Reflection properties of oriented thin CdS films formed by laser ablation

Oriented thin (≈2 μm) films, CdS, prepared by laser ablation were characterized by the dependence of external and internal reflection on both the angle of incidence and the polarization of laser light. The samples exhibit perpendicular and parallel orientation of the crystallographic axis with respect to the surface of the glass substrate. The experiments were performed at 300 K using low intensity (<1 W/cm²) cw emissions at 476.5, 514.5 and 632.8 nm of argon and He–Ne lasers respectively. For blue and green light, the results are very well described by the theoretical models based on Fresnel reflection. In contrast to the external features, the internal reflectance exhibits dichroism and birefringence of the samples at 514.5 nm, revealing the sensitivity of the internal reflection technique to the optical anisotropy of the films. Considering multiple-beam interference, the model of Fresnel also describes satisfactorily the results for red light. However, a rather sensitive dependence on the incoming He–Ne laser intensity was observed. In fact, by increasing the intensity of 64 mW/cm² by about one order of magnitude, only the external reflectance shows good agreement with the theory, whereas the internal reflection properties are obviously influenced by additional effects, such as non-linear change of the optical constants, which are not included in Fresnel reflection considerations.     

UV-induced permanent gratings in sol–gel germanosilicate thin films

Germanosilicate thin films have been elaborated by the sol–gel process and the dip-coating technique. Pulsed or continuous wave UV laser (244 nm) was used to write permanent gratings in these films. In the case of exposure to cw laser, the grating diffraction efficiencies were measured using a focused beam from a He–Ne laser at 633 nm and photo-induced changes in refractive index as high as 4×10⁻³ have been obtained. The thermal behaviour of these gratings has been investigated showing a good stability up to 400°C. Exposure to pulsed fringe pattern led to a glass photo-expansion modulated by a strong corrugation which can be due mainly to photo-ablation at the places of the bright fringes. The waveguide surface at the grating places was investigated through Atomic Force Microscopy (AFM) and microscopic profilometry techniques. Preliminary results on the kinetics of the grating growths are also reported.     

Spectroscopic properties of Yb in heavy metal contained fluorophosphate glasses

A new series of 20Bi(PO₃)₃–10Sr(PO₃)₂–35BaF₂–35MgF₂ doped with Yb³⁺ is introduced for fiber and waveguide laser applications. The stimulated emission cross-section σ_emi, which was found to be 1.37 pm² at the lasing wavelength of 996 nm, is the highest one among fluorophosphate glasses. It has been found that an extremely high gain coefficient of G = 1.65 ms pm⁴ and high quantum efficiency of η = 93% for 1 wt.% Yb₂O₃ doped systems. The various concentration effects on laser performance properties including minimum pumping intensity I_min, the minimum fraction of excited ions β_min and the saturation pumping intensity I_sat are analyzed as a function of Yb₂O₃ concentration. Those results obtained in current system had advantage over some fluorophosphate glasses reported.     

Enhanced ferroelectric properties of multilayer SrBi2Ta2O9/SrBi2Nb2O9 thin films for NVRAM applications

Ferroelectric SrBi₂Ta₂O₉/SrBi₂Nb₂O₉ (SBT/SBN) multilayer thin films with various stacking periodicity were deposited on Pt/TiO₂/SiO₂/Si substrate by pulsed laser deposition technique. The X-ray diffraction patterns indicated that the perovskite phase was fully formed with polycrystalline structure in all the films. The Raman spectra showed the frequency of the O–Ta–O stretching mode for multilayer and single layer SrBi₂(Ta_0.5Nb_0.5)₂O₉ (SBNT) samples was 827–829 cm⁻¹, which was in between the stretching mode frequency in SBT (813 cm⁻¹) and SBN (834 cm⁻¹) thin films. The dielectric constant was increased from 300 (SBT) to 373 at 100 kHz in the double layer SBT/SBN sample with thickness of each layer being 200 nm. The remanent polarization (2P_r) for this film was obtained 41.7 μC/cm², which is much higher, compared to pure SBT film (19.2 μC/cm²). The coercive field of this double layer film (67 kV/cm) was found to be lower than SBN film (98 kV/cm).     

