallized ZnO thin film was obtained at the substrate temperature of 600 ℃ in oxygen pressure of 50 mTorr. The intensity of the luminescence strongly depends on the stoichiometry of the film as well as the crystalline quality.     

Effect of humidity on microstructure and properties of YBCO film prepared by TFA-MOD method

Epitaxial YBCO superconducting films were deposited on the single crystal LaAlO3. (001) substrate by metal organic deposition method. All YBCO films were fired at 820 ℃ in humidity range of 2.6%-19.7% atmosphere. Microstructure of YBCO thin films was ana-lyzed by means of X-ray diffraction (XRD) and scanning electron microscopy (SEM). Superconducting properties of YBCO films were measured by four-probe method. XRD results showed that the second phase (such as BaF2)and a-axis-oriented grains existed in the films prepared at 2.6% humidity condition; a-axis-oriented grains increased in the film prepared at higher than 4.2% humidity condition; almost pure c-axias-oriented grains existed in the films fired at 4.2% humidity condition. Morphologies of the YBCO films showed that all films had a smooth and crack-free surface. YBCO film prepared at 4.2% humidity condition showed Jc value of 3.3 MA/cm2 at 77 K in self-field.     

Characterization of the Surface Film Formed on Molten AZ91D Magnesium Alloy in Atmospheres Containing SO2

The surface film formed on molten AZ91D magnesium alloy in an atmosphere containing SO₂ was characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS). The surface film primarily contained MgO and MgS and had a network structure. MgS increased the Pilling?CBedworth ratio of the film and enhanced its protective capability. The films with a few pores at the surface consisted of two layers with an outer MgO layer and an inner layer of MgO and MgS. The film without pores at the surface also contained MgS and small amounts of MgSO₄ in the outer layer. Increasing the SO₂ content in the atmosphere promoted film growth and the formation of the protective film was prevented with the increased temperature.     

Structure and Waveguide Properties of Sol-Gel Derived Gd2O3 Films

Pure and rare earth doped gadolinium oxide (Gd2O3) waveguide films were prepared by a simple sol-gel process and dip-coating method. Structure of Gd2O3 films annealed at different temperature was investigated by X-ray diffraction and transmission electron microscopy. Oriented growth of (400) face of Gd2O3 has been observed when the films were deposited on amorphous substrate. The refractive index and thickness of films were determined by m-lines spectroscopy. The laser beam (λ= 632.8 nm) was coupled into the film by a prism coupler and the propagation length is about 3.5 cm. Luminescence properties of europium ions doped films were measured by waveguide fluorescence spectroscopy, which shows disordered environment for Eu^3 at 400℃.     

New Application of Stainless Steel

Several rigid substrates such as stainless steel, titanium alloy, aluminum alloy, nickel foil, silicon, and sodium lime glass have been employed for manufacturing high quality TiO2 films by metal organic chemical vapor deposition （MOCVD）. The as-deposited TiO2 films have been characterized with SEM/EDX and XRD. The photocatalytic properties were investigated by decomposition of aqueous orange Ⅱ. UV VIS photospectrometer was employed to check the absorption characteristics and photocatalytic degradation activity. The results show that films synthesized on metal substrates display higher photoactivities than that on absolute substrates such as silicon and glass. It is found that solar light is an alternative to UV-light used for illumination during photodegradation of orange Ⅱ. TiO2 film on stainless steel substrate was regarded as the best one for photocatalysis.     

Synthesis of gadolinium aluminate thin film by ion beam sputtering sequential deposition

Sequentially deposited by thin film synthesis consisted of multilayer precursor film deposition and thermal treatment. It is especially useful in complex-ingredient or precise stoichoimetric controlling thin film synthesis. Gadolinium aluminate,a new good candidate system for many luminescence usages other than laser crystals,scintillation crystals,phosphors,contains many phases,such as Gd4Al2O9(GAM) ,GdAlO3(GAP) ,Gd3Al5O12(GAG) ,so precise stoichoimetry of the amorphous ingredient layers is very important to the final single phase film synthesis. In our work,Gd2O3 and Al amorphous layers(ingredients for gadolinium aluminate film) were deposited in a certain sequence on MgO(100) and Si(100) substrate by IM100(an ion beam sputtering instrument) . The multi-amorphous-layered precursor was annealed with two-step thermal treatment(diffusion at a low temperature and then crystallization at a high temperature) . The XRD(X-ray diffraction pattern) ,SEM(scanning electron microscope second electron image) and AES(Auger electron spectroscopy depth profiles) analyses were used to detect the film microstructures and properties. The analyses results showed that ion beam sputtering deposition could control ingredient stoichoimetric ratio by an in site depositing thickness measurement. During the two-step thermal treatment,diffusion at a low temperature would cost a rather long time to make the amorphous precursor film uniform(more than 120 h) ,and the suitable diffusion temperature should be around 400 oC. The crystallization temperature should be decided by the gadolinium aluminate phase types and cost rather less time(about 4 h) . The stable phases GAP and GAM should be annealed at 1300 oC or higher temperatures,but the metastable phase GAG should just be annealed at around 1100 °C.     

