Si-Ni-Fe alloys for magnetron sputtering targets

The effect of the cooling rate on the microstructure, micromechanical properties, and thermal residual stresses of magnetron sputtering targets made of cast resistance alloys Si-10% Ni-4% Fe and Si-15% Ni-6% Fe is studied. The optimum cooling rates of castings that provide a homogeneous fine-grained structure, high strength characteristics, and the minimum level of residual stresses in the targets are found.     

Wear-resistant Ti-Al-Si-C-N coatings produced by magnetron sputtering of SHS targets

The results of an investigation into hard wear-resistant nanostructured coatings in the Ti-Al-Si-C-N system produced by the magnetron sputtering of multicomponent composite targets with various ratios of metallic and nonmetallic elements are presented. Coatings are deposited in the reaction gas mixture with constant values of the substrate temperature and bias voltage. The structure of coatings is investigated using X-ray diffraction, glow-discharge optical emission spectroscopy, scanning and transmission electron microscopy. The mechanical and tribological properties are determined using the nanoindentation and scratch-testing methods, as well as using tribological tests according to the “pin-on-disc” scheme. The results of investigations show that the coatings are based on the fcc phase consisted of titanium carbonitride with an average crystallite size of 2–20 nm; the crystallites are arranged in an amorphous matrix. The coatings of optimal composition possess hardness of 40–50 GPa, a stable friction coefficient of <0.55, an adhesion strength of ≥50 N, and a wear rate of <1 × 10^?5 mm³/(N m).     

Crystallization of an amorphous Cu60Ti40 alloy prepared by planar magnetron sputtering

The crystallization path of an amorphous Cu₆₀Ti₄₀, alloy was studied using differential scanning calorimetry (DSQ), X-ray diffraction (XRD) and transmission electron microscopy (TEM). The samples were Cu-Ti films≈ 10 μm in thickness prepared by magnetron sputter deposition onto rotating glass substrates. Two exothermic peaks were observed at 418° and 433°C, respectively, with no evidence of a glass transition. Observations from TEM and XRD at various stages of isochronal crystallization indicate that the initial amorphous structure transforms first to a metastable microcrystalline b.c.c. structure prior to formation of the ordered equilibrium Cu₃Ti₂ crystalline phase. The intermediate metastable structure is initially favored since it requires only topological ordering of the atoms into a simple unit cell, without significant diffusion, whereas the final ordered structure requires atom rearrangement over longer distances. The contrast of this sequence of events to that of a similar Cu-Zr alloy is discussed. Analysis of the fully crystallized alloy by convergent beam diffraction is consistent with a P4/nmm space group for the equilibrium phase.     

Magnetron sputtering targets made of a resistance alloy

The effect of the cooling rate on the microstructure and residual stresses of targets made of an Si-37% Cr-10% Ni resistance alloy has been studied. It is found that, at cooling rates below 30 K/s, the residual stresses in the targets made of this alloy are minimal. High-quality targets are shown to be produced from the Si-37% Cr-10% Ni resistance alloy by casting in air.     

磁控溅射法制备W_(1-x)Al_xN薄膜的微结构与性能

采用磁控溅射仪制备一系列不同Al含量的W1-xAlxN薄膜,系统研究该复合膜的微结构、力学性能、高温抗氧化性能及摩擦磨损性能。结果表明,W1-xAlxN薄膜为面心立方结构,呈(200)择优生长。当Al含量(原子分数,下同)为32.4%时,复合膜中形成h-AlN相,且随Al含量增加,h-AlN含量增多。随Al含量增加,薄膜硬度先升高后降低,Al含量为32.4%时薄膜硬度最大,约为37GPa。随Al含量增加,复合膜在室温下的摩擦因数和磨损率均先减小后增大,Al含量为32.4%时达到最小值,分别为0.3和0.9×10-8mm3/(N·mm)。复合膜摩擦因数随温度升高先增大后减小,而磨损率随温度升高逐渐增大,800℃下W0.676Al0.324N薄膜的摩擦因数和磨损率分别为0.32和8.2×10-8mm3/(N·mm)。与W2N薄膜相比,W1-xAlxN薄膜的高温抗氧化性能和摩擦磨损性能显著提高。     

Sputtering targets made of an Si-Ti-Co alloy

The effect of the cooling rate on the microstructure and the micromechanical properties of a resistance air-cast Si-23% Ti-10% Co alloy and on the residual stresses in magnetron sputtering targets made of it is studied. The choice of a proper temperature schedule of melting the alloy and the optimum cooling rate of the alloy melt are shown to result in a homogeneous fine-grained structure of the alloy, high strength characteristics of the targets, and a low level of residual thermal stresses in them.     