Transparent conductive In2O3:Mo thin films prepared by reactive direct current magnetron sputtering at room temperature

An amorphous transparent conductive oxide thin film of molybdenum-doped indium oxide (IMO) was prepared by reactive direct current magnetron sputtering at room temperature. The films formed on glass microscope slides show good electrical and optical properties: the low resistivity of 5.9 × 10^− 4 Ω cm, the carrier concentration of 5.2 × 10²⁰ cm^− 3, the carrier mobility of 20.2 cm² V^− 1 s^− 1, and an average visible transmittance of about 90.1%. The investigation reveals that oxygen content influences greatly the carrier concentration and then the photoelectrical properties of the films. Atomic force microscope evaluation shows that the IMO film with uniform particle size and smooth surface in terms of root mean square of 0.8 nm was obtained.     

Preparation and characterization of chemically deposited PbSnS3 thin films

High-quality and well-reproducible PbSnS₃ thin films have been prepared by a simple and inexpensive chemical-bath deposition method from an aqueous medium, using thioacetamide as a sulphide ion source. X-ray diffraction analysis of the deposited films revealed that the as-deposited films were amorphous, however, an amorphous-to-crystalline phase transition was observed as the result of thermal annealing at 425 K for 1 h. The X-ray structure analysis of the collected powder from the bath annealed at 425 K for 1.5 h revealed an orthorhombic phase.

Analysis of the optical absorption data of crystalline PbSnS₃ films revealed that both direct and indirect optical transitions exist in the photon energy range 1.24–2.48 eV with optical band gaps of 1.68 and 1.42 eV, respectively. However, a forbidden direct optical transition with a band gap value of 1.038 eV dominates at low energy (<1.24 eV). The refractive index changes from 3.38 to 2.16 in the range 500–1300 nm. The high frequency dielectric constant and the carrier concentration to the effective mass ratio calculated from the refractive index analysis were found to be 4.79 and 2.3×10²⁰ cm⁻³, respectively. The temperature dependence of the electrical resistivity of the deposited films follows the semiconductor behaviour with extrinsic and intrinsic conduction. The determined activation energies range are 0.35–0.42 and 0.76–85 eV, respectively.     

Effect of sputtering power on the physical properties of dc magnetron sputtered copper oxide thin films

Cuprous oxide films were deposited on glass substrates using dc magnetron sputtering technique by sputtering of pure copper target in a mixture of argon and oxygen atmosphere under various sputtering powers in the range 0.38–1.50 W cm⁻². The influence of sputtering power on the structural, electrical and optical properties was systematically studied. The films were polycrystalline in nature with cubic structure. The films formed at sputtering powers ≤0.76 W cm⁻² exhibited mixed phase of Cu₂O and CuO while those formed at 1.08 W cm⁻² were single phase Cu₂O. The single-phase Cu₂O films formed at a sputtering power of 1.08 W cm⁻² showed electrical resistivity of 46 Ω cm, Hall mobility of 5.7 cm² V⁻¹ s⁻¹ and optical band gap of 2.04 eV.     

Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films

Atomic layer growth of hafnium dioxide from HfCl₄ and H₂O has been studied at substrate temperatures ranging from 180–600°C. A quartz crystal microbalance was used for the real-time investigation of deposition kinetics and processes affecting the growth rate. It was shown that the layer-by-layer growth was self-limited at temperatures above 180°C. The data of ex situ measurements revealed that the structure, density and optical properties of the films depended on the growth temperature. The absorption coefficient of amorphous films grown at 225°C was below 40 mm⁻¹ in the spectral range of 260–850 nm. The refractive index of the films grown at 225°C was 2.2 and 2.0 at 260 and 580 nm, respectively. The polycrystalline films with monoclinic structure grown at 500°C had about 5% higher refractive index but more than an order of magnitude higher optical losses caused by light absorption and/or scattering.     

Optical properties of rare earth ion (Nd, Er and Tb)-doped alumina films prepared by the sol–gel method

Rare earth ion (Nd³⁺, Er³⁺ and Tb³⁺)-doped alumina films were prepared by the sol–gel method using aqueous alumina sol. The effects of dopant concentration and treatment temperature on the optical properties, absorption and emission were examined for the doped films. Alumina films prepared by this method gave a high dopant concentration (0–15 mol% per alumina). Significant concentration quenching did not occur in this concentration range. The emissions from ⁵D₃ and ⁵D₄ of Tb³⁺-doped film reflected sensitively a matrix environment around Tb³⁺ ions. Er³⁺- and Nd³⁺-doped alumina films resonantly excited by cw Ti–sapphire laser (800 nm) showed upconversion emission at room temperature. The former gave 548 nm (⁴S_3/2→⁴I_15/2) and 640 nm (⁴F_9/2→⁴I_11/2) signals, and the latter 640 nm (⁴G_7/2→⁴I_11/2), which were dependent on alumina.     

