Wet Oxidation of AlxGa1－xAs/GaAs Distributed Bragg Reflectors

The wet oxidation of AlGaAs with high Al content in a distributed Bragg reflectors (DBR) is studied by scanning electron microscopy (SEM) and transmission electron microscopy (TEM).Some voids distribute along the oxide/GaAs interfaces due to the stress induced by the wet oxidation of the AlGaAs layers.These voids decrease the shrinkage of the Al2O3 layers to 8% instead of the theoretical 20% when compared to the unoxidized AlGaAs layers.With the extension of oxidation time,the reactants are more completely transported to the front interface and the products are more completely transported out along the porous interfaces.As a result,the oxide quality is better.     

Selective etching characteristics of HF for AlxGa1-xAs/GaAs

The first detailed report of the selective etching characteristics of an AlxGa1-xAs/GaAs DH wafer (x?0.4) in an HF system is given. Selective etching at a cleaved facet and a calculation of the energy of activation are included.     

AlxGa1-xAs/GaAs分布布拉格反射镜的湿法氧化

对垂直腔面发射激光器(VCSEL)的AlxGa1-xAs/GaAs分布布拉格反射镜(DBR)进行了高温湿法氧化.由于AlxGa1-xAs层的氧化产生了应力而导致Al2O3/GaAs界面处出现了孔洞.这些孔洞反过来又缓解了应力而使氧化层的厚度只收缩了8%而不是理论上的20%.并且,随着氧化时间的延长,湿法氧化反应中的反应物和产物沿着多孔界面在氧化物中的传输越充分,从而使AlGaAs层的氧化进行的越完全,氧化质量就越好.     

AlxGa1-xAs/GaAs异质结中电子迁移率的压力效应

对AlxGa1-xAs/GaAs半导体单异质结系统,引入有限高势垒与考虑导带弯曲的真实势,同时计入电子对异质结势垒的隧穿,利用变分法和记忆函数方法讨论在界面光学声子和体纵光学声子的散射下,异质结界面附近电子迁移率随温度的变化关系及其压力效应.结果显示:电子迁移率随温度、压力的增加而减小;且两种声子的散射作用均随压力增强,界面光学声子的变化幅度更大.因此,在讨论压力的情形下,界面光学声子的作用不容忽略.     

AlxGa1-xAs/GaAs异质结中电子迁移率的压力效应

对AlxGa1-xAs/GaAs半导体单异质结系统,引入有限高势垒与考虑导带弯曲的真实势,同时计入电子对异质结势垒的隧穿,利用变分法和记忆函数方法讨论在界面光学声子和体纵光学声子的散射下,异质结界面附近电子迁移率随温度的变化关系及其压力效应.结果显示:电子迁移率随温度、压力的增加而减小;且两种声子的散射作用均随压力增强,界面光学声子的变化幅度更大.因此,在讨论压力的情形下,界面光学声子的作用不容忽略.     

Al_xGa_(1-x)As/GaAs调制掺杂结构的MBE优化工艺生长

通过对MBE工艺中影响GaAs和AlGaAs材料质量的生长关键工艺实验研究,优化了MBE生长AlxGa1-xAs/GaAs调制掺杂结构工艺。用GEN-ⅡMBE设备生长AlxGa1-xAs/GaAs调制掺杂结构材料,得到了高质量的AlxGa1-xAs/GaAs调制掺杂结构材料。用范德堡法研究材料特性,得到材料参数的典型值:二维电子气浓度在室温时为5.6×1011cm-2,电子迁移率为6000cm2/V·s;在77K低温时浓度达3.5×1011cm-2,电子迁移率为1.43×105cm2/V·s。用C-V法测量其浓度分布表明,分布曲线较陡。典型的器件应用结果为:单管室温直流跨导达280mS/mm,在12GHz时均有8dB以上的增益。     

Investigation on resonant tunneling in GaAs/AlxGa1-xAs DBD using tunneling spectroscopy

 Experimental investigation on resonant tunneling in various GaAs/Al_xGa_(1-x)As double barrier single well structures has been performed by using tunneling spectroscopy at different temperatures.The results show that in addition to resonant tunneling via GaAs well state confined by Al_xGa_(1-x)As Γ-point barrier there exists resonant tunneling via GaAs well state confined by Al_xGa_(1-x)As X-point barrier for both indirect(x>0.4)and direct(x<0.4)cases.     