Effect of the cooling rate on the properties of a Si-10% Al alloy for magnetron sputterint targets

The effect of the cooling rate on the micromechanical properties and residual thermal stresses in Si-10% Al alloy targets has been studied. To reach the required quality, these targets should be cooled at rates of 10–40 K/s. In this case, the alloy has high strength properties, the level of residual stresses in a target is minimal, and the stress distribution is most uniform.     

磁控溅射制备YBCO超导薄膜的AFM研究

采用中空柱阴极直流磁控溅射装置制备YBCO超导薄膜,应用原子力显微镜（AFM）研究了在最佳工艺条件下沉积在LaAlO3和Zr(Y)O2上的具有c轴取向的YBCO超导薄膜及其相应衬底的表面形貌,生长的YBCO膜都具有较好的表面结构,在LaAlO3单晶衬底上的YBCO膜形成大颗粒岛状结构,颗粒生长整齐,尺寸大小均匀;生长在单晶Zr(Y)O2上的YBCO膜则形成起伏较大的层状与岛状生长的混合结构,这些差别的产生与衬底的初始状况及制备过程中膜与衬底的界面作用有关。分析了形成超导薄膜不同表面形貌的原因,从生长机理角度讨论了表面形貌与缺陷和位错的形成机制。     

Development of a hybrid process of obtaining wear-resistant coatings based on ion-plasma arc sputtering and magnetron sputtering

This work is devoted to the development of a new hybrid method of deposition of coatings based on ion-plasma arc sputtering and magnetron sputtering. The objects of investigation were samples of coatings of the Ti-Al-N system on the VK-6 hard-alloy plates obtained by three different methods, namely, ion-plasma sputtering, magnetron sputtering, and hybrid sputtering. Deposition processes were performed under the rarefaction of 1.3 × 10^?3 Pa at a substrate temperature of 550–600°C. A VT-5 alloy of the composition Ti-Al (6 at %) was used as the sputtered material. The phase and elemental compositions of the coatings, their mechanical properties (microhardness and the Young modulus), and adhesion strength were studied. All samples were tested under the conditions of continuous cutting. The results of investigations showed that the coating obtained by the hybrid method possesses a complex of positive properties of the ion-plasma and magnetron coatings, specifically, a high adhesion strength along with the uniformity of the composition and structure, which explains its increased durability.     

镁合金表面磁控溅射沉积铝膜的力学性能

采用直流磁控溅射法在镁合金上沉积铝膜,在高真空下对铝膜进行加热后处理.用X射线衍射仪(XRD)分析膜层为纯铝多晶态,扫描电子显微镜(SEM)观察铝膜晶粒细小.采用纳米压痕/划痕仪对铝膜的厚度、临界附着力、硬度和弹性模量进行了测试,并且用辉光放电光谱仪(GDS)测试了镁合金表面铝膜的成分和性能随薄膜深度的分布.结果表明,铝膜的厚度随后处理温度的升高而降低,其表面硬度和弹性模量高于镁合金基体并且随深度增加而逐渐降低.铝膜与镁合金基体间存在一个过渡层,结合良好且表现出一定的弹塑性能,有利于镁合金表面的防护.     

沉积压力对磁控溅射Mg薄膜结构的影响

采用直流磁控溅射方法在氧化锆固体电解质表面制备了Mg金属薄膜,利用XRD和SEM研究了沉积压力(0.9～2.1Pa)对薄膜形貌和结构的影响.结果表明:随着沉积压力的提高,薄膜结晶程度逐渐变差,晶粒尺寸减小,表面粗糙度增大;薄膜呈(002)择优生长的柱状晶结构,且随着沉积压力的提高薄膜厚度先增加后减小.     

Sputtering Si-Co alloy targets

The effect of the cooling rate on the microstructure, micromechanical characteristics, and residual thermal stresses of targets from a Si-30% Co alloy is studied. The required quality of the targets from this alloy can be obtained at a cooling rate in the range 5–50°C/s. The alloy structure is homogeneous and fine-grained and is characterized by high strength properties. The level of residual stresses in the target is minimal, and their distribution is uniform.     