Structure-composition-property dependence in reactive magnetron sputtered ZnO thin films

Thin films of zinc oxide (ZnO) were prepared by dc reactive magnetron sputtering on glass substrates at various oxygen partial pressures in the range 1×10⁻⁴–6×10⁻³ mbar and substrate temperatures in the range 548–723 K. The variation of cathode potential of zinc target on the oxygen partial pressure was explained in terms of target poisoning effects. The stoichiometry of the films has improved with the increase in the oxygen partial pressure. The films were polycrystalline with wurtzite structure. The films formed at higher substrate temperatures were (0 0 2) oriented. The temperature dependence of Hall mobility of the films formed at various substrate temperatures indicated that the grain boundary scattering of charge carriers was predominant electrical conduction mechanism in these films. The optical band gap of the films increased with the increase of substrate temperature. The ZnO films formed under optimized oxygen partial pressure of 1×10⁻³ mbar and substrate temperature of 663 K exhibited low electrical resistivity of 6.9×10⁻² Ω cm, high visible optical transmittance of 83%, optical band gap of 3.28 eV and a figure of merit of 78 Ω⁻¹ cm⁻¹.     

SiC nanocrystals embedded in oligoetheracrylate photopolymer matrices; new promising nonlinear optical materials

Photoinduced optical phenomena in SiC nanocrystallites embedded within the photo-polymer oligoetheracrylate matrices have been studied using experimental nonlinear optics, particularly photoinduced optical second harmonic generation (SHG). The YAG-Nd-laser (λ=1.06 μm; W=30 MW; pulse duration within the 30–50 ps) was used as a source of pumping light and the nitrogen laser (λ=337 nm) has been applied as a source of the photoinducing light. With increasing intensity of the photoinducing beam, the SHG (λ=0.53 μm) signal increased and achieved a maximum (χ₂₂₂=10.1 ± 0.13 pm/V) at a photon flux of about 1.61 GW/cm². With decreasing temperature, the SHG signal strongly increases within the temperature range 25–30 K. Time-dependent probe–pump measurements indicate an existence of the SHG maximum for a pump–probe time delay of about 20 ps. The SiC hexagonal structural components play a key role in the observed photoinduced nonlinear optical effects. Large values of the nonlinear optical constants as well the good technological parameters open a possibility to enhance the nonlinear optical susceptibilities.     

Preparation and optical properties of sol–gel derived Er-doped Al2O3–Ta2O5 films

Thin films of the system xAl₂O₃–(100 − x)Ta₂O₅–1Er₂O₃ were prepared by a sol–gel method and a dip-coating technique. The influences of the composition and the crystallization of the films on Er³⁺ optical properties were investigated. Results of X-ray diffraction indicated that the crystallization temperature of Ta₂O₅ increased from 800 to 1000 °C with increased values of x. In crystallized films, the intensities of the visible fluorescence and upconversion fluorescence tend to decrease with an increase in x values, due to the high phonon energy of Al₂O₃; the strongest fluorescence is observed in a crystallized film for x = 4 heat treated at 1000 °C. In amorphous films obtained by heat treatment at relatively low temperatures the Er³⁺ fluorescence could not be observed because strong fluorescence from organic residues remaining in the films thoroughly covered the Er³⁺ fluorescence. On the other hand, the Er³⁺ upconversion fluorescence in the amorphous films was observed to be stronger than that in the crystallized films. The strongest upconversion fluorescence is observed in an amorphous film for x = 75 heat treated at 800 °C.     