磁场对GaAs/AlxGa1-xAs异质结系统中束缚极化子的影响

对GaAs/AlxGa1-xAs单异质结系统引入三角势近似异质结势,同时考虑体纵光学(LO)声子和有效近似下两支界面光学(IO)声子的影响,采用变分法讨论了外界恒定磁场对束缚于近界面杂质的光学极化子结合能的影响.利用改进的Lee-Low-Pines(LLP)中间耦合方法处理电子-声子和杂质-声子的相互作用,计算了杂质态结合能随杂质位置、磁场强度、电子面密度的变化关系.结果表明,极化子结合能随磁场呈现增加的趋势,其中LO声子对结合能的负贡献受磁场影响显著,而IO声子的负贡献受磁场的影响并不明显,但当杂质靠近界面时,杂质-IO声子相互作用对磁场的影响很敏感.结果还表明,导带弯曲作用不容忽略;电子像势对结合能的影响很小,可以忽略.     

势垒高度对GaAs/AlxGa1-xAs QWIP光谱特性的影响

为了确定束缚态到准束缚态工作模式QWIP响应波长与势垒高度关系,采用金属有机物化学气相沉积法生长制备势垒高度不同GaAs/AlxGa1-xAs QWIP样品,采用傅里叶光谱仪对样品进行77 K液氮温度光谱测试。结果显示1#,2#样品峰值响应波长与据薛定谔方程得到峰值波长误差为15.6%,4.6%。结果表明:引起量子阱中子带间距离逐渐扩大与峰值响应波长蓝移的根本原因是势垒高度的增加。高分辨透射扫描电镜实验结果表明量子阱材料生长过程精度控制不够及AlGaAs与GaAs晶格不匹配是造成1#样品误差较大的主要原因。说明调节势垒高度可实现QWIP峰值波长微调的目的。     

磁场对GaAs/Al_xGa_(1-x)As异质结系统中束缚极化子的影响

对GaAs/AlxGa1-xAs单异质结系统引入三角势近似异质结势,同时考虑体纵光学(LO)声子和有效近似下两支界面光学(IO)声子的影响,采用变分法讨论了外界恒定磁场对束缚于近界面杂质的光学极化子结合能的影响.利用改进的Lee-Low-Pines(LLP)中间耦合方法处理电子-声子和杂质-声子的相互作用,计算了杂质态结合能随杂质位置、磁场强度、电子面密度的变化关系.结果表明,极化子结合能随磁场呈现增加的趋势,其中LO声子对结合能的负贡献受磁场影响显著,而IO声子的负贡献受磁场的影响并不明显,但当杂质靠近界面时,杂质-IO声子相互作用对磁场的影响很敏感.结果还表明,     

DX centers in AlxGa1-xAs bulk alloy,AlAs/GaAs ordered,and disordered superlattices

Properties of theDX centers in Al_0.5Ga_0.5As bulk alloy (b-AL), (AlAs)₂ (GaSa)₂ ordered superlattice (o-SL) and (AlAs) _m (GaAs) _n disordered superlattice (d-SL) (m = 1, 2, 3,n = 1, 2, 3) with the same macroscopic composition were measured and compared. By deconvolution of deep level transient spectroscopy (DLTS) spectrum due to theDX center, we have found a decrease in the number of separate peaks in DLTS spectrum in an intentionally atomic ordered arrangement. Visiting Scholar of the Japan Society for the Promotion of Science. On leave from Department of Electrical Engineering, San Jose State University, San Jose, California 95192-0084, USA.     

Submilliampere lasing of Zn-diffused mesa buried-hetero AlxGa1-xAs/GaAs multi-quantum-well lasers at 77 K

Extremely low-threshold semiconductor lasers were fabricated by forming Zn-diffused mesa buried-hetero (DMB) structures from low-pressure MOCVD-grown AlxGa1-xAs/GaAs multi-quantum-well, separate-confinement heterostructure wafers. CW threshold currents as low as 880 ?A at 77 K and 2.4 mA at room temperature were obtained for a 100 ?m-long device.     

Bistability of theDX center in GaAs and AlxGa1-xAs,and experimental tests for negativeU of theDX level

We summarize a large body of experimental and theoretical work, especially in Si-doped GaAs and Al _x Ga_1-x As, regarding the bistability of theDX center. There is good evidence that theDX center is just the simple donor, and that each donor can exist in either of two distinct lattice configurations, each with its own spectrum of bound electronic states. Generally, the substitutional configuration binds electrons in shallow hydrogenic states, but many observations also indicate a deep (highly localized) state ofA ₁ symmetry. These states are to be distinguished from bound states of a lattice-distorted configuration, the lowest-lying of which is the deepDX level. The occupation of theDX level in thermal equilibrium with the states of the conduction band can be reasonably well modeled by assuming thatDX is either a one-electron or a two-electron state, and we discuss the reasons for this ambiguity. However, we then show that such thermal equilibrium results are consistent with thermal capture and emission kineticsonly if we assume thatDX is a two-electron state. Our results thus support the model of Chadi and Chang in which the distorted configuration is stabilized by capture of two electrons. In other words, the defect exhibits negative effective correlation energy (negativeU).     