TC4钛合金表面磁控溅射TiAlN涂层的组织与性能

采用TiAl合金靶材,在TC4钛合金基材表面以不同磁控溅射工艺沉积制备了TiAlN涂层。利用扫描电子显微镜(SEM)、能谱仪(EDS)、X射线衍射仪(XRD)分别分析了不同工艺制备的TiAlN涂层的表面形貌、表面成分及相结构,并对TiAlN涂层的耐蚀性、耐磨性等进行了研究。结果表明,采用磁控溅射工艺可在TC4钛合金表面制备出表面相对平整且结构致密的TiAlN涂层;沉积了TiAlN涂层的TC4钛合金试样的表面性能得到了提高,其磨损失重量和TC4钛合金基材相比降低了80%,耐盐雾腐蚀性能达到了保护级9级。     

叠层型Cu沉积TiO2复合薄膜的制备及光学性能

真空蒸镀法结合溶胶凝胶法成功地制备Cu-TiO23层复合结构薄膜.运用XRD,SEM,UV-vis等手段进行结构表征和光吸收性能测试.通过模拟可见光下制备样品对亚甲基蓝溶液降解率的变化,评定其光催化活性.结果表明:该法制备的复合结构薄膜,在未热处理时真空蒸镀的金属层为单质Cu.在723 K热处理后,沉积的Cu被氧化主要以Cu2O的形式存在,而TiO2为单一的锐钛矿晶型.823K保温2.0 h热处理后Cu2O进一步被氧化为CuO,同时出现了少量金红石型TiO2.由于Cu2O与CuO均为窄带隙的半导体,在可见光照射下会发生电子由价带向导带的跃迁,因此复合薄膜表现出明显的可见光吸收性能.降解实验的结果则表明:不同温度热处理后的复合薄膜均表现出较高的光催化活性,特别是723K热处理后的复合薄膜样品可见光催化活性最好,在可见光照射5.0 h后对亚甲基蓝溶液降解率接近100%.分析其原因认为,P型的Cu2O和CuO与n型TiO2半导体接触后,在其界面形成了纳米异质结的结合,其p-n结的内建电场抑制了光生载流予的再复合,提高了量子产率,因此使复合薄膜表现出较高的光催化性能.     

In Situ Synthesis and Characterization of Shape Memory Alloy Nitinol by Laser Direct Deposition

Nitinol is well known for its unique shape-memory and super-elastic properties along with its excellent biomechanical compatibility and corrosion resistance. In this study, a laser direct deposition technique was explored to synthesize high-quality, near-net-shape nitinol components directly from elemental nickel and titanium powders as opposed to using expensive prealloyed nitinol powder. The systematic characterization of samples was done using X-ray diffraction (XRD), scanning electron microscopy (SEM), and energy dispersive X-ray spectroscopy (EDS). Transformation temperatures were obtained using differential scanning calorimetry (DSC). With an optimum ratio of nickel and titanium powder mixture, optimal laser parameters, and post-heat treatment, samples with homogeneous and nearly fully dense NiTi phase were synthesized with less unwanted secondary phases occupying less than 3.2 pct volume fraction. Furthermore, these results were compared with those obtained for samples deposited using prealloyed nitinol powder. This technique offers maximum flexibility and cost benefit in the manufacturability of near-net-shape nitinol components.     

粉末冶金Ti-Al合金表面多孔氧化膜的制备

以含CrO3的氢氟酸水溶液为电解液,采用阳极氧化法于粉末冶金Ti-Al合金表面制备多孔氧化膜。采用场发射扫描电镜(SEM)、X射线衍射仪(XRD)和X射线光电子能谱仪(XPS)对多孔氧化膜的形貌和结构进行分析,研究电解液各组份及浓度、阳极氧化电压对多孔氧化膜的影响规律,并利用电化学测试技术探讨多孔氧化膜的成膜机理。结果表明:合金在不含CrO3的HF电解液中阳极氧化不能获得多孔氧化膜,而是发生严重的腐蚀溶解。电解液中HF浓度和电压均影响氧化膜的形貌,在HF含量为0.2%时可获得规则的多孔氧化膜,孔径在50nm左右;当氧化电压为10V时形成的多孔氧化膜规则性较好,电压增大时多孔氧化膜结构遭到破坏。氧化膜中主要含有无定型的TiO2、Al2O3以及少量晶态的Ti2O、单质Al。多孔氧化膜的生长过程包括阻挡层的形成、多孔氧化膜的初始形成和多孔氧化膜的稳定生长3个阶段。     