The optical and electrical properties of copper indium di-selenide thin films

Thin films of copper indium di-selenide (CIS) with a wide range of compositions near stoichiometry have been formed on glass substrates in vacuum by the stacked elemental layer (SEL) deposition technique. The compositional and optical properties of the films have been measured by proton-induced X-ray emission (PIXE) and spectrophotometry (photon wavelength range of 300–2500 nm), respectively. Electrical conductivity (σ), charge-carrier concentration (n), and Hall mobility (μ_H) were measured at temperatures ranging from 143 to 400 K. It was found that more indium-rich films have higher energy gaps than less indium-rich ones while more Cu-rich films have lower energy gaps than less Cu-rich films. The sub-bandgap absorption of photons is minimum in the samples having Cu/In ≈ 1 and it again decreases, as Cu/In ratio becomes less than 0.60. Indium-rich films show n-type conductivities while near-stoichiometric and copper-rich films have p-type conductivities. At 300 K σ, n and μ_H of the films vary from 2.15 × 10⁻³ to 1.60 × 10⁻¹ (Ω cm)⁻¹, 2.28 × 10¹⁵ to 5.74 × 10¹⁷ cm⁻³ and 1.74 to 5.88 cm² (V s)⁻¹, respectively, and are dependent on the composition of the films. All the films were found to be non-degenerate. The ionization energies for acceptors and donors vary between 12 and 24, and 3 and 8 meV, respectively, and they are correlated well with the Cu/In ratios. The crystallites of the films were found to be partially depleted in charge carriers.     

Boron phosphide films prepared by co-evaporation technique: Synthesis and characterization

We report the physical and electronic properties of BP films of 1:1, 1:1.15 and 1.25:1 stoichiometry prepared by co-evaporating B and P onto glass and Si (100) substrates. Compositional information was obtained from X-ray photoelectron spectroscopy measurements. Optical studies indicated allowed indirect transition at  2.08 eV. The room temperature photoluminescence peak at  2.01 eV was due to band gap transitions which shifted to higher energy value when recorded at lower temperature. Fourier transformed infrared (FTIR) spectra were dominated by the characteristic peak of the B–P located at  810 cm^− 1 which could be identified as arising due to transverse optical vibration mode (k  0) while the shoulder at  850 cm^− 1 may be due to longitudinal optical (k  0) vibration mode. Other characteristic peaks for B–O, P–O and B–H vibration modes were also present in the FTIR spectra. Characteristic Raman peaks for BP located at  415 cm^− 1 and 806 cm^− 1 were observed in these films.     

Structural, electrical, and optical studies on rapid thermally processed ferroelectric BaTiO3 thin films prepared by metallo-organic solution deposition technique

Polycrystalline BaTiO₃ thin films having the perovskite structure were successfully produced on platinum coated silicon, bare silicon, and fused quartz substrate by the combination of the metallo-organic solution deposition technique and post-deposition rapid thermal annealing treatment. The films exhibited good structural, electrical, and optical properties. The electrical measurements were conducted on metal-ferroelectric-metal (MFM) and metal-ferroelectric-semiconductor (MFS) capacitors. The typical measured small signal dielectric constant and dissipation factor at a frequency of 100 kHz were 255 and 0.025, respectively, and the remanent polarization and coercive field were 2.2 μC cm⁻² and 25 kV cm⁻¹, respectively. The resistivity was found to be in the range 10¹⁰–10¹² Ω·cm, up to an applied electric field of 100 kV cm⁻¹, for films annealed in the temperature range 550–700 °C. The films deposited on bare silicon substrates exhibited good film/substrate interface characteristics. The films deposited on fused quartz were highly transparent. An optical band gap of 3.5 eV and a refractive index of 2.05 (measured at 550 nm) was obtained for polycrystalline BaTiO₃ thin film on fused quartz substrate. The optical dispersion behavior of BaTiO₃ thin films was found to fit the Sellmeir dispersion formula well.     

Low threshold, diode end-pumped Nd:GdVO4 self-Raman laser

Low threshold, high efficient Raman laser output has been realized from a compact, diode end-pumped, self-stimulating Nd³⁺:GdVO₄ Raman laser. Maximum Raman output power of 100 mW was achieved at a pulse repetition frequency (PRF) of 10 kHz with 1.8 W pump power. The optical efficiency is 5.6% from diode to Raman laser and the slope efficiency is 8%. The lowest threshold for the SRS process is only 400 mW at a PRF of 5 kHz. By generating second harmonics using a LBO crystal, 3 mW 588 nm yellow laser was also produced. A strong blue emission was observed in the Nd³⁺:GdVO₄ crystal when the Raman laser output, we contribute this for the upconversion of the Nd³⁺ in the crystal.     