Two electron transitions of the exciton bound at the Si Donor confined in GaAs/AlxGa1-xAs quantum wells

The exciton bound to the shallow Si-donor confined in a 100A wide GaAs quantum well has been studied in selective photoluminescence (SPL) and photoluminescence excitation (PLE) spectroscopy. The transition from the ground state, ls(Γ₆), to the first excited state, 2s(Γ₆), of the confined Si donor has been observed via two-electron transitions (TETs) of the donor bound exciton observed in SPL for the first time to the best of our knowledge. The interpretation of the TET peaks is confirmed by PLE measurements. Further, from Zeeman measurements, the magnetic field dependence of the donor ls(Γ₆)-2s(Γ₆) transition energy has been determined.     

Effect of surface encapsulation and As4 overpressure on Si diffusion and impurity-induced layer disordering in GaAs,AlxGa1-xAs,and AlxGa1-xAs-GaAs quantum well heterostructures

Data are presented demonstrating that the surface encapsulant and the As₄ overpressure strongly affect Si diffusion in GaAs and Al_xGa_1-xAs, and thus are important parameters in impurity-induced layer disordering. Increasing As₄ overpressure results in anincrease in diffusion depth in the case of GaAs, and adecrease in diffusion depth for Al_xGa_1-xAs. In addition, the band-edge exciton is observed in absorption on an Al_xGa_1-xAs-GaAs superlattice that is diffused with Si and is converted to bulk crystal Al_yGa_1-yAs via impurity-induced layer disordering. In contrast, the exciton is not observed in absorption on GaAs diffused with Si in spite of the high degree of compensation. These data indicate that the Si diffusion process, and the properties of the diffused material, are different for GaAs and for Al_xGa_1-xAs-GaAs superlattices converted into uniform Al_yGa_1-yAs (0 ≤y ≤x ≤ 1) via impurity-induced layer disordering with the amphoteric dopant Si.     

GaAs MISFET制备中柠檬酸/双氧水溶液对GaAs/AlxGa1-xAs结构的选择湿法腐蚀

用α台阶仪和原子力显微镜(AFM)研究了不同体积比的柠檬酸(50%)/双氧水溶液对GaAs/AlxGa1-xAs系统的选择湿法腐蚀特性,对AlxGa1-xAs停止层的组分和腐蚀液体积比进行了优化.当腐蚀液体积比在1.5∶1到2∶1范围时获得了最好的选择腐蚀效果.在25℃.温度条件下,当腐蚀液体积比为1.5∶1时,对Al摩尔分数x为0.2、0.3和1的GaAs/AlxGa1-xAs系统腐蚀比分别为45、74和大于200,表面腐蚀形貌均匀平整.将这种选择腐蚀技术用于GaAsMISFET的栅槽工艺,获得了良好的阈值电压均匀性.     

Effect of local alloy disorder on the emission kinetics of deep donors (DX centers) in AlxGa1-xAs

In this paper we summarize our recent studies of the effects of local alloy disorder on the properties ofDX levels. A single emission rate is observed in GaAs where all Si-donors have identical local environments. In contrast, three discrete emission rates are observed in dilute AlGaAs alloys, suggesting that the group IV donor moves towards the interstitial site, thereby “selecting” three of the twelve surrounding group III atoms. We present evidence for an ordering of theDX levels consistent with Morgan’s model of a deepening potential well for theDX level as Al atoms are subsequently substituted for Ga atoms near the relaxed donor. These conclusions are consistent with earlier calculations of Chadi and Chang.     

Use of tertiarybutylphosphine for the growth of InP and GaAs1-xPx

A newly-developed phosphorus source, tertiarybutylphosphine (TBP), which is much less toxic than PH₃, has been used to grow InP and GaAs_1-xP_x by atmospheric pressure organometallic vapor phase epitaxy (OMVPE). Excellent morphologies are obtained for the growth of InP between 560 and 630° C for TBP partial pressures larger than 0.5 x 10^-3. For the first time, V/III ratios as low as 3 have been used to grow InP epilayers with featureless morphologies at 600° C. To obtain good morphologies at both lower and higher temperatures, higher TBP partial pressures are necessary. The electron mobility increases and the electron density decreases as the temperature is increased. The highest room temperature mobilities and lowest electron densities, obtained at 630° C, are 3800 cm²/V-sec and 3 x 10¹⁵ cm^-3, respectively. The 10 K photoluminescence spectra of the InP epilayers at higher growth temperatures show no carbon contamination. Bound excition half widths as low as 3.0 meV have been measured. The use of TBP to replace PH₃ in the growth of GaAs_1-xP_x results in a nearly linear relationship between vapor and solid composition at 610° C,i.e., the P distribution coefficient is nearly unity. This contrasts sharply with the very low P distribution coefficient obtained using PH₃ at such low growth temperatures.