离子源辅助中频磁控溅射法在活塞环表面沉积CrN涂层

用热丝弧光放电离子源辅助的中频磁控溅射装置在单晶硅和渗氮钢质活塞环上沉积CrN涂层,并用X射线衍射、原子力显微镜和电子显微镜测量涂层的微结构,用显微硬度计和球盘式摩擦磨损仪测量涂层的硬度和摩擦性能。与常规的中频磁控溅射法相比,采用离子源辅助磁控溅射法制备CrN涂层的沉积速率提高30%以上,达到4.0μm/h。在靶基距为90 mm,氮气分压比为0.14的优化条件下,沉积在活塞环上的CrN涂层结构为CrN(200)取向,涂层厚度达到25μm,硬度高达17.85 GPa,平均摩擦因数为0.48。     

Analysis of the composition of Sr -Bi-Ca-Cu-Pb-O films obtained by magnetron sputtering

The composition of thin films of superconducting Sr-Bi-Ca-Cu-Pb ceramic, deposited by magnetron sputtering from targets prepared from oxide powders of the corresponding elements, was investigated. It was found that the film composition differs from that of the target. Microprobe analysis of target and films can be used to determine the correct target composition for the deposition of a superconducting film.Materials Science Institute, Ukrainian Academy of Sciences, Kiev. Translated from Poroshkovaya Metallurgiya, Nos. 5–6, pp. 27–30, May–June, 1996. Original article submitted May 25, 1994.     

Anti-corrosion performance of Si-surface-alloying NdFeB magnets obtained with magnetron sputtering and thermal diffusion

Si alloying in the surface layer of NdFeB magnets was realized by thermal diffusion combined with magnetron sputtering. The surface composition, phase structure and morphology of NdFeB(S–Si) specimens were characterized by an X-ray diffractometer, an X-ray photoelectron spectrometer and a field emission scanning electron microscope, respectively. The corrosion resistance of bare NdFeB(S–Si) was analyzed by static full immersion corrosion test and electrochemical experiments. Effects of sputtering and thermal diffusion on the microstructure and corrosion resistance of the surface layer were studied. Results show that surface alloying layer can effectively improve the corrosion resistance of bare NdFeB with the optimized static total immersion corrosion test time in NdFeB(1S–Si)-800 of 36 h, which is much longer than that of the pristine NdFeB (less than 0.5 h). The E_corr of NdFeB(1S–Si)-800 positively shifts from −1.05 to −0.92 V, indicating that the corrosion tendency is obviously lower. The J_corr is 1.45 × 10⁻⁶ A/cm² which is 2 orders of magnitude lower than that of the pristine NdFeB (5.25× 10⁻⁴ A/cm²). The intergranular composite oxides existing in Nd-rich phase contribute to the enhancement of corrosion resistance of Si-surface-alloying NdFeB.     

Microstructure and yield phenomenon of an extruded Mg-Y-Cu alloy with LPSO phase

A yield phenomenon was firstly reported in an extruded Mg-6.8Y-2.5Cu alloy and the corresponding microstructure was also investigated in this work,The cast alloy is mainly composed of α-Mg,18R long period stacking order(LPSO) phase,eutectic phase(Mg₂₀Cu₄Y₁),and Mg₂Cu phase.The 18R LPSO phase at the dendritic grain boundary transforms into the 14H LPSO phase in the grain interior during homogenization.After extrusion,the grain size of the homogenized al...     

冷却速度对Al-Si-Cu溅射靶材凝固组织的影响

采用宏观腐蚀、X射线衍射分析和扫描电镜观察,研究在不同冷却速度下凝固的Al-1%Si-0.5%Cu(质量分数,下同)合金的宏观和微观组织.实验结果表明,冷却速度对Al-Si-Cu合金的凝固组织有显著影响.随着冷却速度增大,Al-Si-Cu合金凝固组织的晶粒形状和尺寸以及第二相的大小、形貌和分布都发生明显的变化:炉冷试样晶粒为粗大树枝晶状,第二相呈带状富集在晶界处,宽度达15 μm;铁模和铜模铸造试样具有典型铸锭组织,大部分第二相呈不到3 μm宽的线状富集在晶界处,但铜模铸造试样的柱状晶区较窄,且晶粒较细小;水冷铜模铸造试样几乎完全为细小的等轴晶,晶粒尺寸小而均匀,第二相呈直径约3 μm的细小点状弥散分布在α-Al基体中,可得到成分和结构都较均匀的靶材.