Studies on photoelectrochemical (PEC) cells: A correlation between electrochemical and material properties

CdS_0.9Te_0.1 thin films of various thicknesses (680–2740 nm) were deposited onto the clean glass and stainless steel substrates using a chemical deposition technique. The as-grown films exhibited photoactivity in an aqueous 0.5 M NaOH+0.5 M Na₂S+0.5 M S (pH=12.6) electrolyte. An interface between n-CdS_0.9Te_0.1 semiconductor photoelectrode and an electrolyte redox couple was formed and investigated through the capacitance–voltage, current–voltage and photovoltaic characteristics. The results on the capacitance–voltage and current–voltage measurements in dark are compared with the photovoltage measurements. The measurement on the characteristic photovoltaic properties showed a significant enhancement in the cell performance at a thickness of 2740 nm (0.658% efficiency).     

Analysis of VUV and optical spectra of Cs2NaYF6 crystals doped with Tm

This study presents a detailed interpretation and analysis of the reported interconfigurational spectra of Tm³⁺ in Cs₂NaYF₆ [V.N. Makhov, N.M. Khaidukov, D. Lo, J.C. Krupa, M. Kirm, E. Negodin, Opt. Mater. 27 (2005) 1131]. Since only spin-forbidden d–f emission bands are observed for Tm³⁺ in this host, it is unsuitable for use as a scintillator because the emission lifetime is too long. The d–f emission spectrum is well-explained by calculation and most of the intensity is located in one band: 4f¹¹5d¹ (high-spin) → 4f^{12 3}H₆. Measurements from the bands in the d–f excitation spectrum do not provide the accurate separation energy of the high and low-spin states. Strict O_h point group selection rules are operative for the optical spectra. The electronic states of the 4f¹¹5d¹ configuration (briefly, d-electron states, hereafter) are calculated to span from 58,318 cm⁻¹ to 86,900 cm⁻¹. At least five structured bands are observed in the excitation spectrum and their intensities are fairly well simulated by calculation. The 4f¹² → 4f¹³ (np₆)⁻¹ charge transfer band is assigned between 140 and 120 nm (83,000–71,000 cm⁻¹) and excitation into this band leads to f–f emission, bypassing the d-electron states.     

Optically active Er–Yb codoped Y2O3 films produced by pulsed laser deposition

Optically active Er³⁺:Yb³⁺ codoped Y₂O₃ films have been produced on c-cut sapphire substrates by pulsed laser deposition from ceramic Er:Yb:Y₂O₃ targets having different rare-earth concentrations. Stoichiometic films with very high rare-earth concentrations (up to 5.5 × 10²¹ at cm^− 3) have been achieved by using a low oxygen pressure (1 Pa) during deposition whereas higher pressures lead to films having excess of oxygen. The crystalline structure of such stoichiometric films was found to worsen the thicker the films are. Their luminescence at 1.53 μm and up-conversion effects have been studied by pumping the Yb³⁺ at 0.974 μm. The highest lifetime value (up to 4.6 ms) is achieved in films having Er concentrations of ≈ 3.5 × 10²⁰ at cm^− 3 and total rare-earth concentration ≈ 1.8 × 10²¹ at cm^− 3. All the stoichiometric films irrespective of their rare-earth concentration or crystalline quality have shown no significant up-conversion.     

Alkoxide route to La0.5Sr0.5CoO3 epitaxial thin films on SrTiO3

An all alkoxide based sol–gel route was investigated for preparation of epitaxial La_0.5Sr_0.5CoO₃ (LSCO) films on 100 SrTiO₃ (STO) substrates. Films with 20–30 to 80–100 nm thickness were prepared by spin-coating 0.2–0.6 M (metal) solutions on the STO substrates and heat treatment to 800 °C at 2 °C min^− 1, 30 min, in air. The films were epitaxial with a cube-on-cube alignment and the LSCO cell was strained to match the STO substrate of 3.905 Å closely; a and b = 3.894 Å and 3.897 Å for the 20–30 and 80–100 nm films, respectively. The c-axis was compressed to 3.789 Å and 3.782 Å for the 20–30 and 80–100 nm films, respectively, which resulted in an almost unchanged cell volume as compared to polycrystalline film and nano-phase powders prepared in the same way. The SEM study showed mainly very smooth, featureless surfaces, but also some defects. A film prepared in the same way on an -Al₂O₃ substrate was dense and polycrystalline with crystallite sizes in the range 10–50 nm and gave cubic cell dimensions of a_c = 3.825 Å. The conductivity of the ca 30–40 nm thick polycrystalline film was 1.7 mΩcm, while the epitaxial 80–100 nm film had a conductivity of around 1.9 mΩcm.