Characterization and In Vitro Corrosion Investigations of Thermal Sprayed Hydroxyapatite and Hydroxyapatite-Titania Coatings on Ti Alloy

In the current investigation, hydroxyapatite (HA) powder was mixed with titania (TiO₂) in 50:50?wt?pct for depositing composite coatings on a Ti-alloy substrate using a thermal-spray coating technique. The coatings were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM)/energy-dispersive X-ray spectroscopy (EDS) analyses. The corrosion behavior of the coatings was studied by electrochemical corrosion testing in simulated human body fluid. After the corrosion testing, the samples were analyzed by XRD and SEM/EDS analyses. HA and TiO₂ (rutile) were the main phases observed in the developed coatings. Bulk HA coating was amorphous; however, the addition of TiO₂ effectively improved the crystallinity of HA in HA-TiO₂ coating. The SEM analysis confirmed the formation of a well-formed HA-TiO₂ composite coating. HA coating exhibited higher bond strength (67.8?MPa) compared with HA-TiO₂ composite coating (37.6?MPa). The electrochemical study showed a significant improvement in the corrosion resistance of the Ti alloy after the deposition of the coatings.     

Fabrication of carbide-particle-reinforced titanium aluminide-matrix composites by laser-engineered net shaping

TiAl-based titanium aluminide alloys and their composites reinforced with ceramic particles are considered to be important candidate materials for high-temperature structural applications. Laser-engineered net shaping (LENS) is a layered manufacturing process, which involves laser processing fine powders into three-dimensional components directly from a computer-aided design (CAD) model. In this work, the LENS process was employed to fabricate carbide-particle-reinforced titanium aluminide-matrix composites using TiC and gas-atomized Ti-48Al-2Cr-2Nb powders as the feedstock materials. The composites deposited by the LENS process were susceptible to solid-state cracking due to high thermal stresses. The microstructures of the laser-deposited monolithic and composite titanium aluminide materials were characterized using light optical microscopy (LOM), scanning electron microscopy (SEM), X-ray energy-dispersive spectroscopy (EDS) analysis, electron-probe microanalysis (EPMA), and X-ray diffraction (XRD) techniques. Effects of the LENS processing parameters on the cracking susceptibility and microstructure were studied. Crack-free deposits were fabricated by preheating the substrate to 450 °C to 500 °C during LENS processing. The fabricated composite deposits exhibit a hardness of more than twice the value of the Ti-6Al-4V alloy.     

Si(100)衬底上CeO2薄膜的脉冲激光制备及性能研究

用CeO2陶瓷靶材,使用脉冲激光沉积(PLD)技术在Si(100)衬底上制备了CeO2薄膜.研究了衬底温度、沉积氧压对薄膜性能的影响,实验制备出了高度(111)取向的CeO2薄膜.使用X射线衍射(XRD)、反射式高能电子衍射(RHEED)对薄膜进行晶体结构的表征.结果表明:随着衬底温度的增加,薄膜中的残余宏观应力(拉应力)及微观应力逐渐减小,薄膜结晶质量不断提高,而沉积氧压对此影响较小.RHEED图像显示使用PLD方法在Si衬底上沉积的薄膜具备较高的结晶性及原子级平整的表面.使用原子力显微镜(AFM)对样品进行表面粗糙度分析,发现不同温度下生长的薄膜均具有光滑的表面,方均根粗糙度(RMS)均在0.4 nm以下.使用Keithley 4200半导体测试仪、椭偏仪对薄膜进行电性能及光学性能分析,发现衬底温度对薄膜的电学性能有显著影响,并且CeO2薄膜结晶状态与电学性能有直接的联系.     

氧化铍金刚石膜及其导热性能

提高氧化铍的热导率,既能助其开拓新的发展空间,又能满足电子器件的散热需求,因而利用热丝化学气相沉积法在氧化铍上沉积得到与基体串、并联方式不同的、利于提高导热率的各种金刚石薄膜.通过扫描电镜和原子力显微镜观察薄膜表面的晶体形貌:采用X射线衍射仪分析薄膜成分;借助热物性激光测试仪测量金刚石膜/氧化铍基复合体的热扩散系数,并计算其热导率.结果表明:镀膜后可使氧化铍的热导率提高12.1%～34.4%;基体预处理方法、金刚石膜和氧化铍基体的串、并联方式对复合体的热导率均有较大影响.